JP4364995B2 - 散乱吸収体内部の光路分布計算方法 - Google Patents

散乱吸収体内部の光路分布計算方法 Download PDF

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JP4364995B2
JP4364995B2 JP2000078534A JP2000078534A JP4364995B2 JP 4364995 B2 JP4364995 B2 JP 4364995B2 JP 2000078534 A JP2000078534 A JP 2000078534A JP 2000078534 A JP2000078534 A JP 2000078534A JP 4364995 B2 JP4364995 B2 JP 4364995B2
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time
medium
optical path
light
path length
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JP2001264245A5 (enExample
JP2001264245A (ja
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裕 土屋
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Hamamatsu Photonics KK
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Hamamatsu Photonics KK
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Priority to JP2000078534A priority Critical patent/JP4364995B2/ja
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Priority to AU2001236105A priority patent/AU2001236105A1/en
Priority to PCT/JP2001/001724 priority patent/WO2001071319A1/ja
Priority to DE60138543T priority patent/DE60138543D1/de
Priority to EP01908345A priority patent/EP1284416B1/en
Priority to US10/239,245 priority patent/US6975401B2/en
Publication of JP2001264245A publication Critical patent/JP2001264245A/ja
Publication of JP2001264245A5 publication Critical patent/JP2001264245A5/ja
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4795Scattering, i.e. diffuse reflection spatially resolved investigating of object in scattering medium

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
JP2000078534A 2000-03-21 2000-03-21 散乱吸収体内部の光路分布計算方法 Expired - Lifetime JP4364995B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2000078534A JP4364995B2 (ja) 2000-03-21 2000-03-21 散乱吸収体内部の光路分布計算方法
PCT/JP2001/001724 WO2001071319A1 (fr) 2000-03-21 2001-03-06 Procede de determination de la distribution de parcours optique a l'interieur d'un absorbant de diffusion
DE60138543T DE60138543D1 (de) 2000-03-21 2001-03-06 Verfahren zur berechnung der optischen wegverteilung in einem streuenden absorbierer
EP01908345A EP1284416B1 (en) 2000-03-21 2001-03-06 Method of calculating optical path distribution inside scattering absorber
AU2001236105A AU2001236105A1 (en) 2000-03-21 2001-03-06 Method of calculating optical path distribution inside scattering absorber
US10/239,245 US6975401B2 (en) 2000-03-21 2001-03-06 Method of calculating optical path distribution inside scattering absorber

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JP2000078534A JP4364995B2 (ja) 2000-03-21 2000-03-21 散乱吸収体内部の光路分布計算方法

Publications (3)

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JP2001264245A JP2001264245A (ja) 2001-09-26
JP2001264245A5 JP2001264245A5 (enExample) 2006-12-28
JP4364995B2 true JP4364995B2 (ja) 2009-11-18

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US (1) US6975401B2 (enExample)
EP (1) EP1284416B1 (enExample)
JP (1) JP4364995B2 (enExample)
AU (1) AU2001236105A1 (enExample)
DE (1) DE60138543D1 (enExample)
WO (1) WO2001071319A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4084307B2 (ja) * 2001-12-26 2008-04-30 浜松ホトニクス株式会社 不均質媒質の光学的分析方法
US7286214B2 (en) * 2003-08-25 2007-10-23 University Of South Florida Method and program product for determining a radiance field in an optical environment
US7057182B2 (en) * 2004-03-12 2006-06-06 Hewlett-Packard Development Company, L.P. Method and system for determining distortion in a circuit image
EP1952091A1 (en) * 2005-10-17 2008-08-06 Arryx, Inc. Apparatus and method for detecting deformability of cells using spatially modulated optical force microscopy
US8243071B2 (en) * 2008-02-29 2012-08-14 Microsoft Corporation Modeling and rendering of heterogeneous translucent materials using the diffusion equation
JP5782314B2 (ja) 2011-07-07 2015-09-24 浜松ホトニクス株式会社 生体計測装置および画像作成方法
JP6154613B2 (ja) * 2013-01-18 2017-06-28 浜松ホトニクス株式会社 断面画像計測装置及び計測方法
JP6358573B2 (ja) 2014-05-15 2018-07-18 国立大学法人浜松医科大学 乳房計測装置の作動方法及び乳房計測装置
US11654635B2 (en) 2019-04-18 2023-05-23 The Research Foundation For Suny Enhanced non-destructive testing in directed energy material processing
CN114204985A (zh) * 2021-11-12 2022-03-18 西安理工大学 无线紫外光非直视通信中光子检测概率快速估算方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3310782B2 (ja) * 1994-07-14 2002-08-05 株式会社日立製作所 吸収物質濃度の空間分布画像化装置
JP3771339B2 (ja) 1996-01-18 2006-04-26 浜松ホトニクス株式会社 光ct装置及び光ctによる画像再構成方法
JP3662376B2 (ja) * 1996-05-10 2005-06-22 浜松ホトニクス株式会社 内部特性分布の計測方法および装置
JP3836941B2 (ja) * 1997-05-22 2006-10-25 浜松ホトニクス株式会社 光ct装置及び画像再構成方法
JPH11311569A (ja) 1998-04-28 1999-11-09 Hamamatsu Photonics Kk 内部特性分布の計測方法及び装置
JP3887486B2 (ja) * 1998-05-26 2007-02-28 浜松ホトニクス株式会社 散乱吸収体の内部特性分布の計測方法及び装置

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Publication number Publication date
DE60138543D1 (de) 2009-06-10
EP1284416A1 (en) 2003-02-19
WO2001071319A1 (fr) 2001-09-27
US20030078503A1 (en) 2003-04-24
EP1284416A4 (en) 2004-10-20
US6975401B2 (en) 2005-12-13
AU2001236105A1 (en) 2001-10-03
EP1284416B1 (en) 2009-04-29
JP2001264245A (ja) 2001-09-26

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