JP4280917B2 - Evaluation method and evaluation tool of contact pressure whisker generation state - Google Patents

Evaluation method and evaluation tool of contact pressure whisker generation state Download PDF

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JP4280917B2
JP4280917B2 JP2003395173A JP2003395173A JP4280917B2 JP 4280917 B2 JP4280917 B2 JP 4280917B2 JP 2003395173 A JP2003395173 A JP 2003395173A JP 2003395173 A JP2003395173 A JP 2003395173A JP 4280917 B2 JP4280917 B2 JP 4280917B2
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tin
alloy film
contact
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tin alloy
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JP2005154837A (en
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哲朗 岡田
元伸 久保
勇 梁田
雅宣 辻本
友美 家治
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C.UYEMURA&CO.,LTD.
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Description

本発明は、錫又は錫合金皮膜からの接圧ウィスカの発生の有無、発生の程度を予め評価するための接圧ウィスカ発生状態の評価方法及びこれに用いる評価具に関する。   The present invention relates to a method for evaluating a contact pressure whisker generation state for preliminarily evaluating whether or not a contact pressure whisker is generated from a tin or tin alloy film, and an evaluation tool used therefor.

錫や錫合金めっき皮膜は、皮膜に内部応力があるとウィスカが発生することが知られており、このウィスカにより回路がショートするなどの問題が発生する。   It is known that tin and tin alloy plating films generate whiskers when the film has internal stress, and this whisker causes problems such as short circuit.

このため、めっき液の改良を行うなど、従来より、錫、錫合金めっき皮膜の内部応力を低減させる種々の方法が提案されている。しかし、内部応力が低減され、それ自体ウィスカが発生し難い部材であっても、これに外部から応力が加わると、接圧ウィスカが発生する。ここで、接圧とは、例えばコネクター等の電子部品において、コンタクトの挿入部分にフレキシブル基板を嵌合する場合に差し込まれ、接している錫又は錫合金皮膜個所にかかる外部荷重など、錫又は錫合金皮膜に他部材が圧接固定された際に錫又は錫合金皮膜に加えられた外部荷重であり、電子部品の嵌合個所、接点部分などには表面処理としてSn、Sn−Cu、Sn−Ag、Sn−Bi等のめっきが施されてきたが、これら嵌合個所、接点部分などの圧接部位には接圧ウィスカが発生する。   For this reason, various methods for reducing the internal stress of tin and tin alloy plating films have been proposed, such as improving the plating solution. However, even if the internal stress is reduced and the member itself is difficult to generate a whisker, a contact pressure whisker is generated when stress is applied to the member from the outside. Here, the contact pressure refers to, for example, an external load applied to a contacted tin or tin alloy film in an electronic component such as a connector when a flexible board is fitted to a contact insertion portion, such as tin or tin. It is an external load applied to tin or tin alloy film when other members are pressure-fixed to the alloy film, and Sn, Sn-Cu, Sn-Ag are applied as surface treatments to fitting parts and contact parts of electronic parts. , Sn-Bi and the like have been plated, but contact pressure whiskers are generated at the pressure contact portions such as the fitting portion and the contact portion.

図1は、一の部材aと他の部材bとの嵌合状態の一例を示すもので、図中cの部分が接圧個所である。
具体的には、図2に示すコネクター1には、コネクターピン2に錫又は錫合金めっきが施される。この場合、図2のようなリード3が差し込まれない状態では、コネクターピン2は、内部応力が緩和されるように加熱処理やめっき液の改良が行われているため、長時間放置してもウィスカは発生しない。しかし、ポリイミド4により互いに接触しないように絶縁隔離されたパターン5を有するリード3がコネクター1に差し込まれた場合、コネクターピン2には外部荷重がかかる。そうすると、コネクターピン2の錫又は錫合金めっき皮膜に内部応力があるのと同じ状態となり、ウィスカ(接圧ウィスカ)が発生する。これにより、リード3のポリイミド4による絶縁が阻害され、パターン5間がショートするおそれが生じる。
FIG. 1 shows an example of a fitting state between one member a and another member b, and a portion c in the figure is a contact pressure portion.
Specifically, the connector 1 shown in FIG. 2 is subjected to tin or tin alloy plating on the connector pin 2. In this case, in the state where the lead 3 is not inserted as shown in FIG. 2, the connector pin 2 has been subjected to heat treatment or improvement of the plating solution so as to relieve internal stress. Whisker does not occur. However, when the lead 3 having the pattern 5 insulated and separated so as not to contact each other by the polyimide 4 is inserted into the connector 1, an external load is applied to the connector pin 2. If it does so, it will be in the same state as the internal stress in the tin or tin alloy plating film of the connector pin 2, and a whisker (contact pressure whisker) will generate | occur | produce. Thereby, the insulation of the lead 3 by the polyimide 4 is inhibited, and there is a possibility that the pattern 5 is short-circuited.

また、図3に示す水晶発振子においては、容器6の内外表面に錫又は錫合金めっきが施され、この容器6内に水晶発振子7が圧入される。ここで、8は水晶体、9はリード端子、10はリード端子を被覆絶縁保護するシリコーン樹脂製のリード端子カバーである。上記圧入により、図3において、Xの部分の容器6めっき皮膜に外部荷重が加わる。発振子には、上述したように、リードのショート防止の目的でリード端子カバーが備えられているが、容器6の錫又は錫合金めっき皮膜から接圧ウィスカWがリード端子カバー10内を成長し、リード端子9と接触することでショートするおそれがある。   In the crystal oscillator shown in FIG. 3, tin or tin alloy plating is applied to the inner and outer surfaces of the container 6, and the crystal oscillator 7 is press-fitted into the container 6. Here, 8 is a crystalline lens, 9 is a lead terminal, and 10 is a lead terminal cover made of silicone resin for covering and protecting the lead terminal. By the above press-fitting, an external load is applied to the container 6 plating film in the portion X in FIG. As described above, the oscillator is provided with the lead terminal cover for the purpose of preventing the lead from being short-circuited, but the contact pressure whisker W grows in the lead terminal cover 10 from the tin or tin alloy plating film of the container 6. There is a risk of short circuit by contact with the lead terminal 9.

従来、このような接圧ウィスカが発生するか否か、あるいはどの程度発生するのか予め簡便に評価する方法は知られておらず、実際に互いに嵌合すべき電子部材相互を嵌合し、接圧ウィスカ発生の有無を確認するという実テストを行うほかはなく、このため手間を要し、ウィスカの確認までに時間がかかっていた。   Conventionally, there is no known method for simply evaluating whether or not such contact pressure whiskers are generated or how much they are generated. There was no other way than checking the presence or absence of pressure whiskers, and it took time and time to check whiskers.

本発明は、上記事情に鑑みなされたもので、接圧ウィスカの発生有無や程度を簡単に、短期間で評価することができる接圧ウィスカ発生状態の評価方法及び評価具を提供することを目的とする。   The present invention has been made in view of the above circumstances, and an object thereof is to provide a contact pressure whisker occurrence state evaluation method and an evaluation tool that can easily and in a short period evaluate whether or not contact pressure whiskers are generated. And

本発明は上記目的を達成するため、下記の接圧ウィスカ発生状態の評価方法及び評価具を提供する。
(1)錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する方法であって、錫又は錫合金皮膜が形成された試料に対し、錫又は錫合金皮膜が形成された試料の錫又は錫合金皮膜を挾持する挾持体から突設された圧接部の先端を上記試料の錫又は錫合金皮膜に接触させて荷重を加えることにより、上記圧接部を上記錫又は錫合金皮膜の面積より小さい面積にて接触させて荷重を加え、この荷重を加えた状態で所定期間放置した後、ウィスカの発生の有無及び発生の程度を観察することを特徴とする接圧ウィスカ発生状態の評価方法。
(2)錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する方法であって、錫又は錫合金皮膜が形成された試料に対し、先端形状が球状又は半球状である圧接部の先端を上記試料の錫又は錫合金皮膜に接触させて荷重を加えることにより、上記圧接部を上記錫又は錫合金皮膜の面積より小さい面積にて接触させて荷重を加え、この荷重を加えた状態で所定期間放置した後、ウィスカの発生の有無及び発生の程度を観察することを特徴とする接圧ウィスカ発生状態の評価方法。
(3)圧接部の少なくとも上記錫又は錫合金皮膜に接触する接触部が、上記他部材の圧接部と同じ材質の金属であることを特徴とする(1)又は(2)記載の評価方法。
(4)錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する評価具であって、錫又は錫合金皮膜が形成された試料の錫又は錫合金皮膜を挾持する挾持体と、この挾持体から突設され、該挾持体に挾持された錫又は錫合金皮膜に先端が接触して上記錫又は錫合金皮膜の面積より小さい面積にて圧接する圧接部とを備えたことを特徴とする接圧ウィスカ評価具。
(5)錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する評価具であって、錫又は錫合金皮膜が形成された試料の錫又は錫合金皮膜を挾持する挾持体と、この挾持体に挾持された錫又は錫合金皮膜に先端が接触して上記錫又は錫合金皮膜の面積より小さい面積にて圧接する、先端形状が球状又は半球状である圧接部とを備えたことを特徴とする接圧ウィスカ評価具。
(6)圧接部の少なくとも上記錫又は錫合金皮膜に接触する接触部が、上記他部材の圧接部と同じ材質の金属であることを特徴とする(4)又は(5)記載の接圧ウィスカ評価具。
In order to achieve the above object, the present invention provides an evaluation method and an evaluation tool for the following contact pressure whisker generation state.
(1) A method for evaluating the state of occurrence of contact pressure whiskers generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed. The tip of the press-contact portion projecting from the holding member that holds the tin or tin alloy film of the sample on which the tin or tin alloy film is formed on the sample on which the alloy film is formed is the tin or tin alloy film on the sample. By applying a load by contact, the pressure contact portion is brought into contact with an area smaller than the area of the tin or tin alloy film, and a load is applied. A method for evaluating a contact pressure whisker generation state, characterized by observing the presence or absence and the degree of generation.
(2) A method for evaluating the state of occurrence of contact pressure whiskers generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed. For the sample on which the alloy film is formed, the tip of the pressure contact portion having a spherical or hemispherical tip shape is brought into contact with the tin or tin alloy film of the sample, and a load is applied to the sample. The contact pressure whisker generation is characterized by observing the occurrence of whisker and the degree of the occurrence of whisker after the load is applied in an area smaller than the area of the alloy film and the load is applied for a predetermined period. State evaluation method.
(3) The evaluation method according to (1) or (2), wherein at least the contact portion of the pressure contact portion that contacts the tin or tin alloy film is a metal made of the same material as the pressure contact portion of the other member.
(4) An evaluation tool for evaluating the state of contact whisker generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed, A holding body for holding tin or a tin alloy film of a sample on which a tin alloy film is formed, and the tip or the tin alloy film protruding from the holding body and contacting the tin or the tin alloy film, A contact pressure whisker evaluation tool comprising: a pressure contact portion that is pressure-contacted with an area smaller than the area of the tin alloy film.
(5) An evaluation tool for evaluating the state of contact whisker generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed, A holding body that holds tin or a tin alloy film of a sample on which a tin alloy film is formed, and an area that is smaller than the area of the tin or tin alloy film when the tip contacts the tin or tin alloy film held on the holding body A contact pressure whisker evaluation tool comprising: a pressure contact portion having a spherical shape or a hemispherical tip shape, which is pressure-contacted at a pressure.
(6) The contact pressure whisker according to (4) or (5), wherein at least the contact portion of the pressure contact portion that contacts the tin or tin alloy film is a metal of the same material as the pressure contact portion of the other member. Evaluation tool.

本発明によれば、錫又は錫合金皮膜の接圧個所に生じるウィスカ(接圧ウィスカ)発生の有無及び発生頻度を、接圧擬似状況を作ることにより、促進テストとして簡易に実現し、接圧ウィスカの特性を短期間で速やかに評価することができる。このため、接圧個所があると、通常状態では発生しない錫や錫合金めっき皮膜にウィスカが発生するが、各種電子部品においてかかる接圧ウィスカの発生状況を予め評価することができると共に、錫めっきや錫合金めっきの液組成、めっき条件等が及ぼす錫、錫合金めっき皮膜の接圧ウィスカ発生の傾向等を多数の錫、錫合金めっき皮膜について系統的に調べることが容易であり、接圧ウィスカが発生し難い電子部品の構造改良、錫、錫合金めっき液、めっき条件の検証、改良、開発に有効に利用することができる。   According to the present invention, the presence or absence and occurrence frequency of whisker (contact pressure whisker) generated at the contact point of the tin or tin alloy film can be easily realized as an accelerated test by creating a contact pressure simulated situation. Whisker characteristics can be quickly evaluated in a short period of time. For this reason, whiskering occurs in the tin or tin alloy plating film that does not occur in the normal state if there is a pressure contact point, but it is possible to evaluate in advance the state of occurrence of such pressure whisker in various electronic components, and tin plating It is easy to systematically investigate the contact pressure whisker generation tendency of tin and tin alloy plating film affected by the liquid composition of tin and tin alloy plating, plating conditions, etc. It can be effectively used for structural improvement of electronic components that are less likely to generate rust, tin, tin alloy plating solution, and verification, improvement, and development of plating conditions.

本発明の錫又は錫合金皮膜に外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する方法は、錫又は錫合金皮膜が形成された試料に対し、この試料面積より小さい面積にて荷重を加えた状態で所定期間放置した後、ウィスカの発生の有無及び発生の程度を観察するものである。   The method of evaluating the state of contact pressure whisker generated when an external load is applied to the tin or tin alloy film of the present invention has a smaller area than that of the sample on which the tin or tin alloy film is formed. Then, after leaving for a predetermined period in a state where a load is applied, the presence or absence and the degree of occurrence of whiskers are observed.

この場合、錫又は錫合金皮膜は、通常、めっき法にて形成される。めっきは電気めっき法でも無電解めっき法でもよく、また真空蒸着等の気相めっき法も採用し得る。皮膜厚さは、部材の種類、使用目的等により適宜選定されるが、通常0.5〜15μm、好ましくは1.5〜6μmである。錫合金皮膜としては、Sn−Cu、Sn−Ag、Sn−Bi等が挙げられるが、錫合金中の錫含有量は50質量%以上であることが好ましい。   In this case, the tin or tin alloy film is usually formed by a plating method. The plating may be an electroplating method or an electroless plating method, and a vapor phase plating method such as vacuum deposition may be employed. The film thickness is appropriately selected depending on the type of member, purpose of use, etc., but is usually 0.5 to 15 μm, preferably 1.5 to 6 μm. Examples of the tin alloy film include Sn—Cu, Sn—Ag, and Sn—Bi. The tin content in the tin alloy is preferably 50% by mass or more.

錫又は錫合金皮膜が形成された試料に対し与えられる荷重は、この試料の評価、検証により接圧ウィスカの発生状態の知見が求められる部材に関して、この部材に加えられる他部材からの圧接固定による荷重以上の荷重であることが好ましく、付与される荷重がこれより小さいと、上記試料の評価、検証で接圧ウィスカが発生しなくても、上記部材の実使用では、接圧ウィスカが発生するおそれがある。   The load applied to the sample on which the tin or tin alloy film is formed is determined by the pressure fixing from other members applied to this member for members for which knowledge of the state of contact pressure whisker generation is required by evaluation and verification of this sample. It is preferable that the load is greater than or equal to the load. If the applied load is smaller than this, even if the contact pressure whisker is not generated in the evaluation and verification of the sample, the contact pressure whisker is generated in actual use of the member. There is a fear.

なお、上記部材に加えられる他部材の圧接力は、通常、コネクター使用時の嵌合個所では3〜5kg/mm2であるが、これに限られるものではない。また、この圧接力(荷重)以上の荷重の上限は、一の部材が機械的に破壊しない限り可能であるが、後述する目玉クリップ方式においては、荷重400〜1,300gとすることができ、このとき試料へは22〜26kg/mm2程度の圧接力を加えることができる。 The pressure contact force of the other member applied to the member is usually 3 to 5 kg / mm 2 at the fitting position when the connector is used, but is not limited thereto. Moreover, although the upper limit of the load more than this press-contact force (load) is possible as long as one member is not destroyed mechanically, in the eyeball clip system mentioned later, it can be set as load 400-1300g, At this time, a pressure contact force of about 22 to 26 kg / mm 2 can be applied to the sample.

更に、試料に荷重を加える際、荷重の加えられる面積は、この試料(この試料が有する錫又は錫合金皮膜)の面積よりも小さい面積であることが必要であり、試料に対して線接触又は点接触するように圧接部により荷重を加えることが、理由は不明であるが、接圧ウィスカの発生促進に有利である。このため、試料に荷重を加えるための圧接部の先端形状は、球状又は半球状の形状が最適である。点接触でも圧接部の先端を錐形状とした場合、荷重のかかる力の方向性が生じるおそれがあり、安定してウィスカの発生を促進するためには、上述したように、球状又は半球状のほうがより好ましい。   Furthermore, when a load is applied to the sample, the area to which the load is applied needs to be smaller than the area of this sample (tin or tin alloy film that this sample has), and line contact or Although the reason for applying a load by the pressure contact portion so as to make point contact is unknown, it is advantageous for promoting the generation of the pressure whisker. For this reason, a spherical or hemispherical shape is optimal as the tip shape of the pressure contact portion for applying a load to the sample. When the tip of the pressure contact part is formed in a cone shape even in point contact, there is a possibility that the direction of the force applied by the load may occur, and in order to stably promote the generation of whiskers, as described above, spherical or hemispherical Is more preferable.

また、試料に荷重を加える圧接部は、少なくとも試料に接触する接触部が金属、特にステンレススチールやアルミニウムがよく、とりわけ金属拡散が起こり難いアルミニウムが好ましく、これにより接圧ウィスカの圧接部側からの発生要因を実質的に圧接部による圧接力にとどめることができる。但し、実使用における接圧ウィスカの状況を調べる場合は、上記他部材の圧接部と同様の材質とすること、即ち、コネクターの場合、リードと同金属材質である金とすることが推奨される。   In addition, as for the pressure contact portion for applying a load to the sample, at least the contact portion in contact with the sample is preferably a metal, particularly stainless steel or aluminum, and particularly aluminum which is difficult to cause metal diffusion is preferable. The generation factor can be substantially limited to the pressing force by the pressing portion. However, when investigating the situation of contact pressure whiskers in actual use, it is recommended to use the same material as the pressure contact portion of the other member, that is, in the case of a connector, gold which is the same metal material as the lead. .

試料に対し、荷重を加えた状態で放置する期間は特に制限されず、適宜選定されるが、1〜10日間、特に1〜3日間程度とすることが好ましい。また放置条件は、室温で大気圧下に放置すればよい。   The period in which the sample is allowed to stand in a state where a load is applied is not particularly limited and is appropriately selected, but it is preferably 1 to 10 days, particularly about 1 to 3 days. The leaving condition may be left at room temperature and atmospheric pressure.

以上のような評価方法を実施するために用いる接圧ウィスカ評価具は、錫又は錫合金皮膜に外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する評価具であって、錫又は錫合金皮膜が形成された試料を挾持する挾持体と、この挾持体に挾持された試料にこの試料面積より小さな面積にて圧接する圧接部とを備えた構成とすることができる。   The contact pressure whisker evaluation tool used for carrying out the evaluation method as described above is an evaluation tool for evaluating the occurrence state of contact pressure whisker generated when an external load is applied to the tin or tin alloy film. Or it can be set as the structure provided with the holding body holding the sample in which the tin alloy membrane | film | coat was formed, and the press-contact part which press-contacts the sample held by this holding body in an area smaller than this sample area.

図4は、このような評価具として市販の目玉クリップを利用した例であり、この目玉クリップからなる挾持体11の挟み口12の内面一側に両面接着テープ等を用いて球体13を接着、固定し(図では、直径1mmの3個の球体13を互いにほぼ等間隔ずつ離間させた状態で並列してある)、この球体13(3個の球体の場合は中央の球体のみ)に試料14の錫又は錫合金皮膜が接触するように上記挟み口12の内面他側に配置して該挟み口12にて試料14を挟む構成とすることができる。   FIG. 4 is an example in which a commercially available eyeball clip is used as such an evaluation tool, and the sphere 13 is bonded to the inner surface of the pinch 12 of the holding body 11 made of this eyeball clip using a double-sided adhesive tape or the like. Fixed (in the figure, three spheres 13 having a diameter of 1 mm are juxtaposed in a state of being spaced apart from each other at approximately equal intervals), and the sample 14 is placed on the sphere 13 (only the central sphere in the case of three spheres). The sample 14 may be sandwiched by the pin 12 being disposed on the other side of the inner surface of the pin 12 so that the tin or tin alloy film is in contact therewith.

は、評価具の別の例を示すもので、ヒンジ34にて2枚の板体32,33を開閉可能に連結してなる挾持体31の一方の板体32の内面に試料35を保持する試料保持部36を固定し、またこの試料35に対向するように、他方の板体33の内面に圧接部37を設け、板体32,33を閉じた際に該圧接部37に試料35を接触させると共に、他方の板体33の先端部(開口部側)に設けた止め具38,38にて一方の板体32を固定した際、一方の板体32の開口部側が他方の板体33に挾圧され、これにより試料35に圧接部37が所要荷重で圧接されるようになっている。なお、上記圧接部37は、図に示すように複数個(図面においては3個)設けることができるが、試料35に接触する圧接部37は中央の1個のみとすることがよい。 FIG. 5 shows another example of an evaluation tool. A sample 35 is placed on the inner surface of one plate body 32 of a holding body 31 formed by connecting two plate bodies 32 and 33 so that they can be opened and closed by a hinge 34. A pressure contact portion 37 is provided on the inner surface of the other plate 33 so as to fix the sample holding portion 36 to be held and face the sample 35, and when the plates 32 and 33 are closed, the sample is placed on the pressure contact 37. 35, and when one plate body 32 is fixed by the stoppers 38, 38 provided at the tip (opening side) of the other plate body 33, the opening side of one plate body 32 is the other side. The plate 33 is pressed against the pressure, so that the pressure contact portion 37 is pressed against the sample 35 with a required load. A plurality of pressure contact portions 37 (three in the drawing) can be provided as shown in the figure, but the pressure contact portion 37 contacting the sample 35 is preferably only one in the center.

は、更に評価具の別の例を示すもので、この例は前面が開放する箱体41の内部下面に圧接部42を設け、この圧接部42より少なくとも試料43の厚さ分、上方に仕切板部44を設け、更に仕切板部44の上方に存して箱体41に中央にねじ穴を有する回転板45を回転可能に支承すると共に、上記回転体45のねじ穴にねじ棒46をこのねじ棒46の先端部が上記仕切板部44を貫通するように螺合し、上記回転体45を左右に回転させることにより、ねじ棒46が上下に移動するようになっている。試料43は、圧接部42と仕切板部44との間に配設し、回転体45を操作してねじ棒46を下降させ、ねじ棒46下端面で試料43を圧接部42に押圧することにより、試料43が所用圧接力で圧接部42に圧接されるものである。この場合、上記箱体41、回転体45、ねじ棒46にて挾持体が構成されるものである。 FIG. 6 shows another example of the evaluation tool. In this example, a pressure contact portion 42 is provided on the inner lower surface of the box body 41 whose front surface is open, and the pressure contact portion 42 is at least as thick as the sample 43. A partition plate portion 44 is provided, and a rotary plate 45 having a screw hole in the center is rotatably supported on the box body 41 above the partition plate portion 44, and a screw rod is mounted on the screw hole of the rotary body 45. 46 is screwed so that the tip of the screw rod 46 penetrates the partition plate portion 44, and the rotating body 45 is rotated left and right so that the screw rod 46 moves up and down. The sample 43 is disposed between the pressure contact portion 42 and the partition plate portion 44, operates the rotating body 45 to lower the screw rod 46, and presses the sample 43 against the pressure contact portion 42 at the lower end surface of the screw rod 46. Thus, the sample 43 is brought into pressure contact with the pressure contact portion 42 with a desired pressure contact force. In this case, the box 41, the rotating body 45, and the screw rod 46 constitute a holding body.

なお、上記図5,6における圧接部37,42の態様として、図7〜12を挙げることができる。図の例は圧接部52が配設される部材51に粘着テープ53を介して圧接部52として球体を接着固定したもの、図8〜10はそれぞれ部材51に圧接部52として半球状突起あるいは円錐状突起や角錐台状突起を予め突設した例、図11は部材51に断面三角形状の突条を圧接部52として突設した例、図12は球状の圧接部52を部材51に形成した嵌着孔54に嵌入した例であるが、これらの例に限定されるものではない。
また、Sn−Cu合金めっきを形成する素地(板)がCuやCu合金(黄銅やリン青銅)の場合、Sn−Cu合金めっき皮膜へ素地からの微量元素の拡散が起こるおそれがあり、これによるウィスカの発生を抑制する視点から、42アロイ板を素地に用いることが好適である。
Incidentally, as an aspect of the pressure contact portion 37, 42 in FIG. 5 and 6, it can be given 7-12. Example of FIG. 7 that contact portion 52 is spherical and an adhesive fixing the contact portion 52 via the adhesive tape 53 to the member 51 which is disposed, hemispherical protrusion or a pressing portion 52 in Figures 8-10 member 51 example previously projecting conical projections or truncated pyramid-shaped projections, 11 form examples which projects a triangular cross-section ridges on member 51 as the pressure contact portion 52, 12 is a pressure contact portion 52 of the spherical member 51 However, the present invention is not limited to these examples.
In addition, when the substrate (plate) for forming the Sn—Cu alloy plating is Cu or Cu alloy (brass or phosphor bronze), there is a possibility that trace elements may diffuse from the substrate to the Sn—Cu alloy plating film. From the viewpoint of suppressing the generation of whiskers, it is preferable to use a 42 alloy plate for the substrate.

以下、実施例により本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。
なお、下記の例で、接圧ウィスカの発生測定方法としては、下記接圧クリップ方法を用いた。
EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not restrict | limited to the following Example.
In the following examples, the following contact pressure clip method was used as a method for measuring the generation of contact pressure whiskers.

接圧クリップ方法
図4に示す目玉クリップ11(65mm幅)からなる挾持体11の挟み口12の内面片側に両面接着テープを貼り、この上に直径1mmのステンレススチール球(SUS球)13を3個互いにほぼ等間隔ずつ並列させた状態で接着すると共に、0.3mm厚さ×15mm幅×20mm長さの大きさのNi−Fe(42アロイ)合金板の片面にSn−Cu合金電気めっき皮膜(Cu含量2.0wt%)を膜厚5.7μmで形成した試料14を、そのめっき皮膜が中央のSUS球13に接触するように挟み、この載荷状態で一定期間(1〜10日間)経過した後に試料を外し、走査型電子顕微鏡(SEM)によってウィスカを観察し、SEM像から接圧ウィスカをカウントし、ウィスカ発生数の結果を定量的にデータ化した。なお、この目玉クリップ方式によれば、短期間(1〜3日間)で接圧ウィスカの発生状態を調べることができるものである。
Pressure-contacting clip method A double-sided adhesive tape is applied to one side of the pinch 12 of the holding body 11 made of the eyeball clip 11 (65 mm width) shown in FIG. 4, and a stainless steel ball (SUS ball) 13 having a diameter of 1 mm is placed thereon. Adhere in parallel with each other at approximately equal intervals, and Sn-Cu alloy electroplating film on one side of Ni-Fe (42 alloy) alloy plate of 0.3 mm thickness x 15 mm width x 20 mm length A sample 14 (Cu content 2.0 wt%) formed with a film thickness of 5.7 μm is sandwiched so that the plating film is in contact with the center SUS sphere 13, and a certain period (1 to 10 days) has elapsed in this loaded state. Then, the sample was removed, whiskers were observed with a scanning electron microscope (SEM), the contact pressure whiskers were counted from the SEM image, and the results of the number of whisker generation were quantitatively converted into data. In addition, according to this eyeball clip system, it is possible to examine the occurrence state of the contact pressure whisker in a short period (1 to 3 days).

上記接圧クリップ方法において、試料を挟んだときの試料に与える接圧力(圧接力)は、荷重750g(24kg/mm2程度)であり、試料圧接状態で150℃において所定時間熱処理後、3日間室温に放置し、ウィスカの状況を調べた。熱処理時間とウィスカ発生個数との関係を示す結果を図13に示す。 In the above-mentioned contact pressure clipping method, the contact pressure (pressure contact force) applied to the sample when the sample is sandwiched is a load of 750 g (about 24 kg / mm 2 ), and after heat treatment at 150 ° C. for a predetermined time in the sample pressure contact state, 3 days We left it at room temperature and examined the situation of whiskers. FIG. 13 shows the results showing the relationship between the heat treatment time and the number of whiskers generated.

本発明における一の部材と他の部材との嵌合状態の一例を示した図である。It is the figure which showed an example of the fitting state of one member and other members in this invention. 本発明における一の部材と他の部材の一の具体例を示した図である。It is the figure which showed one specific example of one member in this invention, and another member. 本発明における一の部材と他の部材の他の具体例を示した図であって、(B)は(A)のX部の拡大図である。It is the figure which showed the other specific example of the one member and other member in this invention, Comprising: (B) is an enlarged view of the X section of (A). 本発明における接圧ウィスカ評価具として市販の目玉クリップを利用した例を示した図である。It is the figure which showed the example using a commercially available eyeball clip as a contact pressure whisker evaluation tool in this invention. 本発明における接圧ウィスカ評価具の一の例を示した図である。It is the figure which showed an example of the contact pressure whisker evaluation tool in this invention. 本発明における接圧ウィスカ評価具の他の例を示した図である。It is the figure which showed the other example of the contact pressure whisker evaluation tool in this invention. 本発明における圧接部の具体的な形態の第一の例を示した図である。It is the figure which showed the 1st example of the specific form of the press-contact part in this invention. 本発明における圧接部の具体的な形態の第二の例を示した図である。It is the figure which showed the 2nd example of the specific form of the press-contact part in this invention. 本発明における圧接部の具体的な形態の第三の例を示した図である。It is the figure which showed the 3rd example of the specific form of the press-contact part in this invention. 本発明における圧接部の具体的な形態の第四の例を示した図である。It is the figure which showed the 4th example of the specific form of the press-contact part in this invention. 本発明における圧接部の具体的な形態の第五の例を示した図である。It is the figure which showed the 5th example of the specific form of the press-contact part in this invention. 本発明における圧接部の具体的な形態の第六の例を示した図である。It is the figure which showed the 6th example of the specific form of the press-contact part in this invention. 本発明の実施例における熱処理時間とウィスカ発生個数との関係を示した図である。It is the figure which showed the relationship between the heat processing time and the number of whisker generation | occurrence | production in the Example of this invention.

符号の説明Explanation of symbols

1 コネクター
2 コネクターピン
3 リード
4 ポリイミド
5 パターン
a、b 部材
c 接圧個所
W 接圧ウィスカ
11、31 挾持体
14、35、43 試料
37、42、52 圧接部
DESCRIPTION OF SYMBOLS 1 Connector 2 Connector pin 3 Lead 4 Polyimide 5 Pattern a, b Member c Contact pressure location W Contact pressure whisker 11 , 3 1 Holding body 14, 35, 43 Sample 37, 42, 52 Pressure contact part

Claims (6)

錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する方法であって、錫又は錫合金皮膜が形成された試料に対し、錫又は錫合金皮膜が形成された試料の錫又は錫合金皮膜を挾持する挾持体から突設された圧接部の先端を上記試料の錫又は錫合金皮膜に接触させて荷重を加えることにより、上記圧接部を上記錫又は錫合金皮膜の面積より小さい面積にて接触させて荷重を加え、この荷重を加えた状態で所定期間放置した後、ウィスカの発生の有無及び発生の程度を観察することを特徴とする接圧ウィスカ発生状態の評価方法。 A method for evaluating the state of occurrence of contact pressure whiskers generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed. With respect to the formed sample, the tip of the press-contact portion protruding from the holding body that holds the tin or tin alloy film of the sample on which the tin or tin alloy film is formed is brought into contact with the tin or tin alloy film of the sample. By applying a load, the pressure contact part is brought into contact with an area smaller than the area of the tin or tin alloy film, and the load is applied. A method for evaluating a contact pressure whisker generation state characterized by observing the degree of the above. 錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する方法であって、錫又は錫合金皮膜が形成された試料に対し、先端形状が球状又は半球状である圧接部の先端を上記試料の錫又は錫合金皮膜に接触させて荷重を加えることにより、上記圧接部を上記錫又は錫合金皮膜の面積より小さい面積にて接触させて荷重を加え、この荷重を加えた状態で所定期間放置した後、ウィスカの発生の有無及び発生の程度を観察することを特徴とする接圧ウィスカ発生状態の評価方法。   A method for evaluating the state of occurrence of contact pressure whiskers generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed. By applying a load to the formed sample by bringing the tip of the pressure contact portion having a spherical or hemispherical tip shape into contact with the tin or tin alloy film of the sample, the pressure contact portion is made of the tin or tin alloy film. The contact pressure whisker generation state is characterized by observing whether or not the whisker has been generated and the degree of the occurrence of the whisker after the contact is applied in an area smaller than the area and the load is applied for a predetermined period. Method. 圧接部の少なくとも上記錫又は錫合金皮膜に接触する接触部が、上記他部材の圧接部と同じ材質の金属であることを特徴とする請求項1又は2記載の評価方法。   3. The evaluation method according to claim 1, wherein at least the contact portion of the pressure contact portion that contacts the tin or tin alloy film is a metal made of the same material as the pressure contact portion of the other member. 錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する評価具であって、錫又は錫合金皮膜が形成された試料の錫又は錫合金皮膜を挾持する挾持体と、この挾持体から突設され、該挾持体に挾持された錫又は錫合金皮膜に先端が接触して上記錫又は錫合金皮膜の面積より小さい面積にて圧接する圧接部とを備えたことを特徴とする接圧ウィスカ評価具。 An evaluation tool for evaluating the state of occurrence of contact pressure whiskers generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed, the tin or tin alloy film A holding body for holding the tin or tin alloy film of the sample on which the film is formed, and the above-mentioned tin or tin alloy film protruding from the holding body and contacting the tin or tin alloy film held on the holding body A contact pressure whisker evaluation tool, comprising: a pressure contact portion that is pressure-contacted with an area smaller than the area. 錫又は錫合金皮膜が形成された試料の上記錫又は錫合金皮膜に他部材から外部荷重が加えられることにより発生する接圧ウィスカの発生状態を評価する評価具であって、錫又は錫合金皮膜が形成された試料の錫又は錫合金皮膜を挾持する挾持体と、この挾持体に挾持された錫又は錫合金皮膜に先端が接触して上記錫又は錫合金皮膜の面積より小さい面積にて圧接する、先端形状が球状又は半球状である圧接部とを備えたことを特徴とする接圧ウィスカ評価具。   An evaluation tool for evaluating the state of occurrence of contact pressure whiskers generated when an external load is applied from another member to the tin or tin alloy film of the sample on which the tin or tin alloy film is formed, the tin or tin alloy film A holding body holding the tin or tin alloy film of the sample on which the metal is formed, and the tip is brought into contact with the tin or tin alloy film held on the holding body and pressed in an area smaller than the area of the tin or tin alloy film. And a pressure contact whisker evaluation tool comprising a pressure contact portion whose tip shape is spherical or hemispherical. 圧接部の少なくとも上記錫又は錫合金皮膜に接触する接触部が、上記他部材の圧接部と同じ材質の金属であることを特徴とする請求項4又は5記載の接圧ウィスカ評価具。   The contact pressure whisker evaluation tool according to claim 4 or 5, wherein at least the contact portion of the pressure contact portion that comes into contact with the tin or tin alloy film is a metal made of the same material as the pressure contact portion of the other member.
JP2003395173A 2003-11-26 2003-11-26 Evaluation method and evaluation tool of contact pressure whisker generation state Expired - Fee Related JP4280917B2 (en)

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