JP4464715B2 - 液晶表示装置およびこれらの製造方法 - Google Patents

液晶表示装置およびこれらの製造方法 Download PDF

Info

Publication number
JP4464715B2
JP4464715B2 JP2004065616A JP2004065616A JP4464715B2 JP 4464715 B2 JP4464715 B2 JP 4464715B2 JP 2004065616 A JP2004065616 A JP 2004065616A JP 2004065616 A JP2004065616 A JP 2004065616A JP 4464715 B2 JP4464715 B2 JP 4464715B2
Authority
JP
Japan
Prior art keywords
film
forming
transparent conductive
photolithography
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004065616A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005259371A (ja
JP2005259371A5 (enExample
Inventor
久美 津田
卓司 今村
和式 井上
徹 竹口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2004065616A priority Critical patent/JP4464715B2/ja
Publication of JP2005259371A publication Critical patent/JP2005259371A/ja
Publication of JP2005259371A5 publication Critical patent/JP2005259371A5/ja
Application granted granted Critical
Publication of JP4464715B2 publication Critical patent/JP4464715B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Liquid Crystal (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP2004065616A 2004-03-09 2004-03-09 液晶表示装置およびこれらの製造方法 Expired - Fee Related JP4464715B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004065616A JP4464715B2 (ja) 2004-03-09 2004-03-09 液晶表示装置およびこれらの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004065616A JP4464715B2 (ja) 2004-03-09 2004-03-09 液晶表示装置およびこれらの製造方法

Publications (3)

Publication Number Publication Date
JP2005259371A JP2005259371A (ja) 2005-09-22
JP2005259371A5 JP2005259371A5 (enExample) 2006-11-16
JP4464715B2 true JP4464715B2 (ja) 2010-05-19

Family

ID=35084908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004065616A Expired - Fee Related JP4464715B2 (ja) 2004-03-09 2004-03-09 液晶表示装置およびこれらの製造方法

Country Status (1)

Country Link
JP (1) JP4464715B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101147261B1 (ko) 2004-12-04 2012-05-18 엘지디스플레이 주식회사 반투과형 박막 트랜지스터 기판 및 그 제조 방법
TWI292625B (en) * 2006-01-02 2008-01-11 Au Optronics Corp Fabricating method for pixel structure
JP5000937B2 (ja) * 2006-06-30 2012-08-15 三菱電機株式会社 半導体デバイスの製造方法
JP5175064B2 (ja) * 2007-06-01 2013-04-03 株式会社ジャパンディスプレイウェスト 電気光学装置の製造方法および透明電極の形成方法
JP5437895B2 (ja) 2010-04-20 2014-03-12 株式会社ジャパンディスプレイ 表示装置及びその製造方法
JP2014095795A (ja) 2012-11-09 2014-05-22 Japan Display Inc 液晶表示装置およびその製造方法
KR101504839B1 (ko) * 2012-11-30 2015-03-23 주식회사 엘지화학 전도성 기판 및 이의 제조방법
JP6268568B2 (ja) * 2013-04-09 2018-01-31 大日本印刷株式会社 積層体の製造方法および積層体

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3850462B2 (ja) * 1995-04-26 2006-11-29 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2000067657A (ja) * 1998-08-26 2000-03-03 Internatl Business Mach Corp <Ibm> 赤外線透過に優れた透明導電膜及びその製造方法
JP2002170431A (ja) * 2000-11-29 2002-06-14 Idemitsu Kosan Co Ltd 電極基板およびその製造方法
JP2003163221A (ja) * 2001-11-28 2003-06-06 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
JP4479994B2 (ja) * 2004-02-27 2010-06-09 株式会社半導体エネルギー研究所 半導体装置の作製方法

Also Published As

Publication number Publication date
JP2005259371A (ja) 2005-09-22

Similar Documents

Publication Publication Date Title
US7847910B2 (en) Display panel and method of manufacturing the same
KR100698950B1 (ko) 박막 트랜지스터 어레이 기판의 제조방법
US7986387B2 (en) Transflective liquid crystal display device and method of fabricating the same
US7553711B2 (en) Method for fabricating a thin film transistor for use with a flat panel display device
US20090250244A1 (en) Transparent conductive film, display device, and manufacturing method thereof
CN100517734C (zh) Tft阵列衬底的制造方法
US20050122443A1 (en) Array substrate for liquid crystal display device and fabricating method thereof
JP4802462B2 (ja) 薄膜トランジスタアレイ基板の製造方法
US7388229B2 (en) Thin film transistor substrate, manufacturing method of thin film transistor, and display device
US8030654B2 (en) Thin film transistor and method of manufacturing the same
CN100555641C (zh) Tft阵列衬底及其制造方法、以及使用该衬底的显示装置
US7833813B2 (en) Thin film transistor array panel and method of manufacturing the same
JP4464715B2 (ja) 液晶表示装置およびこれらの製造方法
US7002651B2 (en) Transflective type liquid crystal display device and method for manufacturing the same
US7630049B2 (en) Display device and method with lower layer film formed on substrate but between transparent conductive film and organic layer and then protective film on the transparent film
JP5393071B2 (ja) 電子デバイス、及びその製造方法、並びに電子機器
JP4338481B2 (ja) 液晶表示装置用薄膜トランジスタの製法および液晶表示装置用薄膜トランジスタ
KR20010048150A (ko) 반사-투과형 박막트랜지스터 액정 표시 장치 및 그 제조방법
JP5032188B2 (ja) 液晶表示装置及びその製造方法
JP4084630B2 (ja) 液晶表示装置
JP4814862B2 (ja) 液晶表示装置
JP2010266571A (ja) 半透過性膜、表示デバイス、及びパターン基板の製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061002

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061002

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20071113

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091124

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100121

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100216

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100219

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130226

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4464715

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130226

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140226

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees