JP4383446B2 - 微細構造化基板を接着する方法 - Google Patents
微細構造化基板を接着する方法 Download PDFInfo
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- JP4383446B2 JP4383446B2 JP2006516348A JP2006516348A JP4383446B2 JP 4383446 B2 JP4383446 B2 JP 4383446B2 JP 2006516348 A JP2006516348 A JP 2006516348A JP 2006516348 A JP2006516348 A JP 2006516348A JP 4383446 B2 JP4383446 B2 JP 4383446B2
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Description
−シリコンを用いた、化学またはイオンエッチング、
−ガラスを用いた、化学エッチングまたは超音波もしくはレーザーによる機械加工、
−高分子を用いた、射出成形による複製化、必要なパターンを有する型からの高温スタンプ処理もしくは注入、機械加工、レーザーアブレーションまたはレーザー成長(立体写真転写)である。
[1]米国特許出願第5 842 787A号(Kopf−Sillら)。
[2]国際公開第WO99/56954A号(Caliper Technologies社)。
同じ部品に多数のプローブを設置することや、プローブが付与される領域を幾何学的に配置することは不可能である。
[3]国際公開第WO00/77509A号(Merck Patent Gmbhら)。
前記基板上にグリッドを設置するステップと、
前記グリッドに押し圧を加え、該グリッドを局部的に、上部同一平面領域に接触させる手段を用いて、前記グリッドに接着剤を塗布するステップであって、接着剤の小滴の膜が、前記上部同一平面領域に設置されるステップと、
前記グリッドを除去するステップと、
を有し、
上部同一平面領域は、接着剤の小滴の膜が設置される前に、処理され、該処理は、前記上部同一平面領域の接着剤に対する濡れ性を最適化するように定められることを特徴とする方法によって解決される。
−選定するスクリーン印刷グリッドによって定めることができる、小滴の体積、および設置された小滴配列の密度、
−塗布される支持体のエネルギーおよび表面張力、接着剤の粘度、
−ドクターブレード処理のパラメータ、すなわちドクターブレードの材質および硬度、ドクターブレード処理速度および荷重、ならびにグリッドと基板間の距離である。
−本発明では、幅が50μm以下の、極めて微細な寸法の孔を有する構造化基板の組立体であって、これらの孔が接着剤膜で閉塞されず、あるいは被覆されない組立体を得ることができる。
−本発明は、組み立て前に、基板に局部的に多数の生物プローブを形成する方法と、共存し得る接着技術である。
−本発明は、例えば高温挙動や、接着剤に含まれる成分など、各種機能的な使用に適した特徴を有する多くの接着剤に適用することができる。例えば、シリコン系、アクリル系、エポキシ系、または陽イオン接着剤、熱、紫外線または湿度によって重合化する接着剤、1または2以上の成分を含む接着剤等を用いることが可能である。
−本発明は、半導体ウェハ上のチップをまとめて密閉することに利用することができ、この技術では、いかなる基板寸法に対しても極めて高精度に適合することができる(スクリーン印刷法の場合、1m2以上のスクリーンが用いられる)。
−また本発明は、部品を個々に密閉することに用いることもできる。
−可撓性のあるエポキシ接着剤(例えば、ジュポン1891として市販されている)、
−陽イオン接着剤(例えば、デロカチオボンド(Delo Katiobond)45952市販されている)、
−シリコン接着剤(例えば、東芝GE TSE 399またはTSE 397として市販されている)、
−シリコン接着剤(例えば、ダウコーニング社(Dow Coring)からDC866として市販されている)、
−PDMS(例えば、ダウコーニング社からSylgard 184として市販されている)。
Claims (10)
- 上部同一平面領域と、該同一平面領域間に凹部とを有する、少なくとも一つの微細構造化基板を、前記上部同一平面領域に設置される接着剤によって、接着する方法であって、当該方法は、
前記基板上にマスクの無いグリッドを設置するステップと、
前記グリッドに押し圧を加え、該グリッドを局部的に、上部同一平面領域に接触させる手段を用いて、前記グリッドに接着剤を塗布するステップであって、接着剤の小滴の膜が、前記上部同一平面領域に設置されるステップと、
前記グリッドを除去するステップと、
を有し、
上部同一平面領域は、接着剤の小滴の膜が設置される前に、処理され、該処理は、前記上部同一平面領域の接着剤に対する濡れ性を最適化するように定められることを特徴とする方法。 - 前記手段は、ドクターブレードであることを特徴とする請求項1に記載の方法。
- 前記処理は、上部同一平面領域での接着剤の小滴の広がりを制御するように定められることを特徴とする請求項1または2に記載の方法。
- 微細構造化基板は、密閉基板で密閉され、該密閉基板は、上部同一平面領域に設置された接着剤によって、上部同一平面領域に固定されることを特徴とする請求項1乃至3のいずれか一つに記載の方法。
- 微細構造化基板の凹部は、生物プローブが設置される領域を有することを特徴とする請求項4に記載の方法。
- 前記密閉基板は、生物プローブが設置される領域を有し、該領域は、微細構造化基板が密閉されたとき、該微細構造化基板の凹部と面するように定められることを特徴とする請求項4に記載の方法。
- 前記密閉基板は、流体を微細構造化基板の凹部に添加する際に使用される開口を有することを特徴とする請求項4乃至6のいずれか一つに記載の方法。
- 微細構造化基板組は、予め同一基板にまとめて製作され、全ての微細構造化基板の上部平面領域は、同一平面にあり、接着剤の小滴の膜は、全ての上部平面領域に設置され、全ての微細構造化基板が、同一の密閉基板によって密閉されることにより、密閉された微細構造化基板は、相互に分離されることを特徴とする請求項4乃至7のいずれか一つに記載の方法。
- 微細構造化基板組は、予め同一基板にまとめて製作され、全ての微細構造化基板の上部平面領域は、同一平面にあり、密閉基板組は、予め別の基板にまとめて製作され、各微細構造化基板の上部同一平面領域に接着剤の小滴の膜が設置されてから、微細構造化基板と密閉基板の各々が、相互に分離され、微細構造化基板は、密閉基板によって密閉されることを特徴とする請求項4乃至7のいずれか一つに記載の方法。
- 各基板は、ガラス、シリコンおよび高分子の中から選定される材料であることを特徴とする請求項4乃至7のいずれか一つに記載の方法。
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FR0350218A FR2856047B1 (fr) | 2003-06-16 | 2003-06-16 | Procede de collage de substrats micro-structures |
PCT/FR2004/050274 WO2004112961A1 (fr) | 2003-06-16 | 2004-06-14 | Procede de collage de substrats micro-structures |
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EP (1) | EP1633480B1 (ja) |
JP (1) | JP4383446B2 (ja) |
AT (1) | ATE504353T1 (ja) |
DE (1) | DE602004032134D1 (ja) |
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FR2906237B1 (fr) | 2006-09-22 | 2008-12-19 | Commissariat Energie Atomique | Composants fluidiques double-face |
FR2929860B1 (fr) | 2008-04-11 | 2010-12-17 | Commissariat Energie Atomique | Dispositif d'extraction de particules de l'haleine expiree |
FR2938063B1 (fr) | 2008-11-05 | 2014-09-19 | Commissariat Energie Atomique | Dispositif de preparation et/ou de traitement d'un echantillon biologique |
FR2946658B1 (fr) | 2009-06-11 | 2011-08-05 | Commissariat Energie Atomique | Dispositif microfluidique comportant deux couches hydrophobes assemblees l'une a l'autre et procede d'assemblage |
FR2961519B1 (fr) * | 2010-06-18 | 2012-07-06 | Commissariat Energie Atomique | Procede de collage calibre en epaisseur entre au moins deux substrats |
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JP2015062878A (ja) * | 2013-09-26 | 2015-04-09 | キヤノン株式会社 | 流路デバイスの作製方法、及び流路デバイス |
ITTO20130967A1 (it) * | 2013-11-28 | 2015-05-29 | Stmicroelectronics Malta Ltd | Metodo di impilamento di una pluralita' di piastrine per formare un dispositivo a semiconduttore impilato, e dispositivo a semiconduttore impilato |
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EP3150396B1 (en) * | 2015-10-02 | 2020-08-05 | HP Scitex Ltd | Method of printing protective coatings |
CN110343753B (zh) * | 2015-11-19 | 2022-06-21 | 赛纳生物科技(北京)有限公司 | 一种磷酸修饰荧光团的核苷酸分子测序方法 |
CN107971052A (zh) * | 2018-01-16 | 2018-05-01 | 广东工业大学 | 一种基于感光干膜的微流控芯片及其制备方法 |
EP3750628A1 (de) | 2019-06-14 | 2020-12-16 | Imt Ag | Fluidleitungsteil für eine mikrofluidische vorrichtung, mikrofluidische vorrichtung und verfahren zur fertigung einer mikrofluidischen vorrichtung |
CN110540172A (zh) * | 2019-09-03 | 2019-12-06 | 西安增材制造国家研究院有限公司 | 一种mems封装过程中mems晶元的键合方法 |
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EP1633480B1 (fr) | 2011-04-06 |
FR2856047A1 (fr) | 2004-12-17 |
US20060124230A1 (en) | 2006-06-15 |
DE602004032134D1 (de) | 2011-05-19 |
ATE504353T1 (de) | 2011-04-15 |
JP2007527505A (ja) | 2007-09-27 |
EP1633480A1 (fr) | 2006-03-15 |
FR2856047B1 (fr) | 2005-07-15 |
US8647465B2 (en) | 2014-02-11 |
WO2004112961A1 (fr) | 2004-12-29 |
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