JP4459666B2 - 除去装置 - Google Patents

除去装置 Download PDF

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Publication number
JP4459666B2
JP4459666B2 JP2004070051A JP2004070051A JP4459666B2 JP 4459666 B2 JP4459666 B2 JP 4459666B2 JP 2004070051 A JP2004070051 A JP 2004070051A JP 2004070051 A JP2004070051 A JP 2004070051A JP 4459666 B2 JP4459666 B2 JP 4459666B2
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JP
Japan
Prior art keywords
substrate
film
plasma
gas
reaction vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004070051A
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English (en)
Japanese (ja)
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JP2005260015A (ja
JP2005260015A5 (enExample
Inventor
彰 菅原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP2004070051A priority Critical patent/JP4459666B2/ja
Publication of JP2005260015A publication Critical patent/JP2005260015A/ja
Publication of JP2005260015A5 publication Critical patent/JP2005260015A5/ja
Application granted granted Critical
Publication of JP4459666B2 publication Critical patent/JP4459666B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
JP2004070051A 2004-03-12 2004-03-12 除去装置 Expired - Fee Related JP4459666B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004070051A JP4459666B2 (ja) 2004-03-12 2004-03-12 除去装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004070051A JP4459666B2 (ja) 2004-03-12 2004-03-12 除去装置

Publications (3)

Publication Number Publication Date
JP2005260015A JP2005260015A (ja) 2005-09-22
JP2005260015A5 JP2005260015A5 (enExample) 2007-04-26
JP4459666B2 true JP4459666B2 (ja) 2010-04-28

Family

ID=35085444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004070051A Expired - Fee Related JP4459666B2 (ja) 2004-03-12 2004-03-12 除去装置

Country Status (1)

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JP (1) JP4459666B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101218114B1 (ko) * 2005-08-04 2013-01-18 주성엔지니어링(주) 플라즈마 식각 장치
JP2009302401A (ja) * 2008-06-16 2009-12-24 Tokyo Seimitsu Co Ltd チャックテーブル洗浄方法、チャックテーブル洗浄装置及び半導体ウェーハ平面加工装置
JP4696165B2 (ja) * 2009-02-03 2011-06-08 東京エレクトロン株式会社 基板処理装置及び基板処理方法
US11921427B2 (en) 2018-11-14 2024-03-05 Lam Research Corporation Methods for making hard masks useful in next-generation lithography
CN113227909B (zh) 2018-12-20 2025-07-04 朗姆研究公司 抗蚀剂的干式显影
TWI837391B (zh) 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
WO2021146138A1 (en) 2020-01-15 2021-07-22 Lam Research Corporation Underlayer for photoresist adhesion and dose reduction
WO2022010809A1 (en) 2020-07-07 2022-01-13 Lam Research Corporation Integrated dry processes for patterning radiation photoresist patterning
KR102797476B1 (ko) * 2020-11-13 2025-04-21 램 리써치 코포레이션 포토레지스트의 건식 제거를 위한 프로세스 툴
JP7769144B2 (ja) 2023-03-17 2025-11-12 ラム リサーチ コーポレーション Ｅｕｖパターニングのための乾式現像およびエッチングプロセスの単一プロセスチャンバへの統合

Also Published As

Publication number Publication date
JP2005260015A (ja) 2005-09-22

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