JP4315756B2 - （共）重合体、レジスト組成物、およびパターン形成方法 - Google Patents

（共）重合体、レジスト組成物、およびパターン形成方法 Download PDF

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Publication number
JP4315756B2
JP4315756B2 JP2003276560A JP2003276560A JP4315756B2 JP 4315756 B2 JP4315756 B2 JP 4315756B2 JP 2003276560 A JP2003276560 A JP 2003276560A JP 2003276560 A JP2003276560 A JP 2003276560A JP 4315756 B2 JP4315756 B2 JP 4315756B2
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group
carbon atoms
substituent
polymer
resist composition
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Japanese (ja)
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JP2004051995A (ja
JP2004051995A5 (enrdf_load_stackoverflow
Inventor
竜一 安斎
匡之 藤原
昭史 上田
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Mitsubishi Chemical Corp
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Mitsubishi Chemical Corp
Mitsubishi Rayon Co Ltd
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Priority to JP2003276560A priority Critical patent/JP4315756B2/ja
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Publication of JP2004051995A5 publication Critical patent/JP2004051995A5/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2003276560A 2002-07-19 2003-07-18 （共）重合体、レジスト組成物、およびパターン形成方法 Expired - Fee Related JP4315756B2 (ja)

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JP2003276560A JP4315756B2 (ja) 2002-07-19 2003-07-18 （共）重合体、レジスト組成物、およびパターン形成方法

Applications Claiming Priority (2)

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JP2002211344 2002-07-19
JP2003276560A JP4315756B2 (ja) 2002-07-19 2003-07-18 （共）重合体、レジスト組成物、およびパターン形成方法

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JP2004051995A JP2004051995A (ja) 2004-02-19
JP2004051995A5 JP2004051995A5 (enrdf_load_stackoverflow) 2006-08-31
JP4315756B2 true JP4315756B2 (ja) 2009-08-19

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Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060147832A1 (en) * 2003-03-04 2006-07-06 Hideo Hada Polymer and positive type resist composition
JP4832019B2 (ja) * 2005-07-27 2011-12-07 株式会社ダイセル 環状カーボネート骨格を含む多環式エステル
JP5005197B2 (ja) * 2005-07-27 2012-08-22 株式会社ダイセル 多環式エステル
JP4796794B2 (ja) * 2005-07-27 2011-10-19 ダイセル化学工業株式会社 ラクトン骨格を含む多環式エステル
JP4781086B2 (ja) * 2005-10-31 2011-09-28 ダイセル化学工業株式会社 脂環式骨格を有する高分子化合物
JP5285884B2 (ja) * 2007-09-07 2013-09-11 東京応化工業株式会社 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
JP5418268B2 (ja) * 2010-02-10 2014-02-19 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP5572127B2 (ja) * 2011-06-08 2014-08-13 株式会社ダイセル 脂環式骨格を有する高分子化合物
JP5793388B2 (ja) * 2011-09-30 2015-10-14 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜及びパターン形成方法
JP6002378B2 (ja) 2011-11-24 2016-10-05 東京応化工業株式会社 高分子化合物の製造方法
JP5757851B2 (ja) * 2011-11-25 2015-08-05 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜及びパターン形成方法、及び電子デバイスの製造方法
JP5775804B2 (ja) * 2011-12-06 2015-09-09 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びにそれを用いた感活性光線性又は感放射線性膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
JP2013130654A (ja) * 2011-12-20 2013-07-04 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜及びパターン形成方法、並びに電子デバイスの製造方法及び電子デバイス
JP2013137338A (ja) * 2011-12-27 2013-07-11 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜及びパターン形成方法、並びに電子デバイスの製造方法及び電子デバイス

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