JP4416040B2 - 化合物半導体結晶 - Google Patents
化合物半導体結晶 Download PDFInfo
- Publication number
- JP4416040B2 JP4416040B2 JP2008103762A JP2008103762A JP4416040B2 JP 4416040 B2 JP4416040 B2 JP 4416040B2 JP 2008103762 A JP2008103762 A JP 2008103762A JP 2008103762 A JP2008103762 A JP 2008103762A JP 4416040 B2 JP4416040 B2 JP 4416040B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- crystal
- compound semiconductor
- semiconductor crystal
- gaas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 title claims description 169
- 239000004065 semiconductor Substances 0.000 title claims description 93
- 150000001875 compounds Chemical class 0.000 title claims description 66
- 238000000034 method Methods 0.000 claims description 59
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 52
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 48
- 229910052799 carbon Inorganic materials 0.000 claims description 47
- 239000000758 substrate Substances 0.000 claims description 14
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 7
- 229910052796 boron Inorganic materials 0.000 claims description 7
- 238000007711 solidification Methods 0.000 claims description 3
- 230000008023 solidification Effects 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 99
- 238000004519 manufacturing process Methods 0.000 description 92
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 40
- 229910010271 silicon carbide Inorganic materials 0.000 description 40
- 239000002994 raw material Substances 0.000 description 37
- 239000000463 material Substances 0.000 description 30
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 25
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 23
- 229910001220 stainless steel Inorganic materials 0.000 description 23
- 239000010935 stainless steel Substances 0.000 description 23
- 239000003708 ampul Substances 0.000 description 19
- 239000007789 gas Substances 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 15
- 229910052581 Si3N4 Inorganic materials 0.000 description 14
- 238000007789 sealing Methods 0.000 description 14
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 14
- 239000010453 quartz Substances 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 12
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 10
- 238000009826 distribution Methods 0.000 description 10
- 229910052863 mullite Inorganic materials 0.000 description 10
- 238000003780 insertion Methods 0.000 description 9
- 230000037431 insertion Effects 0.000 description 9
- 239000011810 insulating material Substances 0.000 description 9
- 230000003647 oxidation Effects 0.000 description 9
- 238000007254 oxidation reaction Methods 0.000 description 9
- 239000002131 composite material Substances 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 229910052582 BN Inorganic materials 0.000 description 6
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 6
- 239000000395 magnesium oxide Substances 0.000 description 6
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- 238000002844 melting Methods 0.000 description 5
- 238000012856 packing Methods 0.000 description 5
- 239000003566 sealing material Substances 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229910000953 kanthal Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Images
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- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008103762A JP4416040B2 (ja) | 1997-12-26 | 2008-04-11 | 化合物半導体結晶 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36009097 | 1997-12-26 | ||
| JP7296998 | 1998-03-23 | ||
| JP2008103762A JP4416040B2 (ja) | 1997-12-26 | 2008-04-11 | 化合物半導体結晶 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35255798A Division JP4135239B2 (ja) | 1997-12-26 | 1998-12-11 | 半導体結晶およびその製造方法ならびに製造装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009210124A Division JP2010030891A (ja) | 1997-12-26 | 2009-09-11 | 化合物半導体結晶 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008239480A JP2008239480A (ja) | 2008-10-09 |
| JP2008239480A5 JP2008239480A5 (enExample) | 2009-10-22 |
| JP4416040B2 true JP4416040B2 (ja) | 2010-02-17 |
Family
ID=39911251
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008103762A Expired - Lifetime JP4416040B2 (ja) | 1997-12-26 | 2008-04-11 | 化合物半導体結晶 |
| JP2009210124A Pending JP2010030891A (ja) | 1997-12-26 | 2009-09-11 | 化合物半導体結晶 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009210124A Pending JP2010030891A (ja) | 1997-12-26 | 2009-09-11 | 化合物半導体結晶 |
Country Status (1)
| Country | Link |
|---|---|
| JP (2) | JP4416040B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11289576B2 (en) | 2020-07-14 | 2022-03-29 | Senic Inc. | Wafer and method of manufactruring wafer |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101507571B1 (ko) * | 2013-07-30 | 2015-03-31 | 엑스탈테크놀로지 주식회사 | 갈륨 아세나이드 합성장치 및 합성방법 |
| EP3108042B1 (en) | 2014-02-21 | 2022-08-10 | Momentive Performance Materials Quartz, Inc. | Multi-zone variable power density heater apparatus |
| JP7012431B2 (ja) * | 2014-07-17 | 2022-01-28 | 住友電気工業株式会社 | ＧａＡｓ単結晶 |
| EP3757260A4 (en) | 2018-02-23 | 2021-10-27 | Sumitomo Electric Industries, Ltd. | INDIUM PHOSPHIDE CRYSTAL SUBSTRATE |
| US11408091B2 (en) | 2018-02-23 | 2022-08-09 | Sumitomo Electric Industries, Ltd. | Gallium arsenide crystal substrate |
| CN114635180B (zh) * | 2022-05-19 | 2022-08-09 | 山西中科晶电信息材料有限公司 | 一种半绝缘砷化镓单晶体及其制备方法和生长装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4135239B2 (ja) * | 1997-12-26 | 2008-08-20 | 住友電気工業株式会社 | 半導体結晶およびその製造方法ならびに製造装置 |
-
2008
- 2008-04-11 JP JP2008103762A patent/JP4416040B2/ja not_active Expired - Lifetime
-
2009
- 2009-09-11 JP JP2009210124A patent/JP2010030891A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11289576B2 (en) | 2020-07-14 | 2022-03-29 | Senic Inc. | Wafer and method of manufactruring wafer |
| US11862685B2 (en) | 2020-07-14 | 2024-01-02 | Senic Inc. | Wafer and method of manufacturing wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008239480A (ja) | 2008-10-09 |
| JP2010030891A (ja) | 2010-02-12 |
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