JP4250651B2 - 粒子配列方法、及び、発光素子の製造方法 - Google Patents

粒子配列方法、及び、発光素子の製造方法 Download PDF

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JP4250651B2
JP4250651B2 JP2006265428A JP2006265428A JP4250651B2 JP 4250651 B2 JP4250651 B2 JP 4250651B2 JP 2006265428 A JP2006265428 A JP 2006265428A JP 2006265428 A JP2006265428 A JP 2006265428A JP 4250651 B2 JP4250651 B2 JP 4250651B2
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thin film
particles
light
substrate
particle
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JP2006265428A
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JP2008080461A5 (enExample
JP2008080461A (ja
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本 明 藤
西 務 中
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Toshiba Corp
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Toshiba Corp
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Priority to US11/687,709 priority patent/US7776196B2/en
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/38—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal at least one coating being a coating of an organic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/42—Coatings comprising at least one inhomogeneous layer consisting of particles only
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/445—Organic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/479—Metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/48—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase having a specific function
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/90—Other aspects of coatings
    • C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
    • C03C2217/948—Layers comprising indium tin oxide [ITO]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/85—Arrangements for extracting light from the devices
    • H10K50/854—Arrangements for extracting light from the devices comprising scattering means

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Silicon Compounds (AREA)
JP2006265428A 2006-09-28 2006-09-28 粒子配列方法、及び、発光素子の製造方法 Expired - Fee Related JP4250651B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006265428A JP4250651B2 (ja) 2006-09-28 2006-09-28 粒子配列方法、及び、発光素子の製造方法
US11/687,709 US7776196B2 (en) 2006-09-28 2007-03-19 Method for arranging particles and method for manufacturing light-emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006265428A JP4250651B2 (ja) 2006-09-28 2006-09-28 粒子配列方法、及び、発光素子の製造方法

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JP2008080461A JP2008080461A (ja) 2008-04-10
JP2008080461A5 JP2008080461A5 (enExample) 2008-05-22
JP4250651B2 true JP4250651B2 (ja) 2009-04-08

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US (1) US7776196B2 (enExample)
JP (1) JP4250651B2 (enExample)

Families Citing this family (26)

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US10231344B2 (en) * 2007-05-18 2019-03-12 Applied Nanotech Holdings, Inc. Metallic ink
US8404160B2 (en) 2007-05-18 2013-03-26 Applied Nanotech Holdings, Inc. Metallic ink
US8506849B2 (en) * 2008-03-05 2013-08-13 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
US9730333B2 (en) 2008-05-15 2017-08-08 Applied Nanotech Holdings, Inc. Photo-curing process for metallic inks
JP5214477B2 (ja) * 2009-01-20 2013-06-19 株式会社東芝 粒子配列構造体の製造方法、およびそれを利用する有機エレクトロルミネッセンス素子の製造方法ならびにパターン形成方法
JP5740389B2 (ja) 2009-03-27 2015-06-24 アプライド・ナノテック・ホールディングス・インコーポレーテッド 光焼結及び／またはレーザー焼結を強化するためのバッファ層
WO2010117102A1 (ko) 2009-04-09 2010-10-14 서강대학교 산학협력단 콜로이드 입자들을 단결정들로 정렬하는 방법
US8422197B2 (en) 2009-07-15 2013-04-16 Applied Nanotech Holdings, Inc. Applying optical energy to nanoparticles to produce a specified nanostructure
JP5210270B2 (ja) * 2009-09-09 2013-06-12 ユー・ディー・シー アイルランド リミテッド 有機電界発光素子及びその製造方法
JP2011111355A (ja) * 2009-11-25 2011-06-09 Ricoh Co Ltd 薄膜製造方法および薄膜素子
US20110123728A1 (en) * 2009-11-25 2011-05-26 Ricoh Company, Ltd. Thin film manufacturing method and thin film element
KR101135541B1 (ko) * 2010-04-01 2012-04-13 삼성모바일디스플레이주식회사 유기 발광 장치
JP6125758B2 (ja) 2011-03-31 2017-05-10 住友化学株式会社 光学素子
JP6085095B2 (ja) 2011-03-31 2017-02-22 住友化学株式会社 光学素子
JP6018774B2 (ja) 2011-03-31 2016-11-02 住友化学株式会社 金属系粒子集合体
KR20130111154A (ko) * 2012-03-30 2013-10-10 주식회사 엘지화학 유기전자소자용 기판
TW201419315A (zh) 2012-07-09 2014-05-16 Applied Nanotech Holdings Inc 微米尺寸銅粒子的光燒結法
KR101378168B1 (ko) 2012-07-13 2014-03-24 재단법인 멀티스케일 에너지시스템 연구단 나노입자를 포함하는 전자소자의 제조방법
KR101358098B1 (ko) 2012-07-13 2014-02-05 재단법인 멀티스케일 에너지시스템 연구단 3차원 형상의 나노입자 조립 구조물 및 이를 이용한 가스센서
KR101391010B1 (ko) 2012-07-13 2014-04-30 재단법인 멀티스케일 에너지시스템 연구단 나노입자로 조립된 3차원 구조물 제조방법
WO2014017793A1 (ko) * 2012-07-24 2014-01-30 주식회사 엘지화학 금속입자층 형성 방법 및 이를 이용하여 제조된 발광소자
CN104769733B (zh) * 2012-07-24 2017-08-08 株式会社Lg化学 用于改进发光器件的光提取效率的方法以及用于制造发光器件的方法
JP2015083540A (ja) * 2014-12-03 2015-04-30 株式会社リコー 薄膜製造方法、圧電素子製造方法および記録ヘッド製造方法
GB201509080D0 (en) 2015-05-27 2015-07-08 Landa Labs 2012 Ltd Coating apparatus
US11701684B2 (en) 2015-05-27 2023-07-18 Landa Labs (2012) Ltd. Method for coating a surface with a transferable layer of thermoplastic particles and related apparatus
US12455402B2 (en) * 2022-04-21 2025-10-28 The Mitre Corporation Implanting photonic crystals into polymers

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3940546B2 (ja) * 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
JP3989148B2 (ja) * 1999-12-01 2007-10-10 独立行政法人科学技術振興機構 金属微粒子の光固定化方法
WO2001051276A2 (en) * 2000-01-07 2001-07-19 President And Fellows Of Harvard College Fabrication of metallic microstructures via exposure of photosensitive composition
WO2002054071A1 (en) * 2001-01-08 2002-07-11 Salafsky Joshua S Method and apparatus using a surface-selective nonlinear optical technique
US20050053974A1 (en) * 2003-05-20 2005-03-10 University Of Maryland Apparatus and methods for surface plasmon-coupled directional emission
JP2007510160A (ja) * 2003-10-28 2007-04-19 アリックス インコーポレイテッド ホログラフィック光トラッピングを用いて物質を操作し、処理するためのシステム及び方法

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US20080078678A1 (en) 2008-04-03
US7776196B2 (en) 2010-08-17

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