JP4245748B2 - 動圧軸受の動圧溝の形成方法及び形成装置 - Google Patents

動圧軸受の動圧溝の形成方法及び形成装置 Download PDF

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Publication number
JP4245748B2
JP4245748B2 JP27624899A JP27624899A JP4245748B2 JP 4245748 B2 JP4245748 B2 JP 4245748B2 JP 27624899 A JP27624899 A JP 27624899A JP 27624899 A JP27624899 A JP 27624899A JP 4245748 B2 JP4245748 B2 JP 4245748B2
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Prior art keywords
dynamic pressure
etching
forming
resist
pattern
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JP2001099159A5 (enExample
JP2001099159A (ja
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恵二 佐藤
修 山崎
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Seiko Instruments Inc
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Seiko Instruments Inc
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JP27624899A 1999-09-29 1999-09-29 動圧軸受の動圧溝の形成方法及び形成装置 Expired - Fee Related JP4245748B2 (ja)

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JP27624899A JP4245748B2 (ja) 1999-09-29 1999-09-29 動圧軸受の動圧溝の形成方法及び形成装置

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JP27624899A JP4245748B2 (ja) 1999-09-29 1999-09-29 動圧軸受の動圧溝の形成方法及び形成装置

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JP2001099159A JP2001099159A (ja) 2001-04-10
JP2001099159A5 JP2001099159A5 (enExample) 2005-10-27
JP4245748B2 true JP4245748B2 (ja) 2009-04-02

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002333711A (ja) * 2001-05-08 2002-11-22 Taiyo Denshi Kogyo Kk フォトレジストフィルムのラミネート方法
JP2003097543A (ja) * 2001-09-25 2003-04-03 Koyo Seiko Co Ltd 動圧軸受及びその製造方法
JP2007040536A (ja) * 2006-10-16 2007-02-15 Jtekt Corp 動圧軸受およびその製造方法

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