WO2023199808A1 - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
WO2023199808A1
WO2023199808A1 PCT/JP2023/014042 JP2023014042W WO2023199808A1 WO 2023199808 A1 WO2023199808 A1 WO 2023199808A1 JP 2023014042 W JP2023014042 W JP 2023014042W WO 2023199808 A1 WO2023199808 A1 WO 2023199808A1
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WO
WIPO (PCT)
Prior art keywords
semiconductor device
semiconductor element
signal terminal
power terminals
sealing resin
Prior art date
Application number
PCT/JP2023/014042
Other languages
French (fr)
Japanese (ja)
Inventor
沢水 神田
Original Assignee
ローム株式会社
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Filing date
Publication date
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Publication of WO2023199808A1 publication Critical patent/WO2023199808A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/07Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/18Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different subgroups of the same main group of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N
    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02MAPPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M7/00Conversion of ac power input into dc power output; Conversion of dc power input into ac power output
    • H02M7/42Conversion of dc power input into ac power output without possibility of reversal
    • H02M7/44Conversion of dc power input into ac power output without possibility of reversal by static converters
    • H02M7/48Conversion of dc power input into ac power output without possibility of reversal by static converters using discharge tubes with control electrode or semiconductor devices with control electrode

Definitions

  • the present disclosure relates to a semiconductor device.
  • Patent Document 1 discloses an example of a semiconductor device equipped with two power semiconductor elements (for example, IGBT).
  • the semiconductor device is used in a power conversion device such as an inverter.
  • the semiconductor device is surface mounted on a wiring board.
  • the semiconductor device disclosed in Patent Document 1 includes a plurality of power supply terminals and a plurality of control terminals.
  • a plurality of power supply terminals and a plurality of control terminals protrude outside from a housing that covers the two power semiconductor elements.
  • a portion protruding outward from the housing is bent into a gull wing shape to enable surface mounting.
  • the mutual spacing between the plurality of power supply terminals is further reduced. Thereby, there is a concern that the dielectric strength voltage of the semiconductor device may be reduced due to each portion of the plurality of power supply terminals protruding from the housing to the outside.
  • An object of the present disclosure is to provide a semiconductor device that is improved over conventional ones.
  • a semiconductor device provided by the present disclosure includes: a first semiconductor element, a second semiconductor element, a plurality of power terminals each electrically connected to at least one of the first semiconductor element and the second semiconductor element;
  • the semiconductor device includes a first signal terminal electrically connected to one semiconductor element, a second signal terminal electrically connected to the second semiconductor element, and a sealing resin covering the first semiconductor element and the second semiconductor element.
  • the sealing resin has a bottom surface facing in the first direction.
  • the plurality of power terminals, the first signal terminal, and the second signal terminal are exposed from the bottom surface. When viewed in the first direction, the entirety of each of the plurality of power terminals and the entirety of each of the first signal terminal and the second signal terminal are surrounded by the outer edge of the sealing resin.
  • FIG. 1 is a plan view of a semiconductor device according to a first embodiment of the present disclosure.
  • FIG. 2 is a bottom view of the semiconductor device shown in FIG. 1.
  • FIG. 3 is a bottom view corresponding to FIG. 2, through which the sealing resin is seen.
  • FIG. 4 is a left side view of the semiconductor device shown in FIG.
  • FIG. 5 is a right side view of the semiconductor device shown in FIG. 1.
  • FIG. 6 is a cross-sectional view taken along line VI-VI in FIG.
  • FIG. 7 is a cross-sectional view taken along line VII-VII in FIG.
  • FIG. 8 is a cross-sectional view taken along line VIII-VIII in FIG.
  • FIG. 9 is a partially enlarged view of FIG. 6.
  • FIG. 6 is a cross-sectional view taken along line VI-VI in FIG.
  • FIG. 7 is a cross-sectional view taken along line VII-VII in FIG.
  • FIG. 8 is a cross-sectional view taken along line VIII-V
  • FIG. 10 is a plan view of a modification of the semiconductor device shown in FIG.
  • FIG. 11 is a cross-sectional view taken along line XI-XI in FIG. 10.
  • FIG. 12 is a plan view of a semiconductor device according to a second embodiment of the present disclosure.
  • FIG. 13 is a bottom view of the semiconductor device shown in FIG. 12.
  • FIG. 14 is a left side view of the semiconductor device shown in FIG. 12.
  • FIG. 15 is a right side view of the semiconductor device shown in FIG. 12.
  • FIG. 16 is a cross-sectional view taken along line XVI-XVI in FIG. 13.
  • FIG. 17 is a cross-sectional view taken along line XVII-XVII in FIG. 13.
  • FIG. 18 is a plan view of a modification of the semiconductor device shown in FIG. 12.
  • FIG. 12 is a plan view of a semiconductor device according to a second embodiment of the present disclosure.
  • FIG. 13 is a bottom view of the semiconductor device shown in FIG. 12.
  • FIG. 19 is a sectional view taken along line XIX-XIX in FIG. 18.
  • FIG. 20 is a plan view of a semiconductor device according to a third embodiment of the present disclosure.
  • 21 is a bottom view of the semiconductor device shown in FIG. 20.
  • FIG. 22 is a cross-sectional view taken along line XXII-XXII in FIG. 21.
  • FIG. 23 is a cross-sectional view taken along line XXIII-XXIII in FIG. 21.
  • FIG. 24 is a plan view of a semiconductor device according to a fourth embodiment of the present disclosure.
  • FIG. 25 is a bottom view of the semiconductor device shown in FIG. 24.
  • FIG. 26 is a bottom view corresponding to FIG. 25, in which the sealing resin is seen through.
  • FIG. 27 is a right side view of the semiconductor device shown in FIG. 24.
  • FIG. 28 is a plan view of a semiconductor device according to a fifth embodiment of the present disclosure.
  • FIG. 29 is a bottom view of the semiconductor device shown in FIG. 28.
  • FIG. 30 is a bottom view corresponding to FIG. 29, in which the sealing resin is seen through.
  • FIG. 31 is a front view of the semiconductor device shown in FIG. 28.
  • FIG. 32 is a cross-sectional view taken along the line XXXII-XXXII in FIG. 29.
  • a semiconductor device A10 according to a first embodiment of the present disclosure will be described based on FIGS. 1 to 9.
  • the semiconductor device A10 is used in electronic equipment including a power conversion circuit such as an inverter.
  • the semiconductor device A10 includes a support member 10, two semiconductor elements 20, a plurality of power terminals 30, a plurality of first signal terminals 31, a plurality of second signal terminals 32, two conductive members 40, and two gate wires 41, 2.
  • the detection wire 42 and the sealing resin 50 are provided.
  • FIG. 3 for convenience of understanding, the sealing resin 50 is shown.
  • the outline of the transparent sealing resin 50 is shown by an imaginary line (two-dot chain line).
  • first direction z the normal direction of the bottom surface 52 of the sealing resin 50, which will be described later, will be referred to as a "first direction z.”
  • second direction x One direction perpendicular to the first direction z
  • third direction y A direction perpendicular to the first direction z and the second direction x is referred to as a "third direction y.”
  • the semiconductor device A10 converts the DC power supply voltage applied to the first input terminal 30A and the second input terminal 30B (see FIG. 2) among the plurality of power terminals 30 into AC power using the two semiconductor elements 20.
  • the converted AC power is input to a power supply target such as a motor from an output terminal 30C (see FIG. 2) among the plurality of power terminals 30.
  • the semiconductor device A10 is surface mounted on a wiring board.
  • the sealing resin 50 covers the two semiconductor elements 20, as shown in FIGS. 2, 6, and 7. Furthermore, the sealing resin 50 covers the support member 10 excluding the heat dissipation layer 16, the two conductive members 40, the two gate wires 41, and the two detection wires 42.
  • the sealing resin 50 has electrical insulation properties.
  • the sealing resin 50 is made of a material containing, for example, a black epoxy resin. As shown in FIGS. 1 and 2, the sealing resin 50 has a top surface 51, a bottom surface 52, two first side surfaces 53, and two second side surfaces 54.
  • top surface 51 and the bottom surface 52 face oppositely to each other in the first direction z.
  • Top surface 51 has a periphery 511 that defines top surface 51 .
  • the peripheral edge 511 is surrounded by the outer edge 501 of the sealing resin 50 and is located away from the outer edge 501 when viewed in the first direction z.
  • the outer edge 501 corresponds to the outline of the sealing resin 50 when viewed in the first direction z.
  • each of the two first side surfaces 53 face opposite to each other in the second direction x. As shown in FIG. 5, each of the two first side surfaces 53 is connected to the top surface 51 and the bottom surface 52. Each of the two first side surfaces 53 includes a region connected to the bottom surface 52 and facing in the second direction x, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
  • the two second side surfaces 54 face oppositely to each other in the third direction y.
  • Each of the two second side surfaces 54 is connected to the top surface 51 and the bottom surface 52.
  • Each of the two second side surfaces 54 includes a region connected to the bottom surface 52 and facing in the third direction y, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
  • the support member 10 mounts two semiconductor elements 20, as shown in FIGS. 3 and 8. As shown in FIGS. 1 and 3, the support member 10 includes an insulating layer 11, a first conductive layer 12, a second conductive layer 13, a third conductive layer 14, a plurality of pad layers 15, and a heat dissipation layer 16.
  • the insulating layer 11 is located between the first conductive layer 12 and the second conductive layer 13 and the heat dissipation layer 16 in the first direction z.
  • the material for the insulating layer 11 is preferably one with relatively high thermal conductivity. Therefore, the insulating layer 11 is made of a material containing aluminum nitride (AlN) in its composition, for example.
  • AlN aluminum nitride
  • the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 are connected to the heat dissipation layer 16 with respect to the insulating layer 11 in the first direction z. located on the opposite side.
  • the first conductive layer 12 and the second conductive layer 13 are located between the two semiconductor elements 20 and the insulating layer 11 in the first direction z.
  • Each of the first conductive layer 12 , the second conductive layer 13 , the third conductive layer 14 , and the plurality of pad layers 15 is electrically connected to at least one of the two semiconductor elements 20 .
  • the compositions of the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 include copper (Cu).
  • the first conductive layer 12 is located on one side in the third direction y.
  • the second conductive layer 13 is located next to the first conductive layer 12 in the third direction y.
  • the third conductive layer 14 is sandwiched between the first conductive layer 12 and the second conductive layer 13 in the third direction y.
  • the plurality of pad layers 15 are located on the opposite side of the third conductive layer 14 with respect to the first conductive layer 12 and the second conductive layer 13 in the second direction x.
  • the plurality of pad layers 15 are arranged along the third direction y.
  • the heat dissipation layer 16 is located on the opposite side of the first conductive layer 12 and the second conductive layer 13 with respect to the insulating layer 11 in the first direction z.
  • the heat dissipation layer 16 is exposed from the top surface 51 of the sealing resin 50.
  • the composition of the heat dissipation layer 16 includes copper.
  • the heat dissipation layer 16 completely overlaps each of the two semiconductor elements 20. As shown in FIG.
  • the two semiconductor elements 20 are located between the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. As shown in FIGS. 3 and 8, the two semiconductor elements 20 are individually conductively bonded to the first conductive layer 12 and the second conductive layer 13 of the support member 10 via a bonding layer 29. Bonding layer 29 is, for example, solder. In addition, the bonding layer 29 may be a sintered metal containing silver (Ag) or the like.
  • the two semiconductor elements 20 are n-channel type MOSFETs (Metal-Oxide-Semiconductor Field-Effect Transistors) with a vertical structure.
  • the two semiconductor elements 20 include compound semiconductor substrates.
  • the main material of the compound semiconductor substrate is silicon carbide (SiC).
  • silicon (Si) may be used as the main material of the compound semiconductor substrate.
  • the two semiconductor elements 20 may be other switching elements such as IGBTs (Insulated Gate Bipolar Transistors).
  • IGBTs Insulated Gate Bipolar Transistors
  • each of the two semiconductor elements 20 has a first electrode 21, a second electrode 22, and a gate electrode 23.
  • the first electrode 21 is provided facing either the first conductive layer 12 or the second conductive layer 13 of the support member 10 .
  • a current corresponding to the power before being converted by the semiconductor element 20 flows through the first electrode 21 . That is, the first electrode 21 corresponds to a drain electrode.
  • the second electrode 22 is provided on the opposite side to the first electrode 21 in the first direction z. A current corresponding to the power converted by the semiconductor element 20 flows through the second electrode 22 . That is, the second electrode 22 corresponds to a source electrode.
  • the gate electrode 23 is provided on the opposite side to the first electrode 21 in the first direction z, and is located away from the second electrode 22.
  • a gate voltage for driving the semiconductor element 20 is applied to the gate electrode 23 .
  • the area of the gate electrode 23 is smaller than the area of the second electrode 22 when viewed in the first direction z.
  • the two semiconductor elements 20 include a first semiconductor element 20A and a second semiconductor element 20B.
  • the first electrode 21 of the first semiconductor element 20A is conductively bonded to the first conductive layer 12 of the support member 10 via the bonding layer 29. Thereby, the first semiconductor element 20A is electrically connected to the first conductive layer 12.
  • the first electrode 21 of the second semiconductor element 20B is conductively bonded to the second conductive layer 13 via the bonding layer 29. Thereby, the second semiconductor element 20B is electrically connected to the second conductive layer 13.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are connected to the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. located between.
  • at least one of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 connect two semiconductor elements 20 in the second direction x. They are located opposite each other as a reference.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the bottom surface 52.
  • each of the plurality of power terminals 30, the whole of each of the plurality of first signal terminals 31, and the whole of each of the plurality of second signal terminals 32. is surrounded by an outer edge 501 of the sealing resin 50.
  • each of the plurality of power terminals 30, each of the plurality of first signal terminals 31, and each of the plurality of second signal terminals 32 are separated from the support member 10. It's sticking out.
  • the compositions of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 include copper.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are metal leads.
  • the plurality of power terminals 30 include a first input terminal 30A, a second input terminal 30B, and an output terminal 30C.
  • the first input terminal 30A, the second input terminal 30B, and the output terminal 30C are connected to the plurality of first signal terminals 31 and the plurality of second signal terminals with reference to the two semiconductor elements 20 in the second direction x. It is located on the opposite side from the terminal 32.
  • the second input terminal 30B is located between the first input terminal 30A and the output terminal 30C in the third direction y.
  • the first input terminal 30A is electrically conductively bonded to the first conductive layer 12 of the support member 10. Thereby, the first input terminal 30A is electrically connected to the first semiconductor element 20A.
  • the second input terminal 30B is electrically conductively bonded to the third conductive layer 14 of the support member 10.
  • the output terminal 30C is conductively bonded to the second conductive layer 13 of the support member 10. Thereby, the output terminal 30C is electrically connected to the second semiconductor element 20B.
  • the first input terminal 30A corresponds to the positive electrode (P terminal)
  • the second input terminal 30B corresponds to the negative electrode (N terminal).
  • the plurality of first signal terminals 31 include a first gate terminal 31A, a first detection terminal 31B, and a second detection terminal 31C.
  • Each of the plurality of first signal terminals 31 is electrically connected to the first semiconductor element 20A.
  • the first gate terminal 31A is located closest to the plurality of second signal terminals 32.
  • the first detection terminal 31B is located between the first gate terminal 31A and the second detection terminal 31C in the third direction y.
  • the first gate terminal 31A and the first detection terminal 31B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10.
  • the second detection terminal 31C is conductively bonded to the first conductive layer 12 of the support member 10.
  • a gate voltage for driving the first semiconductor element 20A is applied to the first gate terminal 31A.
  • a voltage equal to the potential applied to the second electrode 22 of the first semiconductor element 20A is applied to the first detection terminal 31B.
  • a voltage equal to the potential applied to the first electrode 21 of the first semiconductor element 20A is applied to the second detection terminal 31C.
  • the plurality of second signal terminals 32 include a second gate terminal 32A, a third detection terminal 32B, and a fourth detection terminal 32C.
  • Each of the plurality of second signal terminals 32 is electrically connected to the second semiconductor element 20B.
  • the second gate terminal 32A among the plurality of second signal terminals 32 is located closest to the plurality of first signal terminals 31.
  • the third detection terminal 32B is located between the second gate terminal 32A and the fourth detection terminal 32C in the third direction y.
  • the second gate terminal 32A and the third detection terminal 32B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10.
  • the fourth detection terminal 32C is electrically conductively bonded to the first conductive layer 12 of the support member 10.
  • a gate voltage for driving the second semiconductor element 20B is applied to the second gate terminal 32A.
  • a voltage equal to the potential applied to the second electrode 22 of the second semiconductor element 20B is applied to the third detection terminal 32B.
  • a voltage equal to the potential applied to the first electrode 21 of the second semiconductor element 20B is applied to the fourth detection terminal 32C.
  • each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 includes a mounting surface 33, an end surface 34, a joint portion 35, a mounting portion 36 and an intermediate portion 37.
  • the mounting surface 33 is exposed from the bottom surface 52 of the sealing resin 50.
  • the mounting surface 33 is flush with the bottom surface 52.
  • the end surface 34 faces the opposite side to the side where the two semiconductor elements 20 are located in the second direction x.
  • the end surface 34 of each of the plurality of power terminals 30 is exposed from one of the two first side surfaces 53 of the sealing resin 50.
  • the plurality of first signal terminals 31 and the end surface 34 of each of the plurality of first signal terminals 31 are exposed from the other first side surface 53 of the two first side surfaces 53.
  • FIG. 3 As shown in FIG. 3, FIG. 6, and FIG. Conductively bonded.
  • the joint portion 35 is sandwiched between the sealing resin 50 and the support member 10.
  • the mounting portion 36 is separated from the joining portion 35 in the first direction z.
  • the mounting portion 36 is exposed from the bottom surface 52 of the sealing resin 50.
  • the intermediate portion 37 connects the joint portion 35 and the mounting portion 36.
  • the mounting portion 36 is located on the opposite side of the joint portion 35 with respect to the intermediate portion 37 in the second direction x.
  • the mounting section 36 includes a mounting surface 33 and an end surface 34.
  • the intermediate portion 37 is inclined with respect to the mounting portion 36 such that the farther from the mounting portion 36 in the first direction z, the closer it approaches the joint portion 35 in the second direction x. .
  • the two conductive members 40 are individually conductively bonded to the two semiconductor elements 20 and the second conductive layer 13 and the third conductive layer 14 of the support member 10.
  • the two conductive members 40 include a first member 40A and a second member 40B.
  • Each of the first member 40A and the second member 40B consists of a plurality of wires.
  • the composition of the plurality of wires includes aluminum (Al).
  • the composition of the plurality of wires may include copper.
  • each of the first member 40A and the second member 40B may be a metal clip instead of the plurality of wires.
  • the first member 40A is conductively bonded to the second electrode 22 of the first semiconductor element 20A and the second conductive layer 13 of the support member 10.
  • the first semiconductor element 20A is electrically connected to the second semiconductor element 20B and the output terminal 30C of the plurality of power terminals 30.
  • the second member 40B is conductively bonded to the second electrode 22 of the second semiconductor element 20B and the third conductive layer 14 of the support member 10.
  • the second semiconductor element 20B is electrically connected to the second input terminal 30B of the plurality of power terminals 30.
  • the first input terminal 30A of the plurality of power terminals 30 is electrically connected to the first semiconductor element 20A.
  • the output terminal 30C is electrically connected to the second semiconductor element 20B. Therefore, each of the plurality of power terminals 30 is electrically connected to at least one of the two semiconductor elements 20.
  • one of the two gate wires 41 has the gate electrode 23 of the first semiconductor element 20A and the first gate terminal 31A of the plurality of pad layers 15 of the support member 10 conductive. It is conductively bonded to the bonded pad layer 15. Thereby, the first gate terminal 31A is electrically connected to the gate electrode 23 of the first semiconductor element 20A.
  • the other gate wire 41 of the two gate wires 41 is connected to the gate electrode 23 of the second semiconductor element 20B and the pad layer 15 to which the second gate terminal 32A among the plurality of pad layers 15 of the support member 10 is conductively bonded. conductively bonded to the Thereby, the second gate terminal 32A is electrically connected to the gate electrode 23 of the second semiconductor element 20B.
  • the composition of the two gate wires 41 includes gold (Au).
  • one of the two detection wires 42 is connected to the second electrode 22 of the first semiconductor element 20A and the first detection terminal 31B among the plurality of pad layers 15 of the support member 10. It is conductively bonded to the pad layer 15 which is conductively bonded. Thereby, the first detection terminal 31B is electrically connected to the second electrode 22 of the first semiconductor element 20A.
  • the other detection wire 42 of the two detection wires 42 is a pad layer 15 to which the second electrode 22 of the second semiconductor element 20B and the third detection terminal 32B among the plurality of pad layers 15 of the support member 10 are electrically bonded. and are electrically conductively bonded to each other. Thereby, the third detection terminal 32B is electrically connected to the second electrode 22 of the second semiconductor element 20B.
  • the composition of the two sensing wires 42 includes aluminum.
  • the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are connected to the periphery 511 of the top surface 51 of the sealing resin 50.
  • the end surfaces 34 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are covered with a sealing resin 50. Therefore, in the semiconductor device A11, only the mounting surfaces 33 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the sealing resin 50.
  • the semiconductor device A10 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50.
  • the sealing resin 50 has a bottom surface 52 facing in the first direction z.
  • a plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52.
  • the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50.
  • the semiconductor device A10 further includes a support member 10 on which a first semiconductor element 20A and a second semiconductor element 20B are mounted.
  • the support member 10 is exposed from the top surface 51 of the sealing resin 50.
  • the first semiconductor element 20A, the second semiconductor element 20B, the plurality of power terminals 30, the first signal terminal 31, and the second signal terminal 32 are located between the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. Located in With this configuration, in the semiconductor device A10, heat can be dissipated from the side opposite to the side where the wiring board on which the semiconductor device A10 is mounted is located in the first direction z.
  • the support member 10 has the heat dissipation layer 16 exposed from the top surface 51.
  • Each of the plurality of power terminals 30 has an end surface 34 facing the opposite side to the side where the first semiconductor element 20A and the second semiconductor element 20B are located in the second direction x.
  • the end surface 34 is exposed from the sealing resin 50.
  • Each of the plurality of power terminals 30 has a joint portion 35, a mounting portion 36, and an intermediate portion 37.
  • the joint portion 35 is joined to the support member 10.
  • the mounting portion 36 is separated from the joint portion 35 in the first direction z and is exposed from the bottom surface 52 of the sealing resin 50.
  • the intermediate portion 37 connects the joint portion 35 and the mounting portion 36.
  • the joint portion 35 is sandwiched between the sealing resin 50 and the support member 10.
  • FIGS. 12 to 17 A semiconductor device A20 according to a second embodiment of the present disclosure will be described based on FIGS. 12 to 17.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
  • the mounting portion 36 has an intermediate portion 37 in the second direction x. It is located on the same side as the joint portion 35 as a reference.
  • the joint portion 35 is sandwiched between the sealing resin 50 and the support member 10.
  • the mounting portion 36 is attached to the joint portion 35 when viewed in the first direction z. overlapping. As a result, a part of the sealing resin 50 is sandwiched between the mounting section 36 and the joining section 35.
  • the intermediate portion 37 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 includes an end surface 34.
  • the end surface 34 of each of the plurality of power terminals 30 is exposed from one of the two first side surfaces 53 of the sealing resin 50.
  • the plurality of first signal terminals 31 and the end surface 34 of each of the plurality of first signal terminals 31 are exposed from the other first side surface 53 of the two first side surfaces 53.
  • the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A20.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are located near the periphery 511 of the top surface 51 of the sealing resin 50. away from As shown in FIG. 19, the end surfaces 34 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are covered with a sealing resin 50. Therefore, in the semiconductor device A21, only the mounting surfaces 33 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the sealing resin 50.
  • the semiconductor device A20 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50.
  • the sealing resin 50 has a bottom surface 52 facing in the first direction z.
  • a plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52.
  • the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A20, it is possible to reduce the size of the semiconductor device A20 while suppressing a decrease in the dielectric strength voltage of the semiconductor device A20.
  • the semiconductor device A20 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
  • the mounting portion 36 is located on the same side as the bonding portion 35 with respect to the intermediate portion 37 in the second direction x.
  • each intermediate portion 37 of the plurality of power terminals 30 includes an end surface 34.
  • the dimension of the end surface 34 exposed from the sealing resin 50 in the first direction z becomes larger. Therefore, when mounting the semiconductor device A20 on a wiring board, the volume of the solder fillet formed along the end surface 34 in the first direction z can be further expanded. This makes it possible to further increase the bonding strength of the semiconductor device A20 to the wiring board and to improve the heat dissipation of the semiconductor device A20.
  • the plurality of power terminals 30, first signal terminals 31, and second signal terminals 32 are separated from the periphery 511 of the top surface 51 of the sealing resin 50 when viewed in the first direction z.
  • each end surface 34 of the plurality of power terminals 30 is covered with the sealing resin 50, so that the area covered by the sealing resin 50 in each of the plurality of sealing resins 50 is further increased. Therefore, it becomes possible to more effectively suppress a decrease in the dielectric strength voltage of the semiconductor device A21.
  • FIGS. 20 to 23 A semiconductor device A30 according to a third embodiment of the present disclosure will be described based on FIGS. 20 to 23.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
  • each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 has a rectangular parallelepiped shape extending in the first direction z.
  • the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are metal blocks. Therefore, each of these does not have a joint portion 35, a mounting portion 36, and an intermediate portion 37.
  • the entirety of each of the plurality of power terminals 30, the entirety of each of the plurality of first signal terminals 31, and the whole of each of the plurality of second signal terminals 32. overlaps the insulating layer 11 of the support member 10. Furthermore, as shown in FIG. 21, when viewed in the first direction z, the entirety of each of the plurality of power terminals 30, the whole of each of the plurality of first signal terminals 31, and the whole of each of the plurality of second signal terminals 32, It overlaps with the first conductive layer 12, second conductive layer 13, third conductive layer 14, and multiple pad layers 15 of the support member 10.
  • the end surfaces 34 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are covered with a sealing resin 50. Therefore, in the semiconductor device A30, only the mounting surfaces 33 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the sealing resin 50.
  • the semiconductor device A30 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50.
  • the sealing resin 50 has a bottom surface 52 facing in the first direction z.
  • the plurality of power terminals 30, the first signal terminal 31, and the second signal terminal 32 are exposed from the bottom surface 52.
  • the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A30, it is possible to reduce the size of the semiconductor device A30 while suppressing a decrease in the withstand voltage of the semiconductor device A30.
  • the semiconductor device A30 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
  • each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 overlap with the support member 10 when viewed in the first direction z.
  • each of the plurality of power terminals 30, first signal terminals 31, and second signal terminals 32 does not protrude from the support member 10 when viewed in the first direction z. Therefore, it is possible to further reduce the dimensions of the semiconductor device A30 in the direction perpendicular to the first direction z.
  • the sealing resin 50 since the end surface 34 of each of the plurality of power terminals 30 is covered with the sealing resin 50, the area covered by the sealing resin 50 in each of the plurality of sealing resins 50 is further increased. Therefore, it becomes possible to more effectively suppress a decrease in the dielectric strength voltage of the semiconductor device A30.
  • FIGS. 24 to 27 A semiconductor device A40 according to a fourth embodiment of the present disclosure will be described based on FIGS. 24 to 27.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • FIG. 26 for convenience of understanding, the sealing resin 50 is shown.
  • the outline of the transparent sealing resin 50 is shown with imaginary lines.
  • the configuration of the plurality of power terminals 30 is different from the configuration of the semiconductor device A10.
  • the output terminal 30C among the plurality of power terminals 30 is connected to the first input terminal 30A and the second It is located on the opposite side to the input terminal 30B.
  • a first gate terminal 31A of the plurality of first signal terminals 31 is located on one side of the output terminal 30C in the third direction y.
  • the second gate terminal 32A of the plurality of second signal terminals 32 is located on the other side of the output terminal 30C in the third direction y.
  • the end surfaces 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 are exposed.
  • the end surface 34 of the output terminal 30C is exposed.
  • the semiconductor device A40 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50.
  • the sealing resin 50 has a bottom surface 52 facing in the first direction z.
  • a plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52.
  • the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A40, it is possible to reduce the size of the semiconductor device A40 while suppressing a decrease in the dielectric strength voltage of the semiconductor device A40. Further, the semiconductor device A40 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
  • the output terminal 30C among the plurality of power terminals 30 is connected to the first input terminal 30A and the first input terminal 30C of the plurality of power terminals 30 with respect to the first semiconductor element 20A and the second semiconductor element 20B in the second direction x. It is located on the opposite side to the second input terminal 30B.
  • FIGS. 28 to 32 A semiconductor device A50 according to a fifth embodiment of the present disclosure will be described based on FIGS. 28 to 32.
  • elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
  • FIG. 30 for convenience of understanding, the sealing resin 50 is shown.
  • the outline of the transparent sealing resin 50 is shown with imaginary lines.
  • the configurations of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
  • the second detection terminal 31C among the plurality of first signal terminals 31 and the fourth detection terminal 32C among the plurality of second signal terminals 32 are connected to each other in the third direction y. They are located on opposite sides with respect to the semiconductor element 20.
  • the second detection terminal 31C is located between the first input terminal 30A of the plurality of power terminals 30 and the first detection terminal 31B of the plurality of first signal terminals 31 in the second direction x.
  • the fourth detection terminal 32C is located between the output terminal 30C of the plurality of power terminals 30 and the third detection terminal 32B of the second signal terminal 32 in the second direction x.
  • the distance between the first gate terminal 31A of the first signal terminal 31 and the second gate terminal 32A of the second signal terminal 32 is longer than the distance in the semiconductor device A10.
  • the end surfaces 34 of each of the second detection terminal 31C and the fourth detection terminal 32C are individually exposed from the two second side surfaces 54 of the sealing resin 50.
  • the semiconductor device A50 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50.
  • the sealing resin 50 has a bottom surface 52 facing in the first direction z.
  • a plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52.
  • the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A50, it is possible to reduce the size of the semiconductor device A50 while suppressing a decrease in the dielectric strength voltage of the semiconductor device A50.
  • the semiconductor device A50 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
  • the distance between the first gate terminal 31A as the first signal terminal 31 and the second gate terminal 32A as the second signal terminal 32 is longer than the distance in the semiconductor device A10. There is. By adopting this configuration, it is possible to reduce noise acting on the first gate terminal 31A and the second gate terminal 32A.
  • At least one of the plurality of power terminals, the first signal terminal, and the second signal terminal connect the first semiconductor element and the second semiconductor element in a second direction perpendicular to the first direction.
  • the semiconductor devices according to supplementary note 1 which are located on opposite sides of each other as a reference.
  • Appendix 3. further comprising a support member on which the first semiconductor element and the second semiconductor element are mounted,
  • the semiconductor device according to appendix 2 wherein the first semiconductor element and the second semiconductor element are located between the bottom surface and the support member in the first direction.
  • Appendix 4 The semiconductor device according to appendix 3, wherein the plurality of power terminals, the first signal terminal, and the second signal terminal are located between the bottom surface and the support member in the first direction.
  • the sealing resin has a top surface facing opposite to the bottom surface in the first direction,
  • the semiconductor device according to appendix 4 wherein the support member is exposed from the top surface.
  • Appendix 6. The semiconductor device according to appendix 5, wherein the plurality of power terminals are joined to the support member.
  • Appendix 7. The semiconductor device according to appendix 6, wherein the first signal terminal and the second signal terminal are joined to the support member.
  • the support member includes an insulating layer, and a first conductive layer and a second conductive layer located between the first semiconductor element, the second semiconductor element, and the insulating layer in the first direction, the first semiconductor element is conductively bonded to the first conductive layer,
  • Appendix 9 The semiconductor device according to appendix 8, wherein any one of the plurality of power terminals is conductively bonded to either the first conductive layer or the second conductive layer.
  • the support member has a heat dissipation layer located on the opposite side of the first conductive layer and the second conductive layer with respect to the insulating layer,
  • Appendix 11 Each of the plurality of power terminals has an end face facing opposite to the side where the first semiconductor element and the second semiconductor element are located in the second direction, 11.
  • Each of the plurality of power terminals includes a joint portion joined to the support member, a mounting portion that is separated from the joint portion in the first direction and exposed from the bottom surface, and the joint portion and the mounting portion.
  • the mounting section is located on the opposite side of the joint section with respect to the intermediate section in the second direction, The semiconductor device according to appendix 12, wherein the mounting portion includes the end surface.
  • Appendix 14 The mounting portion is located on the same side as the joint portion with respect to the intermediate portion in the second direction, The semiconductor device according to appendix 12, wherein the intermediate portion includes the end surface.
  • Appendix 15. 11 The semiconductor device according to any one of appendices 6 to 10, wherein the plurality of power terminals, the first signal terminal, and the second signal terminal are separated from a periphery of the top surface when viewed in the first direction.
  • Appendix 16 Supplementary Notes 7 to 10, wherein the entirety of each of the plurality of power terminals and the entirety of each of the first signal terminal and the second signal terminal overlap with the support member when viewed in the first direction.
  • Each of the plurality of power terminals has a mounting surface exposed from the bottom surface, 11.
  • A10, A20, A30, A40, A50 Semiconductor device 10: Support member 11: Insulating layer 12: First conductive layer 13: Second conductive layer 14: Third conductive layer 15: Pad layer 16: Heat dissipation layer 20: Semiconductor element 20A: First semiconductor element 20B: Second semiconductor element 21: First electrode 22: Second electrode 23: Gate electrode 29: Bonding layer 30: Power terminal 30A: First input terminal 30B: Second input terminal 30C: Output terminal 31: First signal terminal 31A: First gate terminal 31B: First detection terminal 31C: Second detection terminal 32: Second signal terminal 32A: Second gate terminal 32B: Third detection terminal 32C: Fourth detection terminal 33: Mounting surface 34: End surface 35: Joint portion 36: Mounting portion 37: Intermediate portion 40: Conductive member 40A: First member 40B: Second member 41: Gate wire 42: Detection wire 50: Sealing resin 501: Outer edge 51: Top Surface 511: Periphery 52: Bottom surface 53: First side surface 54: Second side surface z: First direction x

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Abstract

A semiconductor device according to the present invention comprises: a first semiconductor element; a second semiconductor element; a plurality of power terminals, each of which is electrically connected to at least one of the first semiconductor element and the second semiconductor element; a first signal terminal which is electrically connected to the first semiconductor element; a second signal terminal which is electrically connected to the second semiconductor element; and a sealing resin which covers the first semiconductor element and the second semiconductor element. The sealing resin has a bottom surface that faces in a first direction. The plurality of power terminals, the first signal terminal and the second signal terminal are exposed from the bottom surface. When viewed in the first direction, the entirety of each one of the plurality of power terminals, the entirety of the first signal terminal and the entirety of the second signal terminal are surrounded by the outer edge of the sealing resin.

Description

半導体装置semiconductor equipment
 本開示は、半導体装置に関する。 The present disclosure relates to a semiconductor device.
 特許文献1には、2つのパワー半導体素子(たとえばIGBT)が搭載された半導体装置の一例が開示されている。当該半導体装置は、インバータなどの電力変換装置に用いられる。当該半導体装置は、配線基板に表面実装される。 Patent Document 1 discloses an example of a semiconductor device equipped with two power semiconductor elements (for example, IGBT). The semiconductor device is used in a power conversion device such as an inverter. The semiconductor device is surface mounted on a wiring board.
 特許文献1に開示されている半導体装置は、複数の電源端子、および複数の制御端子を備える。複数の電源端子、および複数の制御端子は、2つのパワー半導体素子を覆うハウジングから外部に突出している。これらの端子の各々において、ハウジングから外部に突出した部分は、表面実装が可能となるようにガルウィング状に曲げ加工されている。ここで、当該半導体装置の小型化を図ろうとすると、複数の電源端子の相互間隔がより縮小される。これにより、ハウジングから外部に突出した複数の電源端子の各々の部分に起因した、当該半導体装置の絶縁耐圧の低下が懸念される。 The semiconductor device disclosed in Patent Document 1 includes a plurality of power supply terminals and a plurality of control terminals. A plurality of power supply terminals and a plurality of control terminals protrude outside from a housing that covers the two power semiconductor elements. In each of these terminals, a portion protruding outward from the housing is bent into a gull wing shape to enable surface mounting. Here, when attempting to miniaturize the semiconductor device, the mutual spacing between the plurality of power supply terminals is further reduced. Thereby, there is a concern that the dielectric strength voltage of the semiconductor device may be reduced due to each portion of the plurality of power supply terminals protruding from the housing to the outside.
特開2012-244176号公報Japanese Patent Application Publication No. 2012-244176
 本開示は、従来よりも改良が施された半導体装置を提供することを一の課題とする。特に本開示は、上記事情に鑑み、装置の小型化を図りつつ、当該装置の絶縁耐圧の低下を抑制することが可能な半導体装置を提供することを一の課題とする。 An object of the present disclosure is to provide a semiconductor device that is improved over conventional ones. In particular, in view of the above circumstances, it is an object of the present disclosure to provide a semiconductor device that can reduce the size of the device while suppressing a decrease in the dielectric strength of the device.
 本開示によって提供される半導体装置は、第1半導体素子と、第2半導体素子と、各々が前記第1半導体素子および前記第2半導体素子の少なくともいずれかに導通する複数の電力端子と、前記第1半導体素子に導通する第1信号端子と、前記第2半導体素子に導通する第2信号端子と、前記第1半導体素子および前記第2半導体素子を覆う封止樹脂と、を備える。前記封止樹脂は、第1方向を向く底面を有する。前記複数の電力端子、前記第1信号端子および前記第2信号端子は、前記底面から露出している。前記第1方向に視て、前記複数の電力端子の各々の全体と、前記第1信号端子および前記第2信号端子の各々の全体とが、前記封止樹脂の外縁に囲まれている。 A semiconductor device provided by the present disclosure includes: a first semiconductor element, a second semiconductor element, a plurality of power terminals each electrically connected to at least one of the first semiconductor element and the second semiconductor element; The semiconductor device includes a first signal terminal electrically connected to one semiconductor element, a second signal terminal electrically connected to the second semiconductor element, and a sealing resin covering the first semiconductor element and the second semiconductor element. The sealing resin has a bottom surface facing in the first direction. The plurality of power terminals, the first signal terminal, and the second signal terminal are exposed from the bottom surface. When viewed in the first direction, the entirety of each of the plurality of power terminals and the entirety of each of the first signal terminal and the second signal terminal are surrounded by the outer edge of the sealing resin.
 上記構成によれば、半導体装置の小型化を図りつつ、当該半導体装置の絶縁耐圧の低下を抑制することが可能となる。 According to the above configuration, it is possible to reduce the size of the semiconductor device while suppressing a decrease in the withstand voltage of the semiconductor device.
 本開示のその他の特徴および利点は、添付図面に基づき以下に行う詳細な説明によって、より明らかとなろう。 Other features and advantages of the present disclosure will become more apparent from the detailed description given below with reference to the accompanying drawings.
図1は、本開示の第1実施形態にかかる半導体装置の平面図である。FIG. 1 is a plan view of a semiconductor device according to a first embodiment of the present disclosure. 図2は、図1に示す半導体装置の底面図である。FIG. 2 is a bottom view of the semiconductor device shown in FIG. 1. 図3は、図2に対応する底面図であり、封止樹脂を透過している。FIG. 3 is a bottom view corresponding to FIG. 2, through which the sealing resin is seen. 図4は、図1に示す半導体装置の左側面図である。FIG. 4 is a left side view of the semiconductor device shown in FIG. 図5は、図1に示す半導体装置の右側面図である。FIG. 5 is a right side view of the semiconductor device shown in FIG. 1. 図6は、図2のVI-VI線に沿う断面図である。FIG. 6 is a cross-sectional view taken along line VI-VI in FIG. 図7は、図2のVII-VII線に沿う断面図である。FIG. 7 is a cross-sectional view taken along line VII-VII in FIG. 図8は、図2のVIII-VIII線に沿う断面図である。FIG. 8 is a cross-sectional view taken along line VIII-VIII in FIG. 図9は、図6の部分拡大図である。FIG. 9 is a partially enlarged view of FIG. 6. 図10は、図1に示す半導体装置の変形例の平面図である。FIG. 10 is a plan view of a modification of the semiconductor device shown in FIG. 図11は、図10のXI-XI線に沿う断面図である。FIG. 11 is a cross-sectional view taken along line XI-XI in FIG. 10. 図12は、本開示の第2実施形態にかかる半導体装置の平面図である。FIG. 12 is a plan view of a semiconductor device according to a second embodiment of the present disclosure. 図13は、図12に示す半導体装置の底面図である。FIG. 13 is a bottom view of the semiconductor device shown in FIG. 12. 図14は、図12に示す半導体装置の左側面図である。FIG. 14 is a left side view of the semiconductor device shown in FIG. 12. 図15は、図12に示す半導体装置の右側面図である。FIG. 15 is a right side view of the semiconductor device shown in FIG. 12. 図16は、図13のXVI-XVI線に沿う断面図である。FIG. 16 is a cross-sectional view taken along line XVI-XVI in FIG. 13. 図17は、図13のXVII-XVII線に沿う断面図である。FIG. 17 is a cross-sectional view taken along line XVII-XVII in FIG. 13. 図18は、図12に示す半導体装置の変形例の平面図である。FIG. 18 is a plan view of a modification of the semiconductor device shown in FIG. 12. 図19は、図18のXIX-XIX線に沿う断面図である。FIG. 19 is a sectional view taken along line XIX-XIX in FIG. 18. 図20は、本開示の第3実施形態にかかる半導体装置の平面図である。FIG. 20 is a plan view of a semiconductor device according to a third embodiment of the present disclosure. 図21は、図20に示す半導体装置の底面図である。21 is a bottom view of the semiconductor device shown in FIG. 20. 図22は、図21のXXII-XXII線に沿う断面図である。FIG. 22 is a cross-sectional view taken along line XXII-XXII in FIG. 21. 図23は、図21のXXIII-XXIII線に沿う断面図である。FIG. 23 is a cross-sectional view taken along line XXIII-XXIII in FIG. 21. 図24は、本開示の第4実施形態にかかる半導体装置の平面図である。FIG. 24 is a plan view of a semiconductor device according to a fourth embodiment of the present disclosure. 図25は、図24に示す半導体装置の底面図である。FIG. 25 is a bottom view of the semiconductor device shown in FIG. 24. 図26は、図25に対応する底面図であり、封止樹脂を透過している。FIG. 26 is a bottom view corresponding to FIG. 25, in which the sealing resin is seen through. 図27は、図24に示す半導体装置の右側面図である。27 is a right side view of the semiconductor device shown in FIG. 24. 図28は、本開示の第5実施形態にかかる半導体装置の平面図である。FIG. 28 is a plan view of a semiconductor device according to a fifth embodiment of the present disclosure. 図29は、図28に示す半導体装置の底面図である。FIG. 29 is a bottom view of the semiconductor device shown in FIG. 28. 図30は、図29に対応する底面図であり、封止樹脂を透過している。FIG. 30 is a bottom view corresponding to FIG. 29, in which the sealing resin is seen through. 図31は、図28に示す半導体装置の正面図である。FIG. 31 is a front view of the semiconductor device shown in FIG. 28. 図32は、図29のXXXII-XXXII線に沿う断面図である。FIG. 32 is a cross-sectional view taken along the line XXXII-XXXII in FIG. 29.
 本開示を実施するための形態について、添付図面に基づいて説明する。 A mode for carrying out the present disclosure will be described based on the accompanying drawings.
 第1実施形態:
 図1~図9に基づき、本開示の第1実施形態にかかる半導体装置A10について説明する。半導体装置A10は、インバータなど電力変換回路を備える電子機器などに使用される。半導体装置A10は、支持部材10、2つの半導体素子20、複数の電力端子30、複数の第1信号端子31、複数の第2信号端子32、2つの導電部材40、2つのゲートワイヤ41、2つの検出ワイヤ42、および封止樹脂50を備える。ここで、図3は、理解の便宜上、封止樹脂50を透過している。図3では、透過した封止樹脂50の外形線を想像線(二点鎖線)で示している。
First embodiment:
A semiconductor device A10 according to a first embodiment of the present disclosure will be described based on FIGS. 1 to 9. The semiconductor device A10 is used in electronic equipment including a power conversion circuit such as an inverter. The semiconductor device A10 includes a support member 10, two semiconductor elements 20, a plurality of power terminals 30, a plurality of first signal terminals 31, a plurality of second signal terminals 32, two conductive members 40, and two gate wires 41, 2. The detection wire 42 and the sealing resin 50 are provided. Here, in FIG. 3, for convenience of understanding, the sealing resin 50 is shown. In FIG. 3, the outline of the transparent sealing resin 50 is shown by an imaginary line (two-dot chain line).
 半導体装置A10の説明においては、便宜上、後述する封止樹脂50の底面52の法線方向を「第1方向z」と呼ぶ。第1方向zに対して直交する1つの方向を「第2方向x」と呼ぶ。第1方向zおよび第2方向xに対して直交する方向を「第3方向y」と呼ぶ。 In the description of the semiconductor device A10, for convenience, the normal direction of the bottom surface 52 of the sealing resin 50, which will be described later, will be referred to as a "first direction z." One direction perpendicular to the first direction z is called a "second direction x." A direction perpendicular to the first direction z and the second direction x is referred to as a "third direction y."
 半導体装置A10は、複数の電力端子30のうち第1入力端子30Aおよび第2入力端子30B(図2参照)に印加された直流の電源電圧を、2つの半導体素子20により交流電力に変換する。変換された交流電力は、複数の電力端子30のうち出力端子30C(図2参照)からモータなどの電力供給対象に入力される。半導体装置A10は、配線基板に表面実装される。 The semiconductor device A10 converts the DC power supply voltage applied to the first input terminal 30A and the second input terminal 30B (see FIG. 2) among the plurality of power terminals 30 into AC power using the two semiconductor elements 20. The converted AC power is input to a power supply target such as a motor from an output terminal 30C (see FIG. 2) among the plurality of power terminals 30. The semiconductor device A10 is surface mounted on a wiring board.
 封止樹脂50は、図2、図6および図7に示すように、2つの半導体素子20を覆っている。さらに封止樹脂50は、放熱層16を除く支持部材10、2つの導電部材40、2つのゲートワイヤ41、および2つの検出ワイヤ42を覆っている。封止樹脂50は、電気絶縁性を有する。封止樹脂50は、たとえば黒色のエポキシ樹脂を含む材料からなる。図1および図2に示すように、封止樹脂50は、頂面51、底面52、2つの第1側面53、および2つの第2側面54を有する。 The sealing resin 50 covers the two semiconductor elements 20, as shown in FIGS. 2, 6, and 7. Furthermore, the sealing resin 50 covers the support member 10 excluding the heat dissipation layer 16, the two conductive members 40, the two gate wires 41, and the two detection wires 42. The sealing resin 50 has electrical insulation properties. The sealing resin 50 is made of a material containing, for example, a black epoxy resin. As shown in FIGS. 1 and 2, the sealing resin 50 has a top surface 51, a bottom surface 52, two first side surfaces 53, and two second side surfaces 54.
 図4~図8に示すように、頂面51および底面52は、第1方向zにおいて互いに反対側を向く。頂面51は、頂面51を規定する周縁511を有する。第1方向zに視て、周縁511は、封止樹脂50の外縁501に囲まれ、かつ外縁501から離れて位置する。外縁501は、第1方向zに視た封止樹脂50の外形線に相当する。 As shown in FIGS. 4 to 8, the top surface 51 and the bottom surface 52 face oppositely to each other in the first direction z. Top surface 51 has a periphery 511 that defines top surface 51 . The peripheral edge 511 is surrounded by the outer edge 501 of the sealing resin 50 and is located away from the outer edge 501 when viewed in the first direction z. The outer edge 501 corresponds to the outline of the sealing resin 50 when viewed in the first direction z.
 図1および図2に示すように、2つの第1側面53は、第2方向xにおいて互いに反対側を向く。図5に示すように、2つの第1側面53の各々は、頂面51および底面52につながっている。2つの第1側面53の各々は、底面52につながり、かつ第2方向xを向く領域と、頂面51につながり、かつ頂面51に対して傾斜した領域とを含む。 As shown in FIGS. 1 and 2, the two first side surfaces 53 face opposite to each other in the second direction x. As shown in FIG. 5, each of the two first side surfaces 53 is connected to the top surface 51 and the bottom surface 52. Each of the two first side surfaces 53 includes a region connected to the bottom surface 52 and facing in the second direction x, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
 図1、図2、図4および図5に示すように、2つの第2側面54は、第3方向yにおいて互いに反対側を向く。2つの第2側面54の各々は、頂面51および底面52につながっている。2つの第2側面54の各々は、底面52につながり、かつ第3方向yを向く領域と、頂面51につながり、かつ頂面51に対して傾斜した領域とを含む。 As shown in FIGS. 1, 2, 4, and 5, the two second side surfaces 54 face oppositely to each other in the third direction y. Each of the two second side surfaces 54 is connected to the top surface 51 and the bottom surface 52. Each of the two second side surfaces 54 includes a region connected to the bottom surface 52 and facing in the third direction y, and a region connected to the top surface 51 and inclined with respect to the top surface 51.
 支持部材10は、図3および図8に示すように、2つの半導体素子20を搭載している。図1および図3に示すように、支持部材10は、絶縁層11、第1導電層12、第2導電層13、第3導電層14、複数のパッド層15、および放熱層16を有する。 The support member 10 mounts two semiconductor elements 20, as shown in FIGS. 3 and 8. As shown in FIGS. 1 and 3, the support member 10 includes an insulating layer 11, a first conductive layer 12, a second conductive layer 13, a third conductive layer 14, a plurality of pad layers 15, and a heat dissipation layer 16.
 図1および図3に示すように、絶縁層11は、第1方向zにおいて第1導電層12および第2導電層13と放熱層16との間に位置する。絶縁層11の材料は、熱伝導率が比較的高いものが好ましい。そこで絶縁層11は、たとえば窒化アルミニウム(AlN)を組成に含む材料からなる。図6~図8に示すように、第1方向zに対して直交する方向における絶縁層11の端部は、第1方向zにおいて封止樹脂50に挟まれている。 As shown in FIGS. 1 and 3, the insulating layer 11 is located between the first conductive layer 12 and the second conductive layer 13 and the heat dissipation layer 16 in the first direction z. The material for the insulating layer 11 is preferably one with relatively high thermal conductivity. Therefore, the insulating layer 11 is made of a material containing aluminum nitride (AlN) in its composition, for example. As shown in FIGS. 6 to 8, the ends of the insulating layer 11 in the direction perpendicular to the first direction z are sandwiched between the sealing resin 50 in the first direction z.
 図1および図3に示すように、第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15は、第1方向zにおいて絶縁層11を基準として放熱層16とは反対側に位置する。第1導電層12および第2導電層13は、第1方向zにおいて2つの半導体素子20と絶縁層11との間に位置する。第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15の各々は、2つの半導体素子20の少なくともいずれかに導通している。第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15の組成は、銅(Cu)を含む。第1導電層12は、第3方向yの一方側に位置する。第2導電層13は、第3方向yにおいて第1導電層12の隣に位置する。第3導電層14は、第3方向yにおいて第1導電層12と第2導電層13との間に挟まれている。複数のパッド層15は、第2方向xにおいて第1導電層12および第2導電層13を基準として第3導電層14とは反対側に位置する。複数のパッド層15は、第3方向yに沿って配列されている。 As shown in FIGS. 1 and 3, the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 are connected to the heat dissipation layer 16 with respect to the insulating layer 11 in the first direction z. located on the opposite side. The first conductive layer 12 and the second conductive layer 13 are located between the two semiconductor elements 20 and the insulating layer 11 in the first direction z. Each of the first conductive layer 12 , the second conductive layer 13 , the third conductive layer 14 , and the plurality of pad layers 15 is electrically connected to at least one of the two semiconductor elements 20 . The compositions of the first conductive layer 12, the second conductive layer 13, the third conductive layer 14, and the plurality of pad layers 15 include copper (Cu). The first conductive layer 12 is located on one side in the third direction y. The second conductive layer 13 is located next to the first conductive layer 12 in the third direction y. The third conductive layer 14 is sandwiched between the first conductive layer 12 and the second conductive layer 13 in the third direction y. The plurality of pad layers 15 are located on the opposite side of the third conductive layer 14 with respect to the first conductive layer 12 and the second conductive layer 13 in the second direction x. The plurality of pad layers 15 are arranged along the third direction y.
 図8に示すように、放熱層16は、第1方向zにおいて絶縁層11を基準として第1導電層12および第2導電層13とは反対側に位置する。放熱層16は、封止樹脂50の頂面51から露出している。放熱層16の組成は、銅を含む。図1に示すように、放熱層16は、2つの半導体素子20の各々の全体に重なっている。 As shown in FIG. 8, the heat dissipation layer 16 is located on the opposite side of the first conductive layer 12 and the second conductive layer 13 with respect to the insulating layer 11 in the first direction z. The heat dissipation layer 16 is exposed from the top surface 51 of the sealing resin 50. The composition of the heat dissipation layer 16 includes copper. As shown in FIG. 1, the heat dissipation layer 16 completely overlaps each of the two semiconductor elements 20. As shown in FIG.
 2つの半導体素子20は、図8に示すように、第1方向zにおいて封止樹脂50の底面52と支持部材10との間に位置する。図3および図8に示すように、2つの半導体素子20は、支持部材10の第1導電層12および第2導電層13に接合層29を介して個別に導電接合されている。接合層29は、たとえばハンダである。この他、接合層29は、銀(Ag)などを含む焼結金属でもよい。半導体装置A10においては、2つの半導体素子20は、nチャンネル型であり、かつ縦型構造のMOSFET(Metal-Oxide-Semiconductor Field-Effect Transistor)である。2つの半導体素子20は、化合物半導体基板を含む。当該化合物半導体基板の主材料は、炭化ケイ素(SiC)である。この他、当該化合物半導体基板の主材料として、ケイ素(Si)を用いてもよい。この他、2つの半導体素子20は、IGBT(Insulated Gate Bipolar Transistor)などの他のスイッチング素子でもよい。さらに半導体装置A10における半導体素子20の個数は一例であり、その個数は自在に設定できる。 As shown in FIG. 8, the two semiconductor elements 20 are located between the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. As shown in FIGS. 3 and 8, the two semiconductor elements 20 are individually conductively bonded to the first conductive layer 12 and the second conductive layer 13 of the support member 10 via a bonding layer 29. Bonding layer 29 is, for example, solder. In addition, the bonding layer 29 may be a sintered metal containing silver (Ag) or the like. In the semiconductor device A10, the two semiconductor elements 20 are n-channel type MOSFETs (Metal-Oxide-Semiconductor Field-Effect Transistors) with a vertical structure. The two semiconductor elements 20 include compound semiconductor substrates. The main material of the compound semiconductor substrate is silicon carbide (SiC). In addition, silicon (Si) may be used as the main material of the compound semiconductor substrate. In addition, the two semiconductor elements 20 may be other switching elements such as IGBTs (Insulated Gate Bipolar Transistors). Furthermore, the number of semiconductor elements 20 in the semiconductor device A10 is just an example, and the number can be set freely.
 図9に示すように、2つの半導体素子20の各々は、第1電極21、第2電極22およびゲート電極23を有する。第1電極21は、支持部材10の第1導電層12および第2導電層13のいずれかに対向して設けられている。第1電極21には、半導体素子20により変換される前の電力に対応する電流が流れる。すなわち、第1電極21は、ドレイン電極に相当する。 As shown in FIG. 9, each of the two semiconductor elements 20 has a first electrode 21, a second electrode 22, and a gate electrode 23. The first electrode 21 is provided facing either the first conductive layer 12 or the second conductive layer 13 of the support member 10 . A current corresponding to the power before being converted by the semiconductor element 20 flows through the first electrode 21 . That is, the first electrode 21 corresponds to a drain electrode.
 図9に示すように、第2電極22は、第1方向zにおいて第1電極21とは反対側に設けられている。第2電極22には、半導体素子20により変換された後の電力に対応する電流が流れる。すなわち、第2電極22は、ソース電極に相当する。 As shown in FIG. 9, the second electrode 22 is provided on the opposite side to the first electrode 21 in the first direction z. A current corresponding to the power converted by the semiconductor element 20 flows through the second electrode 22 . That is, the second electrode 22 corresponds to a source electrode.
 図9に示すように、ゲート電極23は、第1方向zにおいて第1電極21とは反対側に設けられ、かつ第2電極22から離れて位置する。ゲート電極23には、半導体素子20が駆動するためのゲート電圧が印加される。図3に示すように、第1方向zに視て、ゲート電極23の面積は、第2電極22の面積よりも小である。 As shown in FIG. 9, the gate electrode 23 is provided on the opposite side to the first electrode 21 in the first direction z, and is located away from the second electrode 22. A gate voltage for driving the semiconductor element 20 is applied to the gate electrode 23 . As shown in FIG. 3, the area of the gate electrode 23 is smaller than the area of the second electrode 22 when viewed in the first direction z.
 図3および図7に示すように、2つの半導体素子20は、第1半導体素子20Aおよび第2半導体素子20Bを含む。第1半導体素子20Aの第1電極21は、接合層29を介して支持部材10の第1導電層12に導電接合されている。これにより、第1半導体素子20Aは、第1導電層12に導通している。第2半導体素子20Bの第1電極21は、接合層29を介して第2導電層13に導電接合されている。これにより、第2半導体素子20Bは、第2導電層13に導通している。 As shown in FIGS. 3 and 7, the two semiconductor elements 20 include a first semiconductor element 20A and a second semiconductor element 20B. The first electrode 21 of the first semiconductor element 20A is conductively bonded to the first conductive layer 12 of the support member 10 via the bonding layer 29. Thereby, the first semiconductor element 20A is electrically connected to the first conductive layer 12. The first electrode 21 of the second semiconductor element 20B is conductively bonded to the second conductive layer 13 via the bonding layer 29. Thereby, the second semiconductor element 20B is electrically connected to the second conductive layer 13.
 複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、図6および図7に示すように、第1方向zにおいて封止樹脂50の底面52と支持部材10との間に位置する。図1~図3に示すように、複数の電力端子30の少なくともいずれかと、複数の第1信号端子31、および複数の第2信号端子32とは、第2方向xにおいて2つの半導体素子20を基準として互いに反対側に位置する。図2に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、底面52から露出している。 As shown in FIGS. 6 and 7, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are connected to the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. located between. As shown in FIGS. 1 to 3, at least one of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 connect two semiconductor elements 20 in the second direction x. They are located opposite each other as a reference. As shown in FIG. 2, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the bottom surface 52.
 図1に示すように、第1方向zに視て、複数の電力端子30の各々の全体と、複数の第1信号端子31の各々の全体と、複数の第2信号端子32の各々の全体とが、封止樹脂50の外縁501に囲まれている。半導体装置A10においては、第1方向zに視て、複数の電力端子30の各々と、複数の第1信号端子31の各々と、複数の第2信号端子32の各々とは、支持部材10からはみ出している。複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の組成は、銅を含む。半導体装置A10においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、金属リードである。 As shown in FIG. 1, when viewed in the first direction z, the entirety of each of the plurality of power terminals 30, the whole of each of the plurality of first signal terminals 31, and the whole of each of the plurality of second signal terminals 32. is surrounded by an outer edge 501 of the sealing resin 50. In the semiconductor device A10, when viewed in the first direction z, each of the plurality of power terminals 30, each of the plurality of first signal terminals 31, and each of the plurality of second signal terminals 32 are separated from the support member 10. It's sticking out. The compositions of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 include copper. In the semiconductor device A10, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are metal leads.
 図1~図3に示すように、複数の電力端子30は、第1入力端子30A、第2入力端子30Bおよび出力端子30Cを含む。半導体装置A10においては、第1入力端子30A、第2入力端子30Bおよび出力端子30Cは、第2方向xにおいて2つの半導体素子20を基準として複数の第1信号端子31、および複数の第2信号端子32とは反対側に位置する。第2入力端子30Bは、第3方向yにおいて第1入力端子30Aと出力端子30Cとの間に位置する。第1入力端子30Aは、支持部材10の第1導電層12に導電接合されている。これにより、第1入力端子30Aは、第1半導体素子20Aに導通している。第2入力端子30Bは、支持部材10の第3導電層14に導電接合されている。出力端子30Cは、支持部材10の第2導電層13に導電接合されている。これにより、出力端子30Cは、第2半導体素子20Bに導通している。半導体装置A10においては、第1入力端子30Aが正極(P端子)に相当し、かつ第2入力端子30Bが負極(N端子)に相当する。 As shown in FIGS. 1 to 3, the plurality of power terminals 30 include a first input terminal 30A, a second input terminal 30B, and an output terminal 30C. In the semiconductor device A10, the first input terminal 30A, the second input terminal 30B, and the output terminal 30C are connected to the plurality of first signal terminals 31 and the plurality of second signal terminals with reference to the two semiconductor elements 20 in the second direction x. It is located on the opposite side from the terminal 32. The second input terminal 30B is located between the first input terminal 30A and the output terminal 30C in the third direction y. The first input terminal 30A is electrically conductively bonded to the first conductive layer 12 of the support member 10. Thereby, the first input terminal 30A is electrically connected to the first semiconductor element 20A. The second input terminal 30B is electrically conductively bonded to the third conductive layer 14 of the support member 10. The output terminal 30C is conductively bonded to the second conductive layer 13 of the support member 10. Thereby, the output terminal 30C is electrically connected to the second semiconductor element 20B. In the semiconductor device A10, the first input terminal 30A corresponds to the positive electrode (P terminal), and the second input terminal 30B corresponds to the negative electrode (N terminal).
 図1~図3に示すように、複数の第1信号端子31は、第1ゲート端子31A、第1検出端子31Bおよび第2検出端子31Cを含む。複数の第1信号端子31の各々は、第1半導体素子20Aに導通している。複数の第1信号端子31のうち第1ゲート端子31Aが、複数の第2信号端子32から最も近くに位置する。第1検出端子31Bは、第3方向yにおいて第1ゲート端子31Aと第2検出端子31Cとの間に位置する。 As shown in FIGS. 1 to 3, the plurality of first signal terminals 31 include a first gate terminal 31A, a first detection terminal 31B, and a second detection terminal 31C. Each of the plurality of first signal terminals 31 is electrically connected to the first semiconductor element 20A. Among the plurality of first signal terminals 31, the first gate terminal 31A is located closest to the plurality of second signal terminals 32. The first detection terminal 31B is located between the first gate terminal 31A and the second detection terminal 31C in the third direction y.
 図3に示すように、第1ゲート端子31Aおよび第1検出端子31Bは、支持部材10の複数のパッド層15のいずれか2つのパッド層15に個別に導電接合されている。第2検出端子31Cは、支持部材10の第1導電層12に導電接合されている。第1ゲート端子31Aには、第1半導体素子20Aを駆動するためのゲート電圧が印加される。第1検出端子31Bには、第1半導体素子20Aの第2電極22に印加される電位と等電位の電圧が印加される。第2検出端子31Cには、第1半導体素子20Aの第1電極21に印加される電位と等電位の電圧が印加される。 As shown in FIG. 3, the first gate terminal 31A and the first detection terminal 31B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10. The second detection terminal 31C is conductively bonded to the first conductive layer 12 of the support member 10. A gate voltage for driving the first semiconductor element 20A is applied to the first gate terminal 31A. A voltage equal to the potential applied to the second electrode 22 of the first semiconductor element 20A is applied to the first detection terminal 31B. A voltage equal to the potential applied to the first electrode 21 of the first semiconductor element 20A is applied to the second detection terminal 31C.
 図1~図3に示すように、複数の第2信号端子32は、第2ゲート端子32A、第3検出端子32Bおよび第4検出端子32Cを含む。複数の第2信号端子32の各々は、第2半導体素子20Bに導通している。複数の第2信号端子32のうち第2ゲート端子32Aが、複数の第1信号端子31から最も近くに位置する。第3検出端子32Bは、第3方向yにおいて第2ゲート端子32Aと第4検出端子32Cとの間に位置する。 As shown in FIGS. 1 to 3, the plurality of second signal terminals 32 include a second gate terminal 32A, a third detection terminal 32B, and a fourth detection terminal 32C. Each of the plurality of second signal terminals 32 is electrically connected to the second semiconductor element 20B. The second gate terminal 32A among the plurality of second signal terminals 32 is located closest to the plurality of first signal terminals 31. The third detection terminal 32B is located between the second gate terminal 32A and the fourth detection terminal 32C in the third direction y.
 図3に示すように、第2ゲート端子32Aおよび第3検出端子32Bは、支持部材10の複数のパッド層15のいずれか2つのパッド層15に個別に導電接合されている。第4検出端子32Cは、支持部材10の第1導電層12に導電接合されている。第2ゲート端子32Aには、第2半導体素子20Bを駆動するためのゲート電圧が印加される。第3検出端子32Bには、第2半導体素子20Bの第2電極22に印加される電位と等電位の電圧が印加される。第4検出端子32Cには、第2半導体素子20Bの第1電極21に印加される電位と等電位の電圧が印加される。 As shown in FIG. 3, the second gate terminal 32A and the third detection terminal 32B are individually conductively bonded to any two of the plurality of pad layers 15 of the support member 10. The fourth detection terminal 32C is electrically conductively bonded to the first conductive layer 12 of the support member 10. A gate voltage for driving the second semiconductor element 20B is applied to the second gate terminal 32A. A voltage equal to the potential applied to the second electrode 22 of the second semiconductor element 20B is applied to the third detection terminal 32B. A voltage equal to the potential applied to the first electrode 21 of the second semiconductor element 20B is applied to the fourth detection terminal 32C.
 図3~図7に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々は、実装面33、端面34、接合部35、実装部36および中間部37を有する。 As shown in FIGS. 3 to 7, each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 includes a mounting surface 33, an end surface 34, a joint portion 35, a mounting portion 36 and an intermediate portion 37.
 図2、図6および図7に示すように、実装面33は、封止樹脂50の底面52から露出している。実装面33は、底面52と面一である。 As shown in FIGS. 2, 6, and 7, the mounting surface 33 is exposed from the bottom surface 52 of the sealing resin 50. The mounting surface 33 is flush with the bottom surface 52.
 図2および図3に示すように、端面34は、第2方向xにおいて2つの半導体素子20が位置する側とは反対側を向く。半導体装置A10においては、図4に示すように、複数の電力端子30の各々の端面34は、封止樹脂50の2つの第1側面53のうち一方の第1側面53から露出している。図5に示すように、複数の第1信号端子31、および複数の第1信号端子31の各々の端面34は、2つの第1側面53のうち他方の第1側面53から露出している。 As shown in FIGS. 2 and 3, the end surface 34 faces the opposite side to the side where the two semiconductor elements 20 are located in the second direction x. In the semiconductor device A10, as shown in FIG. 4, the end surface 34 of each of the plurality of power terminals 30 is exposed from one of the two first side surfaces 53 of the sealing resin 50. As shown in FIG. 5, the plurality of first signal terminals 31 and the end surface 34 of each of the plurality of first signal terminals 31 are exposed from the other first side surface 53 of the two first side surfaces 53.
 図3、図6および図7に示すように、接合部35は、支持部材10の第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15のいずれかに導電接合されている。接合部35は、封止樹脂50と支持部材10とに挟まれている。実装部36は、第1方向zにおいて接合部35から離れている。実装部36は、封止樹脂50の底面52から露出している。中間部37は、接合部35と実装部36とを連結している。 As shown in FIG. 3, FIG. 6, and FIG. Conductively bonded. The joint portion 35 is sandwiched between the sealing resin 50 and the support member 10. The mounting portion 36 is separated from the joining portion 35 in the first direction z. The mounting portion 36 is exposed from the bottom surface 52 of the sealing resin 50. The intermediate portion 37 connects the joint portion 35 and the mounting portion 36.
 図3、図6および図7に示すように、実装部36は、第2方向xにおいて中間部37を基準として接合部35とは反対側に位置する。半導体装置A10においては、実装部36は、実装面33および端面34を含む。さらに半導体装置A10においては、中間部37は、第1方向zにおいて実装部36から離れるほど、第2方向xにおいて接合部35に近づく向きとなるように、実装部36に対して傾斜している。 As shown in FIGS. 3, 6, and 7, the mounting portion 36 is located on the opposite side of the joint portion 35 with respect to the intermediate portion 37 in the second direction x. In the semiconductor device A10, the mounting section 36 includes a mounting surface 33 and an end surface 34. Further, in the semiconductor device A10, the intermediate portion 37 is inclined with respect to the mounting portion 36 such that the farther from the mounting portion 36 in the first direction z, the closer it approaches the joint portion 35 in the second direction x. .
 2つの導電部材40は、図3に示すように、2つの半導体素子20と、支持部材10の第2導電層13および第3導電層14とに個別に導電接合されている。2つの導電部材40は、第1部材40Aおよび第2部材40Bを含む。第1部材40Aおよび第2部材40Bの各々は、複数のワイヤからなる。当該複数のワイヤの組成は、アルミニウム(Al)を含む。この他、当該複数のワイヤの組成は、銅を含むものでもよい。さらに第1部材40Aおよび第2部材40Bの各々は、複数のワイヤに替えて金属製のクリップでもよい。 As shown in FIG. 3, the two conductive members 40 are individually conductively bonded to the two semiconductor elements 20 and the second conductive layer 13 and the third conductive layer 14 of the support member 10. The two conductive members 40 include a first member 40A and a second member 40B. Each of the first member 40A and the second member 40B consists of a plurality of wires. The composition of the plurality of wires includes aluminum (Al). In addition, the composition of the plurality of wires may include copper. Furthermore, each of the first member 40A and the second member 40B may be a metal clip instead of the plurality of wires.
 図3に示すように、第1部材40Aは、第1半導体素子20Aの第2電極22と、支持部材10の第2導電層13とに導電接合されている。これにより、第1半導体素子20Aは、第2半導体素子20Bと、複数の電力端子30の出力端子30Cとに導通している。図3に示すように、第2部材40Bは、第2半導体素子20Bの第2電極22と、支持部材10の第3導電層14とに導電接合されている。これにより、第2半導体素子20Bは、複数の電力端子30の第2入力端子30Bに導通している。さらに先述のとおり、複数の電力端子30の第1入力端子30Aは、第1半導体素子20Aに導通している。出力端子30Cは、第2半導体素子20Bに導通している。したがって、複数の電力端子30の各々は、2つの半導体素子20の少なくともいずれかに導通している。 As shown in FIG. 3, the first member 40A is conductively bonded to the second electrode 22 of the first semiconductor element 20A and the second conductive layer 13 of the support member 10. Thereby, the first semiconductor element 20A is electrically connected to the second semiconductor element 20B and the output terminal 30C of the plurality of power terminals 30. As shown in FIG. 3, the second member 40B is conductively bonded to the second electrode 22 of the second semiconductor element 20B and the third conductive layer 14 of the support member 10. Thereby, the second semiconductor element 20B is electrically connected to the second input terminal 30B of the plurality of power terminals 30. Further, as described above, the first input terminal 30A of the plurality of power terminals 30 is electrically connected to the first semiconductor element 20A. The output terminal 30C is electrically connected to the second semiconductor element 20B. Therefore, each of the plurality of power terminals 30 is electrically connected to at least one of the two semiconductor elements 20.
 図3に示すように、2つのゲートワイヤ41のうち一方のゲートワイヤ41は、第1半導体素子20Aのゲート電極23と、支持部材10の複数のパッド層15のうち第1ゲート端子31Aが導電接合されたパッド層15とに導電接合されている。これにより、第1ゲート端子31Aは、第1半導体素子20Aのゲート電極23に導通している。2つのゲートワイヤ41のうち他方のゲートワイヤ41は、第2半導体素子20Bのゲート電極23と、支持部材10の複数のパッド層15のうち第2ゲート端子32Aが導電接合されたパッド層15とに導電接合されている。これにより、第2ゲート端子32Aは、第2半導体素子20Bのゲート電極23に導通している。2つのゲートワイヤ41の組成は、金(Au)を含む。 As shown in FIG. 3, one of the two gate wires 41 has the gate electrode 23 of the first semiconductor element 20A and the first gate terminal 31A of the plurality of pad layers 15 of the support member 10 conductive. It is conductively bonded to the bonded pad layer 15. Thereby, the first gate terminal 31A is electrically connected to the gate electrode 23 of the first semiconductor element 20A. The other gate wire 41 of the two gate wires 41 is connected to the gate electrode 23 of the second semiconductor element 20B and the pad layer 15 to which the second gate terminal 32A among the plurality of pad layers 15 of the support member 10 is conductively bonded. conductively bonded to the Thereby, the second gate terminal 32A is electrically connected to the gate electrode 23 of the second semiconductor element 20B. The composition of the two gate wires 41 includes gold (Au).
 図3に示すように、2つの検出ワイヤ42のうち一方の検出ワイヤ42は、第1半導体素子20Aの第2電極22と、支持部材10の複数のパッド層15のうち第1検出端子31Bが導電接合されたパッド層15とに導電接合されている。これにより、第1検出端子31Bは、第1半導体素子20Aの第2電極22に導通している。2つの検出ワイヤ42のうち他方の検出ワイヤ42は、第2半導体素子20Bの第2電極22と、支持部材10の複数のパッド層15のうち第3検出端子32Bが導電接合されたパッド層15とに導電接合されている。これにより、第3検出端子32Bは、第2半導体素子20Bの第2電極22に導通している。2つの検出ワイヤ42の組成は、アルミニウムを含む。 As shown in FIG. 3, one of the two detection wires 42 is connected to the second electrode 22 of the first semiconductor element 20A and the first detection terminal 31B among the plurality of pad layers 15 of the support member 10. It is conductively bonded to the pad layer 15 which is conductively bonded. Thereby, the first detection terminal 31B is electrically connected to the second electrode 22 of the first semiconductor element 20A. The other detection wire 42 of the two detection wires 42 is a pad layer 15 to which the second electrode 22 of the second semiconductor element 20B and the third detection terminal 32B among the plurality of pad layers 15 of the support member 10 are electrically bonded. and are electrically conductively bonded to each other. Thereby, the third detection terminal 32B is electrically connected to the second electrode 22 of the second semiconductor element 20B. The composition of the two sensing wires 42 includes aluminum.
 第1実施形態の変形例:
 次に、図10および図11に基づき、半導体装置A10の変形例である半導体装置A11について説明する。
Modification of the first embodiment:
Next, a semiconductor device A11, which is a modification of the semiconductor device A10, will be described based on FIGS. 10 and 11.
 半導体装置A11においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A10の当該構成と異なる。図10に示すように、第1方向zに視て、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、封止樹脂50の頂面51の周縁511から離れている。図11に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々の端面34は、封止樹脂50に覆われている。したがって、半導体装置A11においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々の実装面33のみが封止樹脂50から露出している。 In the semiconductor device A11, the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10. As shown in FIG. 10, when viewed in the first direction z, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are connected to the periphery 511 of the top surface 51 of the sealing resin 50. away from As shown in FIG. 11, the end surfaces 34 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are covered with a sealing resin 50. Therefore, in the semiconductor device A11, only the mounting surfaces 33 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the sealing resin 50.
 次に、半導体装置A10の作用効果について説明する。 Next, the effects of the semiconductor device A10 will be explained.
 半導体装置A10は、複数の電力端子30、第1信号端子31、第2信号端子32および封止樹脂50を備える。封止樹脂50は、第1方向zを向く底面52を有する。複数の電力端子30、第1信号端子31および第2信号端子32は、底面52から露出している。第1方向zに視て、複数の電力端子30の各々の全体と、第1信号端子31および第2信号端子32の各々の全体とが、封止樹脂50の外縁501に囲まれている。本構成をとることにより、配線基板に対する半導体装置A10の表面実装を可能としつつ、複数の電力端子30、第1信号端子31および第2信号端子32の各々において、封止樹脂50に覆われる面積が増加する。したがって、本構成によれば、半導体装置A10において、半導体装置A10の小型化を図りつつ、半導体装置A10の絶縁耐圧の低下を抑制することが可能となる。 The semiconductor device A10 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50. The sealing resin 50 has a bottom surface 52 facing in the first direction z. A plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52. When viewed in the first direction z, the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. By adopting this configuration, the area covered by the sealing resin 50 in each of the plurality of power terminals 30, the first signal terminal 31, and the second signal terminal 32 is made possible while surface mounting the semiconductor device A10 on the wiring board. increases. Therefore, according to this configuration, in the semiconductor device A10, it is possible to reduce the size of the semiconductor device A10 while suppressing a decrease in the withstand voltage of the semiconductor device A10.
 半導体装置A10は、第1半導体素子20Aおよび第2半導体素子20Bを搭載する支持部材10をさらに備える。支持部材10は、封止樹脂50の頂面51から露出している。第1半導体素子20A、第2半導体素子20B、複数の電力端子30、第1信号端子31および第2信号端子32は、第1方向zにおいて封止樹脂50の底面52と支持部材10との間に位置する。本構成をとることにより、半導体装置A10においては、第1方向zにおいて半導体装置A10が実装される配線基板が位置する側とは反対側から放熱を図ることが可能となる。 The semiconductor device A10 further includes a support member 10 on which a first semiconductor element 20A and a second semiconductor element 20B are mounted. The support member 10 is exposed from the top surface 51 of the sealing resin 50. The first semiconductor element 20A, the second semiconductor element 20B, the plurality of power terminals 30, the first signal terminal 31, and the second signal terminal 32 are located between the bottom surface 52 of the sealing resin 50 and the support member 10 in the first direction z. Located in With this configuration, in the semiconductor device A10, heat can be dissipated from the side opposite to the side where the wiring board on which the semiconductor device A10 is mounted is located in the first direction z.
 上記の場合において、支持部材10は、頂面51から露出する放熱層16を有する。本構成をとることにより、半導体装置A10の放熱効率をさらに向上させることができる。 In the above case, the support member 10 has the heat dissipation layer 16 exposed from the top surface 51. By adopting this configuration, the heat dissipation efficiency of the semiconductor device A10 can be further improved.
 複数の電力端子30の各々は、第2方向xにおいて第1半導体素子20Aおよび第2半導体素子20Bが位置する側とは反対側を向く端面34を有する。端面34は、封止樹脂50から露出している。本構成をとることにより、半導体装置A10を配線基板に実装する際、端面34に沿ったハンダフィレットを形成することができる。これにより、配線基板に対する半導体装置A10の接合強度の増加を図ることが可能となる。 Each of the plurality of power terminals 30 has an end surface 34 facing the opposite side to the side where the first semiconductor element 20A and the second semiconductor element 20B are located in the second direction x. The end surface 34 is exposed from the sealing resin 50. By adopting this configuration, a solder fillet can be formed along the end surface 34 when the semiconductor device A10 is mounted on a wiring board. This makes it possible to increase the bonding strength of the semiconductor device A10 to the wiring board.
 複数の電力端子30の各々は、接合部35、実装部36および中間部37を有する。接合部35は、支持部材10に接合されている。実装部36は、第1方向zにおいて接合部35から離れており、かつ封止樹脂50の底面52から露出している。中間部37は、接合部35と実装部36とを連結している。接合部35は封止樹脂50と支持部材10とに挟まれている。本構成をとることにより、複数の電力端子30が底面52から脱落することを防止できる。 Each of the plurality of power terminals 30 has a joint portion 35, a mounting portion 36, and an intermediate portion 37. The joint portion 35 is joined to the support member 10. The mounting portion 36 is separated from the joint portion 35 in the first direction z and is exposed from the bottom surface 52 of the sealing resin 50. The intermediate portion 37 connects the joint portion 35 and the mounting portion 36. The joint portion 35 is sandwiched between the sealing resin 50 and the support member 10. By adopting this configuration, it is possible to prevent the plurality of power terminals 30 from falling off the bottom surface 52.
 第2実施形態:
 図12~図17に基づき、本開示の第2実施形態にかかる半導体装置A20について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。
Second embodiment:
A semiconductor device A20 according to a second embodiment of the present disclosure will be described based on FIGS. 12 to 17. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
 半導体装置A20においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A10の当該構成と異なる。 In the semiconductor device A20, the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
 図16および図17に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々において、実装部36は、第2方向xにおいて中間部37を基準として接合部35と同じ側に位置する。接合部35は、封止樹脂50と支持部材10とに挟まれている。図13に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々において、第1方向zに視て、実装部36は、接合部35に重なっている。これにより、封止樹脂50の一部は、実装部36と接合部35とに挟まれている。 As shown in FIGS. 16 and 17, in each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32, the mounting portion 36 has an intermediate portion 37 in the second direction x. It is located on the same side as the joint portion 35 as a reference. The joint portion 35 is sandwiched between the sealing resin 50 and the support member 10. As shown in FIG. 13, in each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32, the mounting portion 36 is attached to the joint portion 35 when viewed in the first direction z. overlapping. As a result, a part of the sealing resin 50 is sandwiched between the mounting section 36 and the joining section 35.
 図14および図15に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々の中間部37は、端面34を含む。半導体装置A20においては、複数の電力端子30の各々の端面34は、封止樹脂50の2つの第1側面53のうち一方の第1側面53から露出している。複数の第1信号端子31、および複数の第1信号端子31の各々の端面34は、2つの第1側面53のうち他方の第1側面53から露出している。 As shown in FIGS. 14 and 15, the intermediate portion 37 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 includes an end surface 34. In the semiconductor device A20, the end surface 34 of each of the plurality of power terminals 30 is exposed from one of the two first side surfaces 53 of the sealing resin 50. The plurality of first signal terminals 31 and the end surface 34 of each of the plurality of first signal terminals 31 are exposed from the other first side surface 53 of the two first side surfaces 53.
 第2実施形態の変形例:
 次に、図18および図19に基づき、半導体装置A20の変形例である半導体装置A21について説明する。
Modification of the second embodiment:
Next, a semiconductor device A21, which is a modification of the semiconductor device A20, will be described with reference to FIGS. 18 and 19.
 半導体装置A21においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A20の当該構成と異なる。図18に示すように、第1方向zに視て、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、封止樹脂50の頂面51の周縁511から離れている。図19に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々の端面34は、封止樹脂50に覆われている。したがって、半導体装置A21においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々の実装面33のみが封止樹脂50から露出している。 In the semiconductor device A21, the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A20. As shown in FIG. 18, when viewed in the first direction z, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are located near the periphery 511 of the top surface 51 of the sealing resin 50. away from As shown in FIG. 19, the end surfaces 34 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are covered with a sealing resin 50. Therefore, in the semiconductor device A21, only the mounting surfaces 33 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the sealing resin 50.
 次に、半導体装置A20の作用効果について説明する。 Next, the effects of the semiconductor device A20 will be explained.
 半導体装置A20は、複数の電力端子30、第1信号端子31、第2信号端子32および封止樹脂50を備える。封止樹脂50は、第1方向zを向く底面52を有する。複数の電力端子30、第1信号端子31および第2信号端子32は、底面52から露出している。第1方向zに視て、複数の電力端子30の各々の全体と、第1信号端子31および第2信号端子32の各々の全体とが、封止樹脂50の外縁501に囲まれている。したがって、本構成によれば、半導体装置A20においても、半導体装置A20の小型化を図りつつ、半導体装置A20の絶縁耐圧の低下を抑制することが可能となる。さらに半導体装置A20は、半導体装置A10と共通する構成を具備することにより、半導体装置A10と同等の作用効果を奏する。 The semiconductor device A20 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50. The sealing resin 50 has a bottom surface 52 facing in the first direction z. A plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52. When viewed in the first direction z, the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A20, it is possible to reduce the size of the semiconductor device A20 while suppressing a decrease in the dielectric strength voltage of the semiconductor device A20. Furthermore, the semiconductor device A20 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
 半導体装置A20においては、複数の電力端子30の各々において、実装部36は、第2方向xにおいて中間部37を基準として接合部35と同じ側に位置する。本構成をとることにより、複数の電力端子30の各々の第2方向xにおける寸法がより小さくなる。したがって、半導体装置A20の第2方向xにおける寸法をより縮小することが可能となる。 In the semiconductor device A20, in each of the plurality of power terminals 30, the mounting portion 36 is located on the same side as the bonding portion 35 with respect to the intermediate portion 37 in the second direction x. By adopting this configuration, the dimensions of each of the plurality of power terminals 30 in the second direction x become smaller. Therefore, it becomes possible to further reduce the dimensions of the semiconductor device A20 in the second direction x.
 上記の構成において、複数の電力端子30の各々の中間部37は、端面34を含む。本構成をとることにより、封止樹脂50から露出する端面34の第1方向zの寸法がより大きくなる。したがって、半導体装置A20を配線基板に実装する際、端面34に沿って形成されるハンダフィレットの第1方向zの体積をより拡大させることができる。これにより、配線基板に対する半導体装置A20の接合強度のさらなる増加と、半導体装置A20の放熱性の向上とを図ることが可能となる。 In the above configuration, each intermediate portion 37 of the plurality of power terminals 30 includes an end surface 34. By adopting this configuration, the dimension of the end surface 34 exposed from the sealing resin 50 in the first direction z becomes larger. Therefore, when mounting the semiconductor device A20 on a wiring board, the volume of the solder fillet formed along the end surface 34 in the first direction z can be further expanded. This makes it possible to further increase the bonding strength of the semiconductor device A20 to the wiring board and to improve the heat dissipation of the semiconductor device A20.
 半導体装置A21においては、第1方向zに視て、複数の電力端子30、第1信号端子31および第2信号端子32は、封止樹脂50の頂面51の周縁511から離れている。本構成をとることにより、複数の電力端子30の各々の端面34が封止樹脂50に覆われるため、複数の封止樹脂50の各々において封止樹脂50に覆われる面積がより増加する。したがって、半導体装置A21の絶縁耐圧の低下をより効果的に抑制することが可能となる。 In the semiconductor device A21, the plurality of power terminals 30, first signal terminals 31, and second signal terminals 32 are separated from the periphery 511 of the top surface 51 of the sealing resin 50 when viewed in the first direction z. With this configuration, each end surface 34 of the plurality of power terminals 30 is covered with the sealing resin 50, so that the area covered by the sealing resin 50 in each of the plurality of sealing resins 50 is further increased. Therefore, it becomes possible to more effectively suppress a decrease in the dielectric strength voltage of the semiconductor device A21.
 第3実施形態:
 図20~図23に基づき、本開示の第3実施形態にかかる半導体装置A30について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。
Third embodiment:
A semiconductor device A30 according to a third embodiment of the present disclosure will be described based on FIGS. 20 to 23. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted.
 半導体装置A30においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A10の当該構成と異なる。 In the semiconductor device A30, the configurations of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
 図21~図23に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々は、第1方向zに延びる直方体状である。半導体装置A30においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32は、金属ブロックである。したがって、これら各々は、接合部35、実装部36および中間部37を有しない。 As shown in FIGS. 21 to 23, each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 has a rectangular parallelepiped shape extending in the first direction z. In the semiconductor device A30, the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are metal blocks. Therefore, each of these does not have a joint portion 35, a mounting portion 36, and an intermediate portion 37.
 図20および図21に示すように、第1方向zに視て、複数の電力端子30の各々の全体と、複数の第1信号端子31、および複数の第2信号端子32の各々の全体とが、支持部材10の絶縁層11に重なっている。さらに図21に示すように、第1方向zに視て、複数の電力端子30の各々の全体と、複数の第1信号端子31、および複数の第2信号端子32の各々の全体とが、支持部材10の第1導電層12、第2導電層13、第3導電層14、および複数のパッド層15に重なっている。 As shown in FIGS. 20 and 21, when viewed in the first direction z, the entirety of each of the plurality of power terminals 30, the entirety of each of the plurality of first signal terminals 31, and the whole of each of the plurality of second signal terminals 32. overlaps the insulating layer 11 of the support member 10. Furthermore, as shown in FIG. 21, when viewed in the first direction z, the entirety of each of the plurality of power terminals 30, the whole of each of the plurality of first signal terminals 31, and the whole of each of the plurality of second signal terminals 32, It overlaps with the first conductive layer 12, second conductive layer 13, third conductive layer 14, and multiple pad layers 15 of the support member 10.
 図21および図22に示すように、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々の端面34は、封止樹脂50に覆われている。したがって、半導体装置A30においては、複数の電力端子30、複数の第1信号端子31、および複数の第2信号端子32の各々の実装面33のみが封止樹脂50から露出している。 As shown in FIGS. 21 and 22, the end surfaces 34 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are covered with a sealing resin 50. Therefore, in the semiconductor device A30, only the mounting surfaces 33 of each of the plurality of power terminals 30, the plurality of first signal terminals 31, and the plurality of second signal terminals 32 are exposed from the sealing resin 50.
 次に、半導体装置A30の作用効果について説明する。 Next, the effects of the semiconductor device A30 will be explained.
 半導体装置A30は、複数の電力端子30、第1信号端子31、第2信号端子32および封止樹脂50を備える。封止樹脂50は、第1方向zを向く底面52を有する。複数の電力端子30、第1信号端子31および第2信号端子32は、底面52から露出している。第1方向zに視て、複数の電力端子30の各々の全体と、第1信号端子31および第2信号端子32の各々の全体とが、封止樹脂50の外縁501に囲まれている。したがって、本構成によれば、半導体装置A30においても、半導体装置A30の小型化を図りつつ、半導体装置A30の絶縁耐圧の低下を抑制することが可能となる。さらに半導体装置A30は、半導体装置A10と共通する構成を具備することにより、半導体装置A10と同等の作用効果を奏する。 The semiconductor device A30 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50. The sealing resin 50 has a bottom surface 52 facing in the first direction z. The plurality of power terminals 30, the first signal terminal 31, and the second signal terminal 32 are exposed from the bottom surface 52. When viewed in the first direction z, the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A30, it is possible to reduce the size of the semiconductor device A30 while suppressing a decrease in the withstand voltage of the semiconductor device A30. Furthermore, the semiconductor device A30 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
 半導体装置A30においては、第1方向zに視て、複数の電力端子30の各々の全体と、第1信号端子31および第2信号端子32の各々の全体とが支持部材10に重なる。本構成をとることにより、第1方向zに視て、複数の電力端子30、第1信号端子31および第2信号端子32の各々が、支持部材10からはみ出さないものとなる。したがって、半導体装置A30の第1方向zに対して直交する方向における寸法をより縮小することが可能となる。 In the semiconductor device A30, the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 overlap with the support member 10 when viewed in the first direction z. By adopting this configuration, each of the plurality of power terminals 30, first signal terminals 31, and second signal terminals 32 does not protrude from the support member 10 when viewed in the first direction z. Therefore, it is possible to further reduce the dimensions of the semiconductor device A30 in the direction perpendicular to the first direction z.
 さらに半導体装置A30においては、複数の電力端子30の各々の端面34が封止樹脂50に覆われるため、複数の封止樹脂50の各々において封止樹脂50に覆われる面積がより増加する。したがって、半導体装置A30の絶縁耐圧の低下をより効果的に抑制することが可能となる。 Further, in the semiconductor device A30, since the end surface 34 of each of the plurality of power terminals 30 is covered with the sealing resin 50, the area covered by the sealing resin 50 in each of the plurality of sealing resins 50 is further increased. Therefore, it becomes possible to more effectively suppress a decrease in the dielectric strength voltage of the semiconductor device A30.
 第4実施形態:
 図24~図27に基づき、本開示の第4実施形態にかかる半導体装置A40について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。ここで、図26は、理解の便宜上、封止樹脂50を透過している。図26では、透過した封止樹脂50の外形線を想像線で示している。
Fourth embodiment:
A semiconductor device A40 according to a fourth embodiment of the present disclosure will be described based on FIGS. 24 to 27. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted. Here, in FIG. 26, for convenience of understanding, the sealing resin 50 is shown. In FIG. 26, the outline of the transparent sealing resin 50 is shown with imaginary lines.
 半導体装置A40においては、複数の電力端子30の構成が、半導体装置A10の当該構成と異なる。 In the semiconductor device A40, the configuration of the plurality of power terminals 30 is different from the configuration of the semiconductor device A10.
 図24~図26に示すように、複数の電力端子30のうち出力端子30Cは、第2方向xにおいて2つの半導体素子20を基準として、複数の電力端子30の第1入力端子30Aおよび第2入力端子30Bとは反対側に位置する。出力端子30Cの第3方向yの一方側には、複数の第1信号端子31の第1ゲート端子31Aが位置する。出力端子30Cの第3方向yの他方側には、複数の第2信号端子32の第2ゲート端子32Aが位置する。 As shown in FIGS. 24 to 26, the output terminal 30C among the plurality of power terminals 30 is connected to the first input terminal 30A and the second It is located on the opposite side to the input terminal 30B. A first gate terminal 31A of the plurality of first signal terminals 31 is located on one side of the output terminal 30C in the third direction y. The second gate terminal 32A of the plurality of second signal terminals 32 is located on the other side of the output terminal 30C in the third direction y.
 図27に示すように、封止樹脂50の2つの第1側面53のうち複数の第1信号端子31、および複数の第2信号端子32の各々の端面34が露出する第1側面53から、出力端子30Cの端面34が露出している。 As shown in FIG. 27, from the first side surface 53 of the two first side surfaces 53 of the sealing resin 50, the end surfaces 34 of each of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 are exposed. The end surface 34 of the output terminal 30C is exposed.
 次に、半導体装置A40の作用効果について説明する。 Next, the effects of the semiconductor device A40 will be explained.
 半導体装置A40は、複数の電力端子30、第1信号端子31、第2信号端子32および封止樹脂50を備える。封止樹脂50は、第1方向zを向く底面52を有する。複数の電力端子30、第1信号端子31および第2信号端子32は、底面52から露出している。第1方向zに視て、複数の電力端子30の各々の全体と、第1信号端子31および第2信号端子32の各々の全体とが、封止樹脂50の外縁501に囲まれている。したがって、本構成によれば、半導体装置A40においても、半導体装置A40の小型化を図りつつ、半導体装置A40の絶縁耐圧の低下を抑制することが可能となる。さらに半導体装置A40は、半導体装置A10と共通する構成を具備することにより、半導体装置A10と同等の作用効果を奏する。 The semiconductor device A40 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50. The sealing resin 50 has a bottom surface 52 facing in the first direction z. A plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52. When viewed in the first direction z, the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A40, it is possible to reduce the size of the semiconductor device A40 while suppressing a decrease in the dielectric strength voltage of the semiconductor device A40. Further, the semiconductor device A40 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
 半導体装置A40においては、複数の電力端子30のうち出力端子30Cは、第2方向xにおいて第1半導体素子20Aおよび第2半導体素子20Bを基準として、複数の電力端子30の第1入力端子30Aおよび第2入力端子30Bとは反対側に位置する。本構成をとることにより、第1入力端子30Aおよび第2入力端子30Bに作用する相互誘導の効果が向上するため、半導体装置A40における寄生インダクタンスを低減することが可能となる。 In the semiconductor device A40, the output terminal 30C among the plurality of power terminals 30 is connected to the first input terminal 30A and the first input terminal 30C of the plurality of power terminals 30 with respect to the first semiconductor element 20A and the second semiconductor element 20B in the second direction x. It is located on the opposite side to the second input terminal 30B. By adopting this configuration, the effect of mutual induction acting on the first input terminal 30A and the second input terminal 30B is improved, so that the parasitic inductance in the semiconductor device A40 can be reduced.
 第5実施形態:
 図28~図32に基づき、本開示の第5実施形態にかかる半導体装置A50について説明する。これらの図において、先述した半導体装置A10と同一、または類似の要素には同一の符号を付して、重複する説明を省略する。ここで、図30は、理解の便宜上、封止樹脂50を透過している。図30では、透過した封止樹脂50の外形線を想像線で示している。
Fifth embodiment:
A semiconductor device A50 according to a fifth embodiment of the present disclosure will be described based on FIGS. 28 to 32. In these figures, elements that are the same as or similar to those of the semiconductor device A10 described above are denoted by the same reference numerals, and redundant explanation will be omitted. Here, in FIG. 30, for convenience of understanding, the sealing resin 50 is shown. In FIG. 30, the outline of the transparent sealing resin 50 is shown with imaginary lines.
 半導体装置A50においては、複数の第1信号端子31、および複数の第2信号端子32の構成が、半導体装置A10の当該構成と異なる。 In the semiconductor device A50, the configurations of the plurality of first signal terminals 31 and the plurality of second signal terminals 32 are different from the configuration of the semiconductor device A10.
 図28~図30に示すように、複数の第1信号端子31のうち第2検出端子31Cと、複数の第2信号端子32のうち第4検出端子32Cとは、第3方向yにおいて2つの半導体素子20を基準として互いに反対側に位置する。第2検出端子31Cは、第2方向xにおいて複数の電力端子30の第1入力端子30Aと、複数の第1信号端子31の第1検出端子31Bとの間に位置する。第4検出端子32Cは、第2方向xにおいて複数の電力端子30の出力端子30Cと、第2信号端子32の第3検出端子32Bとの間に位置する。半導体装置A50においては、第1信号端子31の第1ゲート端子31Aと、第2信号端子32の第2ゲート端子32Aとの間隔は、半導体装置A10の場合の当該間隔よりも長くなっている。 As shown in FIGS. 28 to 30, the second detection terminal 31C among the plurality of first signal terminals 31 and the fourth detection terminal 32C among the plurality of second signal terminals 32 are connected to each other in the third direction y. They are located on opposite sides with respect to the semiconductor element 20. The second detection terminal 31C is located between the first input terminal 30A of the plurality of power terminals 30 and the first detection terminal 31B of the plurality of first signal terminals 31 in the second direction x. The fourth detection terminal 32C is located between the output terminal 30C of the plurality of power terminals 30 and the third detection terminal 32B of the second signal terminal 32 in the second direction x. In the semiconductor device A50, the distance between the first gate terminal 31A of the first signal terminal 31 and the second gate terminal 32A of the second signal terminal 32 is longer than the distance in the semiconductor device A10.
 図31および図32に示すように、第2検出端子31Cおよび第4検出端子32Cの各々の端面34は、封止樹脂50の2つの第2側面54から個別に露出している。 As shown in FIGS. 31 and 32, the end surfaces 34 of each of the second detection terminal 31C and the fourth detection terminal 32C are individually exposed from the two second side surfaces 54 of the sealing resin 50.
 次に、半導体装置A50の作用効果について説明する。 Next, the effects of the semiconductor device A50 will be explained.
 半導体装置A50は、複数の電力端子30、第1信号端子31、第2信号端子32および封止樹脂50を備える。封止樹脂50は、第1方向zを向く底面52を有する。複数の電力端子30、第1信号端子31および第2信号端子32は、底面52から露出している。第1方向zに視て、複数の電力端子30の各々の全体と、第1信号端子31および第2信号端子32の各々の全体とが、封止樹脂50の外縁501に囲まれている。したがって、本構成によれば、半導体装置A50においても、半導体装置A50の小型化を図りつつ、半導体装置A50の絶縁耐圧の低下を抑制することが可能となる。さらに半導体装置A50は、半導体装置A10と共通する構成を具備することにより、半導体装置A10と同等の作用効果を奏する。 The semiconductor device A50 includes a plurality of power terminals 30, a first signal terminal 31, a second signal terminal 32, and a sealing resin 50. The sealing resin 50 has a bottom surface 52 facing in the first direction z. A plurality of power terminals 30, a first signal terminal 31, and a second signal terminal 32 are exposed from the bottom surface 52. When viewed in the first direction z, the entirety of each of the plurality of power terminals 30 and the entirety of each of the first signal terminal 31 and the second signal terminal 32 are surrounded by the outer edge 501 of the sealing resin 50. Therefore, according to this configuration, even in the semiconductor device A50, it is possible to reduce the size of the semiconductor device A50 while suppressing a decrease in the dielectric strength voltage of the semiconductor device A50. Furthermore, the semiconductor device A50 has the same configuration as the semiconductor device A10, and thus has the same effects as the semiconductor device A10.
 半導体装置A50においては、第1信号端子31としての第1ゲート端子31Aと、第2信号端子32としての第2ゲート端子32Aとの間隔が、半導体装置A10の場合の当該間隔よりも長くなっている。本構成をとることにより、第1ゲート端子31Aおよび第2ゲート端子32Aに作用するノイズを低減することが可能となる。 In the semiconductor device A50, the distance between the first gate terminal 31A as the first signal terminal 31 and the second gate terminal 32A as the second signal terminal 32 is longer than the distance in the semiconductor device A10. There is. By adopting this configuration, it is possible to reduce noise acting on the first gate terminal 31A and the second gate terminal 32A.
 本開示は、先述した実施形態に限定されるものではない。本開示の各部の具体的な構成は、種々に設計変更自在である。 The present disclosure is not limited to the embodiments described above. The specific configuration of each part of the present disclosure can be modified in various ways.
 本開示は、以下の付記に記載した実施形態を含む。 The present disclosure includes embodiments described in the appendix below.
 付記1.
 第1半導体素子と、
 第2半導体素子と、
 各々が前記第1半導体素子および前記第2半導体素子の少なくともいずれかに導通する複数の電力端子と、
 前記第1半導体素子に導通する第1信号端子と、
 前記第2半導体素子に導通する第2信号端子と、
 前記第1半導体素子および前記第2半導体素子を覆う封止樹脂と、を備え、
 前記封止樹脂は、第1方向を向く底面を有し、
 前記複数の電力端子、前記第1信号端子および前記第2信号端子は、前記底面から露出しており、
 前記第1方向に視て、前記複数の電力端子の各々の全体と、前記第1信号端子および前記第2信号端子の各々の全体とが、前記封止樹脂の外縁に囲まれている、半導体装置。
 付記2.
 前記複数の電力端子の少なくともいずれかと、前記第1信号端子および前記第2信号端子と、は、前記第1方向に対して直交する第2方向において前記第1半導体素子および前記第2半導体素子を基準として互いに反対側に位置する、付記1に記載の半導体装置。
 付記3.
 前記第1半導体素子および前記第2半導体素子を搭載する支持部材をさらに備え、
 前記第1半導体素子および前記第2半導体素子は、前記第1方向において前記底面と前記支持部材との間に位置する、付記2に記載の半導体装置。
 付記4.
 前記複数の電力端子、前記第1信号端子および前記第2信号端子は、前記第1方向において前記底面と前記支持部材との間に位置する、付記3に記載の半導体装置。
 付記5.
 前記封止樹脂は、前記第1方向において前記底面とは反対側を向く頂面を有し、
 前記支持部材は、前記頂面から露出している、付記4に記載の半導体装置。
 付記6.
 前記複数の電力端子は、前記支持部材に接合されている、付記5に記載の半導体装置。
 付記7.
 前記第1信号端子および前記第2信号端子は、前記支持部材に接合されている、付記6に記載の半導体装置。
 付記8.
 前記支持部材は、絶縁層と、前記第1方向において前記第1半導体素子および前記第2半導体素子と前記絶縁層との間に位置する第1導電層および第2導電層と、を有し、
 前記第1半導体素子は、前記第1導電層に導電接合されており、
 前記第2半導体素子は、前記第2導電層に導電接合されている、付記7に記載の半導体装置。
 付記9.
 前記複数の電力端子のいずれかは、前記第1導電層および前記第2導電層のいずれかに導電接合されている、付記8に記載の半導体装置。
 付記10.
 前記支持部材は、前記絶縁層を基準として前記第1導電層および前記第2導電層とは反対側に位置する放熱層を有し、
 前記放熱層は、前記頂面から露出している、付記9に記載の半導体装置。
 付記11.
 前記複数の電力端子の各々は、前記第2方向において前記第1半導体素子および前記第2半導体素子が位置する側とは反対側を向く端面を有し、
 前記端面は、前記封止樹脂から露出している、付記6ないし10のいずれかに記載の半導体装置。
 付記12.
 前記複数の電力端子の各々は、前記支持部材に接合された接合部と、前記第1方向において前記接合部から離れており、かつ前記底面から露出する実装部と、前記接合部と前記実装部とを連結する中間部と、を有し
 前記接合部は、前記封止樹脂と前記支持部材とに挟まれている、付記11に記載の半導体装置。
 付記13.
 前記実装部は、前記第2方向において前記中間部を基準として前記接合部とは反対側に位置しており、
 前記実装部は、前記端面を含む、付記12に記載の半導体装置。
 付記14.
 前記実装部は、前記第2方向において前記中間部を基準として前記接合部と同じ側に位置しており、
 前記中間部は、前記端面を含む、付記12に記載の半導体装置。
 付記15.
 前記第1方向に視て、前記複数の電力端子、前記第1信号端子および前記第2信号端子は、前記頂面の周縁から離れている、付記6ないし10のいずれかに記載の半導体装置。
 付記16.
 前記第1方向に視て、前記複数の電力端子の各々の全体と、前記第1信号端子および前記第2信号端子の各々の全体と、が前記支持部材に重なっている、付記7ないし10のいずれかに記載の半導体装置。
 付記17.
 前記複数の電力端子の各々は、前記底面から露出する実装面を有し、
 前記実装面は、前記底面と面一である、付記1ないし10のいずれかに記載の半導体装置。
Additional note 1.
a first semiconductor element;
a second semiconductor element;
a plurality of power terminals each electrically connected to at least one of the first semiconductor element and the second semiconductor element;
a first signal terminal electrically connected to the first semiconductor element;
a second signal terminal electrically connected to the second semiconductor element;
a sealing resin that covers the first semiconductor element and the second semiconductor element,
The sealing resin has a bottom surface facing in a first direction,
The plurality of power terminals, the first signal terminal, and the second signal terminal are exposed from the bottom surface,
When viewed in the first direction, the entirety of each of the plurality of power terminals and the entirety of each of the first signal terminal and the second signal terminal are surrounded by an outer edge of the sealing resin. Device.
Appendix 2.
At least one of the plurality of power terminals, the first signal terminal, and the second signal terminal connect the first semiconductor element and the second semiconductor element in a second direction perpendicular to the first direction. The semiconductor devices according to supplementary note 1, which are located on opposite sides of each other as a reference.
Appendix 3.
further comprising a support member on which the first semiconductor element and the second semiconductor element are mounted,
The semiconductor device according to appendix 2, wherein the first semiconductor element and the second semiconductor element are located between the bottom surface and the support member in the first direction.
Appendix 4.
The semiconductor device according to appendix 3, wherein the plurality of power terminals, the first signal terminal, and the second signal terminal are located between the bottom surface and the support member in the first direction.
Appendix 5.
The sealing resin has a top surface facing opposite to the bottom surface in the first direction,
The semiconductor device according to appendix 4, wherein the support member is exposed from the top surface.
Appendix 6.
The semiconductor device according to appendix 5, wherein the plurality of power terminals are joined to the support member.
Appendix 7.
The semiconductor device according to appendix 6, wherein the first signal terminal and the second signal terminal are joined to the support member.
Appendix 8.
The support member includes an insulating layer, and a first conductive layer and a second conductive layer located between the first semiconductor element, the second semiconductor element, and the insulating layer in the first direction,
the first semiconductor element is conductively bonded to the first conductive layer,
The semiconductor device according to appendix 7, wherein the second semiconductor element is conductively bonded to the second conductive layer.
Appendix 9.
The semiconductor device according to appendix 8, wherein any one of the plurality of power terminals is conductively bonded to either the first conductive layer or the second conductive layer.
Appendix 10.
The support member has a heat dissipation layer located on the opposite side of the first conductive layer and the second conductive layer with respect to the insulating layer,
The semiconductor device according to appendix 9, wherein the heat dissipation layer is exposed from the top surface.
Appendix 11.
Each of the plurality of power terminals has an end face facing opposite to the side where the first semiconductor element and the second semiconductor element are located in the second direction,
11. The semiconductor device according to any one of appendices 6 to 10, wherein the end surface is exposed from the sealing resin.
Appendix 12.
Each of the plurality of power terminals includes a joint portion joined to the support member, a mounting portion that is separated from the joint portion in the first direction and exposed from the bottom surface, and the joint portion and the mounting portion. and an intermediate portion that connects the semiconductor device according to appendix 11, wherein the joint portion is sandwiched between the sealing resin and the support member.
Appendix 13.
The mounting section is located on the opposite side of the joint section with respect to the intermediate section in the second direction,
The semiconductor device according to appendix 12, wherein the mounting portion includes the end surface.
Appendix 14.
The mounting portion is located on the same side as the joint portion with respect to the intermediate portion in the second direction,
The semiconductor device according to appendix 12, wherein the intermediate portion includes the end surface.
Appendix 15.
11. The semiconductor device according to any one of appendices 6 to 10, wherein the plurality of power terminals, the first signal terminal, and the second signal terminal are separated from a periphery of the top surface when viewed in the first direction.
Appendix 16.
Supplementary Notes 7 to 10, wherein the entirety of each of the plurality of power terminals and the entirety of each of the first signal terminal and the second signal terminal overlap with the support member when viewed in the first direction. The semiconductor device according to any one of the above.
Appendix 17.
Each of the plurality of power terminals has a mounting surface exposed from the bottom surface,
11. The semiconductor device according to any one of appendices 1 to 10, wherein the mounting surface is flush with the bottom surface.
A10,A20,A30,A40,A50:半導体装置
10:支持部材    11:絶縁層
12:第1導電層    13:第2導電層
14:第3導電層    15:パッド層
16:放熱層    20:半導体素子
20A:第1半導体素子    20B:第2半導体素子
21:第1電極    22:第2電極
23:ゲート電極    29:接合層
30:電力端子    30A:第1入力端子
30B:第2入力端子    30C:出力端子
31:第1信号端子    31A:第1ゲート端子
31B:第1検出端子    31C:第2検出端子
32:第2信号端子    32A:第2ゲート端子
32B:第3検出端子    32C:第4検出端子
33:実装面    34:端面
35:接合部    36:実装部
37:中間部    40:導電部材
40A:第1部材    40B:第2部材
41:ゲートワイヤ    42:検出ワイヤ
50:封止樹脂    501:外縁
51:頂面    511:周縁
52:底面    53:第1側面
54:第2側面    z:第1方向
x:第2方向    y:第3方向
A10, A20, A30, A40, A50: Semiconductor device 10: Support member 11: Insulating layer 12: First conductive layer 13: Second conductive layer 14: Third conductive layer 15: Pad layer 16: Heat dissipation layer 20: Semiconductor element 20A: First semiconductor element 20B: Second semiconductor element 21: First electrode 22: Second electrode 23: Gate electrode 29: Bonding layer 30: Power terminal 30A: First input terminal 30B: Second input terminal 30C: Output terminal 31: First signal terminal 31A: First gate terminal 31B: First detection terminal 31C: Second detection terminal 32: Second signal terminal 32A: Second gate terminal 32B: Third detection terminal 32C: Fourth detection terminal 33: Mounting surface 34: End surface 35: Joint portion 36: Mounting portion 37: Intermediate portion 40: Conductive member 40A: First member 40B: Second member 41: Gate wire 42: Detection wire 50: Sealing resin 501: Outer edge 51: Top Surface 511: Periphery 52: Bottom surface 53: First side surface 54: Second side surface z: First direction x: Second direction y: Third direction

Claims (17)

  1.  第1半導体素子と、
     第2半導体素子と、
     各々が前記第1半導体素子および前記第2半導体素子の少なくともいずれかに導通する複数の電力端子と、
     前記第1半導体素子に導通する第1信号端子と、
     前記第2半導体素子に導通する第2信号端子と、
     前記第1半導体素子および前記第2半導体素子を覆う封止樹脂と、を備え、
     前記封止樹脂は、第1方向を向く底面を有し、
     前記複数の電力端子、前記第1信号端子および前記第2信号端子は、前記底面から露出しており、
     前記第1方向に視て、前記複数の電力端子の各々の全体と、前記第1信号端子および前記第2信号端子の各々の全体とが、前記封止樹脂の外縁に囲まれている、半導体装置。
    a first semiconductor element;
    a second semiconductor element;
    a plurality of power terminals each electrically connected to at least one of the first semiconductor element and the second semiconductor element;
    a first signal terminal electrically connected to the first semiconductor element;
    a second signal terminal electrically connected to the second semiconductor element;
    a sealing resin that covers the first semiconductor element and the second semiconductor element,
    The sealing resin has a bottom surface facing in a first direction,
    The plurality of power terminals, the first signal terminal, and the second signal terminal are exposed from the bottom surface,
    When viewed in the first direction, the entirety of each of the plurality of power terminals and the entirety of each of the first signal terminal and the second signal terminal are surrounded by an outer edge of the sealing resin. Device.
  2.  前記複数の電力端子の少なくともいずれかと、前記第1信号端子および前記第2信号端子と、は、前記第1方向に対して直交する第2方向において前記第1半導体素子および前記第2半導体素子を基準として互いに反対側に位置する、請求項1に記載の半導体装置。 At least one of the plurality of power terminals, the first signal terminal, and the second signal terminal connect the first semiconductor element and the second semiconductor element in a second direction perpendicular to the first direction. The semiconductor devices according to claim 1, wherein the semiconductor devices are located on opposite sides of each other as a reference.
  3.  前記第1半導体素子および前記第2半導体素子を搭載する支持部材をさらに備え、
     前記第1半導体素子および前記第2半導体素子は、前記第1方向において前記底面と前記支持部材との間に位置する、請求項2に記載の半導体装置。
    further comprising a support member on which the first semiconductor element and the second semiconductor element are mounted,
    3. The semiconductor device according to claim 2, wherein the first semiconductor element and the second semiconductor element are located between the bottom surface and the support member in the first direction.
  4.  前記複数の電力端子、前記第1信号端子および前記第2信号端子は、前記第1方向において前記底面と前記支持部材との間に位置する、請求項3に記載の半導体装置。 The semiconductor device according to claim 3, wherein the plurality of power terminals, the first signal terminal, and the second signal terminal are located between the bottom surface and the support member in the first direction.
  5.  前記封止樹脂は、前記第1方向において前記底面とは反対側を向く頂面を有し、
     前記支持部材は、前記頂面から露出している、請求項4に記載の半導体装置。
    The sealing resin has a top surface facing opposite to the bottom surface in the first direction,
    The semiconductor device according to claim 4, wherein the support member is exposed from the top surface.
  6.  前記複数の電力端子は、前記支持部材に接合されている、請求項5に記載の半導体装置。 The semiconductor device according to claim 5, wherein the plurality of power terminals are joined to the support member.
  7.  前記第1信号端子および前記第2信号端子は、前記支持部材に接合されている、請求項6に記載の半導体装置。 The semiconductor device according to claim 6, wherein the first signal terminal and the second signal terminal are joined to the support member.
  8.  前記支持部材は、絶縁層と、前記第1方向において前記第1半導体素子および前記第2半導体素子と前記絶縁層との間に位置する第1導電層および第2導電層と、を有し、
     前記第1半導体素子は、前記第1導電層に導電接合されており、
     前記第2半導体素子は、前記第2導電層に導電接合されている、請求項7に記載の半導体装置。
    The support member includes an insulating layer, and a first conductive layer and a second conductive layer located between the first semiconductor element, the second semiconductor element, and the insulating layer in the first direction,
    the first semiconductor element is conductively bonded to the first conductive layer,
    8. The semiconductor device according to claim 7, wherein the second semiconductor element is conductively bonded to the second conductive layer.
  9.  前記複数の電力端子のいずれかは、前記第1導電層および前記第2導電層のいずれかに導電接合されている、請求項8に記載の半導体装置。 The semiconductor device according to claim 8, wherein any one of the plurality of power terminals is conductively bonded to either the first conductive layer or the second conductive layer.
  10.  前記支持部材は、前記絶縁層を基準として前記第1導電層および前記第2導電層とは反対側に位置する放熱層を有し、
     前記放熱層は、前記頂面から露出している、請求項9に記載の半導体装置。
    The support member has a heat dissipation layer located on the opposite side of the first conductive layer and the second conductive layer with respect to the insulating layer,
    The semiconductor device according to claim 9, wherein the heat dissipation layer is exposed from the top surface.
  11.  前記複数の電力端子の各々は、前記第2方向において前記第1半導体素子および前記第2半導体素子が位置する側とは反対側を向く端面を有し、
     前記端面は、前記封止樹脂から露出している、請求項6ないし10のいずれかに記載の半導体装置。
    Each of the plurality of power terminals has an end face facing opposite to the side where the first semiconductor element and the second semiconductor element are located in the second direction,
    11. The semiconductor device according to claim 6, wherein the end surface is exposed from the sealing resin.
  12.  前記複数の電力端子の各々は、前記支持部材に接合された接合部と、前記第1方向において前記接合部から離れており、かつ前記底面から露出する実装部と、前記接合部と前記実装部とを連結する中間部と、を有し
     前記接合部は、前記封止樹脂と前記支持部材とに挟まれている、請求項11に記載の半導体装置。
    Each of the plurality of power terminals includes a joint portion joined to the support member, a mounting portion that is separated from the joint portion in the first direction and exposed from the bottom surface, and the joint portion and the mounting portion. 12. The semiconductor device according to claim 11, further comprising: an intermediate portion connecting said bonding portion with said sealing resin and said support member.
  13.  前記実装部は、前記第2方向において前記中間部を基準として前記接合部とは反対側に位置しており、
     前記実装部は、前記端面を含む、請求項12に記載の半導体装置。
    The mounting section is located on the opposite side of the joint section with respect to the intermediate section in the second direction,
    The semiconductor device according to claim 12, wherein the mounting section includes the end surface.
  14.  前記実装部は、前記第2方向において前記中間部を基準として前記接合部と同じ側に位置しており、
     前記中間部は、前記端面を含む、請求項12に記載の半導体装置。
    The mounting portion is located on the same side as the joint portion with respect to the intermediate portion in the second direction,
    13. The semiconductor device according to claim 12, wherein the intermediate portion includes the end surface.
  15.  前記第1方向に視て、前記複数の電力端子、前記第1信号端子および前記第2信号端子は、前記頂面の周縁から離れている、請求項6ないし10のいずれかに記載の半導体装置。 The semiconductor device according to any one of claims 6 to 10, wherein the plurality of power terminals, the first signal terminal, and the second signal terminal are separated from a periphery of the top surface when viewed in the first direction. .
  16.  前記第1方向に視て、前記複数の電力端子の各々の全体と、前記第1信号端子および前記第2信号端子の各々の全体と、が前記支持部材に重なっている、請求項7ないし10のいずれかに記載の半導体装置。 Claims 7 to 10, wherein the entirety of each of the plurality of power terminals and the entirety of each of the first signal terminal and the second signal terminal overlap with the support member when viewed in the first direction. The semiconductor device according to any one of.
  17.  前記複数の電力端子の各々は、前記底面から露出する実装面を有し、
     前記実装面は、前記底面と面一である、請求項1ないし16のいずれかに記載の半導体装置。
    Each of the plurality of power terminals has a mounting surface exposed from the bottom surface,
    17. The semiconductor device according to claim 1, wherein the mounting surface is flush with the bottom surface.
PCT/JP2023/014042 2022-04-12 2023-04-05 Semiconductor device WO2023199808A1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11312775A (en) * 1998-04-28 1999-11-09 Ars Seimitsu Kk Manufacture of semiconductor package and semiconductor package manufactured by the method
JP2000091493A (en) * 1998-09-16 2000-03-31 Mitsui High Tec Inc Surface-mounted semiconductor device
JP2011223016A (en) * 2005-11-18 2011-11-04 Fairchild Semiconductor Corp Semiconductor die package using lead frame and clip and its manufacturing method
JP2020009979A (en) * 2018-07-12 2020-01-16 株式会社 日立パワーデバイス Semiconductor device and manufacturing method thereof
JP2021034657A (en) * 2019-08-28 2021-03-01 富士電機株式会社 Semiconductor device and method of manufacturing semiconductor device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11312775A (en) * 1998-04-28 1999-11-09 Ars Seimitsu Kk Manufacture of semiconductor package and semiconductor package manufactured by the method
JP2000091493A (en) * 1998-09-16 2000-03-31 Mitsui High Tec Inc Surface-mounted semiconductor device
JP2011223016A (en) * 2005-11-18 2011-11-04 Fairchild Semiconductor Corp Semiconductor die package using lead frame and clip and its manufacturing method
JP2020009979A (en) * 2018-07-12 2020-01-16 株式会社 日立パワーデバイス Semiconductor device and manufacturing method thereof
JP2021034657A (en) * 2019-08-28 2021-03-01 富士電機株式会社 Semiconductor device and method of manufacturing semiconductor device

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