JP4476595B2 - Vacuum suction jig - Google Patents

Vacuum suction jig Download PDF

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JP4476595B2
JP4476595B2 JP2003362997A JP2003362997A JP4476595B2 JP 4476595 B2 JP4476595 B2 JP 4476595B2 JP 2003362997 A JP2003362997 A JP 2003362997A JP 2003362997 A JP2003362997 A JP 2003362997A JP 4476595 B2 JP4476595 B2 JP 4476595B2
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mounting member
jig
support member
vacuum suction
glass
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JP2005125446A (en
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知之 小倉
伸也 佐藤
亜希子 梅木
達也 塩貝
正弘 森
俊一 佐々木
智浩 石野
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Taiheiyo Cement Corp
NTK Ceratec Co Ltd
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Nihon Ceratec Co Ltd
Taiheiyo Cement Corp
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Description

本発明は、例えばラップなどの湿式加工を行う際、被加工物(被吸着物)である半導体ウエハやガラス基板などを吸着保持するのに用いられる真空吸着用治具に関するものである。   The present invention relates to a vacuum chucking jig used for sucking and holding a semiconductor wafer, a glass substrate, or the like, which is a workpiece (a workpiece to be adsorbed), when performing wet processing such as lapping.

たとえば半導体装置の製造過程において、半導体ウエハを搬送したり、加工したり、あるいは検査したりする際には、真空吸着力を利用して半導体ウエハを保持する治具が用いられている。こうした真空吸着用治具としては、被吸着物である半導体ウエハが載置される吸着面に多数の開口を、また、内部にこの開口各々から続く多数の貫通孔を形成したものが一般的である。使用時には、治具に接続された真空ポンプの作用で貫通孔内が真空状態となり、その結果、吸着面の開口を閉塞するよう載置される半導体ウエハは治具に吸着保持される。 For example, when a semiconductor wafer is transported, processed, or inspected in the process of manufacturing a semiconductor device, a jig for holding the semiconductor wafer using a vacuum adsorption force is used. As such a vacuum suction jig, generally, a plurality of openings are formed on a suction surface on which a semiconductor wafer as an object to be sucked is placed, and a plurality of through holes continuing from each of the openings are formed inside. is there. During use, the inside of the through hole is evacuated by the action of a vacuum pump connected to the jig, and as a result, the semiconductor wafer placed so as to close the opening of the adsorption surface is adsorbed and held by the jig.

しかしながら、この真空吸着用治具には次のような問題点がある。すなわち、上記開口はある一定の間隔で治具吸着面に形成されているわけであるが、真空吸着力は実際のところ局所的にしか、つまりこの開口が存在する地点にしか働かない。したがって、吸着力は均一なものとはならず、安定した吸着保持状態を実現するのは困難である。そして当然のことながら、このような状態では、半導体ウエハの加工精度が低下するなど、さまざまな不具合が生じやすい。   However, this vacuum suction jig has the following problems. That is, the openings are formed on the jig suction surface at a certain interval, but the vacuum suction force actually works only locally, that is, only at the point where the opening exists. Therefore, the suction force is not uniform, and it is difficult to realize a stable suction holding state. Of course, in such a state, various problems such as a decrease in the processing accuracy of the semiconductor wafer are likely to occur.

こうした問題点に鑑みて、被吸着物が載置される部位を、多孔質体から構成してなる治具が提案されている(たとえば特許文献1参照)。さらに具体的に言うと、この改良型の真空吸着用治具は、表面および内部に互いに連通した無数の気孔が存在する多孔質体からなる載置部材と、非多孔質体からなる支持部材とを主要構成要素として具備する。支持部材は載置部材全体を収容する凹部を有しており、したがって両者は、密封層となる板ガラス、もしくは、板ガラスとガラス粉末を間に挟んで、載置部材が支持部材に嵌合収容された状態となるよう、まず組み合わされる。改良型の真空吸着用治具は、さらに所定の温度で熱処理を行い、支持部材と載置部材とを接合し、一体化することによってできあがっている。
特開昭53−90871号公報
In view of these problems, a jig is proposed in which a portion on which an adsorbent is placed is made of a porous body (see, for example, Patent Document 1). More specifically, the improved vacuum suction jig includes a mounting member made of a porous body having innumerable pores communicating with each other on the surface and inside, and a support member made of a non-porous body. As a main component. The support member has a recess that accommodates the entire mounting member. Therefore, both of the mounting member are fitted and accommodated in the support member with the glass sheet serving as a sealing layer or the glass sheet and the glass powder interposed therebetween. First, it is combined so that it will be in the state. The improved vacuum chuck is completed by further heat-treating at a predetermined temperature, joining the support member and the mounting member, and integrating them.
JP-A-53-90871

上記提案に係る真空吸着用治具を用いれば、半導体ウエハなどの被吸着物を、吸着面全域において均一な力で吸着することができる。すなわち、安定した吸着保持状態を容易に実現することが可能で、加工精度の低下といった不具合は生じにくい。ところが、その一方で次のような問題を抱えている。吸着保持した被吸着物を加工する際、たとえば研削加工する際には、研削屑や脱落砥粒(研削砥石の自生作用による脱落した砥粒)などの汚染物質が発生する。こうした環境下で、多孔質体からなる載置部材を備えた真空吸着用治具を使用した場合、汚染物質は不可避的に載置部材内部に吸い込まれてしまう。 If the vacuum suction jig according to the above proposal is used, an object to be adsorbed such as a semiconductor wafer can be adsorbed with a uniform force over the entire adsorbing surface. That is, it is possible to easily realize a stable suction holding state, and problems such as a decrease in processing accuracy are unlikely to occur. However, on the other hand, it has the following problems. When processing the object to be adsorbed and held, for example, when grinding, contaminants such as grinding scraps and falling abrasive grains (abrasive grains dropped due to the self-generated action of the grinding wheel) are generated. Under such circumstances, when a vacuum suction jig having a mounting member made of a porous material is used, contaminants are inevitably sucked into the mounting member.

載置部材の内部に汚染物質が侵入した状態(目詰り状態)で真空吸着用治具を使い続けると、汚染物質が半導体ウエハの裏面に転移するおそれがある。このため真空吸着用治具、特にその載置部材は定期的に洗浄しなければならない。ところで洗浄作業は、治具の内部に、支持部材裏面の吸引口から洗浄液を圧入することによって行われる。だが、従来型の真空吸着用治具では、こうした洗浄処理を施しても載置部材と支持部材との境界部分から洗浄液が漏れだしてしまい、汚染物質による載置部材の目詰りを完全に解消できないことが多かった。   If the vacuum suction jig is continuously used in a state where the contaminant has entered the inside of the mounting member (clogged state), the contaminant may be transferred to the back surface of the semiconductor wafer. For this reason, the vacuum suction jig, particularly its mounting member, must be cleaned periodically. By the way, the cleaning operation is performed by press-fitting the cleaning liquid into the jig from the suction port on the back surface of the support member. However, with the conventional vacuum chuck, the cleaning liquid leaks from the boundary between the mounting member and the support member even after such a cleaning process, completely eliminating clogging of the mounting member due to contaminants. There were many things I couldn't do.

したがって、本発明が解決しようとする課題は、洗浄時に載置部材と支持部材との境界部分から洗浄液が漏れ出さないようにし、載置部材の内部に侵入した汚染物質が被吸着面に転移し、それを汚染してしまうといった問題が起きないようにすることである。さらには、洗浄処理によって載置部材の目詰りを完全に解消して、真空吸着用治具を長期間の使用に耐えられるようにすることである。   Therefore, the problem to be solved by the present invention is to prevent the cleaning liquid from leaking from the boundary portion between the mounting member and the support member during cleaning, and the contaminants that have entered the mounting member are transferred to the surface to be adsorbed. , To avoid the problem of contaminating it. Furthermore, the clogging of the mounting member is completely eliminated by the cleaning process so that the vacuum suction jig can withstand long-term use.

上記の課題を解決するべく鋭意研究を推し進めた結果、本発明は、洗浄時に、載置部材と支持部材との境界部分から洗浄液が漏れ出す原因を突き止めた。すなわち従来の真空吸着用治具は、上述したように、多孔質体からなる載置部材を、接着層となるガラス粉末を挟んで支持部材の凹部に収容し、さらに熱処理を施すことにより製造されている。つまり、溶融したガラスが載置部材と支持部材とを一体化させ、この結果、真空吸着用治具ができあがるわけである。 As a result of advancing earnest research to solve the above problems, the present invention has found the cause of the cleaning liquid leaking from the boundary portion between the mounting member and the support member during cleaning. In other words, as described above, a conventional vacuum suction jig is manufactured by storing a mounting member made of a porous body in a concave portion of a support member with a glass powder serving as an adhesive layer interposed therebetween, and further performing a heat treatment. ing. That is, the molten glass integrates the mounting member and the support member, and as a result, a vacuum suction jig is completed.

こうした手法により載置部材を支持部材に接合した場合、両者の接合面、さらに詳しくは載置部材と接着層との境界面には、微細な空隙が生じやすい。これは、溶融したガラスの一部が、載置部材の表層部分に浸透するからであると考えられる。さて、真空吸着用治具の内部に洗浄液を圧入した場合、その全量が載置部材の内部を経て、表面(吸着面)から排出されるのが理想である。ところが、載置部材と接着層との境界域に微細な空隙が生じた真空吸着用治具では、その内部に圧入した洗浄液の大半が、この空隙を通過して、載置部材と支持部材の境界部分、正確には載置部材の局面と支持部材の凹部周壁面との間の空隙から外に排出されてしまう。こうした理由で、従来は載置部材の内部を十分に洗浄することができなかった。   When the mounting member is bonded to the support member by such a technique, a fine gap is likely to be generated on the joint surface between them, more specifically, on the boundary surface between the mounting member and the adhesive layer. This is considered to be because a part of the molten glass penetrates into the surface layer portion of the mounting member. Now, when the cleaning liquid is press-fitted into the vacuum suction jig, it is ideal that the entire amount is discharged from the surface (suction surface) through the inside of the mounting member. However, in a vacuum suction jig in which a fine gap is generated in the boundary region between the mounting member and the adhesive layer, most of the cleaning liquid press-fitted into the gap passes through the gap, and the mounting member and the support member It will be discharged | emitted out of the space | gap between a boundary part and the aspect of a mounting member and the recessed part surrounding wall surface of a supporting member correctly. For these reasons, conventionally, the inside of the mounting member cannot be sufficiently cleaned.

そこで本発明者は、載置部材と接着層との境界域に生じる微細な空隙を経て、載置部材の周面と支持部材の凹部周壁面との間の空隙に向かう洗浄液の無用な流れを遮断できるよう治具の内部構造を工夫すれば、上記の課題を解決できるであろうと考えた。こうした技術的思想に基づき。さらに研究を進めた結果、支持部材の凹部底面上に、この凹部の周壁面に沿って載置部材と接着層との境界域を取り囲むよう、環状の板ガラス、もしくは環状の板ガラスの表面に少なくとも有機系接着剤を含むガラス粉末を溶融し、固化させて得た環状の密封層を設ければよいことを見出した。   Therefore, the present inventor passes an unnecessary flow of the cleaning liquid toward the gap between the peripheral surface of the mounting member and the concave peripheral wall surface of the support member through the fine gap generated in the boundary region between the mounting member and the adhesive layer. We thought that the above problem could be solved by devising the internal structure of the jig so that it could be shut off. Based on these technical ideas. As a result of further research, on the bottom surface of the concave portion of the support member, at least organic on the surface of the annular plate glass or the annular plate glass so as to surround the boundary area between the mounting member and the adhesive layer along the peripheral wall surface of the concave portion. It has been found that an annular sealing layer obtained by melting and solidifying glass powder containing a system adhesive may be provided.

すなわち、環状の板ガラス、もしくは、環状の板ガラスの表面に塗布される有機系接着剤を含むガラス粉末は、熱処理を行った際、板ガラスは部分的に溶融し、さらに、有機系接着剤から発生するガスが溶融したガラスを発泡させ、最終的に、十分な液密性を有する閉気孔層つまり密封層となる。そして、上記のごとく配置されたこの密封層は、載置部材と接着層との境界域に生じる微細な空隙を経て、載置部材の周面と支持部材の凹部周壁面との間の空隙に向かう洗浄液の流れは、環状の密封層の存在によって完全に遮断される。したがって、真空吸着用治具の内部に圧入した洗浄液は、その全量が載置部材の内部を経て、表面(吸着面)から排出されるようになる。   That is, when a glass powder containing an organic adhesive applied to the surface of an annular plate glass or an annular plate glass is subjected to heat treatment, the plate glass partially melts and is further generated from the organic adhesive. The glass in which the gas is melted is foamed and finally becomes a closed pore layer having a sufficient liquid-tightness, that is, a sealing layer. Then, the sealing layer arranged as described above passes through a fine gap generated in the boundary region between the mounting member and the adhesive layer, and is formed into a gap between the peripheral surface of the mounting member and the concave peripheral wall surface of the support member. The direction of the flow of cleaning liquid is completely blocked by the presence of the annular sealing layer. Therefore, the entire amount of the cleaning liquid press-fitted into the vacuum suction jig is discharged from the surface (suction surface) through the inside of the mounting member.

本発明は、こうした新知見に基づいてなされたものであり、上記の課題を解決するため、被吸着物が載置される、多孔質体から構成された載置部材と、一主面側に、この載置部材を収容するための凹部が形成されてなるとともに、載置部材をこの凹部に収容した状態で支持する支持部材と、載置部材における被吸着物とを接する上面に対抗する下面と、支持部材における凹部の底面との間に介在させた、載置部材と支持部材とを接合する接着層と、を具備してなる真空吸着用治具について、支持部材における凹部の底面上に、この凹部の周壁面に沿って載置部材と接着層の境界域を取り囲むよう、環状の板ガラス、もしくは、環状の板ガラスの表面に少なくとも有機系接着剤を含むガラス粉末を塗布したものを設置後に熱処理して溶融し、固化させて得た環状の密封層を設けたことを特徴とする。ここで、「載置部材と接着層との境界域を取り囲む」とは、密封層が、載置部材および接着層の両方にまたがり、かつ、それらに接した状態で存在していることを意味する。   The present invention has been made on the basis of such new findings, and in order to solve the above-described problems, a placement member composed of a porous body on which an object to be adsorbed is placed, and a main surface side. A lower surface that is formed with a recess for accommodating the mounting member, and that supports a support member that supports the mounting member in a state in which the mounting member is accommodated in the recess, and an upper surface that contacts the object to be adsorbed on the mounting member. And an adhesive layer for joining the mounting member and the support member, interposed between the bottom surface of the concave portion in the support member, on the bottom surface of the concave portion in the support member. After installing the annular plate glass or the glass plate containing at least an organic adhesive on the surface of the annular plate glass so as to surround the boundary area between the mounting member and the adhesive layer along the peripheral wall surface of the recess Heat treated to melt and solidify It is not characterized by providing an annular sealing layer was obtained. Here, “surrounding the boundary area between the mounting member and the adhesive layer” means that the sealing layer extends over both the mounting member and the adhesive layer and exists in contact with them. To do.

なお、上記密封層を形成する環状の板ガラスとしては、900℃程度の温度で部分的に溶融する、市販の普通板ガラスを使用することができる。また、この環状の板ガラス表面に塗布する上記密封層を形成する混合物が含有する混合物としては、市販の有機系接着剤としては、たとえばエポキシ樹脂、シリコン樹脂、アクリル樹脂、フェノール樹脂などが挙げられる。また、密封層を形成する混合物には、さらにアルミナ(Al2O3)粉末などを混合してもよく、この場合に、アルミナ粉末はフィラーとして機能することとなる。   In addition, as a cyclic | annular plate glass which forms the said sealing layer, the commercially available normal plate glass which melt | dissolves partially at the temperature of about 900 degreeC can be used. Moreover, as a mixture which the mixture which forms the said sealing layer apply | coated to this cyclic | annular plate glass surface contains a commercially available organic adhesive, an epoxy resin, a silicone resin, an acrylic resin, a phenol resin etc. are mentioned, for example. In addition, alumina (Al2O3) powder or the like may be further mixed with the mixture forming the sealing layer, and in this case, the alumina powder functions as a filler.

特に、上記密封層を形成する環状の板ガラス表面に塗布する混合物として、ガラス粉末、エポキシ樹脂、そしてアルミナ粉末の3成分からなるものを用いる場合、ガラス粉末の比率は50〜80重量%、エポキシ樹脂の比率は10〜20重量%、そしてアルミナ粉末の比率は10〜30重量%に設定されることが好ましい。ただし、言うまでもなく、ガラス粉末の比率α、エポキシ樹脂の比率β、そして、アルミナ粉末の比率γは、これらの総和すなわちα+β+γが100%となるように相互に調整される。 In particular, when a mixture composed of three components of glass powder, epoxy resin, and alumina powder is used as the mixture applied to the surface of the annular plate glass forming the sealing layer, the ratio of the glass powder is 50 to 80% by weight, epoxy resin Is preferably set to 10 to 20% by weight, and the alumina powder is preferably set to 10 to 30% by weight. However, it goes without saying that the ratio α of the glass powder, the ratio β of the epoxy resin, and the ratio γ of the alumina powder are mutually adjusted so that the sum of these, that is, α + β + γ becomes 100%.

真空吸着用治具を上記のごとく構成する場合、まず、有機系接着剤の存在により、常温において、環状の板ガラスを介して、載置部材と支持部材とを接着(仮止め)することが可能となり、この結果、治具製造時の作業性が大幅に向上する。次に、熱処理を行った際には、上述したとおり環状の板ガラスの一部および有機系接着剤を含むガラス粉末が発泡溶融して環状の密封層となり、これが、載置部材と接着層との境界域に生じる微細な空隙を経て、載置部材の周面と支持部材の凹部周壁面との空隙に向かう洗浄液の流れを完全に遮断する。よって、真空吸着用治具の内部に圧入した洗浄液が、載置部材と支持部材との境界部分から外に漏れ出すことはなく、その全てが載置部材の内部を経て、吸着面全域から排出されるようになる。     When the vacuum suction jig is configured as described above, first, the mounting member and the supporting member can be bonded (temporarily fixed) via an annular plate glass at room temperature due to the presence of the organic adhesive. As a result, the workability at the time of manufacturing the jig is greatly improved. Next, when the heat treatment is performed, as described above, a part of the annular plate glass and the glass powder containing the organic adhesive are foamed and melted to form an annular sealing layer, which is formed between the mounting member and the adhesive layer. The flow of the cleaning liquid toward the gap between the peripheral surface of the mounting member and the peripheral wall surface of the concave portion of the support member is completely blocked through the fine gap generated in the boundary region. Therefore, the cleaning liquid press-fitted into the vacuum suction jig does not leak out from the boundary portion between the mounting member and the support member, and all of it is discharged from the entire suction surface through the mounting member. Will come to be.

したがって、本発明に係る真空吸着用治具は、載置部材の内部を十分に洗浄することが可能である。すなわち治具をある一定期間にわたって継続使用することで、載置部材の内部に汚染物質が侵入してしまっても、洗浄作業を実施すれば、それを速やかに取り除くことができる。また、定期的に洗浄作業を実施することで、載置部材の内部に侵入した汚染物質が被吸着面に転移し、それを汚染してしまうという問題は解消される。さらに、本発明に係る真空吸着用治具は、洗浄処理によって載置部材の目詰りを解消することができるため、良好な吸着性能を維持したまま、長期間の使用にも十分に耐える。ゆえに、耐用年数を延ばすことができ、経済性にも優れる。   Therefore, the vacuum suction jig according to the present invention can sufficiently clean the inside of the mounting member. That is, by continuously using the jig for a certain period of time, even if a contaminant enters the inside of the mounting member, it can be quickly removed by performing a cleaning operation. Further, by periodically performing the cleaning operation, the problem that the contaminants that have entered the inside of the mounting member are transferred to the surface to be adsorbed and contaminated is solved. Furthermore, since the vacuum suction jig according to the present invention can eliminate clogging of the mounting member by the cleaning process, it can sufficiently withstand long-term use while maintaining good suction performance. Therefore, the service life can be extended and the economy is excellent.

以下、図1及び図2を用いて、本発明の一実施形態を具体的に説明する。ここで、図1は本実施形態に係る真空吸着用治具(以下、本治具とも言う)の平面図、図2は図1におけるX−X線での本治具の断面図である。さて、本治具は、例えば半導体ウエハなどの吸着保持に使用されるものである。すなわち、半導体ウエハなどの被吸着物は、本治具によって吸着保持された状態で搬送され、また、同状態で加工や検査などが実施されることになる。   Hereinafter, an embodiment of the present invention will be described in detail with reference to FIGS. 1 and 2. Here, FIG. 1 is a plan view of a vacuum suction jig (hereinafter also referred to as this jig) according to the present embodiment, and FIG. 2 is a cross-sectional view of the jig taken along line XX in FIG. Now, this jig is used, for example, for sucking and holding a semiconductor wafer or the like. That is, an object to be adsorbed such as a semiconductor wafer is conveyed while being adsorbed and held by the jig, and processing and inspection are performed in the same state.

本治具は円盤状の外形を有しており、その上面(吸着面)には、図2に一点鎖線で示すように半導体ウエハ(被吸着物)Fは治具上面に吸着保持される。すなわち、図示していない真空ポンプを作動させると、それに接続された本治具の内部空間は真空状態となり、その結果生じる真空吸着力が半導体ウエハFを吸着面上に拘束する。   The jig has a disk-like outer shape, and a semiconductor wafer (adsorbed object) F is adsorbed and held on the upper surface (adsorption surface) of the jig as indicated by a one-dot chain line in FIG. That is, when a vacuum pump (not shown) is operated, the internal space of the jig connected thereto is in a vacuum state, and the resulting vacuum suction force restrains the semiconductor wafer F on the suction surface.

さて、本治具は、主要構成要素として、載置部材1及び支持部材2を具備している。このうち載置部材1は多孔質体から構成されており、その上には被吸着物である半導体ウエハFが直に載置される。さらに詳しく言うと、載置部材1はアルミナなどのセラミックスから構成されたものであり、研磨加工によって、その上面(吸着面)は十分に平坦化されている。また、この載置部材1の周面には封孔処理が施されている。すなわち、周面をガラスコーティングすることで気孔の開口を閉塞し、周面からは吸引がなされないようにした。さらに、載置部材1の下面側周縁部には、環状に切欠きを設けている。つまり、載置部材1の下面側周縁部は、その上面にわたって段部を形成した。これは、後述の密封層を配置するスペースを確保するためである。   Now, the jig includes a mounting member 1 and a support member 2 as main components. Among these, the mounting member 1 is composed of a porous body, and a semiconductor wafer F as an adsorbed material is directly mounted thereon. More specifically, the mounting member 1 is made of ceramics such as alumina, and its upper surface (adsorption surface) is sufficiently flattened by polishing. Further, the peripheral surface of the mounting member 1 is sealed. That is, the opening of the pores was closed by coating the peripheral surface with glass so that suction was not performed from the peripheral surface. In addition, an annular notch is provided in the lower surface side peripheral portion of the mounting member 1. That is, the lower surface side peripheral portion of the mounting member 1 formed a step portion over the upper surface. This is to secure a space for arranging a sealing layer described later.

なお、本実施形態では、まず載置部材1の周面にガラスペーストを塗布し、その後、約1000℃にて焼成することでガラスコーティング層(図示せず)を形成している。しかしながら、封孔方法はこれに限定されるわけではない。他にも、載置部材1の材質などを考慮して、樹脂の塗布、溶射、めっきなど、さまざまな手法を採用できる。   In the present embodiment, first, a glass paste is applied to the peripheral surface of the mounting member 1, and then fired at about 1000 ° C. to form a glass coating layer (not shown). However, the sealing method is not limited to this. In addition, various methods such as resin coating, thermal spraying, and plating can be adopted in consideration of the material of the mounting member 1.

また、載置部材1を構成する多孔質体の材質も、本実施形態のものに限定されない。それ以外にもたとえば、ジルコニア、炭化ケイ素、窒化ケイ素などのセラミックス材、あるいは銅やアルミニウム、ステンレスといった金属材、さらにはフッ素樹脂などの樹脂材を用いて、載置部材1を得ることができる。ちなみに、載置部材1を構成する多孔質体としては、気孔の平均径が10〜100μm程度で、かつ、気孔率が20〜40%のものが好ましい。   Moreover, the material of the porous body which comprises the mounting member 1 is not limited to the thing of this embodiment. In addition, for example, the mounting member 1 can be obtained using a ceramic material such as zirconia, silicon carbide, or silicon nitride, a metal material such as copper, aluminum, or stainless steel, or a resin material such as fluororesin. Incidentally, the porous body constituting the mounting member 1 is preferably one having an average pore diameter of about 10 to 100 μm and a porosity of 20 to 40%.

次に、支持部材2についてであるが、この支持部材2も、たとえばアルミナなどのセラミックスから構成されている。しかしながら、支持部材2を構成するセラミックスは、載置部材1とは異なり、緻密な非多孔質体である。なお、支持部材2の材質についても、本実施形態のものに限定されるわけではなく、それ以外にもたとえば、ジルコニア、炭化ケイ素、窒化ケイ素などのセラミックス材、あるいはアルミニウムなどの金属材を用いて構成できる。   Next, as for the support member 2, this support member 2 is also made of ceramics such as alumina. However, unlike the mounting member 1, the ceramic constituting the supporting member 2 is a dense non-porous body. The material of the support member 2 is not limited to that of the present embodiment, and other than that, for example, a ceramic material such as zirconia, silicon carbide, or silicon nitride, or a metal material such as aluminum is used. Can be configured.

支持部材2の上面側(一主面側)には、載置部材1の外形とほとんど同じ大きさの円形の凹部(大径凹部)2aが形成されており、載置部材1はこの凹部2aに完全に収まった状態で、支持部材2と一体化している。言い換えれば、支持部材2は、載置部材1を収容するための凹部2aを有しており、載置部材1をこの凹部2aに嵌合収容した状態で支持する役割を果たす。支持部材2の内部には、さらに、載置部材1が収まる凹部2aよりも内径の小さな凹部(小径凹部)2bが形成されている。この凹部2bの開放面は、凹部2aの底面と同じ高さにあり、また、その底面は、支持部材2の下面に設けた吸気口2cとつながっている。したがって、載置部材1と支持部材2とが一体化された状態、つまり載置部材1によって凹部2bの開放面が閉塞された状態で、吸気口2cに接続した真空ポンプを作動させると、凹部2bの内部が真空となる。   On the upper surface side (one main surface side) of the support member 2, a circular recess (large-diameter recess) 2 a having almost the same size as the outer shape of the mounting member 1 is formed. It is integrated with the support member 2 in a state of being completely accommodated. In other words, the support member 2 has a recess 2a for accommodating the mounting member 1, and plays a role of supporting the mounting member 1 in a state of being fitted and accommodated in the recess 2a. A recess (small-diameter recess) 2b having an inner diameter smaller than the recess 2a in which the mounting member 1 is accommodated is further formed inside the support member 2. The open surface of the recess 2 b is at the same height as the bottom surface of the recess 2 a, and the bottom surface is connected to the intake port 2 c provided on the lower surface of the support member 2. Therefore, when the mounting member 1 and the supporting member 2 are integrated, that is, in a state where the opening surface of the recess 2b is closed by the mounting member 1, the vacuum pump connected to the air inlet 2c is operated. The inside of 2b becomes a vacuum.

続いて、載置部材1と支持部材2との接合部分の構造について、さらに詳しく説明する。本治具は、載置部材1と支持部材2とを接合する接着層3を具備する。すなわち、載置部材1における半導体ウエハFと接する上面に対向する下面と、支持部材2における凹部2aの底面との間には、厚みの小さな接着層3が介在させられている。この接着層3は、熱処理によってガラス粉末(たとえば上記封孔処理に用いられるガラスよりも軟化温度の低いもの)を溶融し、固化させて得たものである。   Next, the structure of the joint portion between the mounting member 1 and the support member 2 will be described in more detail. The jig includes an adhesive layer 3 that joins the placement member 1 and the support member 2. That is, the adhesive layer 3 having a small thickness is interposed between the lower surface facing the upper surface of the mounting member 1 that contacts the semiconductor wafer F and the bottom surface of the recess 2 a of the support member 2. The adhesive layer 3 is obtained by melting and solidifying glass powder (for example, one having a softening temperature lower than that of the glass used for the sealing treatment) by heat treatment.

本治具は、上記接着層3に加えて、さらに環状の密封層4を具備する。この密封層4は、支持部材2における凹部2aの底面上に、この凹部2aの周壁面に沿って、載置部材1と接着層3との境界域を取り囲むように設けられている。言い換えれば、本実施形態では、載置部材1と接着層3との境界面が、環状の密封層4で囲まれた開放空間内に完全に収まった状態となるようにしている。密封層4は、環状の板ガラス、もしくは、環状の板ガラスの表面に少なくとも有機系接着剤を含むガラス粉末を塗布したものを設置後に熱処理によって溶融し、固化させて得たものである。   The jig further includes an annular sealing layer 4 in addition to the adhesive layer 3. The sealing layer 4 is provided on the bottom surface of the concave portion 2a in the support member 2 so as to surround the boundary area between the mounting member 1 and the adhesive layer 3 along the peripheral wall surface of the concave portion 2a. In other words, in this embodiment, the boundary surface between the mounting member 1 and the adhesive layer 3 is in a state of being completely contained in an open space surrounded by the annular sealing layer 4. The sealing layer 4 is obtained by melting and solidifying an annular plate glass or a glass plate containing glass powder containing at least an organic adhesive on the surface of the annular plate glass after installation.

本治具のおおよその製造手順(載置部材1と支持部材2との接合手順)は次のようになる。本治具を得るには、まず、支持部材2における凹部2aの底面上に、特にその周壁面に沿って、環状の板ガラス、もしくは、環状の板ガラスの表面に少なくとも有機系接着剤を含むガラス粉末(以下、密封層を形成する混合物と言う)を塗布したものを環状に設置する。ただし、この密封層を形成する混合物は、載置部材1側、特にその段部に配置してもよい。また、これに加えて支持部材2における凹部2aの底面上には、接着層3となるガラス粉末を適量散布しておく。   The approximate manufacturing procedure of this jig (joining procedure of the mounting member 1 and the support member 2) is as follows. In order to obtain this jig, first, on the bottom surface of the recess 2a in the support member 2, especially along the peripheral wall surface thereof, an annular plate glass, or a glass powder containing at least an organic adhesive on the surface of the annular plate glass The one coated with (hereinafter referred to as a mixture forming a sealing layer) is installed in an annular shape. However, the mixture forming the sealing layer may be disposed on the mounting member 1 side, particularly on the stepped portion. In addition to this, an appropriate amount of glass powder to be the adhesive layer 3 is dispersed on the bottom surface of the recess 2a in the support member 2.

こうして接合準備が整ったならば、続いては、支持部材2の凹部2a内に、周面の封孔処理が済んだ載置部材1を収容する。この際、密封層を形成する混合物が有する接着作用により、常温にもかかわらず、載置部材1は支持部材2に簡単に仮止めされる。載置部材1を支持部材2に組み付けた後は、たとえば900℃程度で熱処理を行い、これによって形成される接着層3及び密封層4の作用で、両者を完全に一体化する。最後に、半導体ウエハFが載置される面(吸着面)をダイヤモンド砥石などを用いて研磨すれば、図2に示すような断面を有する真空吸着用治具が完成となる。   When the preparation for joining is thus completed, the mounting member 1 whose peripheral surface has been sealed is then housed in the recess 2 a of the support member 2. At this time, due to the adhesive action of the mixture forming the sealing layer, the mounting member 1 is simply temporarily fixed to the support member 2 regardless of the room temperature. After the mounting member 1 is assembled to the support member 2, heat treatment is performed at about 900 ° C., for example, and the two are completely integrated by the action of the adhesive layer 3 and the sealing layer 4 formed thereby. Finally, if the surface (suction surface) on which the semiconductor wafer F is placed is polished using a diamond grindstone or the like, a vacuum suction jig having a cross section as shown in FIG. 2 is completed.

さて、真空吸着用治具を上記のごとく構成する場合、熱処理を行った際に、環状の板ガラスの一部および有機系接着剤を含むガラス粉末が発泡溶融して環状の密封層4となる。そしてこれが、載置部材1と接着層3との境界域に生じる微細な空隙を経て、載置部材1の周面と支持部材2における凹部2aの周壁面との間の空隙に向かう洗浄液の流れを完全に遮断する。よって、真空吸着用治具の内部に圧入した洗浄液の一部が、載置部材1と支持部材2との境界部分から外に漏れ出すことはなく、その全量が載置部材1の内部を経て、吸着面全域から排出される。   When the vacuum suction jig is configured as described above, a glass powder containing a part of the annular plate glass and the organic adhesive is foamed and melted to form the annular sealing layer 4 when heat treatment is performed. And this is the flow of the cleaning liquid toward the gap between the peripheral surface of the mounting member 1 and the peripheral wall surface of the recess 2a in the support member 2 through a fine gap generated in the boundary region between the mounting member 1 and the adhesive layer 3. Is completely shut off. Therefore, a part of the cleaning liquid press-fitted into the vacuum suction jig does not leak out from the boundary portion between the mounting member 1 and the supporting member 2, and the entire amount passes through the mounting member 1. , Discharged from the entire adsorption surface.

したがって本治具は、載置部材1の内部を十分に洗浄することが可能である。すなわち、本治具をある一定期間にわたって継続使用することで、載置部材1の内部に汚染物質が侵入してしまっても、洗浄作業を実施すれば、それを速やかに取り除くことができる。また、載置部材1の内部に侵入した汚染物質が半導体ウエハFの裏面に転移し、それを汚染させてしまうといった問題も起きなくなる。さらに本治具は、洗浄処理によって載置部材1の目詰りを容易に解消することができるため、良好な吸着性能を維持したままで長期間の使用にも十分に耐える。ゆえに、耐用年数を延ばすことができ、経済性にも優れる。   Therefore, this jig can sufficiently clean the inside of the mounting member 1. That is, by continuously using this jig for a certain period of time, even if a contaminant enters the inside of the mounting member 1, it can be quickly removed by performing a cleaning operation. Further, the problem that the contaminants that have entered the inside of the mounting member 1 are transferred to the back surface of the semiconductor wafer F and contaminate it does not occur. Further, the jig can easily remove the clogging of the mounting member 1 by the cleaning process, and thus can sufficiently withstand long-term use while maintaining good adsorption performance. Therefore, the service life can be extended and the economy is excellent.

本実施形態に係る真空吸着用治具を、環状の板ガラス及びその表面に塗布して密封層を形成する混合物として、環状の板ガラス(製品名:フロート板ガラス 旭硝子社製)、ガラス粉末(製品名:ASF−100 旭硝子社製)、エポキシ樹脂(製品名:XNR−3305 スリーボンド社製)、そしてアルミナ粉末(WA♯200)からなるものを用いて、計4種類製作した。以下、実施例1〜5は、上記3成分の、質量%で表した混合比率が互いに異なっている。すなわち実施例1は、環状の板ガラスのみで構成されており、実施例2では、ガラス粉末、エポキシ樹脂、アルミナ粉末の配率が60:20:20である。実施例3の配合比率は80:10:10であり、また実施例4及び実施例5の配合比率はそれぞれ50:30:20および40:40:20である。また、比較のために、環状の密封層を持たない従来型の真空吸着用治具も用意した(以下、比較例と言う。他の条件については実施例1〜5と同じ)。   As a mixture for applying the vacuum suction jig according to the present embodiment to an annular plate glass and its surface to form a sealing layer, an annular plate glass (product name: float plate glass manufactured by Asahi Glass Co., Ltd.), glass powder (product name: ASF-100 manufactured by Asahi Glass Co., Ltd., epoxy resin (product name: XNR-3305 manufactured by Three Bond Co.), and alumina powder (WA # 200) were used to produce a total of four types. Hereinafter, Examples 1 to 5 are different from each other in the mixing ratio of the above three components expressed in mass%. That is, Example 1 is composed only of an annular plate glass. In Example 2, the distribution ratio of glass powder, epoxy resin, and alumina powder is 60:20:20. The blending ratio of Example 3 is 80:10:10, and the blending ratios of Example 4 and Example 5 are 50:30:20 and 40:40:20, respectively. For comparison, a conventional vacuum suction jig having no annular sealing layer was also prepared (hereinafter referred to as a comparative example. Other conditions are the same as those in Examples 1 to 5).

実施例1〜5および比較例について洗浄試験を行い、洗浄液の漏出の有無を調べた。洗浄液の圧力は、400kPa(約4気圧)である。結果は、以下の表1に示すとおりのものとなった。次に、実施例1〜5および比較例について、使用開始時の吸着性能、および使用と洗浄処理とを交互に100回繰り返した後(100サイクル後)の吸着性能を調べた。すなわち、被吸着物として半導体ウエハを用い、各治具の吸着能力を、◎(極めて良好)、○(良好)、×(吸着力不足)の3段階で評価した。この結果も表1に併せて示す。   A cleaning test was conducted on Examples 1 to 5 and Comparative Example, and the presence or absence of leakage of the cleaning liquid was examined. The pressure of the cleaning liquid is 400 kPa (about 4 atm). The results were as shown in Table 1 below. Next, with respect to Examples 1 to 5 and the comparative example, the adsorption performance at the start of use and the adsorption performance after alternately repeating the use and the washing treatment 100 times (after 100 cycles) were examined. That is, a semiconductor wafer was used as an object to be adsorbed, and the adsorption ability of each jig was evaluated in three stages: ◎ (very good), ○ (good), and × (insufficient adsorption power). The results are also shown in Table 1.

Figure 0004476595
Figure 0004476595

表1の結果より、本発明の真空吸着用治具は、洗浄液の漏出は無く、使用と洗浄処理とを交互に100回繰り返した後(100サイクル後)の吸着性能は良好であった。
一方比較例では、洗浄液の漏出が見られ、また、吸着性能の低下も顕著であった。さらには、被吸着物の汚染の程度が著しく増加した。
From the results of Table 1, the vacuum adsorption jig of the present invention did not leak the cleaning liquid, and the adsorption performance after 100 times of repeated use and cleaning treatment (after 100 cycles) was good.
On the other hand, in the comparative example, leakage of the cleaning liquid was observed, and the decrease in adsorption performance was significant. Furthermore, the degree of contamination of the adsorbents has increased significantly.

本発明の実施形態に係る真空吸着用治具の平面図である。It is a top view of the jig for vacuum suction concerning the embodiment of the present invention. 図1におけるX-X線での、本発明の実施形態に係る真空吸着用治具の断面図である。It is sectional drawing of the jig | tool for vacuum suction which concerns on embodiment of this invention in the XX line in FIG.

符号の説明Explanation of symbols

1 載置部材
2 支持部材
2a 支持部材の凹部(大径凹部)
2b 支持部材の凹部(小径凹部)
2c 支持部材の吸気口
3 接着層
4 密封層
F 半導体ウエハ(被吸着物)
1 Mounting member 2 Support member
2a Recess of support member (large diameter recess)
2b Support member recess (small-diameter recess)
2c Support member air inlet 3 Adhesive layer 4 Sealing layer F Semiconductor wafer (adsorbent)

Claims (1)

被吸着物が載置される、多孔質体から構成された載置部材と、一主面側に、この載置部材を収容するための凹部が形成されてなるとともに、載置部材をこの凹部に収容した状態で支持する支持部材と、載置部材における被吸着物とを接する上面に対抗する下面と、支持部材における凹部の底面との間に介在させた、載置部材と支持部材とを接合する接着層と、を具備してなる真空吸着用治具であって、支持部材における凹部の底面上に、この凹部の周壁面に沿って載置部材と接着層の境界域を取り囲むよう、環状の板ガラス表面に少なくとも有機系接着剤を含むガラス粉末を塗布したものを設置後に熱処理して得た環状の密封層を設けたことを特徴とする真空吸着用治具。 A placing member made of a porous body on which an object to be adsorbed is placed, and a concave portion for accommodating the placing member is formed on one main surface side. A mounting member and a supporting member that are interposed between a supporting member that is supported in a state of being accommodated in the housing, a lower surface that opposes the upper surface that contacts the object to be adsorbed in the mounting member, and a bottom surface of the recess in the supporting member A vacuum suction jig comprising a bonding layer to be joined, and on the bottom surface of the concave portion of the support member, so as to surround the boundary region between the mounting member and the adhesive layer along the peripheral wall surface of the concave portion, A vacuum suction jig comprising an annular sealing layer obtained by heat-treating a glass plate containing at least an organic adhesive coated on an annular plate glass surface after installation.
JP2003362997A 2003-10-23 2003-10-23 Vacuum suction jig Expired - Fee Related JP4476595B2 (en)

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JP4476595B2 true JP4476595B2 (en) 2010-06-09

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4577100A (en) * 1983-12-27 1986-03-18 United Technologies Corporation Temperature compensated optical pressure sensor
JP2007035999A (en) * 2005-07-28 2007-02-08 Sumitomo Electric Ind Ltd Wafer holding body for wafer prober, and wafer prober for mounting the same
JP5143607B2 (en) * 2008-03-28 2013-02-13 太平洋セメント株式会社 Vacuum adsorption device
JP2010118424A (en) * 2008-11-12 2010-05-27 Disco Abrasive Syst Ltd Conveying device for thin plate type workpiece
JP5489744B2 (en) * 2010-01-23 2014-05-14 京セラ株式会社 Method for manufacturing adsorption member
JP2015170617A (en) * 2014-03-04 2015-09-28 東京エレクトロン株式会社 Liquid processing apparatus
CN105081971A (en) * 2015-08-31 2015-11-25 平凉市老兵科技研发有限公司 Transfer sucker for thinning machine

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