JP4272785B2 - 光学処理方法およびそれを用いた光学処理装置 - Google Patents

光学処理方法およびそれを用いた光学処理装置 Download PDF

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JP4272785B2
JP4272785B2 JP2000007734A JP2000007734A JP4272785B2 JP 4272785 B2 JP4272785 B2 JP 4272785B2 JP 2000007734 A JP2000007734 A JP 2000007734A JP 2000007734 A JP2000007734 A JP 2000007734A JP 4272785 B2 JP4272785 B2 JP 4272785B2
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optical
aberration
optical system
paraxial
analysis
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JP2001201714A (ja
JP2001201714A5 (enExample
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敬介 荒木
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Canon Inc
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Canon Inc
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JP2000007734A 2000-01-17 2000-01-17 光学処理方法およびそれを用いた光学処理装置 Expired - Fee Related JP4272785B2 (ja)

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JP2001201714A JP2001201714A (ja) 2001-07-27
JP2001201714A5 JP2001201714A5 (enExample) 2007-03-08
JP4272785B2 true JP4272785B2 (ja) 2009-06-03

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07333562A (ja) * 1994-06-08 1995-12-22 Canon Inc 偏心光学系及びその製造方法
JP3715686B2 (ja) * 1995-06-21 2005-11-09 キヤノン株式会社 処理方法及びそれを用いた処理装置
JPH10221638A (ja) * 1997-01-31 1998-08-21 Canon Inc 画像観察光学系
JP4136061B2 (ja) * 1998-04-06 2008-08-20 オリンパス株式会社 近軸量処理方法及び処理装置
JP2001142025A (ja) * 1999-11-17 2001-05-25 Mixed Reality Systems Laboratory Inc 画像表示装置
JP3854763B2 (ja) * 1999-11-19 2006-12-06 キヤノン株式会社 画像表示装置

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