JP4470095B2 - 照明光学装置、露光装置および露光方法 - Google Patents

照明光学装置、露光装置および露光方法 Download PDF

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Publication number
JP4470095B2
JP4470095B2 JP2003390672A JP2003390672A JP4470095B2 JP 4470095 B2 JP4470095 B2 JP 4470095B2 JP 2003390672 A JP2003390672 A JP 2003390672A JP 2003390672 A JP2003390672 A JP 2003390672A JP 4470095 B2 JP4470095 B2 JP 4470095B2
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Prior art keywords
illumination
light source
optical axis
prism
light beam
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Japanese (ja)
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JP2005156592A5 (enrdf_load_stackoverflow
JP2005156592A (ja
Inventor
修 谷津
壽 西永
威人 工藤
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Nikon Corp
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Nikon Corp
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  • Microscoopes, Condenser (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003390672A 2003-11-20 2003-11-20 照明光学装置、露光装置および露光方法 Expired - Fee Related JP4470095B2 (ja)

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JP2003390672A JP4470095B2 (ja) 2003-11-20 2003-11-20 照明光学装置、露光装置および露光方法

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JP2003390672A JP4470095B2 (ja) 2003-11-20 2003-11-20 照明光学装置、露光装置および露光方法

Related Child Applications (2)

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JP2010003941A Division JP4952801B2 (ja) 2010-01-12 2010-01-12 照明光学系、露光装置および露光方法
JP2010003938A Division JP4952800B2 (ja) 2010-01-12 2010-01-12 照明光学系、露光装置および露光方法

Publications (3)

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JP2005156592A JP2005156592A (ja) 2005-06-16
JP2005156592A5 JP2005156592A5 (enrdf_load_stackoverflow) 2008-02-28
JP4470095B2 true JP4470095B2 (ja) 2010-06-02

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016139143A (ja) * 2016-02-15 2016-08-04 株式会社ニコン 照明光学装置、露光装置および露光方法
JP2017173839A (ja) * 2017-05-11 2017-09-28 株式会社ニコン 照明光学装置、露光装置および露光方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2157480B1 (en) 2003-04-09 2015-05-27 Nikon Corporation Exposure method and apparatus, and device manufacturing method
TWI511179B (zh) 2003-10-28 2015-12-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI389174B (zh) 2004-02-06 2013-03-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US20050225740A1 (en) * 2004-03-31 2005-10-13 Padlyar Sushil D Light source for photolithography
KR101544336B1 (ko) 2005-05-12 2015-08-12 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP4676815B2 (ja) * 2005-05-26 2011-04-27 ルネサスエレクトロニクス株式会社 露光装置および露光方法
JP2007220767A (ja) * 2006-02-15 2007-08-30 Canon Inc 露光装置及びデバイス製造方法
JP2008108851A (ja) * 2006-10-24 2008-05-08 Canon Inc 照明装置及び当該照明装置を有する露光装置、並びに、デバイス製造方法
WO2008080534A1 (en) * 2006-12-28 2008-07-10 Carl Zeiss Smt Ag Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
DE102007019831B4 (de) * 2007-04-25 2012-03-01 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP5365982B2 (ja) * 2008-10-02 2013-12-11 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
DE102013214459B4 (de) * 2013-07-24 2015-07-16 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage
JP5644921B2 (ja) * 2013-09-09 2014-12-24 株式会社ニコン 照明光学装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016139143A (ja) * 2016-02-15 2016-08-04 株式会社ニコン 照明光学装置、露光装置および露光方法
JP2017173839A (ja) * 2017-05-11 2017-09-28 株式会社ニコン 照明光学装置、露光装置および露光方法

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