JP4437524B2 - プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 - Google Patents
プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 Download PDFInfo
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- JP4437524B2 JP4437524B2 JP2002346910A JP2002346910A JP4437524B2 JP 4437524 B2 JP4437524 B2 JP 4437524B2 JP 2002346910 A JP2002346910 A JP 2002346910A JP 2002346910 A JP2002346910 A JP 2002346910A JP 4437524 B2 JP4437524 B2 JP 4437524B2
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- Prior art keywords
- silicon island
- laser
- information
- scanning
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 126
- 229910052710 silicon Inorganic materials 0.000 claims description 126
- 239000010703 silicon Substances 0.000 claims description 126
- 239000004065 semiconductor Substances 0.000 claims description 100
- 239000000758 substrate Substances 0.000 claims description 71
- 238000000034 method Methods 0.000 claims description 52
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 238000005457 optimization Methods 0.000 claims description 26
- 239000003550 marker Substances 0.000 claims description 25
- 238000013528 artificial neural network Methods 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims 1
- 238000002922 simulated annealing Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 86
- 239000013078 crystal Substances 0.000 description 32
- 238000000605 extraction Methods 0.000 description 17
- 238000002425 crystallisation Methods 0.000 description 16
- 230000008025 crystallization Effects 0.000 description 16
- 238000000059 patterning Methods 0.000 description 16
- 230000010355 oscillation Effects 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 230000001678 irradiating effect Effects 0.000 description 10
- 230000001133 acceleration Effects 0.000 description 9
- 239000012535 impurity Substances 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 238000009826 distribution Methods 0.000 description 5
- 238000005224 laser annealing Methods 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 238000005499 laser crystallization Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 238000007715 excimer laser crystallization Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 230000006911 nucleation Effects 0.000 description 3
- 238000010899 nucleation Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000007790 solid phase Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 210000002569 neuron Anatomy 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002068 genetic effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 239000010979 ruby Substances 0.000 description 1
- 229910001750 ruby Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002346910A JP4437524B2 (ja) | 2001-11-30 | 2002-11-29 | プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001367989 | 2001-11-30 | ||
| JP2001-367989 | 2001-11-30 | ||
| JP2002346910A JP4437524B2 (ja) | 2001-11-30 | 2002-11-29 | プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003229378A JP2003229378A (ja) | 2003-08-15 |
| JP2003229378A5 JP2003229378A5 (enExample) | 2006-01-19 |
| JP4437524B2 true JP4437524B2 (ja) | 2010-03-24 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002346910A Expired - Fee Related JP4437524B2 (ja) | 2001-11-30 | 2002-11-29 | プログラム及びプログラムを記録したコンピュータ読み取り可能な記録媒体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4437524B2 (enExample) |
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2002
- 2002-11-29 JP JP2002346910A patent/JP4437524B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003229378A (ja) | 2003-08-15 |
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