JP4253707B2 - 露光パターン形成方法 - Google Patents

露光パターン形成方法 Download PDF

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Publication number
JP4253707B2
JP4253707B2 JP2004134441A JP2004134441A JP4253707B2 JP 4253707 B2 JP4253707 B2 JP 4253707B2 JP 2004134441 A JP2004134441 A JP 2004134441A JP 2004134441 A JP2004134441 A JP 2004134441A JP 4253707 B2 JP4253707 B2 JP 4253707B2
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JP
Japan
Prior art keywords
exposure
pattern
exposed
laser beam
reference position
Prior art date
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Expired - Fee Related
Application number
JP2004134441A
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English (en)
Japanese (ja)
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JP2005316167A (ja
JP2005316167A5 (https=
Inventor
三好 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to JP2004134441A priority Critical patent/JP4253707B2/ja
Priority to CNB2005800131153A priority patent/CN100483258C/zh
Priority to PCT/JP2005/008115 priority patent/WO2005106591A1/ja
Priority to KR1020067022507A priority patent/KR101094468B1/ko
Priority to TW094113745A priority patent/TWI380134B/zh
Publication of JP2005316167A publication Critical patent/JP2005316167A/ja
Publication of JP2005316167A5 publication Critical patent/JP2005316167A5/ja
Application granted granted Critical
Publication of JP4253707B2 publication Critical patent/JP4253707B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laser Beam Printer (AREA)
  • Mechanical Optical Scanning Systems (AREA)
JP2004134441A 2004-04-28 2004-04-28 露光パターン形成方法 Expired - Fee Related JP4253707B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004134441A JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法
CNB2005800131153A CN100483258C (zh) 2004-04-28 2005-04-28 曝光图案形成方法
PCT/JP2005/008115 WO2005106591A1 (ja) 2004-04-28 2005-04-28 露光パターン形成方法
KR1020067022507A KR101094468B1 (ko) 2004-04-28 2005-04-28 노광 패턴 형성 방법
TW094113745A TWI380134B (en) 2004-04-28 2005-04-28 Exposure pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004134441A JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法

Publications (3)

Publication Number Publication Date
JP2005316167A JP2005316167A (ja) 2005-11-10
JP2005316167A5 JP2005316167A5 (https=) 2007-05-24
JP4253707B2 true JP4253707B2 (ja) 2009-04-15

Family

ID=35241830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004134441A Expired - Fee Related JP4253707B2 (ja) 2004-04-28 2004-04-28 露光パターン形成方法

Country Status (5)

Country Link
JP (1) JP4253707B2 (https=)
KR (1) KR101094468B1 (https=)
CN (1) CN100483258C (https=)
TW (1) TWI380134B (https=)
WO (1) WO2005106591A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5344730B2 (ja) * 2006-05-22 2013-11-20 株式会社ブイ・テクノロジー 露光装置
JP5319175B2 (ja) * 2008-06-17 2013-10-16 日立造船株式会社 パターン描画方法及び装置
JP5351287B2 (ja) * 2010-01-21 2013-11-27 シャープ株式会社 基板、基板に対する露光方法、光配向処理方法
JP5538049B2 (ja) * 2010-04-22 2014-07-02 日東電工株式会社 フォトマスクと基材との位置合わせ方法および配線回路基板の製造方法
JP5704315B2 (ja) * 2011-01-07 2015-04-22 株式会社ブイ・テクノロジー 露光装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010623A (ja) * 1983-06-29 1985-01-19 Fujitsu Ltd ホトリピ−タ
JPS62124999A (ja) * 1985-11-27 1987-06-06 株式会社ニコン 自動作図装置
JP3046697B2 (ja) * 1993-11-08 2000-05-29 シャープ株式会社 露光装置
JPH09171106A (ja) * 1995-10-19 1997-06-30 Fuji Photo Film Co Ltd カラーフィルターの作製方法
JP3169068B2 (ja) * 1997-12-04 2001-05-21 日本電気株式会社 電子線露光方法及び半導体ウエハ
KR20030033067A (ko) * 2000-09-21 2003-04-26 가부시키가이샤 니콘 결상특성의 계측방법 및 노광방법
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
JP2005316167A (ja) 2005-11-10
WO2005106591A1 (ja) 2005-11-10
KR20070001251A (ko) 2007-01-03
CN100483258C (zh) 2009-04-29
TWI380134B (en) 2012-12-21
TW200606595A (en) 2006-02-16
KR101094468B1 (ko) 2011-12-19
CN1947064A (zh) 2007-04-11

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