JP4349364B2 - Semiconductor device - Google Patents
Semiconductor device Download PDFInfo
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- JP4349364B2 JP4349364B2 JP2005372250A JP2005372250A JP4349364B2 JP 4349364 B2 JP4349364 B2 JP 4349364B2 JP 2005372250 A JP2005372250 A JP 2005372250A JP 2005372250 A JP2005372250 A JP 2005372250A JP 4349364 B2 JP4349364 B2 JP 4349364B2
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- 239000004065 semiconductor Substances 0.000 title claims description 77
- 238000000605 extraction Methods 0.000 claims description 28
- 239000004020 conductor Substances 0.000 claims description 4
- 239000011347 resin Substances 0.000 description 10
- 229920005989 resin Polymers 0.000 description 10
- 238000007789 sealing Methods 0.000 description 8
- 229910000679 solder Inorganic materials 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- 239000011888 foil Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
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Description
この発明は、半導体装置に係り、特に電力変換をおこなう半導体装置を構成する半導体素子の引き出し電極部(インナーリード部)のインダクタンス低減に関するものである。 The present invention relates to a semiconductor device, and more particularly to an inductance reduction of a lead electrode portion (inner lead portion) of a semiconductor element constituting a semiconductor device that performs power conversion.
半導体装置を構成する半導体素子の導通電流を外部に取り出すために、半導体素子の内部電極を半導体装置の外部電極に接続することが必要不可欠であるが、従来はアルミニウム等の金属細線により両電極を接続していた。近年、取り扱う電流の増大による電力損失を低減させるため、例えば特許文献1に示されるように、引き出し電極(インナーリード)で両電極を接続する構造(ダイレクトリードボンディング構造)が提案されている。
In order to extract the conduction current of the semiconductor element constituting the semiconductor device to the outside, it is essential to connect the internal electrode of the semiconductor element to the external electrode of the semiconductor device. Conventionally, both electrodes are connected by a thin metal wire such as aluminum. I was connected. In recent years, in order to reduce power loss due to an increase in current to be handled, a structure (direct lead bonding structure) in which both electrodes are connected by an extraction electrode (inner lead) has been proposed as disclosed in
このようなダイレクトリードボンディング構造を有した半導体装置においては、引き出し電極は直接半導体素子の内部電極に半田により接合されているが、引き出し電極の側面に溶融した半田による半田溜り部が発生し半導体装置の信頼性を低下させていた。このため上記特許文献1によれば、引き出し電極を、半田を介して半導体素子の内部電極に接合された引き出し電極端部と、半導体素子の導通電流を外部に導出するための引き出し電極配線部と、引き出し電極端部と引き出し電極配線部とを空隙を有するように連結する引き出し電極連結部とから構成することを教示している。このように引き出し電極端部と引き出し電極配線部とを空隙を有するように連結することにより、半導体素子と引き出し電極とを半田付けする際に半田溜り部を形成することなく、信頼性に優れたダイレクトリードボンディング構造を有した半導体装置を実現できるからである。また、上記のような構成の引き出し電極を採用することにより、半導体素子と引き出し電極配線部との間に発生する熱応力が、引き出し電極連結部により緩和されるため、半導体素子と引き出し電極とを接合している半田層のはんだ疲労が抑制され、半導体装置の信頼性をより高めていた。
In the semiconductor device having such a direct lead bonding structure, the extraction electrode is directly bonded to the internal electrode of the semiconductor element by soldering, but a solder reservoir due to molten solder is generated on the side surface of the extraction electrode. Had reduced the reliability. For this reason, according to
しかしながら、従来の半導体装置においては、引き出し電極端部と引き出し電極配線部とを空隙を有するように連結する必要があるため、半導体素子を支持しているベース板と引き出し電極配線部との間に一定の距離が存在していた。このような半導体装置においては、外部電極からベース板に導入された主電流は半導体素子に流れ込み、引き出し電極を通って外部電極から排出される。したがって、半導体素子を支持しているベース板と引き出し電極配線部との間の距離が大きいと、上記主電流経路を構成するループの面積が大きくなり、半導体装置固有の浮遊インダクタンスが大きくなる。 However, in the conventional semiconductor device, since it is necessary to connect the end portion of the extraction electrode and the extraction electrode wiring portion so as to have a gap, between the base plate supporting the semiconductor element and the extraction electrode wiring portion. There was a certain distance. In such a semiconductor device, the main current introduced from the external electrode to the base plate flows into the semiconductor element, and is discharged from the external electrode through the extraction electrode. Therefore, if the distance between the base plate supporting the semiconductor element and the lead electrode wiring portion is large, the area of the loop constituting the main current path increases, and the stray inductance inherent to the semiconductor device increases.
このように固有の浮遊インダクタンスが大きくなると、半導体装置のスイッチング動作時における急激な電流変化(di/dt)により発生するサージ電圧が上記インダクタンスに比例して大きくなり、そのようなサージ電圧による半導体装置の破壊を防止するために、急激な電流変化を抑制する工夫が必要となり、そのことが電力変換の効率低下またはコストの増大を招いていた。 When the inherent stray inductance increases as described above, a surge voltage generated by a rapid current change (di / dt) during the switching operation of the semiconductor device increases in proportion to the inductance, and the semiconductor device due to such a surge voltage. In order to prevent the destruction of the power, it is necessary to devise a device for suppressing a rapid current change, which causes a reduction in power conversion efficiency or an increase in cost.
この発明は、上述のような課題を解決するためになされたもので、その目的は、半導体装置の主電流経路を構成する部材の形状に工夫を加えることにより、半導体装置固有の浮遊インダクタンスを減少させ、サージ電圧の低い半導体装置を提供しようとするものである。 The present invention has been made to solve the above-described problems, and its object is to reduce the stray inductance inherent to a semiconductor device by adding ingenuity to the shape of members constituting the main current path of the semiconductor device. Thus, a semiconductor device with a low surge voltage is to be provided.
前記の目的を達成するために、本発明に係る半導体装置は、導電体からなるベース板と、上記ベース板上に一方の主面が対向するように戴置され、他方の主面上に内部電極を有する半導体素子と、上記内部電極に接合された引き出し電極端部と、上記引き出し電極端部と相対する位置に設けられ上記半導体素子の導通電流を外部に導出するための引き出し電極配線部と、上記引き出し電極端部と上記引き出し電極配線部とを間に空隙を有するように連結する引き出し電極連結部とを含む引き出し電極とを備えた半導体装置であって、上記引き出し電極配線部は、上記ベース板の上記半導体素子が戴置された面の上方から見て、上記半導体素子と重ならない部分において上記ベース板に近接するように屈曲されていることを特徴とする。 In order to achieve the above object, a semiconductor device according to the present invention includes a base plate made of a conductor, and is placed on the base plate so that one main surface faces the other, and the other main surface has an internal structure. A semiconductor element having an electrode; an extraction electrode end joined to the internal electrode; and an extraction electrode wiring portion provided at a position opposite to the extraction electrode end for leading the conduction current of the semiconductor element to the outside A lead electrode including a lead electrode connecting portion for connecting the lead electrode end portion and the lead electrode wiring portion with a gap therebetween, wherein the lead electrode wiring portion is The base plate is bent so as to be close to the base plate at a portion not overlapping with the semiconductor element when viewed from above the surface on which the semiconductor element is placed.
上記のような構成としたため、本発明に係る半導体装置によれば、従来の半導体装置と比較して主電流経路を構成するループの面積が小さくなり、半導体装置固有の浮遊インダクタンスが小さくなり、発生するサージ電圧が低下するため、電力変換効率がよくコストの低廉な半導体装置が実現できる。 Due to the configuration as described above, according to the semiconductor device of the present invention, the area of the loop constituting the main current path is reduced as compared with the conventional semiconductor device, and the stray inductance inherent to the semiconductor device is reduced. Therefore, a semiconductor device with high power conversion efficiency and low cost can be realized.
<実施の形態1>
以下、本発明の実施の形態1を図に基づいて説明する。図1は本発明に係る半導体装置の実施の形態1を示す平面図(a)、そのA−A断面図(b)及びそのB−B断面図(c)である。平面図においては便宜上封止樹脂を省略している。
<
図1において、銅又は銅合金からなり、相対向する2つの平行な主面を有し、厚みが4mmで25mm×45mmの長方形のベース板1の上面には、電力用半導体素子である、厚さ250μm、主面の大きさが15mm角のIGBT2と、ほぼ同一の厚さ及び大きさを有するダイオード3とが半田層(図示せず)により半田付けされている。同様にベース板4の上面には、電力用半導体素子である、厚さ250μm、主面の大きさが15mm角のIGBT5と、ほぼ同一の厚さ及び大きさを有するダイオード6とが半田層(図示せず)により半田付けされている。
In FIG. 1, the upper surface of a
銅又は銅合金からなる厚みが0.2mmの引き出し電極7が、IGBT2及びダイオード3の表面の内部電極と外部端子である出力端子9との間を電気的に接続している。引き出し電極7は、IGBT2及びダイオード3の表面の内部電極と接合される引き出し電極端部7aと、引き出し電極端部7aと相対する位置に設けられIGBT2及びダイオード3に流れる電流を外部に導出する引き出し電極配線部7bと、引き出し電極端部7aと引き出し電極配線部7bとを間に空隙を有するように連結する引き出し電極連結部7cとから構成されている。同様にもうひとつの引き出し電極8は、IGBT5及びダイオード6の表面の内部電極と外部端子であるN端子10との間を電気的に接続しており、IGBT5及びダイオード6の表面の内部電極と接合される引き出し電極端部8aと、IGBT5及びダイオード6に流れる電流を外部に導出する引き出し電極配線部8bと、引き出し電極端部8aと引き出し電極配線部8bとを間に空隙を有するように連結する引き出し電極連結部8cとから構成されている。同時に出力端子9はベース板4にも半田付けや超音波接合により接合され、電気的にも接続されている。ベース板1には外部端子であるP端子11が半田付けや超音波接合により接合されている。
A
ここで引き出し電極配線部7bは、IGBT2の上方からダイオード3の上方を経由して出力端子9に向かって延在しているが、IGBT2とダイオード3との間及びダイオード3と出力端子9との間の部分においてベース板1の方向に近接するように屈曲されている。同様に引き出し電極配線部8bは、IGBT5の上方からダイオード6の上方を経由してN端子10に向かって延在しているが、IGBT5とダイオード6との間及びダイオード6とN端子10との間の部分においてベース板4の方向に近接するように屈曲されている。
Here, the lead electrode wiring portion 7 b extends from the upper side of the
ベース板1及び4の下には絶縁シート12及び金属箔13が設けられている。外部環境から保護するための封止樹脂14はトランスファーモールド等により、出力端子9、N端子10、P端子11及び金属箔13の一部が露出するようにベース板1及び4、IGBT2及び5、ダイオード3及び6、引き出し電極7及び8を封着し、図1(a)の平面図のように上方から見て四辺形のパッケージを構成している。半導体装置固有の浮遊インダクタンスを低減させるため、主電流が流れる出力端子9、N端子10、P端子11の3つの外部端子は、モールド樹脂の一つの側面より並列に取り出されている。このように構成されることにより、この半導体装置は図2のような回路構成となっている。なお、図2において制御端子15及び制御端子16はそれぞれIGBT2及びIGBT5を制御するためのゲート信号を入力する端子であるが、図1においては簡略化のため図示を省略している。
Under the
次に本実施の形態にかかる半導体装置の動作について説明する。本半導体装置は直流電力を任意の周波数の交流電力に電力変換をおこなう場合に用いられる。P端子11には比較的高い電位を有する直流電源が、N端子10には比較的低い電位を有する直流電源が接続され、これら直流電源より供給された直流電力を交流電力に変換して、出力端子9からモータ等の負荷に供給する。供給される交流電力が一方の極性のときは、IGBT2は導通状態にありIGBT5は非導通状態にあるため、P端子11から入力された主電流はベース板1、IGBT2、引き出し電極7という電流経路を経て出力端子9から負荷に流れ込む。逆に供給される交流電力が他方の極性のときは、IGBT2は非導通状態にありIGBT5は導通状態にあるため、出力端子9から導入された主電流はベース板4、IGBT5、引き出し電極8という電流経路を経てN端子10から直流電源に戻る。
Next, the operation of the semiconductor device according to this embodiment will be described. This semiconductor device is used when DC power is converted into AC power of an arbitrary frequency. A DC power source having a relatively high potential is connected to the P terminal 11, and a DC power source having a relatively low potential is connected to the
このような半導体装置においては、動作時に流れる電流経路は、例えば図1(b)でいえば、ベース板4、IGBT5、引き出し電極8というループを構成するが、本実施の形態にかかる半導体装置においては上述したように引き出し電極配線部8bの一部がベース板4の方向に近接するように屈曲されているので、このループ面積が従来の半導体装置に比較して小さく形成されることになる。このことはベース板1、IGBT2、引き出し電極7で構成されるループにおいても同様である。これにより、半導体装置固有の浮遊インダクタンスが小さくなり、発生するサージ電圧が低下するため、電力変換効率がよくコストの低廉な半導体装置が実現できる。特に本実施例のように、主電流が流れる出力端子9、N端子10、P端子11の3つの外部端子がモールド樹脂の一つの側面より並列に取り出されているような半導体装置においては、その効果は大きい。
In such a semiconductor device, the current path that flows during operation forms a loop of the
<実施の形態2>
以下、本発明の実施の形態2を図に基づいて説明する。図3は本発明に係る半導体装置の実施の形態2を示す平面図(a)及びそのC−C断面図(b)である。平面図においては便宜上封止樹脂を省略している。
<
図3に示された実施の形態2の構成は、ベース板1及び4にはそれぞれ2つの凹部1a、4aが設けられ、各凹部の中にIGBT2、ダイオード3、IGBT5、ダイオード6が収容されており、引き出し電極7及び引き出し電極8には図1のような屈曲部は存在しないが、上記凹部により実質的に引き出し電極配線部8bとベース板4との間隔が小さくなっている。それ以外の点は、図1の実施の形態1と同じ構成であり、またその動作も実施の形態1の動作と同じである。
In the configuration of the second embodiment shown in FIG. 3, the
したがって、本実施の形態に係る半導体装置においても、動作時に流れる電流経路は、ベース板4、IGBT5、引き出し電極8というループを構成する。特にスイッチング動作時における急激な電流変化(di/dt)を伴う電流は表皮効果により導体の表面を流れるため、主電流の大部分はベース板4の表面近くを流れる。本実施の形態にかかる半導体装置においては上述したように引き出し電極配線部8bとベース板4との間隔が小さくなっているので、このループ面積が従来の半導体装置に比較して小さく形成されることになる。このことはベース板1、IGBT2、引き出し電極7で構成されるループにおいても同様である。これにより、半導体装置固有の浮遊インダクタンスが小さくなり、発生するサージ電圧が低下するため、電力変換効率がよくコストの低廉な半導体装置が実現できる。
Therefore, also in the semiconductor device according to the present embodiment, the current path that flows during operation forms a loop of the
また本実施の形態においては、図3に示されるように引き出し電極7及び引き出し電極8に複数個の貫通孔7d及び8dが設けられている。一般に本実施例のように引き出し電極配線部8bとベース板4との間隔を小さくすると、トランスファーモールドによる成型時に、封止樹脂14が引き出し電極配線部8bとベース板4との間隙に十分に充填されず、ボイドが発生する恐れがある。したがってこのような貫通孔を設けることにより、注入された封止樹脂はこれらの貫通孔8dを経由して引き出し電極配線部8bとベース板4との間隙に回りこめるため、上述のようなボイドの発生を防止できる。
In the present embodiment, a plurality of through
また本実施の形態においては図4に示されるような変形例にすることも可能である。図4においてはベース板4は外部端子が露出する封止樹脂面の方向に延在され、N端子10は引き出し電極配線部8bのベース板4と対向する面側において接合されている。また同様にベース板1は外部端子が露出する封止樹脂面の方向に延在され、出力端子9は引き出し電極配線部7bのベース板1と対向する面側において引き出し電極配線部7bと接合されている。このような構造としたことにより、外部端子であるN端子10又は出力端子9とベース板1又はベース板4との間隔も小さくでき、外部端子を含めた半導体装置固有の浮遊インダクタンスの低減が図られることとなり、より一層の電力変換効率の向上やコストの低減が実現できる。
Further, in the present embodiment, a modification as shown in FIG. 4 is possible. In FIG. 4, the
以上、本発明の具体的な実施形態を説明したが、本発明はこれらに限らず種々の改変が可能である。例えば、上記実施の形態において半導体素子の組み合わせはIGBTとダイオードであるが、IGBTとIGBT、ダイオードとダイオード、MOSFETとMOSFET又はその他の半導体素子の組み合わせであってもよく、あるいはIGBT単体、MOSFET単体又はその他の半導体素子単体であっても本発明の範囲に含まれる。また、実施の形態2に係る半導体装置に示されている貫通孔は実施の形態1に係る半導体装置に適用することも可能であり同様の効果が得られることはいうまでもない。さらにはこのような貫通孔は実施の形態2のように円形である必要はなく、長方形又はその他の形状であってもよい。 Although specific embodiments of the present invention have been described above, the present invention is not limited to these and various modifications can be made. For example, in the above embodiment, the combination of the semiconductor elements is IGBT and diode, but IGBT and IGBT, diode and diode, MOSFET and MOSFET or other semiconductor elements may be combined, or IGBT alone, MOSFET alone or Other single semiconductor elements are also included in the scope of the present invention. Needless to say, the through-hole shown in the semiconductor device according to the second embodiment can be applied to the semiconductor device according to the first embodiment, and the same effect can be obtained. Further, such a through hole does not need to be circular as in the second embodiment, and may be rectangular or other shapes.
1 ベース板、 2 IGBT、 3 ダイオード、 4 ベース板、 5 IGBT、 6 ダイオード、 7 引き出し電極、 7a 引き出し電極端部、 7b 引き出し電極配線部、 7c 引き出し電極連結部、 7d 引き出し電極連結部、 8 引き出し電極、 8a 引き出し電極端部、 8b 引き出し電極配線部、 8c 引き出し電極連結部、 8d 引き出し電極連結部、 9 出力端子、 10 N端子 11 P端子 12 絶縁シート 13 金属箔 14 封止樹脂 15 制御端子 16 制御端子。
DESCRIPTION OF
Claims (3)
前記ベース板上に一方の主面が対向するように戴置され、他方の主面上に内部電極を有する半導体素子と、
前記内部電極に接合された引き出し電極端部と、前記引き出し電極端部と相対する位置に設けられ前記半導体素子の導通電流を外部に導出するための引き出し電極配線部と、前記引き出し電極端部と前記引き出し電極配線部とを間に空隙を有するように連結する引き出し電極連結部とを含む引き出し電極と、
を備えた半導体装置であって、
前記引き出し電極配線部は、前記ベース板の前記半導体素子が戴置された面の上方から見て、前記半導体素子と重ならない部分において前記ベース板に近接するように屈曲されていることを特徴とする半導体装置。 A base plate made of a conductor;
A semiconductor element placed on the base plate so that one main surface is opposed to the other and having an internal electrode on the other main surface;
An extraction electrode end joined to the internal electrode, an extraction electrode wiring portion provided at a position opposite to the extraction electrode end for leading the conduction current of the semiconductor element to the outside, and the extraction electrode end A lead electrode including a lead electrode connecting portion for connecting the lead electrode wiring portion with a gap therebetween;
A semiconductor device comprising:
The lead electrode wiring portion is bent so as to be close to the base plate at a portion not overlapping the semiconductor element when viewed from above the surface of the base plate on which the semiconductor element is placed. Semiconductor device.
前記ベース板上に一方の主面が対向するように戴置され、他方の主面上に内部電極を有する半導体素子と、
前記内部電極に接合された引き出し電極端部と、前記引き出し電極端部と相対する位置に設けられ前記半導体素子の導通電流を外部に導出するための引き出し電極配線部と、前記引き出し電極端部と前記引き出し電極配線部とを間に空隙を有するように連結する引き出し電極連結部とを含む引き出し電極と、
を備えた半導体装置であって、
前記ベース板は、前記半導体素子を収容する凹部を備えていることを特徴とする半導体装置。 A base plate made of a conductor;
A semiconductor element placed on the base plate so that one main surface is opposed to the other and having an internal electrode on the other main surface;
An extraction electrode end joined to the internal electrode, an extraction electrode wiring portion provided at a position opposite to the extraction electrode end for leading the conduction current of the semiconductor element to the outside, and the extraction electrode end A lead electrode including a lead electrode connecting portion for connecting the lead electrode wiring portion with a gap therebetween;
A semiconductor device comprising:
The semiconductor device according to claim 1, wherein the base plate includes a recess that accommodates the semiconductor element.
The semiconductor device according to claim 1, wherein the lead electrode wiring portion includes at least one through hole.
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JP2017073406A (en) * | 2014-02-24 | 2017-04-13 | 三菱電機株式会社 | Electrode lead and semiconductor device |
JP6385234B2 (en) * | 2014-10-16 | 2018-09-05 | 三菱電機株式会社 | Semiconductor device |
JP6822000B2 (en) * | 2016-08-05 | 2021-01-27 | 株式会社デンソー | Semiconductor device |
US20210013183A1 (en) * | 2018-03-26 | 2021-01-14 | Pansonic Intellectual Property Management Co., Ltd. | Semiconductor module |
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2005
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Cited By (1)
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US9117688B2 (en) | 2011-04-18 | 2015-08-25 | Mitsubishi Electric Corporation | Semiconductor device, inverter device provided with semiconductor device, and in-vehicle rotating electrical machine provided with semiconductor device and inverter device |
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