JP4343148B2 - 材料複合体ウェーハの製造方法 - Google Patents
材料複合体ウェーハの製造方法 Download PDFInfo
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- JP4343148B2 JP4343148B2 JP2005172713A JP2005172713A JP4343148B2 JP 4343148 B2 JP4343148 B2 JP 4343148B2 JP 2005172713 A JP2005172713 A JP 2005172713A JP 2005172713 A JP2005172713 A JP 2005172713A JP 4343148 B2 JP4343148 B2 JP 4343148B2
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- thermal annealing
- material composite
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
- H01L21/76254—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques with separation/delamination along an ion implanted layer, e.g. Smart-cut, Unibond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Recrystallisation Techniques (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Laminated Bodies (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Description
Claims (15)
- 材料複合体ウェーハの製造方法であって、
ソース基板に所定の分割領域を形成するステップと、
ソース‐ハンドル複合体を形成するために前記ソース基板をハンドル基板に取り付けるステップと、
前記ソース基板を所定の分割領域において脆弱化するために前記ソース基板を熱アニールする熱アニールステップと、を含み、
前記熱アニールステップの間及び/又は後に、前記脆弱化された所定の分割領域の物理的な強度を特徴づけている脆弱化の程度を測定し、
前記ソース基板の光学特性を計測することにより、前記脆弱化の程度を、2回以上、測定し、
前記脆弱化の程度の進展に依存してアニール持続時間及び/又はアニール温度を適応させる、ことを特徴とする方法。 - 前記脆弱化された所定の分割領域の光学特性を計測する、請求項1に記載の方法。
- 可視域及び/又はX線領域で、及び/又は赤外域で、前記光学特性を計測することを特徴とする請求項1又は2に記載の材料複合体の製造方法。
- 前記ソース‐ハンドル複合体の反射率又は透過率を計測することにより、前記脆弱化の程度を測定することを特徴とする請求項1〜3のいずれか1項に記載の材料複合体の製造方法。
- 脆弱化された所定の分割領域の反射率を計測する、請求項4に記載の方法。
- 前記熱アニールステップの間及び/又は後で計測された光学特性を熱アニールステップに先立って計測された前記光学特性と比較することにより、前記脆弱化の程度を測定することを特徴とする請求項1〜5のいずれか1項に記載の材料複合体の製造方法。
- 前記反射率又は透過率を1つの波長について計測することを特徴とする請求項4に記載の材料複合体の製造方法。
- 前記反射率又は前記透過率を、所定の範囲内の波長で計測することを特徴とする請求項4に記載の材料複合体の製造方法。
- 前記脆弱化の程度を、連続的に又は周期的に測定することを特徴とする請求項1〜8のいずれか1項に記載の材料複合体の製造方法。
- 前記脆弱化の程度が所定の値に相当する場合には、前記熱アニールステップを停止することを特徴とする請求項1〜9のいずれか1項に記載の材料複合体の製造方法。
- 前記熱アニールステップを自動的に停止する、請求項10に記載の方法。
- 前記ハンドル基板が透過性であり、前記ハンドル基板を通過させた計測を実施することにより前記脆弱化の程度を測定することを特徴とする請求項1〜11のいずれか1項に記載の材料複合体の製造方法。
- 前記材料複合体ウェーハは、異なる物理的特性及び/又は化学的特性を備えた少なくとも2種類の材料を含む非均質材料複合体である、請求項1〜12のいずれか1項に記載の方法。
- 前記2種類の材料が、異なる熱膨張係数を備えた請求項13に記載の方法。
- 熱アニール装置において、請求項1〜14のいずれか1項に記載の方法に従って前記脆弱化の程度を測定する装置の使用法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04291472A EP1605505B1 (en) | 2004-06-11 | 2004-06-11 | Method for manufacturing a material compound wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006041488A JP2006041488A (ja) | 2006-02-09 |
JP4343148B2 true JP4343148B2 (ja) | 2009-10-14 |
Family
ID=34931172
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005172713A Expired - Fee Related JP4343148B2 (ja) | 2004-06-11 | 2005-06-13 | 材料複合体ウェーハの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (2) | US7217639B2 (ja) |
EP (1) | EP1605505B1 (ja) |
JP (1) | JP4343148B2 (ja) |
AT (1) | ATE393473T1 (ja) |
DE (1) | DE602004013292T2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5044195B2 (ja) * | 2006-11-10 | 2012-10-10 | 信越化学工業株式会社 | Soq基板の製造方法 |
FR2914488B1 (fr) * | 2007-03-30 | 2010-08-27 | Soitec Silicon On Insulator | Substrat chauffage dope |
FR2915625B1 (fr) * | 2007-04-27 | 2009-10-02 | Soitec Silicon On Insulator | Procede de transfert d'une couche epitaxiale |
EP2103632A1 (en) * | 2008-03-20 | 2009-09-23 | Ineos Europe Limited | Polymerisation process |
US8698106B2 (en) * | 2008-04-28 | 2014-04-15 | Varian Semiconductor Equipment Associates, Inc. | Apparatus for detecting film delamination and a method thereof |
FR3132787A1 (fr) * | 2022-02-14 | 2023-08-18 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Procédé de suivi de fragilisation d’une interface entre un substrat et une couche et dispositif permettant un tel suivi |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09213652A (ja) * | 1996-02-01 | 1997-08-15 | Semiconductor Energy Lab Co Ltd | レーザーアニール装置 |
US6033974A (en) * | 1997-05-12 | 2000-03-07 | Silicon Genesis Corporation | Method for controlled cleaving process |
US5877070A (en) | 1997-05-31 | 1999-03-02 | Max-Planck Society | Method for the transfer of thin layers of monocrystalline material to a desirable substrate |
US6166354A (en) * | 1997-06-16 | 2000-12-26 | Advanced Micro Devices, Inc. | System and apparatus for in situ monitoring and control of annealing in semiconductor fabrication |
FR2767416B1 (fr) | 1997-08-12 | 1999-10-01 | Commissariat Energie Atomique | Procede de fabrication d'un film mince de materiau solide |
US5882987A (en) * | 1997-08-26 | 1999-03-16 | International Business Machines Corporation | Smart-cut process for the production of thin semiconductor material films |
US6425971B1 (en) * | 2000-05-10 | 2002-07-30 | Silverbrook Research Pty Ltd | Method of fabricating devices incorporating microelectromechanical systems using UV curable tapes |
US20040087042A1 (en) * | 2002-08-12 | 2004-05-06 | Bruno Ghyselen | Method and apparatus for adjusting the thickness of a layer of semiconductor material |
EP1429381B1 (en) * | 2002-12-10 | 2011-07-06 | S.O.I.Tec Silicon on Insulator Technologies | A method for manufacturing a material compound |
-
2004
- 2004-06-11 DE DE602004013292T patent/DE602004013292T2/de not_active Expired - Lifetime
- 2004-06-11 EP EP04291472A patent/EP1605505B1/en not_active Expired - Lifetime
- 2004-06-11 AT AT04291472T patent/ATE393473T1/de not_active IP Right Cessation
- 2004-12-03 US US11/004,408 patent/US7217639B2/en not_active Expired - Fee Related
-
2005
- 2005-06-13 JP JP2005172713A patent/JP4343148B2/ja not_active Expired - Fee Related
-
2006
- 2006-12-28 US US11/617,345 patent/US20070105246A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20050277269A1 (en) | 2005-12-15 |
ATE393473T1 (de) | 2008-05-15 |
US7217639B2 (en) | 2007-05-15 |
JP2006041488A (ja) | 2006-02-09 |
EP1605505B1 (en) | 2008-04-23 |
DE602004013292T2 (de) | 2009-05-28 |
EP1605505A1 (en) | 2005-12-14 |
US20070105246A1 (en) | 2007-05-10 |
DE602004013292D1 (de) | 2008-06-05 |
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