JP4371996B2 - リソグラフィ装置またはリソグラフィ処理セルを作動する方法、リソグラフィ装置およびリソグラフィ処理セル - Google Patents

リソグラフィ装置またはリソグラフィ処理セルを作動する方法、リソグラフィ装置およびリソグラフィ処理セル Download PDF

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JP4371996B2
JP4371996B2 JP2004371509A JP2004371509A JP4371996B2 JP 4371996 B2 JP4371996 B2 JP 4371996B2 JP 2004371509 A JP2004371509 A JP 2004371509A JP 2004371509 A JP2004371509 A JP 2004371509A JP 4371996 B2 JP4371996 B2 JP 4371996B2
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tasks
task
machine
schedule
resource
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JP2005191571A (ja
JP2005191571A5 (https=
Inventor
ヨセフス マルティヌス ファン デン ニューウェラール ノーベルテュス
オンフリー ヨハネス
ペトルス ヨハヌス ファン リーロプ ヘンリクス
コーネリス ウィルヘルムス マリア ブラスペニング ニールス
エールクマン ローダ ヤコブス
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エーエスエムエル ネザーランズ ビー．ブイ．
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32301—Simulate production, process stages, determine optimum scheduling rules
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004371509A 2003-12-23 2004-12-22 リソグラフィ装置またはリソグラフィ処理セルを作動する方法、リソグラフィ装置およびリソグラフィ処理セル Expired - Fee Related JP4371996B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US74332003A 2003-12-23 2003-12-23
US10/846,854 US20050137734A1 (en) 2003-12-23 2004-05-17 Method of operating a lithographic apparatus or lithographic processsing cell, lithographic apparatus and lithographic processing cell

Publications (3)

Publication Number Publication Date
JP2005191571A JP2005191571A (ja) 2005-07-14
JP2005191571A5 JP2005191571A5 (https=) 2008-09-11
JP4371996B2 true JP4371996B2 (ja) 2009-11-25

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JP2004371509A Expired - Fee Related JP4371996B2 (ja) 2003-12-23 2004-12-22 リソグラフィ装置またはリソグラフィ処理セルを作動する方法、リソグラフィ装置およびリソグラフィ処理セル

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US (1) US20050137734A1 (https=)
JP (1) JP4371996B2 (https=)

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WO2003012837A1 (fr) * 2001-07-31 2003-02-13 Asahi Kasei Microsystems Co.,Ltd. Systeme de gestion de la fabrication de semi-conducteurs
US7068351B2 (en) * 2004-02-20 2006-06-27 Asml Netherlands B.V. Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program
WO2005103819A2 (en) * 2004-04-20 2005-11-03 Litel Instruments Method of emulation of lithographic projection tools
US7184849B2 (en) * 2004-05-25 2007-02-27 Asml Netherlands B.V. Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program
US7646468B2 (en) * 2006-04-04 2010-01-12 Asml Netherlands B.V. Lithographic processing cell and device manufacturing method
JP5087907B2 (ja) * 2006-11-15 2012-12-05 株式会社ニコン 電子部品の製造方法及びデバイス製造方法並びに電子部品の製造システム
JP2009038055A (ja) * 2007-07-31 2009-02-19 Nuflare Technology Inc 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
JP2009224374A (ja) * 2008-03-13 2009-10-01 Oki Semiconductor Co Ltd Ｐｅｂ装置及びその制御方法
US8065638B2 (en) * 2009-01-30 2011-11-22 Synopsys, Inc. Incremental concurrent processing for efficient computation of high-volume layout data
US8893061B2 (en) * 2009-01-30 2014-11-18 Synopsys, Inc. Incremental concurrent processing for efficient computation of high-volume layout data
EP2224383A1 (en) * 2009-02-25 2010-09-01 Siemens Aktiengesellschaft Method for scheduling a production process by supporting the visualization of material shortages
JP5468282B2 (ja) * 2009-03-24 2014-04-09 株式会社野村総合研究所 プロジェクト管理支援装置
US8606386B2 (en) * 2010-03-12 2013-12-10 Ana Maria Dias Medureira Pereira Multi-agent system for distributed manufacturing scheduling with Genetic Algorithms and Tabu Search
US9798947B2 (en) * 2011-10-31 2017-10-24 Applied Materials, Inc. Method and system for splitting scheduling problems into sub-problems
NL2010166A (en) * 2012-02-22 2013-08-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP6312379B2 (ja) * 2013-07-19 2018-04-18 キヤノン株式会社 リソグラフィ装置、リソグラフィ方法、リソグラフィシステム、プログラム、物品の製造方法
KR102194974B1 (ko) * 2014-04-29 2020-12-28 엘에스일렉트릭(주) 프로세스 검증 기능이 구비된 전력 계통 감시 및 제어 시스템
AU2015100138A4 (en) * 2015-01-12 2015-03-05 Macau University Of Science And Technology Method for Scheduling Single-arm Cluster Tools with Wafer Revisiting and Residency Time Constraints
CN110536783B (zh) 2017-04-19 2022-06-14 株式会社安川电机 编程支持装置、机器人系统、编程支持方法以及存储介质
DE102020201558A1 (de) * 2020-02-07 2021-03-18 Carl Zeiss Smt Gmbh Vorrichtung zur Reinigung einer Plasma-Strahlungsquelle
CN111347678B (zh) * 2020-03-09 2021-01-12 西南交通大学 一种多关节工业机器人3d打印路径优化方法
US11901204B2 (en) * 2020-05-22 2024-02-13 Applied Materials, Inc. Predictive wafer scheduling for multi-chamber semiconductor equipment
CN111933517B (zh) * 2020-08-14 2024-06-21 北京北方华创微电子装备有限公司 一种半导体工艺设备中工艺任务的启动方法、装置
CN112232578B (zh) * 2020-10-26 2025-02-07 上海华力集成电路制造有限公司 基于关键指标算法的光刻机台效能评价系统及其应用方法
CN114864456B (zh) * 2022-07-08 2022-09-13 埃克斯工业(广东)有限公司 半导体清洗设备调度方法、系统、装置及存储介质

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CN1359533A (zh) * 1999-06-29 2002-07-17 株式会社尼康 标记探测法及其装置、曝光法及其设备和器件制造方法及其器件
JP4915033B2 (ja) * 2000-06-15 2012-04-11 株式会社ニコン 露光装置、基板処理装置及びリソグラフィシステム、並びにデバイス製造方法
JP2002190443A (ja) * 2000-12-20 2002-07-05 Hitachi Ltd 露光方法およびその露光システム
US6725113B1 (en) * 2001-10-23 2004-04-20 Advanced Micro Devices, Inc. Lot start agent that determines virtual WIP time including an exponentially weighted moving average cycle time
US6868298B2 (en) * 2001-12-28 2005-03-15 Texas Instruments Incorporated Method and apparatus for bottleneck feed factor based scheduling
US20040030428A1 (en) * 2002-05-03 2004-02-12 Manugistics, Inc. System and method for scheduling and sequencing supply chain resources
US6741941B2 (en) * 2002-09-04 2004-05-25 Hitachi, Ltd. Method and apparatus for analyzing defect information
US7174232B2 (en) * 2003-10-30 2007-02-06 Agency For Science, Technology And Research Job release with multiple constraints

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JP2005191571A (ja) 2005-07-14

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