JP4349364B2 - Semiconductor device - Google Patents

Semiconductor device Download PDF

Info

Publication number
JP4349364B2
JP4349364B2 JP2005372250A JP2005372250A JP4349364B2 JP 4349364 B2 JP4349364 B2 JP 4349364B2 JP 2005372250 A JP2005372250 A JP 2005372250A JP 2005372250 A JP2005372250 A JP 2005372250A JP 4349364 B2 JP4349364 B2 JP 4349364B2
Authority
JP
Japan
Prior art keywords
semiconductor device
lead electrode
base plate
wiring portion
semiconductor element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2005372250A
Other languages
Japanese (ja)
Other versions
JP2007173703A (en
Inventor
信義 木本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2005372250A priority Critical patent/JP4349364B2/en
Publication of JP2007173703A publication Critical patent/JP2007173703A/en
Application granted granted Critical
Publication of JP4349364B2 publication Critical patent/JP4349364B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L24/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L24/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/62Protection against overvoltage, e.g. fuses, shunts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L24/36Structure, shape, material or disposition of the strap connectors prior to the connecting process
    • H01L24/37Structure, shape, material or disposition of the strap connectors prior to the connecting process of an individual strap connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/84Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a strap connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • H01L25/072Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/291Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29101Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/36Structure, shape, material or disposition of the strap connectors prior to the connecting process
    • H01L2224/37Structure, shape, material or disposition of the strap connectors prior to the connecting process of an individual strap connector
    • H01L2224/37001Core members of the connector
    • H01L2224/3701Shape
    • H01L2224/37011Shape comprising apertures or cavities
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L2224/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • H01L2224/4005Shape
    • H01L2224/4007Shape of bonding interfaces, e.g. interlocking features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L2224/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • H01L2224/401Disposition
    • H01L2224/40135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/40137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L2224/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • H01L2224/401Disposition
    • H01L2224/40135Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/40137Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • H01L2224/40139Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate with an intermediate bond, e.g. continuous strap daisy chain
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/34Strap connectors, e.g. copper straps for grounding power devices; Manufacturing methods related thereto
    • H01L2224/39Structure, shape, material or disposition of the strap connectors after the connecting process
    • H01L2224/40Structure, shape, material or disposition of the strap connectors after the connecting process of an individual strap connector
    • H01L2224/401Disposition
    • H01L2224/40151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/40221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/40245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/83801Soldering or alloying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/84Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a strap connector
    • H01L2224/842Applying energy for connecting
    • H01L2224/84201Compression bonding
    • H01L2224/84205Ultrasonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/84Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a strap connector
    • H01L2224/848Bonding techniques
    • H01L2224/84801Soldering or alloying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1305Bipolar Junction Transistor [BJT]
    • H01L2924/13055Insulated gate bipolar transistor [IGBT]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Inverter Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

この発明は、半導体装置に係り、特に電力変換をおこなう半導体装置を構成する半導体素子の引き出し電極部(インナーリード部)のインダクタンス低減に関するものである。   The present invention relates to a semiconductor device, and more particularly to an inductance reduction of a lead electrode portion (inner lead portion) of a semiconductor element constituting a semiconductor device that performs power conversion.

半導体装置を構成する半導体素子の導通電流を外部に取り出すために、半導体素子の内部電極を半導体装置の外部電極に接続することが必要不可欠であるが、従来はアルミニウム等の金属細線により両電極を接続していた。近年、取り扱う電流の増大による電力損失を低減させるため、例えば特許文献1に示されるように、引き出し電極(インナーリード)で両電極を接続する構造(ダイレクトリードボンディング構造)が提案されている。   In order to extract the conduction current of the semiconductor element constituting the semiconductor device to the outside, it is essential to connect the internal electrode of the semiconductor element to the external electrode of the semiconductor device. Conventionally, both electrodes are connected by a thin metal wire such as aluminum. I was connected. In recent years, in order to reduce power loss due to an increase in current to be handled, a structure (direct lead bonding structure) in which both electrodes are connected by an extraction electrode (inner lead) has been proposed as disclosed in Patent Document 1, for example.

特開2004−228461号公報 (図3)JP 2004-228461 A (FIG. 3)

このようなダイレクトリードボンディング構造を有した半導体装置においては、引き出し電極は直接半導体素子の内部電極に半田により接合されているが、引き出し電極の側面に溶融した半田による半田溜り部が発生し半導体装置の信頼性を低下させていた。このため上記特許文献1によれば、引き出し電極を、半田を介して半導体素子の内部電極に接合された引き出し電極端部と、半導体素子の導通電流を外部に導出するための引き出し電極配線部と、引き出し電極端部と引き出し電極配線部とを空隙を有するように連結する引き出し電極連結部とから構成することを教示している。このように引き出し電極端部と引き出し電極配線部とを空隙を有するように連結することにより、半導体素子と引き出し電極とを半田付けする際に半田溜り部を形成することなく、信頼性に優れたダイレクトリードボンディング構造を有した半導体装置を実現できるからである。また、上記のような構成の引き出し電極を採用することにより、半導体素子と引き出し電極配線部との間に発生する熱応力が、引き出し電極連結部により緩和されるため、半導体素子と引き出し電極とを接合している半田層のはんだ疲労が抑制され、半導体装置の信頼性をより高めていた。   In the semiconductor device having such a direct lead bonding structure, the extraction electrode is directly bonded to the internal electrode of the semiconductor element by soldering, but a solder reservoir due to molten solder is generated on the side surface of the extraction electrode. Had reduced the reliability. For this reason, according to Patent Document 1, the lead electrode is connected to the internal electrode of the semiconductor element via the solder, and the lead electrode wiring part for leading the conduction current of the semiconductor element to the outside. In addition, it teaches that the lead electrode end portion and the lead electrode wiring portion are constituted by a lead electrode connecting portion that connects the lead electrode wiring portion with a gap. By connecting the lead electrode end portion and the lead electrode wiring portion so as to have a gap in this way, it is excellent in reliability without forming a solder pool portion when soldering the semiconductor element and the lead electrode. This is because a semiconductor device having a direct lead bonding structure can be realized. In addition, by adopting the lead electrode having the above-described configuration, the thermal stress generated between the semiconductor element and the lead electrode wiring portion is relieved by the lead electrode connecting portion. The solder fatigue of the solder layers to be joined is suppressed, and the reliability of the semiconductor device is further improved.

しかしながら、従来の半導体装置においては、引き出し電極端部と引き出し電極配線部とを空隙を有するように連結する必要があるため、半導体素子を支持しているベース板と引き出し電極配線部との間に一定の距離が存在していた。このような半導体装置においては、外部電極からベース板に導入された主電流は半導体素子に流れ込み、引き出し電極を通って外部電極から排出される。したがって、半導体素子を支持しているベース板と引き出し電極配線部との間の距離が大きいと、上記主電流経路を構成するループの面積が大きくなり、半導体装置固有の浮遊インダクタンスが大きくなる。   However, in the conventional semiconductor device, since it is necessary to connect the end portion of the extraction electrode and the extraction electrode wiring portion so as to have a gap, between the base plate supporting the semiconductor element and the extraction electrode wiring portion. There was a certain distance. In such a semiconductor device, the main current introduced from the external electrode to the base plate flows into the semiconductor element, and is discharged from the external electrode through the extraction electrode. Therefore, if the distance between the base plate supporting the semiconductor element and the lead electrode wiring portion is large, the area of the loop constituting the main current path increases, and the stray inductance inherent to the semiconductor device increases.

このように固有の浮遊インダクタンスが大きくなると、半導体装置のスイッチング動作時における急激な電流変化(di/dt)により発生するサージ電圧が上記インダクタンスに比例して大きくなり、そのようなサージ電圧による半導体装置の破壊を防止するために、急激な電流変化を抑制する工夫が必要となり、そのことが電力変換の効率低下またはコストの増大を招いていた。   When the inherent stray inductance increases as described above, a surge voltage generated by a rapid current change (di / dt) during the switching operation of the semiconductor device increases in proportion to the inductance, and the semiconductor device due to such a surge voltage. In order to prevent the destruction of the power, it is necessary to devise a device for suppressing a rapid current change, which causes a reduction in power conversion efficiency or an increase in cost.

この発明は、上述のような課題を解決するためになされたもので、その目的は、半導体装置の主電流経路を構成する部材の形状に工夫を加えることにより、半導体装置固有の浮遊インダクタンスを減少させ、サージ電圧の低い半導体装置を提供しようとするものである。   The present invention has been made to solve the above-described problems, and its object is to reduce the stray inductance inherent to a semiconductor device by adding ingenuity to the shape of members constituting the main current path of the semiconductor device. Thus, a semiconductor device with a low surge voltage is to be provided.

前記の目的を達成するために、本発明に係る半導体装置は、導電体からなるベース板と、上記ベース板上に一方の主面が対向するように戴置され、他方の主面上に内部電極を有する半導体素子と、上記内部電極に接合された引き出し電極端部と、上記引き出し電極端部と相対する位置に設けられ上記半導体素子の導通電流を外部に導出するための引き出し電極配線部と、上記引き出し電極端部と上記引き出し電極配線部とを間に空隙を有するように連結する引き出し電極連結部とを含む引き出し電極とを備えた半導体装置であって、上記引き出し電極配線部は、上記ベース板の上記半導体素子が戴置された面の上方から見て、上記半導体素子と重ならない部分において上記ベース板に近接するように屈曲されていることを特徴とする。   In order to achieve the above object, a semiconductor device according to the present invention includes a base plate made of a conductor, and is placed on the base plate so that one main surface faces the other, and the other main surface has an internal structure. A semiconductor element having an electrode; an extraction electrode end joined to the internal electrode; and an extraction electrode wiring portion provided at a position opposite to the extraction electrode end for leading the conduction current of the semiconductor element to the outside A lead electrode including a lead electrode connecting portion for connecting the lead electrode end portion and the lead electrode wiring portion with a gap therebetween, wherein the lead electrode wiring portion is The base plate is bent so as to be close to the base plate at a portion not overlapping with the semiconductor element when viewed from above the surface on which the semiconductor element is placed.

上記のような構成としたため、本発明に係る半導体装置によれば、従来の半導体装置と比較して主電流経路を構成するループの面積が小さくなり、半導体装置固有の浮遊インダクタンスが小さくなり、発生するサージ電圧が低下するため、電力変換効率がよくコストの低廉な半導体装置が実現できる。   Due to the configuration as described above, according to the semiconductor device of the present invention, the area of the loop constituting the main current path is reduced as compared with the conventional semiconductor device, and the stray inductance inherent to the semiconductor device is reduced. Therefore, a semiconductor device with high power conversion efficiency and low cost can be realized.

<実施の形態1>
以下、本発明の実施の形態1を図に基づいて説明する。図1は本発明に係る半導体装置の実施の形態1を示す平面図(a)、そのA−A断面図(b)及びそのB−B断面図(c)である。平面図においては便宜上封止樹脂を省略している。
<Embodiment 1>
Embodiment 1 of the present invention will be described below with reference to the drawings. FIG. 1A is a plan view showing a semiconductor device according to a first embodiment of the present invention, FIG. 1A is a sectional view taken along line AA, and FIG. 1C is a sectional view taken along line BB. In the plan view, the sealing resin is omitted for convenience.

図1において、銅又は銅合金からなり、相対向する2つの平行な主面を有し、厚みが4mmで25mm×45mmの長方形のベース板1の上面には、電力用半導体素子である、厚さ250μm、主面の大きさが15mm角のIGBT2と、ほぼ同一の厚さ及び大きさを有するダイオード3とが半田層(図示せず)により半田付けされている。同様にベース板4の上面には、電力用半導体素子である、厚さ250μm、主面の大きさが15mm角のIGBT5と、ほぼ同一の厚さ及び大きさを有するダイオード6とが半田層(図示せず)により半田付けされている。   In FIG. 1, the upper surface of a rectangular base plate 1 made of copper or a copper alloy and having two parallel main surfaces facing each other and having a thickness of 4 mm and having a thickness of 25 mm × 45 mm is a power semiconductor element. An IGBT 2 having a thickness of 250 μm and a main surface of 15 mm square and a diode 3 having substantially the same thickness and size are soldered by a solder layer (not shown). Similarly, on the upper surface of the base plate 4, an IGBT 5 having a thickness of 250 μm and a main surface of 15 mm square, and a diode 6 having substantially the same thickness and size, which are power semiconductor elements, are solder layers ( (Not shown).

銅又は銅合金からなる厚みが0.2mmの引き出し電極7が、IGBT2及びダイオード3の表面の内部電極と外部端子である出力端子9との間を電気的に接続している。引き出し電極7は、IGBT2及びダイオード3の表面の内部電極と接合される引き出し電極端部7aと、引き出し電極端部7aと相対する位置に設けられIGBT2及びダイオード3に流れる電流を外部に導出する引き出し電極配線部7bと、引き出し電極端部7aと引き出し電極配線部7bとを間に空隙を有するように連結する引き出し電極連結部7cとから構成されている。同様にもうひとつの引き出し電極8は、IGBT5及びダイオード6の表面の内部電極と外部端子であるN端子10との間を電気的に接続しており、IGBT5及びダイオード6の表面の内部電極と接合される引き出し電極端部8aと、IGBT5及びダイオード6に流れる電流を外部に導出する引き出し電極配線部8bと、引き出し電極端部8aと引き出し電極配線部8bとを間に空隙を有するように連結する引き出し電極連結部8cとから構成されている。同時に出力端子9はベース板4にも半田付けや超音波接合により接合され、電気的にも接続されている。ベース板1には外部端子であるP端子11が半田付けや超音波接合により接合されている。   A lead electrode 7 made of copper or a copper alloy and having a thickness of 0.2 mm electrically connects the internal electrode on the surface of the IGBT 2 and the diode 3 and the output terminal 9 which is an external terminal. The lead electrode 7 is provided at a position opposite to the lead electrode end 7a joined to the internal electrode on the surface of the IGBT 2 and the diode 3, and a lead facing the lead electrode end 7a, and leads the current flowing through the IGBT 2 and the diode 3 to the outside. The electrode wiring part 7b is composed of a lead electrode connecting part 7c that connects the lead electrode end part 7a and the lead electrode wiring part 7b with a gap therebetween. Similarly, another lead electrode 8 is electrically connected between the internal electrode on the surface of the IGBT 5 and the diode 6 and the N terminal 10 which is an external terminal, and is joined to the internal electrode on the surface of the IGBT 5 and the diode 6. The lead electrode end portion 8a, the lead electrode wiring portion 8b for leading the current flowing through the IGBT 5 and the diode 6 to the outside, and the lead electrode end portion 8a and the lead electrode wiring portion 8b are connected so as to have a gap therebetween. And an extraction electrode connecting portion 8c. At the same time, the output terminal 9 is joined to the base plate 4 by soldering or ultrasonic joining, and is also electrically connected. A P terminal 11 which is an external terminal is joined to the base plate 1 by soldering or ultrasonic joining.

ここで引き出し電極配線部7bは、IGBT2の上方からダイオード3の上方を経由して出力端子9に向かって延在しているが、IGBT2とダイオード3との間及びダイオード3と出力端子9との間の部分においてベース板1の方向に近接するように屈曲されている。同様に引き出し電極配線部8bは、IGBT5の上方からダイオード6の上方を経由してN端子10に向かって延在しているが、IGBT5とダイオード6との間及びダイオード6とN端子10との間の部分においてベース板4の方向に近接するように屈曲されている。   Here, the lead electrode wiring portion 7 b extends from the upper side of the IGBT 2 toward the output terminal 9 via the upper side of the diode 3, but between the IGBT 2 and the diode 3 and between the diode 3 and the output terminal 9. It is bent so as to be close to the direction of the base plate 1 in the intermediate portion. Similarly, the lead electrode wiring portion 8 b extends from the upper side of the IGBT 5 toward the N terminal 10 via the upper side of the diode 6, but between the IGBT 5 and the diode 6 and between the diode 6 and the N terminal 10. It is bent so as to be close to the direction of the base plate 4 at the intermediate portion.

ベース板1及び4の下には絶縁シート12及び金属箔13が設けられている。外部環境から保護するための封止樹脂14はトランスファーモールド等により、出力端子9、N端子10、P端子11及び金属箔13の一部が露出するようにベース板1及び4、IGBT2及び5、ダイオード3及び6、引き出し電極7及び8を封着し、図1(a)の平面図のように上方から見て四辺形のパッケージを構成している。半導体装置固有の浮遊インダクタンスを低減させるため、主電流が流れる出力端子9、N端子10、P端子11の3つの外部端子は、モールド樹脂の一つの側面より並列に取り出されている。このように構成されることにより、この半導体装置は図2のような回路構成となっている。なお、図2において制御端子15及び制御端子16はそれぞれIGBT2及びIGBT5を制御するためのゲート信号を入力する端子であるが、図1においては簡略化のため図示を省略している。   Under the base plates 1 and 4, an insulating sheet 12 and a metal foil 13 are provided. The sealing resin 14 for protecting from the external environment is formed by transfer molding or the like so that the output terminals 9, N terminal 10, P terminal 11, and part of the metal foil 13 are exposed, the base plates 1 and 4, IGBTs 2 and 5, The diodes 3 and 6 and the extraction electrodes 7 and 8 are sealed to constitute a quadrilateral package as viewed from above as shown in the plan view of FIG. In order to reduce the stray inductance inherent to the semiconductor device, the three external terminals of the output terminal 9, the N terminal 10 and the P terminal 11 through which the main current flows are taken out in parallel from one side surface of the mold resin. With this configuration, the semiconductor device has a circuit configuration as shown in FIG. 2, the control terminal 15 and the control terminal 16 are terminals for inputting gate signals for controlling the IGBT 2 and the IGBT 5, respectively, but are not shown in FIG. 1 for simplification.

次に本実施の形態にかかる半導体装置の動作について説明する。本半導体装置は直流電力を任意の周波数の交流電力に電力変換をおこなう場合に用いられる。P端子11には比較的高い電位を有する直流電源が、N端子10には比較的低い電位を有する直流電源が接続され、これら直流電源より供給された直流電力を交流電力に変換して、出力端子9からモータ等の負荷に供給する。供給される交流電力が一方の極性のときは、IGBT2は導通状態にありIGBT5は非導通状態にあるため、P端子11から入力された主電流はベース板1、IGBT2、引き出し電極7という電流経路を経て出力端子9から負荷に流れ込む。逆に供給される交流電力が他方の極性のときは、IGBT2は非導通状態にありIGBT5は導通状態にあるため、出力端子9から導入された主電流はベース板4、IGBT5、引き出し電極8という電流経路を経てN端子10から直流電源に戻る。   Next, the operation of the semiconductor device according to this embodiment will be described. This semiconductor device is used when DC power is converted into AC power of an arbitrary frequency. A DC power source having a relatively high potential is connected to the P terminal 11, and a DC power source having a relatively low potential is connected to the N terminal 10. The DC power supplied from these DC power sources is converted into AC power and output. A terminal 9 supplies a load such as a motor. When the supplied AC power has one polarity, the IGBT 2 is in a conducting state and the IGBT 5 is in a non-conducting state, so that the main current input from the P terminal 11 is a current path of the base plate 1, the IGBT 2, and the extraction electrode 7. Through the output terminal 9 into the load. Conversely, when the AC power supplied is in the other polarity, the IGBT 2 is in a non-conducting state and the IGBT 5 is in a conducting state, so the main current introduced from the output terminal 9 is the base plate 4, the IGBT 5, and the extraction electrode 8. It returns to the DC power source from the N terminal 10 through the current path.

このような半導体装置においては、動作時に流れる電流経路は、例えば図1(b)でいえば、ベース板4、IGBT5、引き出し電極8というループを構成するが、本実施の形態にかかる半導体装置においては上述したように引き出し電極配線部8bの一部がベース板4の方向に近接するように屈曲されているので、このループ面積が従来の半導体装置に比較して小さく形成されることになる。このことはベース板1、IGBT2、引き出し電極7で構成されるループにおいても同様である。これにより、半導体装置固有の浮遊インダクタンスが小さくなり、発生するサージ電圧が低下するため、電力変換効率がよくコストの低廉な半導体装置が実現できる。特に本実施例のように、主電流が流れる出力端子9、N端子10、P端子11の3つの外部端子がモールド樹脂の一つの側面より並列に取り出されているような半導体装置においては、その効果は大きい。   In such a semiconductor device, the current path that flows during operation forms a loop of the base plate 4, the IGBT 5, and the extraction electrode 8, for example, in FIG. 1B, but in the semiconductor device according to the present embodiment, As described above, since a part of the lead electrode wiring portion 8b is bent so as to be close to the direction of the base plate 4, this loop area is formed smaller than that of the conventional semiconductor device. The same applies to the loop composed of the base plate 1, IGBT 2, and extraction electrode 7. As a result, the stray inductance inherent to the semiconductor device is reduced and the generated surge voltage is reduced, so that a semiconductor device with high power conversion efficiency and low cost can be realized. In particular, as in this embodiment, in a semiconductor device in which three external terminals of the output terminal 9, the N terminal 10 and the P terminal 11 through which the main current flows are taken out in parallel from one side surface of the mold resin, The effect is great.

<実施の形態2>
以下、本発明の実施の形態2を図に基づいて説明する。図3は本発明に係る半導体装置の実施の形態2を示す平面図(a)及びそのC−C断面図(b)である。平面図においては便宜上封止樹脂を省略している。
<Embodiment 2>
Embodiment 2 of the present invention will be described below with reference to the drawings. FIG. 3A is a plan view showing a semiconductor device according to a second embodiment of the present invention, and FIG. In the plan view, the sealing resin is omitted for convenience.

図3に示された実施の形態2の構成は、ベース板1及び4にはそれぞれ2つの凹部1a、4aが設けられ、各凹部の中にIGBT2、ダイオード3、IGBT5、ダイオード6が収容されており、引き出し電極7及び引き出し電極8には図1のような屈曲部は存在しないが、上記凹部により実質的に引き出し電極配線部8bとベース板4との間隔が小さくなっている。それ以外の点は、図1の実施の形態1と同じ構成であり、またその動作も実施の形態1の動作と同じである。   In the configuration of the second embodiment shown in FIG. 3, the base plates 1 and 4 are each provided with two recesses 1a and 4a, and IGBT2, diode 3, IGBT5, and diode 6 are accommodated in each recess. In addition, the lead electrode 7 and the lead electrode 8 do not have a bent portion as shown in FIG. 1, but the gap between the lead electrode wiring portion 8b and the base plate 4 is substantially reduced by the recess. The other points are the same as those of the first embodiment shown in FIG. 1, and the operation thereof is the same as that of the first embodiment.

したがって、本実施の形態に係る半導体装置においても、動作時に流れる電流経路は、ベース板4、IGBT5、引き出し電極8というループを構成する。特にスイッチング動作時における急激な電流変化(di/dt)を伴う電流は表皮効果により導体の表面を流れるため、主電流の大部分はベース板4の表面近くを流れる。本実施の形態にかかる半導体装置においては上述したように引き出し電極配線部8bとベース板4との間隔が小さくなっているので、このループ面積が従来の半導体装置に比較して小さく形成されることになる。このことはベース板1、IGBT2、引き出し電極7で構成されるループにおいても同様である。これにより、半導体装置固有の浮遊インダクタンスが小さくなり、発生するサージ電圧が低下するため、電力変換効率がよくコストの低廉な半導体装置が実現できる。   Therefore, also in the semiconductor device according to the present embodiment, the current path that flows during operation forms a loop of the base plate 4, the IGBT 5, and the extraction electrode 8. In particular, since a current accompanied by a rapid current change (di / dt) during the switching operation flows on the surface of the conductor due to the skin effect, most of the main current flows near the surface of the base plate 4. In the semiconductor device according to the present embodiment, since the distance between the lead electrode wiring portion 8b and the base plate 4 is small as described above, the loop area is formed smaller than that of the conventional semiconductor device. become. The same applies to the loop composed of the base plate 1, IGBT 2, and extraction electrode 7. As a result, the stray inductance inherent to the semiconductor device is reduced and the generated surge voltage is reduced, so that a semiconductor device with high power conversion efficiency and low cost can be realized.

また本実施の形態においては、図3に示されるように引き出し電極7及び引き出し電極8に複数個の貫通孔7d及び8dが設けられている。一般に本実施例のように引き出し電極配線部8bとベース板4との間隔を小さくすると、トランスファーモールドによる成型時に、封止樹脂14が引き出し電極配線部8bとベース板4との間隙に十分に充填されず、ボイドが発生する恐れがある。したがってこのような貫通孔を設けることにより、注入された封止樹脂はこれらの貫通孔8dを経由して引き出し電極配線部8bとベース板4との間隙に回りこめるため、上述のようなボイドの発生を防止できる。   In the present embodiment, a plurality of through holes 7d and 8d are provided in the extraction electrode 7 and the extraction electrode 8 as shown in FIG. In general, when the distance between the lead electrode wiring portion 8b and the base plate 4 is reduced as in this embodiment, the sealing resin 14 is sufficiently filled in the gap between the lead electrode wiring portion 8b and the base plate 4 during molding by transfer molding. Otherwise, voids may occur. Therefore, by providing such a through hole, the injected sealing resin can go around the gap between the lead electrode wiring portion 8b and the base plate 4 via these through holes 8d. Occurrence can be prevented.

また本実施の形態においては図4に示されるような変形例にすることも可能である。図4においてはベース板4は外部端子が露出する封止樹脂面の方向に延在され、N端子10は引き出し電極配線部8bのベース板4と対向する面側において接合されている。また同様にベース板1は外部端子が露出する封止樹脂面の方向に延在され、出力端子9は引き出し電極配線部7bのベース板1と対向する面側において引き出し電極配線部7bと接合されている。このような構造としたことにより、外部端子であるN端子10又は出力端子9とベース板1又はベース板4との間隔も小さくでき、外部端子を含めた半導体装置固有の浮遊インダクタンスの低減が図られることとなり、より一層の電力変換効率の向上やコストの低減が実現できる。   Further, in the present embodiment, a modification as shown in FIG. 4 is possible. In FIG. 4, the base plate 4 extends in the direction of the sealing resin surface from which the external terminals are exposed, and the N terminal 10 is joined on the surface side facing the base plate 4 of the lead electrode wiring portion 8b. Similarly, the base plate 1 extends in the direction of the sealing resin surface from which the external terminals are exposed, and the output terminal 9 is joined to the lead electrode wiring portion 7b on the side of the lead electrode wiring portion 7b facing the base plate 1. ing. By adopting such a structure, the distance between the N terminal 10 or the output terminal 9 which is an external terminal and the base plate 1 or the base plate 4 can be reduced, thereby reducing the stray inductance specific to the semiconductor device including the external terminal. As a result, the power conversion efficiency can be further improved and the cost can be reduced.

以上、本発明の具体的な実施形態を説明したが、本発明はこれらに限らず種々の改変が可能である。例えば、上記実施の形態において半導体素子の組み合わせはIGBTとダイオードであるが、IGBTとIGBT、ダイオードとダイオード、MOSFETとMOSFET又はその他の半導体素子の組み合わせであってもよく、あるいはIGBT単体、MOSFET単体又はその他の半導体素子単体であっても本発明の範囲に含まれる。また、実施の形態2に係る半導体装置に示されている貫通孔は実施の形態1に係る半導体装置に適用することも可能であり同様の効果が得られることはいうまでもない。さらにはこのような貫通孔は実施の形態2のように円形である必要はなく、長方形又はその他の形状であってもよい。   Although specific embodiments of the present invention have been described above, the present invention is not limited to these and various modifications can be made. For example, in the above embodiment, the combination of the semiconductor elements is IGBT and diode, but IGBT and IGBT, diode and diode, MOSFET and MOSFET or other semiconductor elements may be combined, or IGBT alone, MOSFET alone or Other single semiconductor elements are also included in the scope of the present invention. Needless to say, the through-hole shown in the semiconductor device according to the second embodiment can be applied to the semiconductor device according to the first embodiment, and the same effect can be obtained. Further, such a through hole does not need to be circular as in the second embodiment, and may be rectangular or other shapes.

本発明に係る半導体装置の実施の形態1を示す平面図(a)、そのA−A断面図(b)及びそのB−B断面図(c)である。BRIEF DESCRIPTION OF THE DRAWINGS It is the top view (a) which shows Embodiment 1 of the semiconductor device based on this invention, its AA sectional drawing (b), and its BB sectional drawing (c). 本発明に係る半導体装置の回路構成図である。It is a circuit block diagram of the semiconductor device which concerns on this invention. 本発明に係る半導体装置の実施の形態2を示す平面図(a)及びそのC−C断面図(b)である。It is the top view (a) which shows Embodiment 2 of the semiconductor device which concerns on this invention, and its CC sectional drawing (b). 本発明に係る半導体装置の実施の形態2の変形例を示す平面図(a)及びそのD−D断面図(b)である。It is the top view (a) which shows the modification of Embodiment 2 of the semiconductor device which concerns on this invention, and its DD sectional drawing (b).

符号の説明Explanation of symbols

1 ベース板、 2 IGBT、 3 ダイオード、 4 ベース板、 5 IGBT、 6 ダイオード、 7 引き出し電極、 7a 引き出し電極端部、 7b 引き出し電極配線部、 7c 引き出し電極連結部、 7d 引き出し電極連結部、 8 引き出し電極、 8a 引き出し電極端部、 8b 引き出し電極配線部、 8c 引き出し電極連結部、 8d 引き出し電極連結部、 9 出力端子、 10 N端子 11 P端子 12 絶縁シート 13 金属箔 14 封止樹脂 15 制御端子 16 制御端子。

DESCRIPTION OF SYMBOLS 1 Base board, 2 IGBT, 3 Diode, 4 Base board, 5 IGBT, 6 Diode, 7 Lead electrode, 7a Lead electrode edge part, 7b Lead electrode wiring part, 7c Lead electrode connection part, 7d Lead electrode connection part, 8 Lead Electrode, 8a Lead electrode end part, 8b Lead electrode wiring part, 8c Lead electrode connecting part, 8d Lead electrode connecting part, 9 Output terminal, 10 N terminal 11 P terminal 12 Insulating sheet 13 Metal foil 14 Sealing resin 15 Control terminal 16 Control terminal.

Claims (3)

導電体からなるベース板と、
前記ベース板上に一方の主面が対向するように戴置され、他方の主面上に内部電極を有する半導体素子と、
前記内部電極に接合された引き出し電極端部と、前記引き出し電極端部と相対する位置に設けられ前記半導体素子の導通電流を外部に導出するための引き出し電極配線部と、前記引き出し電極端部と前記引き出し電極配線部とを間に空隙を有するように連結する引き出し電極連結部とを含む引き出し電極と、
を備えた半導体装置であって、
前記引き出し電極配線部は、前記ベース板の前記半導体素子が戴置された面の上方から見て、前記半導体素子と重ならない部分において前記ベース板に近接するように屈曲されていることを特徴とする半導体装置。
A base plate made of a conductor;
A semiconductor element placed on the base plate so that one main surface is opposed to the other and having an internal electrode on the other main surface;
An extraction electrode end joined to the internal electrode, an extraction electrode wiring portion provided at a position opposite to the extraction electrode end for leading the conduction current of the semiconductor element to the outside, and the extraction electrode end A lead electrode including a lead electrode connecting portion for connecting the lead electrode wiring portion with a gap therebetween;
A semiconductor device comprising:
The lead electrode wiring portion is bent so as to be close to the base plate at a portion not overlapping the semiconductor element when viewed from above the surface of the base plate on which the semiconductor element is placed. Semiconductor device.
導電体からなるベース板と、
前記ベース板上に一方の主面が対向するように戴置され、他方の主面上に内部電極を有する半導体素子と、
前記内部電極に接合された引き出し電極端部と、前記引き出し電極端部と相対する位置に設けられ前記半導体素子の導通電流を外部に導出するための引き出し電極配線部と、前記引き出し電極端部と前記引き出し電極配線部とを間に空隙を有するように連結する引き出し電極連結部とを含む引き出し電極と、
を備えた半導体装置であって、
前記ベース板は、前記半導体素子を収容する凹部を備えていることを特徴とする半導体装置。
A base plate made of a conductor;
A semiconductor element placed on the base plate so that one main surface is opposed to the other and having an internal electrode on the other main surface;
An extraction electrode end joined to the internal electrode, an extraction electrode wiring portion provided at a position opposite to the extraction electrode end for leading the conduction current of the semiconductor element to the outside, and the extraction electrode end A lead electrode including a lead electrode connecting portion for connecting the lead electrode wiring portion with a gap therebetween;
A semiconductor device comprising:
The semiconductor device according to claim 1, wherein the base plate includes a recess that accommodates the semiconductor element.
前記引き出し電極配線部は、少なくとも1つの貫通孔を備えていることを特徴とする請求項1又は請求項2記載の半導体装置。
The semiconductor device according to claim 1, wherein the lead electrode wiring portion includes at least one through hole.
JP2005372250A 2005-12-26 2005-12-26 Semiconductor device Active JP4349364B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005372250A JP4349364B2 (en) 2005-12-26 2005-12-26 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005372250A JP4349364B2 (en) 2005-12-26 2005-12-26 Semiconductor device

Publications (2)

Publication Number Publication Date
JP2007173703A JP2007173703A (en) 2007-07-05
JP4349364B2 true JP4349364B2 (en) 2009-10-21

Family

ID=38299825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005372250A Active JP4349364B2 (en) 2005-12-26 2005-12-26 Semiconductor device

Country Status (1)

Country Link
JP (1) JP4349364B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9117688B2 (en) 2011-04-18 2015-08-25 Mitsubishi Electric Corporation Semiconductor device, inverter device provided with semiconductor device, and in-vehicle rotating electrical machine provided with semiconductor device and inverter device

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4666185B2 (en) 2008-06-26 2011-04-06 三菱電機株式会社 Semiconductor device
JP5947537B2 (en) 2011-04-19 2016-07-06 トヨタ自動車株式会社 Semiconductor device and manufacturing method thereof
JP2013232495A (en) * 2012-04-27 2013-11-14 Mitsubishi Electric Corp Semiconductor device
JP2017073406A (en) * 2014-02-24 2017-04-13 三菱電機株式会社 Electrode lead and semiconductor device
JP6385234B2 (en) * 2014-10-16 2018-09-05 三菱電機株式会社 Semiconductor device
JP6822000B2 (en) * 2016-08-05 2021-01-27 株式会社デンソー Semiconductor device
US20210013183A1 (en) * 2018-03-26 2021-01-14 Pansonic Intellectual Property Management Co., Ltd. Semiconductor module

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9117688B2 (en) 2011-04-18 2015-08-25 Mitsubishi Electric Corporation Semiconductor device, inverter device provided with semiconductor device, and in-vehicle rotating electrical machine provided with semiconductor device and inverter device

Also Published As

Publication number Publication date
JP2007173703A (en) 2007-07-05

Similar Documents

Publication Publication Date Title
EP3107120B1 (en) Power semiconductor module
US10398023B2 (en) Semiconductor device
KR100430772B1 (en) A semiconductor device
JP4349364B2 (en) Semiconductor device
JP4973059B2 (en) Semiconductor device and power conversion device
JP4640213B2 (en) Power semiconductor device and inverter bridge module using the same
US9831160B2 (en) Semiconductor device
JP2013069782A (en) Semiconductor device
JP2019207990A (en) Semiconductor device, cooling module, power conversion device, and electric vehicle
JP4491244B2 (en) Power semiconductor device
JP5481104B2 (en) Semiconductor device
US11996344B2 (en) Semiconductor device
JP2015162609A (en) semiconductor device
WO2021002132A1 (en) Semiconductor module circuit structure
KR101734712B1 (en) Power module
JP7035920B2 (en) Semiconductor devices and power converters
JP2005277014A (en) Semiconductor device
CN111354709B (en) Semiconductor device and method for manufacturing the same
JP7147186B2 (en) semiconductor equipment
JP5962364B2 (en) Power semiconductor module
JP5682511B2 (en) Semiconductor module
US20230087499A1 (en) Semiconductor unit and semiconductor device
JP7218564B2 (en) semiconductor equipment
WO2023090072A1 (en) Semiconductor device
WO2023199808A1 (en) Semiconductor device

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20071114

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090624

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090630

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090713

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120731

Year of fee payment: 3

R151 Written notification of patent or utility model registration

Ref document number: 4349364

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120731

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130731

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250