JP4323365B2 - Acrylic resin board manufacturing method - Google Patents
Acrylic resin board manufacturing method Download PDFInfo
- Publication number
- JP4323365B2 JP4323365B2 JP2004112069A JP2004112069A JP4323365B2 JP 4323365 B2 JP4323365 B2 JP 4323365B2 JP 2004112069 A JP2004112069 A JP 2004112069A JP 2004112069 A JP2004112069 A JP 2004112069A JP 4323365 B2 JP4323365 B2 JP 4323365B2
- Authority
- JP
- Japan
- Prior art keywords
- acrylic resin
- mass
- acrylate
- resin plate
- methacrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004925 Acrylic resin Substances 0.000 title claims description 52
- 229920000178 Acrylic resin Polymers 0.000 title claims description 52
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000000178 monomer Substances 0.000 claims description 36
- 239000000203 mixture Substances 0.000 claims description 35
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 16
- 125000005250 alkyl acrylate group Chemical group 0.000 claims description 11
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 239000003505 polymerization initiator Substances 0.000 claims description 10
- 230000000379 polymerizing effect Effects 0.000 claims description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 4
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 claims description 2
- 229940126062 Compound A Drugs 0.000 claims 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 22
- 238000006116 polymerization reaction Methods 0.000 description 16
- -1 alkylene glycol Chemical compound 0.000 description 15
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 12
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000011156 evaluation Methods 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 4
- MOYAFQVGZZPNRA-UHFFFAOYSA-N Terpinolene Chemical compound CC(C)=C1CCC(C)=CC1 MOYAFQVGZZPNRA-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000003431 cross linking reagent Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- OWQCUVRSJUABCB-UHFFFAOYSA-N 16-methylheptadecyl 2-methylprop-2-enoate Chemical compound CC(C)CCCCCCCCCCCCCCCOC(=O)C(C)=C OWQCUVRSJUABCB-UHFFFAOYSA-N 0.000 description 3
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 description 3
- IEMBFTKNPXENSE-UHFFFAOYSA-N 2-(2-methylpentan-2-ylperoxy)propan-2-yl hydrogen carbonate Chemical compound CCCC(C)(C)OOC(C)(C)OC(O)=O IEMBFTKNPXENSE-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000005341 toughened glass Substances 0.000 description 3
- WERYXYBDKMZEQL-UHFFFAOYSA-N 1,4-butanediol Substances OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 2
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 2
- RTEZVHMDMFEURJ-UHFFFAOYSA-N 2-methylpentan-2-yl 2,2-dimethylpropaneperoxoate Chemical compound CCCC(C)(C)OOC(=O)C(C)(C)C RTEZVHMDMFEURJ-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WQAQPCDUOCURKW-UHFFFAOYSA-N butanethiol Chemical compound CCCCS WQAQPCDUOCURKW-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical compound C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 2
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- HMZGPNHSPWNGEP-UHFFFAOYSA-N octadecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)C(C)=C HMZGPNHSPWNGEP-UHFFFAOYSA-N 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000006188 syrup Substances 0.000 description 2
- 235000020357 syrup Nutrition 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- KEROTHRUZYBWCY-UHFFFAOYSA-N tridecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCOC(=O)C(C)=C KEROTHRUZYBWCY-UHFFFAOYSA-N 0.000 description 2
- 230000002087 whitening effect Effects 0.000 description 2
- LBDSQNRQXIKAGX-UHFFFAOYSA-N (2-methyl-3-prop-2-enoyloxypropyl) prop-2-enoate Chemical compound C=CC(=O)OCC(C)COC(=O)C=C LBDSQNRQXIKAGX-UHFFFAOYSA-N 0.000 description 1
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- KDGNCLDCOVTOCS-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy propan-2-yl carbonate Chemical compound CC(C)OC(=O)OOC(C)(C)C KDGNCLDCOVTOCS-UHFFFAOYSA-N 0.000 description 1
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- AYMDJPGTQFHDSA-UHFFFAOYSA-N 1-(2-ethenoxyethoxy)-2-ethoxyethane Chemical compound CCOCCOCCOC=C AYMDJPGTQFHDSA-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical compound CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- PFHOSZAOXCYAGJ-UHFFFAOYSA-N 2-[(2-cyano-4-methoxy-4-methylpentan-2-yl)diazenyl]-4-methoxy-2,4-dimethylpentanenitrile Chemical compound COC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)OC PFHOSZAOXCYAGJ-UHFFFAOYSA-N 0.000 description 1
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 1
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 1
- XKBHBVFIWWDGQX-UHFFFAOYSA-N 2-bromo-3,3,4,4,5,5,5-heptafluoropent-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(Br)=C XKBHBVFIWWDGQX-UHFFFAOYSA-N 0.000 description 1
- SFPNZPQIIAJXGL-UHFFFAOYSA-N 2-ethoxyethyl 2-methylprop-2-enoate Chemical compound CCOCCOC(=O)C(C)=C SFPNZPQIIAJXGL-UHFFFAOYSA-N 0.000 description 1
- FWWXYLGCHHIKNY-UHFFFAOYSA-N 2-ethoxyethyl prop-2-enoate Chemical compound CCOCCOC(=O)C=C FWWXYLGCHHIKNY-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- BIISIZOQPWZPPS-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-ylbenzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1 BIISIZOQPWZPPS-UHFFFAOYSA-N 0.000 description 1
- HTWRFCRQSLVESJ-UHFFFAOYSA-N 3-(2-methylprop-2-enoyloxy)propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCOC(=O)C(C)=C HTWRFCRQSLVESJ-UHFFFAOYSA-N 0.000 description 1
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 description 1
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 1
- GFLJTEHFZZNCTR-UHFFFAOYSA-N 3-prop-2-enoyloxypropyl prop-2-enoate Chemical compound C=CC(=O)OCCCOC(=O)C=C GFLJTEHFZZNCTR-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- SAPGBCWOQLHKKZ-UHFFFAOYSA-N 6-(2-methylprop-2-enoyloxy)hexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCCCOC(=O)C(C)=C SAPGBCWOQLHKKZ-UHFFFAOYSA-N 0.000 description 1
- JTHZUSWLNCPZLX-UHFFFAOYSA-N 6-fluoro-3-methyl-2h-indazole Chemical compound FC1=CC=C2C(C)=NNC2=C1 JTHZUSWLNCPZLX-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- OUZSYEIJTQTXEF-UHFFFAOYSA-N C(C(=C)C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(O)C(C)(C)CO Chemical compound C(C(=C)C)(=O)O.C(C=C)(=O)O.C(C=C)(=O)O.C(O)C(C)(C)CO OUZSYEIJTQTXEF-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 241001611138 Isma Species 0.000 description 1
- KPHXTYILUIVPGL-UHFFFAOYSA-N N(=NC(C#N)(CC(C)(C)OC)C)C(C#N)(CC(C)(OC)C)C.C(C(=C)C)(=O)OCCCCCCCCCCCCCCCC(C)C Chemical compound N(=NC(C#N)(CC(C)(C)OC)C)C(C#N)(CC(C)(OC)C)C.C(C(=C)C)(=O)OCCCCCCCCCCCCCCCC(C)C KPHXTYILUIVPGL-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- IAXXETNIOYFMLW-COPLHBTASA-N [(1s,3s,4s)-4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl] 2-methylprop-2-enoate Chemical compound C1C[C@]2(C)[C@@H](OC(=O)C(=C)C)C[C@H]1C2(C)C IAXXETNIOYFMLW-COPLHBTASA-N 0.000 description 1
- WPMFZXJYQLIHBM-UHFFFAOYSA-N [2-methyl-3-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(C)COC(=O)C(C)=C WPMFZXJYQLIHBM-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- KYIKRXIYLAGAKQ-UHFFFAOYSA-N abcn Chemical compound C1CCCCC1(C#N)N=NC1(C#N)CCCCC1 KYIKRXIYLAGAKQ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- FEKRGEXVMOWHGD-UHFFFAOYSA-N decane;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CCCCCCCCCC FEKRGEXVMOWHGD-UHFFFAOYSA-N 0.000 description 1
- KWWBHCXWSVLTBF-UHFFFAOYSA-N decane;prop-2-enoic acid Chemical compound OC(=O)C=C.CCCCCCCCCC KWWBHCXWSVLTBF-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- CIKJANOSDPPCAU-UHFFFAOYSA-N ditert-butyl cyclohexane-1,4-dicarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1CCC(C(=O)OOC(C)(C)C)CC1 CIKJANOSDPPCAU-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000007602 hot air drying Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229940119545 isobornyl methacrylate Drugs 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000005641 methacryl group Chemical group 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010414 supernatant solution Substances 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- OPQYOFWUFGEMRZ-UHFFFAOYSA-N tert-butyl 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOC(=O)C(C)(C)C OPQYOFWUFGEMRZ-UHFFFAOYSA-N 0.000 description 1
- NMOALOSNPWTWRH-UHFFFAOYSA-N tert-butyl 7,7-dimethyloctaneperoxoate Chemical compound CC(C)(C)CCCCCC(=O)OOC(C)(C)C NMOALOSNPWTWRH-UHFFFAOYSA-N 0.000 description 1
- VEQHTYHLJYNSTG-UHFFFAOYSA-N tert-butyl 9-tert-butylperoxy-9-oxononanoate Chemical compound CC(C)(C)OOC(=O)CCCCCCCC(=O)OC(C)(C)C VEQHTYHLJYNSTG-UHFFFAOYSA-N 0.000 description 1
- SWAXTRYEYUTSAP-UHFFFAOYSA-N tert-butyl ethaneperoxoate Chemical compound CC(=O)OOC(C)(C)C SWAXTRYEYUTSAP-UHFFFAOYSA-N 0.000 description 1
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XOALFFJGWSCQEO-UHFFFAOYSA-N tridecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCOC(=O)C=C XOALFFJGWSCQEO-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Description
本発明は、耐熱性に優れたアクリル系樹脂板の製造方法に関する。 The present invention relates to a method for producing an acrylic resin plate having excellent heat resistance.
アクリル系樹脂板は、その優れた光学特性により、レンズ、自動車部品、照明部品、各種電子ディスプレイ等に使用されている。しかし、アクリル系樹脂板は、高温で加熱処理加工が行われる場合は耐熱性が不十分であるという欠点がある。 Acrylic resin plates are used in lenses, automobile parts, lighting parts, various electronic displays and the like because of their excellent optical properties. However, the acrylic resin plate has a drawback that its heat resistance is insufficient when heat treatment is performed at a high temperature.
アクリル系樹脂板の耐熱性を改良する技術として、メタクリル酸メチルの重合時に多官能モノマーを添加することにより、架橋構造を導入する方法がある。例えば、主に耐熱性と耐衝撃性を改良する目的で、メタクリル酸メチル単独重合体とメタクリル酸メチルとからなる組成物に、アルキレングリコールの多官能(メタ)アクリレートを添加して鋳込重合する方法が提案されている(例えば、特許文献1参照)。しかし、この方法では、通常は十分な耐熱性を得ることができない。この方法で十分な耐熱性を得るためには、多官能(メタ)アクリレートを大量に添加する必要があり、その際は得られる樹脂成形品の外観が悪化する傾向がある。 As a technique for improving the heat resistance of an acrylic resin plate, there is a method of introducing a crosslinked structure by adding a polyfunctional monomer during polymerization of methyl methacrylate. For example, for the purpose of mainly improving heat resistance and impact resistance, cast polymerization is performed by adding a polyfunctional (meth) acrylate of alkylene glycol to a composition comprising a methyl methacrylate homopolymer and methyl methacrylate. A method has been proposed (see, for example, Patent Document 1). However, this method usually does not provide sufficient heat resistance. In order to obtain sufficient heat resistance by this method, it is necessary to add a large amount of polyfunctional (meth) acrylate, and in that case, the appearance of the resulting resin molded product tends to deteriorate.
また、耐熱性や外観を改良する目的で、メタクリル酸メチルと多官能(メタ)アクリレートに、シクロヘキサジエンおよびその誘導体並びにテルペノイド系化合物およびその誘導体のうちの少なくとも一種を添加して鋳込重合する方法が提案されている(例えば、特許文献2参照)。しかし、この方法では、通常は十分な耐熱性を得ることができない。また、得られる樹脂板は吸湿し易いものとなる。 In addition, for the purpose of improving heat resistance and appearance, a method in which at least one of cyclohexadiene and a derivative thereof and a terpenoid compound and a derivative thereof is added to methyl methacrylate and a polyfunctional (meth) acrylate to perform polymerization polymerization. Has been proposed (see, for example, Patent Document 2). However, this method usually does not provide sufficient heat resistance. Moreover, the obtained resin board becomes easy to absorb moisture.
また、耐熱性や外観を改良する目的で、アルキルメタクリレート単量体および(メタ)アクリレート系架橋剤を配合してその一部を重合してなるアルキルメタクリレート系シラップと、架橋剤とからなる組成物を鋳込重合する方法が提案されている(例えば、特許文献3参照)。しかし、この方法では、架橋剤を配合してシラップを調製する際にゲル化が起こり易い。 In addition, for the purpose of improving heat resistance and appearance, a composition comprising an alkyl methacrylate syrup obtained by blending an alkyl methacrylate monomer and a (meth) acrylate crosslinking agent and polymerizing a part thereof, and a crosslinking agent Has been proposed (see, for example, Patent Document 3). However, in this method, gelation tends to occur when a syrup is prepared by blending a crosslinking agent.
また、外観を改良する目的で、架橋剤とアルキルメタクリレート系重合体の比率を一定領域に規定する方法が提案されている(例えば、特許文献4参照)。しかし、ここでは、多官能性単量体が20質量%を超える実施の記載は無く、この方法では通常は十分な耐熱性を得ることができない。さらに、耐熱性が高くかつ外観に優れた樹脂板を得るためには組成上の制約があり、それが工業化する際の支障となる。 In addition, for the purpose of improving the appearance, a method has been proposed in which the ratio between the crosslinking agent and the alkyl methacrylate polymer is defined in a certain region (see, for example, Patent Document 4). However, here, there is no description of implementation in which the polyfunctional monomer exceeds 20% by mass, and this method usually cannot provide sufficient heat resistance. Furthermore, in order to obtain a resin plate having high heat resistance and excellent appearance, there are restrictions on the composition, which becomes a hindrance to industrialization.
また、メチルメタクリレートを主体とする単量体とアリル(メタ)アクリレートとを、10時間半減期温度が75℃を境に高いものと低いものでその差が5℃以上隔たっている少なくとも2種のラジカル重合開始剤を用いて注型重合するアクリル系樹脂板の製造方法が提案されている(例えば、特許文献5参照)。しかし、この方法ではアリル基の重合性が悪く、十分な耐熱性が得られない傾向がある。 In addition, a monomer mainly composed of methyl methacrylate and allyl (meth) acrylate are at least two kinds having a difference of 5 ° C. or more between a high and low 10-hour half-life temperature of 75 ° C. A method for producing an acrylic resin plate that undergoes cast polymerization using a radical polymerization initiator has been proposed (see, for example, Patent Document 5). However, in this method, the allyl group has poor polymerizability, and there is a tendency that sufficient heat resistance cannot be obtained.
さらに、オレフィン性基を有する多官能(メタ)アクリレートを主成分としてラジカル重合する光学材料の製造法が提案されている(例えば、特許文献6、7参照)。この方法では良好な耐熱性、低吸湿性を得ることができるが、オレフィン性基を有する多官能(メタ)アクリレートの重合性が悪いので、得られる樹脂板の残存モノマー量が多いという問題がある。
本発明の目的は、耐熱性に優れ、かつ残存モノマー量が少ないアクリル系樹脂板の製造方法を提供することにある。 An object of the present invention is to provide a method for producing an acrylic resin plate having excellent heat resistance and a small amount of residual monomer.
本発明は、単官能アクリル酸アルキルエステル単量体3〜10質量%と、炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステルを含むモノエチレン性不飽和単量体2〜62質量%と、下記一般式(1)で示される多官能(メタ)アクリレート35〜95質量%とを含む混合物100質量部当たり、10時間半減期温度が80℃以上の重合開始剤0.01〜1質量部と、メルカプト化合物0.01〜0.5質量部とを含有させて重合性混合物とし、該重合性混合物を重合硬化する工程を有するアクリル系樹脂板の製造方法である。 The present invention relates to 3 to 10% by mass of a monofunctional alkyl acrylate monomer and 2 to 62% by mass of a monoethylenically unsaturated monomer containing a methacrylic acid alkyl ester having an alkyl group having 1 to 4 carbon atoms. , 0.01 to 1 part by mass of a polymerization initiator having a 10-hour half-life temperature of 80 ° C or more per 100 parts by mass of a mixture containing 35 to 95% by mass of a polyfunctional (meth) acrylate represented by the following general formula (1) And a mercapto compound in an amount of 0.01 to 0.5 parts by mass to form a polymerizable mixture, and a method for producing an acrylic resin plate having a step of polymerizing and curing the polymerizable mixture.
(式中、R1はHまたはCH3を示す。)。 (Wherein R 1 represents H or CH 3 ).
さらに本発明は、上記製造方法で得られるアクリル系樹脂板の少なくとも一表面上に透明導電性膜を形成するアクリル系樹脂積層体の製造方法である。 Furthermore, this invention is a manufacturing method of the acrylic resin laminated body which forms a transparent conductive film on at least one surface of the acrylic resin board obtained by the said manufacturing method.
本発明のアクリル系樹脂板の製造方法においては、特定の組成を採用しているので、アクリル系樹脂の優れた光学特性を維持したまま、耐熱性および残存モノマー量について大きく改善できる。特に、この製造方法で得られるアクリル系樹脂板は、その上にITO膜等の透明導電膜を形成したアクリル系樹脂積層体として非常に有用である。 In the method for producing an acrylic resin plate of the present invention, since a specific composition is adopted, the heat resistance and the residual monomer amount can be greatly improved while maintaining the excellent optical properties of the acrylic resin. In particular, the acrylic resin plate obtained by this production method is very useful as an acrylic resin laminate in which a transparent conductive film such as an ITO film is formed thereon.
<アクリル系樹脂板>
本発明のアクリル系樹脂板の製造方法は、単官能アクリル酸アルキルエステル単量体3〜10質量%と、炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステルを含むモノエチレン性不飽和単量体2〜62質量%と、前記一般式(1)で示される多官能(メタ)アクリレート35〜95質量%とを含む混合物100質量部当たり、10時間半減期温度が80℃以上の重合開始剤0.01〜1質量部と、メルカプト化合物0.01〜0.5質量部とを含有させて重合性混合物とし、該重合性混合物を重合硬化する工程を有する。
<Acrylic resin plate>
The method for producing an acrylic resin plate of the present invention comprises a monoethylenically unsaturated monomer comprising 3 to 10% by mass of a monofunctional alkyl acrylate monomer and a methacrylic acid alkyl ester having an alkyl group having 1 to 4 carbon atoms. Start of polymerization with a 10-hour half-life temperature of 80 ° C. or more per 100 parts by mass of a mixture containing 2 to 62% by mass of the monomer and 35 to 95% by mass of the polyfunctional (meth) acrylate represented by the general formula (1) A step of containing 0.01 to 1 part by mass of an agent and 0.01 to 0.5 part by mass of a mercapto compound to form a polymerizable mixture and polymerizing and curing the polymerizable mixture is included.
単官能アクリル酸アルキルエステル単量体の含有量は、混合物中、3〜10質量%である。この含有量が3質量%以上であると残存モノマー量が減少し、10質量%以下であると耐熱性が向上する傾向がある。さらにこの含有量は、5〜10質量%であることが好ましい。 Content of a monofunctional alkyl acrylate monomer is 3 to 10% by mass in the mixture. When this content is 3% by mass or more, the amount of residual monomer is reduced, and when it is 10% by mass or less, heat resistance tends to be improved. Furthermore, this content is preferably 5 to 10% by mass.
単官能アクリル酸アルキルエステル単量体は、炭素数1〜4のアルキル基を有するアクリル酸アルキルエステルであることが好ましい。炭素数1〜4のアルキル基を有するアクリル酸アルキルエステルとしては、例えば、アクリル酸メチル、アクリル酸エチル、アクリル酸n−プロピル、アクリル酸イソプロピル、アクリル酸n−ブチル、アクリル酸i−ブチル、アクリル酸t−ブチル等が挙げられる。これらは併用することもできる。中でも、アクリル酸メチルが特に好ましい。 The monofunctional alkyl acrylate monomer is preferably an alkyl acrylate having an alkyl group having 1 to 4 carbon atoms. Examples of the alkyl acrylate ester having an alkyl group having 1 to 4 carbon atoms include methyl acrylate, ethyl acrylate, n-propyl acrylate, isopropyl acrylate, n-butyl acrylate, i-butyl acrylate, and acrylic. Examples include t-butyl acid. These can also be used in combination. Of these, methyl acrylate is particularly preferable.
炭素数1〜4のアルキル基を有するアクリル酸アルキルエステル以外の単官能アクリル酸アルキルエステル単量体としては、例えば、アクリル酸2−エチルヘキシル、アクリル酸ラウリル、アクリル酸トリデシル、アクリル酸ステアリル、アクリル酸イソステアリル、アクリル酸シクロヘキシル、アクリル酸ベンジル、アクリル酸イソボルニル、アクリル酸グリシジル、アクリル酸テトラヒドロフルフリル、アクリル酸2−ヒドロキシエチル、アクリル酸ヒドロキシプロピル、アクリル酸メトキシエチル、アクリル酸エトキシエチル等が挙げられる。これらは併用することもできる。 Examples of monofunctional alkyl acrylate monomers other than alkyl acrylate having an alkyl group having 1 to 4 carbon atoms include, for example, 2-ethylhexyl acrylate, lauryl acrylate, tridecyl acrylate, stearyl acrylate, acrylic acid Examples include isostearyl, cyclohexyl acrylate, benzyl acrylate, isobornyl acrylate, glycidyl acrylate, tetrahydrofurfuryl acrylate, 2-hydroxyethyl acrylate, hydroxypropyl acrylate, methoxyethyl acrylate, and ethoxyethyl acrylate. . These can also be used in combination.
炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステルを含むモノエチレン性不飽和単量体の含有量は、混合物中、2〜62質量%である。この含有量が2質量%以上であると外観が向上し、62質量%以下であると耐熱性が向上する傾向がある。さらにこの含有量は、5〜50質量%であることが好ましく、10〜45質量%であることがより好ましい。また、炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステルを含むモノエチレン性不飽和単量体の総量を100質量部とした場合、炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステルの割合は50質量部以上であることが好ましく、それ以外のモノエチレン性不飽和単量体の割合は50質量部以下であることが好ましい。この割合にすると、透明性が向上する傾向があり、また耐熱性がより向上することがある。 Content of the monoethylenically unsaturated monomer containing the methacrylic acid alkyl ester which has a C1-C4 alkyl group is 2-62 mass% in a mixture. When the content is 2% by mass or more, the appearance is improved, and when it is 62% by mass or less, the heat resistance tends to be improved. Further, the content is preferably 5 to 50% by mass, and more preferably 10 to 45% by mass. Moreover, when the total amount of the monoethylenically unsaturated monomer containing the methacrylic acid alkyl ester which has a C1-C4 alkyl group is 100 mass parts, the methacrylic acid alkyl ester which has a C1-C4 alkyl group Is preferably 50 parts by mass or more, and the ratio of other monoethylenically unsaturated monomers is preferably 50 parts by mass or less. When the ratio is set, transparency tends to be improved, and heat resistance may be further improved.
炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステルとしては、例えば、メタクリル酸メチル、メタクリル酸エチル、メタクリル酸n−プロピル、メタクリル酸イソプロピル、メタクリル酸n−ブチル、メタクリル酸i−ブチル、メタクリル酸t−ブチル等が挙げられる。これらは併用することもできる。中でも、メタクリル酸メチルが特に好ましい。 Examples of the alkyl methacrylate having an alkyl group having 1 to 4 carbon atoms include methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, i-butyl methacrylate, and methacrylic acid. Examples include t-butyl acid. These can also be used in combination. Of these, methyl methacrylate is particularly preferred.
炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステル以外のモノエチレン性不飽和単量体としては、単官能アクリル酸アルキルエステル単量体以外の各種のものを挙げることができる。例えば、スチレン、α−メチルスチレン、アクリロニトリル、メタクリル酸、メタクリル酸2−エチルヘキシル、メタクリル酸ラウリル、メタクリル酸トリデシル、メタクリル酸ステアリル、メタクリル酸イソステアリル、メタクリル酸シクロヘキシル、メタクリル酸ベンジル、メタクリル酸イソボルニル、メタクリル酸グリシジル、メタクリル酸テトラヒドロフルフリル、メタクリル酸2−ヒドロキシエチル、メタクリル酸ヒドロキシプロピル、メタクリル酸メトキシエチル、メタクリル酸エトキシエチル等が挙げられる。これらは併用することもできる。中でも、メタクリル酸2−エチルヘキシル、メタクリル酸ラウリル、メタクリル酸トリデシル、メタクリル酸ステアリル、メタクリル酸イソステアリル等の炭素数8〜20のアルキル基を有するメタクリル酸アルキルが、吸水率低下の点から好ましい。 Examples of the monoethylenically unsaturated monomer other than the methacrylic acid alkyl ester having an alkyl group having 1 to 4 carbon atoms include those other than the monofunctional alkyl acrylate monomer. For example, styrene, α-methylstyrene, acrylonitrile, methacrylic acid, 2-ethylhexyl methacrylate, lauryl methacrylate, tridecyl methacrylate, stearyl methacrylate, isostearyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, isobornyl methacrylate, methacryl Examples include glycidyl acid, tetrahydrofurfuryl methacrylate, 2-hydroxyethyl methacrylate, hydroxypropyl methacrylate, methoxyethyl methacrylate, ethoxyethyl methacrylate, and the like. These can also be used in combination. Among them, alkyl methacrylate having an alkyl group having 8 to 20 carbon atoms such as 2-ethylhexyl methacrylate, lauryl methacrylate, tridecyl methacrylate, stearyl methacrylate, and isostearyl methacrylate is preferable from the viewpoint of a decrease in water absorption.
前記一般式(1)で示される多官能(メタ)アクリレートの含有量は、混合物中、35〜95質量%である。この含有量が35質量%以上であると耐熱性が向上し、95質量%以下であると外観が良好になる傾向がある。この含有量は、45〜90質量%であることが好ましく、50〜85質量%であることがより好ましい。 Content of the polyfunctional (meth) acrylate shown by the said General formula (1) is 35-95 mass% in a mixture. When this content is 35% by mass or more, the heat resistance is improved, and when it is 95% by mass or less, the appearance tends to be good. This content is preferably 45 to 90% by mass, and more preferably 50 to 85% by mass.
この一般式(1)で示される化合物としては、例えば、ビス(オキシメチル)トリシクロ[5,2,1,02,6]デカンジアクリレート、ビス(オキシメチル)トリシクロ[5,2,1,02,6]デカンジメタクリレートが挙げられる。これらは併用することもできる。 The compound represented by the general formula (1), for example, bis (oxymethyl) tricyclo [5,2,1,0 2,6] decane acrylate, bis (oxymethyl) tricyclo [5, 2, 1, 0 2,6 ] decanedimethacrylate. These can also be used in combination.
また、必要に応じてその他の多官能(メタ)アクリレートを併用することもできる。その具体例としては、エチレングリコールジメタクリレート、エチレングリコールジアクリレート、1,3−プロパンジオールジメタクリレート、1,3−プロパンジオールジアクリレート、1,4−ブチレングリコールジメタクリレート、1,4−ブチレングリコールジアクリレート、1,6−ヘキサンジオールジメタクリレート、1,6−ヘキサンジオールジアクリレート、2−メチル−1,3−プロパンジオールジメタクリレート、2−メチル−1,3−プロパンジオールジアクリレート、ネオペンチルグリコールジメタクリレート、ネオペンチルグリコールジアクリレート、2,2'−ジメチル−1,4−ブタンジオールジメタクリレート、2,2'−ジメチル−1,4−ブタンジオールジアクリレート、トリメチロールプロパントリメタクリレート、トリメチロールプロパントリアクリレート、ペンタエリスリトールテトラメタクリレート、ペンタエリスリトールテトラアクリレート、ジトリメチロールプロパンヘキサメタクリレート、ジトリメチロールプロパンヘキサアクリレート、ジペンタエリスリトールヘキサメタクリレート、ジペンタエリスリトールヘキサアクリレート等が挙げられる。上述したその他の多官能(メタ)アクリレートは、必要に応じて2種類以上を併用することもできる。その他の多官能(メタ)アクリレートの量は、混合物中15質量%以下であることが好ましく、10質量%以下であることがさらに好ましい。15質量%以下であると、低吸湿性が向上する傾向があり、また外観が向上することがある。 Moreover, other polyfunctional (meth) acrylate can also be used together as needed. Specific examples thereof include ethylene glycol dimethacrylate, ethylene glycol diacrylate, 1,3-propanediol dimethacrylate, 1,3-propanediol diacrylate, 1,4-butylene glycol dimethacrylate, and 1,4-butylene glycol diacrylate. Acrylate, 1,6-hexanediol dimethacrylate, 1,6-hexanediol diacrylate, 2-methyl-1,3-propanediol dimethacrylate, 2-methyl-1,3-propanediol diacrylate, neopentyl glycol diacrylate Methacrylate, neopentyl glycol diacrylate, 2,2′-dimethyl-1,4-butanediol dimethacrylate, 2,2′-dimethyl-1,4-butanediol diacrylate, trimethylolpropane trimethacrylate, Trimethylolpropane triacrylate, pentaerythritol tetramethacrylate, pentaerythritol tetraacrylate, ditrimethylolpropane hexa methacrylate, ditrimethylolpropane hexaacrylate, dipentaerythritol hexamethacrylate, dipentaerythritol hexaacrylate, and the like. Two or more kinds of the other polyfunctional (meth) acrylates described above may be used in combination as necessary. The amount of the other polyfunctional (meth) acrylate is preferably 15% by mass or less in the mixture, and more preferably 10% by mass or less. If it is 15% by mass or less, the low hygroscopicity tends to be improved, and the appearance may be improved.
本発明においては、上述した各単量体を主成分として含む混合物100質量部当たり、10時間半減期温度が80℃以上の重合開始剤0.01〜1質量部と、メルカプト化合物0.01〜0.5質量部とを含有させて重合性混合物とする。 In the present invention, 0.01 to 1 part by weight of a polymerization initiator having a 10-hour half-life temperature of 80 ° C. or more per 100 parts by weight of a mixture containing the above-mentioned monomers as main components, and a mercapto compound 0.01 to 0.5 parts by mass is added to obtain a polymerizable mixture.
10時間半減期温度が80℃以上の重合開始剤としては、例えば、1,1'−アゾビス(シクロヘキサン−1−カルボニトリル)(10時間半減期温度88℃)、2,2'−アゾビス(2,4,4−トリメチルペンテン)(10時間半減期温度110℃)、2−シアノ−2−プロピラゾホルムアミド(10時間半減期温度104℃)、ジクミルパーオキサイド(10時間半減期温度117℃)、t−ブチルクミルパーオキサイド(10時間半減期温度121℃)、ジ−t−ブチルパーオキサイド(10時間半減期温度126℃)、t−ブチルパーオキシ−3,3,5−トリメチルヘキサノエート(10時間半減期温度100℃)、t−ブチルパーオキシラウレート(10時間半減期温度95℃)、t−ブチルパーオキシアセテート(10時間半減期温度103℃)、ジ−t−ブチルパーオキシヘキサヒドロテレフタレート(10時間半減期温度83℃)、ジ−t−ブチルパーオキシアゼレート(10時間半減期温度99℃)、t−ブチルパーオキシアリルカーボネート(10時間半減期温度94℃)、t−ブチルパーオキシイソプロピルカーボネート(10時間半減期温度97℃)、1,1−ジ−t−ブチルパーオキシシクロヘキサン(10時間半減期温度97℃)、t−ヘキシルパーオキシイソプロピルモノカーボネート(10時間半減温度95℃)、1,1−ジ−t−ブチルパーオキシ−3,3,5−トリメチルシクロヘキサン(10時間半減期温度95℃)、1,1−ジ−t−ヘキシルパーオキシ−3,3,5−トリメチルシクロヘキサン(10時間半減期温度87℃)等が挙げられる。これらは併用することもできる。10時間半減期温度の上限は、130℃であることが好ましい。 Examples of the polymerization initiator having a 10-hour half-life temperature of 80 ° C. or more include 1,1′-azobis (cyclohexane-1-carbonitrile) (10-hour half-life temperature 88 ° C.), 2,2′-azobis (2 , 4,4-trimethylpentene) (10-hour half-life temperature 110 ° C.), 2-cyano-2-propyrazoformamide (10-hour half-life temperature 104 ° C.), dicumyl peroxide (10-hour half-life temperature 117 ° C.) T-butylcumyl peroxide (10-hour half-life temperature 121 ° C.), di-t-butyl peroxide (10-hour half-life temperature 126 ° C.), t-butyl peroxy-3,3,5-trimethylhexanoate (10-hour half-life temperature 100 ° C.), t-butyl peroxylaurate (10-hour half-life temperature 95 ° C.), t-butyl peroxyacetate (10-hour half-life temperature 03 ° C.), di-t-butylperoxyhexahydroterephthalate (10-hour half-life temperature 83 ° C.), di-t-butyl peroxyazelate (10-hour half-life temperature 99 ° C.), t-butyl peroxyallyl carbonate (10-hour half-life temperature 94 ° C), t-butyl peroxyisopropyl carbonate (10-hour half-life temperature 97 ° C), 1,1-di-t-butylperoxycyclohexane (10-hour half-life temperature 97 ° C), t -Hexylperoxyisopropyl monocarbonate (10 hour half-life temperature 95 ° C), 1,1-di-t-butylperoxy-3,3,5-trimethylcyclohexane (10 hour half-life temperature 95 ° C), 1,1- And di-t-hexylperoxy-3,3,5-trimethylcyclohexane (10 hour half-life temperature 87 ° C.). These can also be used in combination. The upper limit of the 10-hour half-life temperature is preferably 130 ° C.
10時間半減期温度が80℃以上の重合開始剤の添加量は、混合物100質量部当たり、0.01〜1質量部である。この添加量が0.01質量部以上であると、耐熱性が向上し、残存モノマー量が減少する傾向がある。また、1質量部以下であると残存開始剤が減少し熱安定性が良好になる傾向がある。さらに、この添加量は0.02〜0.5質量部であることが好ましい。 The addition amount of the polymerization initiator having a 10-hour half-life temperature of 80 ° C. or more is 0.01 to 1 part by mass per 100 parts by mass of the mixture. When the addition amount is 0.01 parts by mass or more, the heat resistance is improved and the residual monomer amount tends to decrease. Moreover, there exists a tendency for a residual initiator to reduce that it is 1 mass part or less, and for heat stability to become favorable. Furthermore, this addition amount is preferably 0.02 to 0.5 parts by mass.
また、このような重合開始剤と共に、10時間半減期温度が80℃未満の重合開始剤を併用することもできる。10時間半減期温度が80℃未満の重合開始剤としては、例えば、t−ブチルパーオキシイソブチレート(10時間半減期温度77℃)、t−ブチルパーオキシ−2−エチルヘキサノエート(10時間半減期温度72℃)、t−ブチルパーオキシピバレート(10時間半減期温度55℃)、t−ヘキシルパーオキシピバレート(10時間半減期温度53℃)、t−ブチルパーオキシネオデカノエート(10時間半減期温度47℃)、2,2'−アゾビスイソブチロニトリル(10時間半減期温度65℃)、2,2'−アゾビス(2,4−ジメチルバレロニトリル)(10時間半減期温度51℃)、2,2'−アゾビス(2,4−ジメチル−4−メトキシバレロニトリル)(10時間半減期温度30℃)等が挙げられる。これらは併用することもできる。 A polymerization initiator having a 10-hour half-life temperature of less than 80 ° C. can be used in combination with such a polymerization initiator. Examples of the polymerization initiator having a 10-hour half-life temperature of less than 80 ° C. include t-butyl peroxyisobutyrate (10-hour half-life temperature 77 ° C.), t-butyl peroxy-2-ethylhexanoate (10 Time half-life temperature 72 ° C), t-butyl peroxypivalate (10-hour half-life temperature 55 ° C), t-hexyl peroxypivalate (10-hour half-life temperature 53 ° C), t-butylperoxyneodecano Ate (10-hour half-life temperature 47 ° C.), 2,2′-azobisisobutyronitrile (10-hour half-life temperature 65 ° C.), 2,2′-azobis (2,4-dimethylvaleronitrile) (10 hours And a 2,2′-azobis (2,4-dimethyl-4-methoxyvaleronitrile) (10 hour half-life temperature 30 ° C.). These can also be used in combination.
メルカプト化合物としては、例えば、t−ブチルメルカプタン、n−ブチルメルカプタン、n−オクチルメルカプタン、t−ドデシルメルカプタン、n−ドデシルメルカプタン等が挙げられる。 Examples of the mercapto compound include t-butyl mercaptan, n-butyl mercaptan, n-octyl mercaptan, t-dodecyl mercaptan, n-dodecyl mercaptan, and the like.
メルカプト化合物の添加量は、混合物100質量部当たり、0.01〜0.5質量部である。この添加量が0.01質量部以上であると残存モノマー量が減少し、0.5質量部以下であると耐熱性が向上する傾向がある。さらに、この添加量は0.03〜0.3質量部であることが好ましい。 The addition amount of a mercapto compound is 0.01-0.5 mass part per 100 mass parts of mixtures. When the added amount is 0.01 parts by mass or more, the amount of residual monomers decreases, and when it is 0.5 parts by mass or less, the heat resistance tends to be improved. Furthermore, this addition amount is preferably 0.03 to 0.3 parts by mass.
重合性混合物は、上述した各成分を主成分として含むものであるが、必要に応じて、さらに着色剤、離型剤、酸化防止剤、安定剤、帯電防止剤、抗菌剤、難燃剤、耐衝撃改質剤、光安定剤、紫外線吸収剤、光拡散剤、重合禁止剤、テルピノレン等の重合調節剤等を添加することができる。 The polymerizable mixture contains the above-described components as main components, but if necessary, a colorant, a release agent, an antioxidant, a stabilizer, an antistatic agent, an antibacterial agent, a flame retardant, and an impact resistance modifier. A quality control agent, a light stabilizer, an ultraviolet absorber, a light diffusing agent, a polymerization inhibitor, a polymerization regulator such as terpinolene, and the like can be added.
以上説明した重合性混合物を重合硬化することにより、アクリル系樹脂板を得ることができる。重合性混合物の重合硬化方法としては、従来より知られる各種の方法を用いることができる。特に、鋳型に重合性混合物を注入し、重合硬化して、鋳型から剥離する、いわゆる鋳込重合法が好ましい。以下に、単官能アクリル酸アルキルエステル単量体としてアクリル酸メチル、炭素数1〜4のアルキル基を有するメタクリル酸アルキルエステルとしてメタクリル酸メチルを使用する鋳込重合の方法を例示する。ただし、本発明はこれに限定されない。 An acrylic resin plate can be obtained by polymerizing and curing the polymerizable mixture described above. Various conventionally known methods can be used as a polymerization and curing method for the polymerizable mixture. Particularly preferred is a so-called casting polymerization method in which a polymerizable mixture is injected into a mold, polymerized and cured, and then peeled off from the mold. Below, the method of casting polymerization which uses methyl acrylate as a monofunctional alkyl acrylate monomer and methyl methacrylate as a methacrylic acid alkyl ester which has a C1-C4 alkyl group is illustrated. However, the present invention is not limited to this.
まず、アクリル酸メチル、メタクリル酸メチル、ビス(オキシメチル)トリシクロ[5,2,1,02,6]デカンジ(メタ)アクリレート、さらに必要に応じて共重合可能な他のモノエチレン性不飽和単量体を吸引瓶中に仕込み、攪拌して混合物とする。その混合物に、重合開始剤、メルカプト化合物、必要に応じて重合調節剤を添加し、真空脱気を行って、重合性混合物とする。この重合性混合物を、一対の強化ガラスシートにガスケットを挟んで構成された鋳型に注入し、加熱炉に入れて40〜70℃で2〜5時間、100〜150℃で1〜6時間重合硬化を行い、鋳型から剥離して、アクリル系樹脂板を得ることができる。 First, methyl acrylate, methyl methacrylate, bis (oxymethyl) tricyclo [5,2,1,0 2,6] Dekanji (meth) acrylate, further copolymerizable other monoethylenically unsaturated optionally The monomer is charged into a suction bottle and stirred to obtain a mixture. A polymerization initiator, a mercapto compound, and a polymerization regulator as necessary are added to the mixture, and vacuum deaeration is performed to obtain a polymerizable mixture. This polymerizable mixture is poured into a mold constituted by sandwiching a gasket between a pair of tempered glass sheets, placed in a heating furnace and polymerized and cured at 40 to 70 ° C. for 2 to 5 hours, and at 100 to 150 ° C. for 1 to 6 hours. And peeling from the mold to obtain an acrylic resin plate.
この強化ガラスシートに代えて、例えば、鏡面SUSシート、表面に細かな凹凸を付けたガラスシート、対向して走行する鏡面SUS製のエンドレスベルト等を鋳型として使用することもできる。また、重合温度、時間は、所望に応じて適宜選択すればよい。 Instead of this tempered glass sheet, for example, a mirror surface SUS sheet, a glass sheet with fine irregularities on the surface, an endless belt made of mirror surface SUS that runs oppositely can be used as a mold. Further, the polymerization temperature and time may be appropriately selected as desired.
アクリル系樹脂板の板厚は、0.5〜5mmであることが好ましい。板厚が0.5mm以上であると、塊状重合により製板する場合、アクリル系樹脂板を鋳型から剥離させる時に割れが発生し難くなる傾向がある。また、5mm以下であると、重合時に板割れし難くなる傾向がある。 The thickness of the acrylic resin plate is preferably 0.5 to 5 mm. When the plate thickness is 0.5 mm or more, when the plate is produced by bulk polymerization, cracks tend not to occur when the acrylic resin plate is peeled from the mold. Moreover, when it is 5 mm or less, there is a tendency that it is difficult to break the plate during polymerization.
本発明で得られるアクリル系樹脂板は、アクリル系樹脂の優れた光学特性を維持したまま、耐熱性、残存モノマー量が大きく改良されたものである。このようなアクリル系樹脂板は、例えば、白熱灯カバー、ハロゲンランプカバー等の発熱光源の周辺材料、衣類乾燥機、電子レンジ、オーブン等の加熱家電機器の部品、眼鏡レンズ、サングラスレンズ、カメラ用レンズ、ビデオカメラ用レンズ、ゴーグル用レンズ、コンタクトレンズ等の光学レンズ、メーターカバー等の車載部品、車載用のオーディオ機器部品、車載用のディスプレイ装置部品、車載用ナビゲーションシステム部品等の車載材料に、さらには、プラズマディスプレイ装置、液晶ディスプレイ装置、プロジェクション式ディスプレイ装置等の各種ディスプレイ装置の前面板、液晶ディスプレイの光導光板等の各種ディスプレイ部材に用いることができる。 The acrylic resin plate obtained by the present invention is greatly improved in heat resistance and residual monomer amount while maintaining the excellent optical properties of the acrylic resin. Such acrylic resin plates are, for example, peripheral materials for exothermic light sources such as incandescent lamp covers and halogen lamp covers, parts of heating household appliances such as clothes dryers, microwave ovens, ovens, eyeglass lenses, sunglasses lenses, and cameras. In-vehicle materials such as lenses, video camera lenses, goggles lenses, contact lenses and other optical lenses, meter covers and other in-vehicle parts, in-vehicle audio equipment parts, in-vehicle display device parts, in-vehicle navigation system parts, Furthermore, it can be used for various display members such as a front plate of various display devices such as a plasma display device, a liquid crystal display device, and a projection display device, and a light guide plate of a liquid crystal display.
<透明導電性膜>
本発明で得られるアクリル系樹脂板は、その少なくとも一表面上に透明導電性膜を形成して、アクリル系樹脂積層体とすることができる。この透明導電性膜としては、透明かつ導電性の薄膜であればよい。例えば、無機薄膜や有機高分子薄膜を使用できる。
<Transparent conductive film>
The acrylic resin plate obtained in the present invention can be formed into an acrylic resin laminate by forming a transparent conductive film on at least one surface thereof. The transparent conductive film may be a transparent and conductive thin film. For example, an inorganic thin film or an organic polymer thin film can be used.
無機薄膜の材料としては、例えば、酸化錫、酸化インジウム、ITO(錫添加酸化インジウム)等の透明金属酸化物が挙げられる。中でも、ITOが好ましい。また、有機高分子薄膜の材料としては、ポリイソチアナフテン等が挙げられる。 Examples of the material for the inorganic thin film include transparent metal oxides such as tin oxide, indium oxide, and ITO (tin-added indium oxide). Of these, ITO is preferable. Examples of the material for the organic polymer thin film include polyisothianaphthene.
アクリル系樹脂板の上に透明導電性膜を成膜する方法としては、従来より知られる各種の成膜法を使用できる。成膜法の例としては、真空蒸着法、スパッタリング法、CVD法、イオンプレーティング法等の真空成膜法が挙げられる。 As a method for forming a transparent conductive film on an acrylic resin plate, various conventionally known film forming methods can be used. Examples of film forming methods include vacuum film forming methods such as vacuum deposition, sputtering, CVD, and ion plating.
ここで、ITO薄膜のスパッタリング法による成膜の具体例を説明する。まず、洗浄工程において純水またはアルカリ水で透明基板を洗浄し、大気中で120℃以上、好ましくは120〜150℃の温度で1〜4時間乾燥する。そして、真空下、100〜150℃、好ましくは120〜150℃の温度においてITOのスパッタリング処理を施す。タッチパネル用透明電極板として利用する場合、透明導電性膜の厚さは、10〜50nmが好ましく、25〜40nmがより好ましい。これら範囲内の厚さを採用すれば、ガラス基板を使用したタッチパネル用透明電極板と比べて、軽量化、薄肉化を図ることができる。 Here, a specific example of film formation by sputtering of an ITO thin film will be described. First, in the cleaning step, the transparent substrate is washed with pure water or alkaline water and dried in the atmosphere at a temperature of 120 ° C. or higher, preferably 120 to 150 ° C. for 1 to 4 hours. Then, ITO is sputtered at a temperature of 100 to 150 ° C., preferably 120 to 150 ° C. under vacuum. When used as a transparent electrode plate for a touch panel, the thickness of the transparent conductive film is preferably 10 to 50 nm, and more preferably 25 to 40 nm. If the thickness within these ranges is adopted, it is possible to reduce the weight and thickness as compared with the transparent electrode plate for a touch panel using a glass substrate.
アクリル系樹脂板上の少なくとも一表面上にITO等の透明導電膜を形成したアクリル系樹脂積層体は、透明導電材の用途に利用可能である。例えば、コンデンサ、抵抗体等の電気部品回路材料、電子写真や静電記録等の複写用材料、液晶ディスプレイ用、エレクトロクロミックディスプレイ用、エレクトロルミネッセンスディスプレイ用、タッチパネル用等の信号入力用透明電極、太陽電池、光増幅器等の光電変換素子に、その他、帯電防止用部材、電磁波遮蔽用部材、面発熱体、センサー等の各種用途に用いることができる。中でも、タッチパネル用透明電極板として利用することが好ましい。 An acrylic resin laminate in which a transparent conductive film such as ITO is formed on at least one surface on an acrylic resin plate can be used for applications of transparent conductive materials. For example, electrical component circuit materials such as capacitors and resistors, copying materials such as electrophotography and electrostatic recording, transparent electrodes for signal input for liquid crystal displays, electrochromic displays, electroluminescence displays, touch panels, etc. In addition to photoelectric conversion elements such as batteries and optical amplifiers, it can be used for various applications such as antistatic members, electromagnetic wave shielding members, surface heating elements, and sensors. Especially, it is preferable to utilize as a transparent electrode plate for touch panels.
以下、実施例により本発明を更に具体的に説明する。なお、以下の記載において「部」は質量基準である。また、表中の各評価は次の方法に従い実施した。 Hereinafter, the present invention will be described more specifically with reference to examples. In the following description, “part” is based on mass. Each evaluation in the table was performed according to the following method.
(1)アクリル系樹脂板の評価:
(1−1)荷重たわみ温度:
アクリル系樹脂板の耐熱性を評価する為に、JIS−K7207に示される測定法に準拠して、荷重たわみ温度を測定した。
(1) Evaluation of acrylic resin plate:
(1-1) Deflection temperature under load:
In order to evaluate the heat resistance of the acrylic resin plate, the deflection temperature under load was measured according to the measurement method shown in JIS-K7207.
(1−2)ヘーズ:
アクリル系樹脂板の光学特性を評価する為に、JIS−K7136に示される測定法に準拠して、ヘーズを測定した。
(1-2) Haze:
In order to evaluate the optical characteristics of the acrylic resin plate, haze was measured in accordance with the measurement method shown in JIS-K7136.
(1−3)残存モノマー量:
アクリル系樹脂板中のビス(オキシメチル)トリシクロ[5,2,1,02,6]デカンジ(メタ)アクリレートの残存モノマー量を評価する為に、ニッパーを用いてペレット状に粉砕したサンプル0.1gを塩化メチレン20ml中に添加し、23℃で4日間静置し、上澄み溶液をガスクロマトグラフに注入して、その残存モノマー量を測定した。ガスクロマトグラフの測定条件を以下に示す。
・装置:ヒューレットパッカード社製HP6890
・データ処理装置:HPケミステーション
・使用カラム:HP−5 0.32mmφ×30m×0.25μm膜厚
・カラム温度条件:40℃/1min保持→290℃/3min保持、20℃/min昇温
・INJ温度:280℃
・キャリアーガス(He)流量:20.0ml/min。
(1-3) Residual monomer amount:
To evaluate the bis acrylic resin plate in (oxymethyl) tricyclo [5,2,1,0 2,6] Dekanji (meth) amount of residual monomer of acrylate, sample 0 was pulverized into pellets with a nipper .1 g was added to 20 ml of methylene chloride, allowed to stand at 23 ° C. for 4 days, the supernatant solution was injected into a gas chromatograph, and the amount of residual monomer was measured. The measurement conditions of the gas chromatograph are shown below.
Apparatus: HP6890 manufactured by Hewlett-Packard Company
Data processor: HP ChemStation Column used: HP-5 0.32 mmφ × 30 m × 0.25 μm film thickness Column temperature conditions: 40 ° C./1 min hold → 290 ° C./3 min hold, 20 ° C./min temperature rise INJ temperature: 280 ° C
Carrier gas (He) flow rate: 20.0 ml / min.
(1−4)外観:
アクリル系樹脂板の外観を評価する為に、サンプルを10枚作製し、目視により白化、ヒケ等の欠陥の無いサンプル数をn/10で示した。
(1-4) Appearance:
In order to evaluate the appearance of the acrylic resin plate, ten samples were prepared, and the number of samples free from defects such as whitening and sink marks was visually indicated as n / 10.
(2)アクリル系樹脂積層体の評価:
(2−1)全光線透過率:
アクリル系樹脂積層体の透明性を評価する為に、JIS−K7361に示される測定法に準拠して、全光線透過率を測定した。
(2) Evaluation of acrylic resin laminate:
(2-1) Total light transmittance:
In order to evaluate the transparency of the acrylic resin laminate, the total light transmittance was measured based on the measurement method described in JIS-K7361.
(2−2)基板の変形:
アクリル系樹脂板(基板)の変形の有無について、透明導電性膜(ITO)を成膜する前の基板の乾燥、次いでスパッタリング法による成膜という一連の製造工程において肉眼で観察し、アクリル系樹脂板に変形が無い場合は「○」(良好)と評価し、変形が生じた場合は「×」(不良)と評価した。
(2-2) Deformation of substrate:
Whether or not the acrylic resin plate (substrate) is deformed is observed with the naked eye in a series of manufacturing processes of drying the substrate before forming the transparent conductive film (ITO) and then forming the film by sputtering. When there was no deformation in the plate, it was evaluated as “◯” (good), and when the deformation occurred, it was evaluated as “x” (bad).
(2−3)ITOの状態:
透明導電性膜(ITO)の状態について、スパッタリング法による成膜工程を観察し、光学的な歪みやクラック等が認められない場合は「○」(良好)と評価し、光学的な歪みやクラックが認められる場合は「×」(不良)と評価した。
(2-3) ITO state:
Regarding the state of the transparent conductive film (ITO), observe the film forming process by sputtering method, and if no optical distortion or crack is observed, evaluate it as “Good” (good) and optical distortion or crack Was evaluated as “x” (defect).
(2−4)表面抵抗率:
透明導電性膜の表面抵抗率を、四端子法により測定した。
(2-4) Surface resistivity:
The surface resistivity of the transparent conductive film was measured by the four probe method.
(2−5)密着性:
カッターを使用して、透明導電性膜(ITO)に1mm間隔で縦・横11本ずつ格子状に、樹脂基板まで達するように傷を入れ、1×1mmの升目100個を作製した。この升目の上に粘着テープ(ニチバン製、商品名セロハンテープ)をよく密着させ、45°手前方向に急激に剥した。このとき、透明導電性膜が剥離せずに残存した升目の数(n)をn/100として表示した。nの値は、具体的には、96個以上であることが好ましく、100個であることがより好ましい。nの値が大きい程、透明導電性膜の密着性が高いといえる。
(2-5) Adhesiveness:
Using a cutter, scratches were made on the transparent conductive film (ITO) in a grid pattern of 11 pieces in the vertical and horizontal directions at intervals of 1 mm so as to reach the resin substrate, and 100 squares of 1 × 1 mm were produced. An adhesive tape (manufactured by Nichiban, product name cellophane tape) was closely adhered on the mesh, and was peeled off in a 45 ° front direction. At this time, the number (n) of the cells remaining without peeling off the transparent conductive film was indicated as n / 100. Specifically, the value of n is preferably 96 or more, and more preferably 100. It can be said that the larger the value of n, the higher the adhesion of the transparent conductive film.
<アクリル系樹脂板の製造>
[実施例1]
アクリル酸メチル7部と、メタクリル酸メチル10部と、ビス(オキシメチル)トリシクロ[5,2,1,02,6]デカンジメタクリレート80部と、メタクリル酸イソステアリル3部の混合物100部当たり、重合開始剤として2,2'−アゾビス(2,4−ジメチル−4−メトキシバレロニトリル)(10時間半減期温度30℃)0.05部、t−ヘキシルパーオキシピバレート(10時間半減期温度53℃)0.1部、t−ヘキシルパーオキシイソプロピルモノカーボネート(10時間半減温度95℃)0.1部、メルカプト化合物としてt−ドデシルメルカプタン0.05部、重合調節剤としてテルピノレン0.03部を混合し、吸引瓶中に仕込んで攪拌し、真空脱気を行い、重合性混合物を得た。
<Manufacture of acrylic resin plate>
[Example 1]
And 7 parts of methyl acrylate, and 10 parts of methyl methacrylate, bis (oxymethyl) tricyclo [5,2,1,0 2,6] and decane dimethacrylate 80 parts, mixtures 100 per parts of 3 parts isostearyl methacrylate 2,2′-azobis (2,4-dimethyl-4-methoxyvaleronitrile) (10 hour half-life temperature 30 ° C.) as a polymerization initiator, 0.05 part, t-hexylperoxypivalate (10 hour half-life) (Temperature 53 ° C.) 0.1 part, t-hexylperoxyisopropyl monocarbonate (10 hour half-life temperature 95 ° C.) 0.1 part, mercapto compound t-dodecyl mercaptan 0.05 part, terpinolene 0.03 as a polymerization regulator The parts were mixed, charged into a suction bottle, stirred, and vacuum degassed to obtain a polymerizable mixture.
この重合性混合物を、間隔1.7mmの一対の強化ガラスシートにガスケットを挟んで構成された鋳型に注入し、気泡を除き、加熱炉に入れて、55℃で1時間、50℃で1時間、続いて135℃で3時間重合を行った。その後、鋳型を40℃以下に冷却して剥離し、厚み1mmのアクリル系樹脂板を得た。 This polymerizable mixture was poured into a mold formed by sandwiching a gasket between a pair of tempered glass sheets having a distance of 1.7 mm, removed from the bubbles, placed in a heating furnace, and heated at 55 ° C. for 1 hour and at 50 ° C. for 1 hour. Subsequently, polymerization was carried out at 135 ° C. for 3 hours. Thereafter, the mold was cooled to 40 ° C. or lower and peeled to obtain an acrylic resin plate having a thickness of 1 mm.
この樹脂板は白化やヒケのない良好な外観を有していた。樹脂板のヘーズを測定したところ0.2%であり、良好な透明性を示した。また、荷重たわみ温度は200℃を超えており、耐熱性に優れていた。さらに、残存モノマー量は少量(1.31%)であった。本実施例の重合性混合物の主要な原料組成を表1に示し、評価結果を表2に示す。 This resin plate had a good appearance without whitening or sink marks. The haze of the resin plate was measured and found to be 0.2%, indicating good transparency. Moreover, the deflection temperature under load exceeded 200 ° C. and was excellent in heat resistance. Furthermore, the residual monomer amount was small (1.31%). Table 1 shows the main raw material composition of the polymerizable mixture of this example, and Table 2 shows the evaluation results.
[実施例2〜8、比較例1〜9]
表1及び表3に示すように主要な原料組成を変更したこと以外は、実施例1と同様にしてアクリル系樹脂板を製造した(表に記載されてない原料については実施例1と同様)。評価結果を表2及び表4に示す。
[Examples 2 to 8, Comparative Examples 1 to 9]
An acrylic resin plate was produced in the same manner as in Example 1 except that the main raw material composition was changed as shown in Tables 1 and 3 (the raw materials not listed in the table are the same as in Example 1). . The evaluation results are shown in Tables 2 and 4.
<透明導電性膜の成膜>
実施例1〜8および比較例1〜9で得た各アクリル系樹脂板を、純水で洗浄し、熱風乾燥炉に入れて大気中で150℃、2時間乾燥した。次いで、スパッタリング法により樹脂板上に透明導電性膜としてITOを成膜し、アクリル系樹脂積層体を得た。透明導電性膜の膜厚は約30nmに調整した。また、このスパッタリングにおいては、質量比95/5のIn2O3/SnO2をターゲットとし、10-3Paまで排気し、体積比92.5/7.5のアルゴン/酸素を導入ガスとし、150℃の加熱下でRFスパッタリングを行った。評価結果を表2及び表4に示す。
<Deposition of transparent conductive film>
Each acrylic resin plate obtained in Examples 1 to 8 and Comparative Examples 1 to 9 was washed with pure water, placed in a hot air drying furnace, and dried in air at 150 ° C. for 2 hours. Next, ITO was formed as a transparent conductive film on the resin plate by a sputtering method to obtain an acrylic resin laminate. The film thickness of the transparent conductive film was adjusted to about 30 nm. Moreover, in this sputtering, In 2 O 3 / SnO 2 having a mass ratio of 95/5 is used as a target, exhausted to 10 −3 Pa, argon / oxygen having a volume ratio of 92.5 / 7.5 is used as an introduction gas, RF sputtering was performed under heating at 150 ° C. The evaluation results are shown in Tables 2 and 4.
各表中の略号は、以下の化合物を示す。
・「MA」:アクリル酸メチル
・「EA」:アクリル酸エチル
・「ISMA」:メタクリル酸イソステアリル
・「TDMA」:ビス(オキシメチル)トリシクロ[5,2,1,02,6]デカンジメタクリレート
・「HPIC」:t−ヘキシルパーオキシイソプロピルモノカーボネート(10時間半減期温度95℃)
・「tDM」:t−ドデシルメルカプタン
・「nDM」:n−ドデシルメルカプタン
・「C6DA」:1,6−ヘキサンジオールジアクリレート
表1および表2に示すように、実施例1〜8では、アクリル系樹脂板の耐熱性、透明性、残存モノマー量、アクリル系樹脂積層体の透明性、外観、表面抵抗率、密着性について良好な結果が得られた。
The abbreviations in each table indicate the following compounds.
· "MA": methyl acrylate, "EA": ethyl acrylate, "ISMA": isostearyl methacrylate "TDMA": bis (oxymethyl) tricyclo [5,2,1,0 2,6] Dekanji Methacrylate “HPIC”: t-hexylperoxyisopropyl monocarbonate (10 hours half-life temperature 95 ° C.)
"TDM": t-dodecyl mercaptan "nDM": n-dodecyl mercaptan "C6DA": 1,6-hexanediol diacrylate As shown in Tables 1 and 2, in Examples 1 to 8, acrylic Good results were obtained with respect to heat resistance, transparency, residual monomer amount of the resin plate, transparency, appearance, surface resistivity, and adhesion of the acrylic resin laminate.
一方、表3および表4に示すように、比較例1〜5では、アクリル系樹脂板の残存モノマー量が多く、アクリル系樹脂積層体の表面抵抗率、密着性が悪化するという問題が生じた。比較例6および7では、アクリル系樹脂板の外観が悪化した。また、比較例8及び9では、アクリル系樹脂板の耐熱性が低く、アクリル系樹脂積層体製造時の150℃の加熱時に変形が生じ、表面抵抗率、密着性が悪化した。 On the other hand, as shown in Tables 3 and 4, in Comparative Examples 1 to 5, there was a problem that the amount of residual monomer in the acrylic resin plate was large, and the surface resistivity and adhesion of the acrylic resin laminate deteriorated. . In Comparative Examples 6 and 7, the appearance of the acrylic resin plate deteriorated. Moreover, in Comparative Examples 8 and 9, the heat resistance of the acrylic resin plate was low, deformation occurred during heating at 150 ° C. during the production of the acrylic resin laminate, and the surface resistivity and adhesion deteriorated.
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