JP4431273B2 - 走査型エバネッセント電磁顕微鏡 - Google Patents
走査型エバネッセント電磁顕微鏡 Download PDFInfo
- Publication number
- JP4431273B2 JP4431273B2 JP2000513305A JP2000513305A JP4431273B2 JP 4431273 B2 JP4431273 B2 JP 4431273B2 JP 2000513305 A JP2000513305 A JP 2000513305A JP 2000513305 A JP2000513305 A JP 2000513305A JP 4431273 B2 JP4431273 B2 JP 4431273B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- frequency
- probe
- tip
- distance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/18—SNOM [Scanning Near-Field Optical Microscopy] or apparatus therefor, e.g. SNOM probes
- G01Q60/22—Probes, their manufacture, or their related instrumentation, e.g. holders
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Measurement Of Resistance Or Impedance (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5947197P | 1997-09-22 | 1997-09-22 | |
| US60/059,471 | 1997-09-22 | ||
| PCT/US1998/019764 WO1999016102A1 (en) | 1997-09-22 | 1998-09-22 | Scanning evanescent electro-magnetic microscope |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001517804A JP2001517804A (ja) | 2001-10-09 |
| JP2001517804A5 JP2001517804A5 (https=) | 2006-01-05 |
| JP4431273B2 true JP4431273B2 (ja) | 2010-03-10 |
Family
ID=22023166
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000513305A Expired - Fee Related JP4431273B2 (ja) | 1997-09-22 | 1998-09-22 | 走査型エバネッセント電磁顕微鏡 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1018138A4 (https=) |
| JP (1) | JP4431273B2 (https=) |
| AU (1) | AU1061599A (https=) |
| WO (1) | WO1999016102A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7550963B1 (en) | 1996-09-20 | 2009-06-23 | The Regents Of The University Of California | Analytical scanning evanescent microwave microscope and control stage |
| US6173604B1 (en) | 1996-09-20 | 2001-01-16 | The Regents Of The University Of California | Scanning evanescent electro-magnetic microscope |
| JP3478955B2 (ja) | 1997-09-29 | 2003-12-15 | 日本電子株式会社 | トンネル電流検出装置における疑似電流防止装置 |
| EP1212625A1 (en) * | 1999-09-10 | 2002-06-12 | University of Maryland, College Park | Quantitative imaging of dielectric permittivity and tunability |
| JP3536973B2 (ja) | 2000-04-20 | 2004-06-14 | 日本電気株式会社 | 同軸プローブおよび該同軸プローブを用いた走査型マイクロ波顕微鏡 |
| CN100370263C (zh) * | 2005-06-23 | 2008-02-20 | 中国科学技术大学 | 用扫描近场微波显微镜测量材料压电系数的方法及装置 |
| JP4732201B2 (ja) * | 2006-03-17 | 2011-07-27 | キヤノン株式会社 | 電磁波を用いたセンシング装置 |
| JP2009229423A (ja) * | 2008-03-25 | 2009-10-08 | Kobe Steel Ltd | 近接場プローブ及びこの近接場プローブを備えた電気的特性測定装置 |
| CN111351807A (zh) * | 2020-04-18 | 2020-06-30 | 李赞 | 使用近场微波的介电谱显微测量 |
| PT118063A (pt) | 2022-06-22 | 2023-12-22 | Univ Aveiro | Microscópio híbrido de varrimento por micro-ondas de campo próximo |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5821410A (en) * | 1996-09-20 | 1998-10-13 | Regents Of The University Of California | Scanning tip microwave near field microscope |
-
1998
- 1998-09-22 EP EP98953178A patent/EP1018138A4/en not_active Withdrawn
- 1998-09-22 JP JP2000513305A patent/JP4431273B2/ja not_active Expired - Fee Related
- 1998-09-22 WO PCT/US1998/019764 patent/WO1999016102A1/en not_active Ceased
- 1998-09-22 AU AU10615/99A patent/AU1061599A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO1999016102A1 (en) | 1999-04-01 |
| JP2001517804A (ja) | 2001-10-09 |
| EP1018138A4 (en) | 2000-12-20 |
| AU1061599A (en) | 1999-04-12 |
| EP1018138A1 (en) | 2000-07-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6532806B1 (en) | Scanning evanescent electro-magnetic microscope | |
| US8358141B2 (en) | Analytical scanning evanescent microwave microscope and control stage | |
| US5821410A (en) | Scanning tip microwave near field microscope | |
| JP5172057B2 (ja) | 材料の複素誘電率の局部測定のための装置 | |
| Rosner et al. | High-frequency near-field microscopy | |
| Imtiaz et al. | Effect of tip geometry on contrast and spatial resolution of the near-field microwave microscope | |
| Lai et al. | Atomic-force-microscope-compatible near-field scanning microwave microscope with separated excitation and sensing probes | |
| US5936237A (en) | Combined topography and electromagnetic field scanning probe microscope | |
| Karbassi et al. | Quantitative scanning near-field microwave microscopy for thin film dielectric constant measurement | |
| Klein et al. | A metal-dielectric antenna for terahertz near-field imaging | |
| US7285963B2 (en) | Method and system for measurement of dielectric constant of thin films using a near field microwave probe | |
| US20060125465A1 (en) | Evanescent microwave probe with enhanced resolution and sensitivity | |
| Geaney et al. | Near-field scanning microwave microscopy in the single photon regime | |
| Tabib-Azar et al. | Novel physical sensors using evanescent microwave probes | |
| JP4431273B2 (ja) | 走査型エバネッセント電磁顕微鏡 | |
| US7130755B2 (en) | Near-field scanning microwave microscope using dielectric resonator | |
| Reznik et al. | Quantitative model for near-field scanning microwave microscopy: Application to metrology of thin film dielectrics | |
| Wang et al. | Evanescent microwave probe measurement of low-k dielectric films | |
| Ma et al. | The distribution measurement of the photo-induced plasma in semiconductor by near-field scanning microwave microscopy | |
| Rosner et al. | Near-field antennas integrated with scanning probes for THz to visible microscopy: Scale modeling and limitations on performance | |
| Kantor et al. | Method of increasing spatial resolution of the scanning near-field microwave microscopy | |
| Tong et al. | Local permittivity measurement of dielectric materials based on the non-contact force curve of microwave atomic force microscopy | |
| Zhao et al. | Quantitative evaluation of local permittivity of semiconductor nanomaterials using microwave atomic force microscopy | |
| Wang et al. | Calibration methods of a 2GHz evanescent microwave magnetic probe for noncontact and nondestructive metal characterization for corrosion, defects, conductivity, and thickness nonuniformities | |
| Zhong et al. | Developments and Recent Progresses in Microwave Impedance Microscope |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050922 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050922 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081006 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20081219 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20090106 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20090608 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091008 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091116 |
|
| A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20091119 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20091210 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091221 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121225 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121225 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131225 Year of fee payment: 4 |
|
| LAPS | Cancellation because of no payment of annual fees |