JP4235778B2 - 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法 - Google Patents

投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法 Download PDF

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Publication number
JP4235778B2
JP4235778B2 JP14160799A JP14160799A JP4235778B2 JP 4235778 B2 JP4235778 B2 JP 4235778B2 JP 14160799 A JP14160799 A JP 14160799A JP 14160799 A JP14160799 A JP 14160799A JP 4235778 B2 JP4235778 B2 JP 4235778B2
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Japan
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lens group
wavelength
negative
negative lens
positive
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Expired - Fee Related
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JP14160799A
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Japanese (ja)
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JP2000039557A (ja
JP2000039557A5 (OSRAM
Inventor
雅人 熊澤
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Nikon Corp
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Nikon Corp
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Publication of JP2000039557A5 publication Critical patent/JP2000039557A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP14160799A 1998-05-21 1999-05-21 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法 Expired - Fee Related JP4235778B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14160799A JP4235778B2 (ja) 1998-05-21 1999-05-21 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10-140285 1998-05-21
JP14028598 1998-05-21
JP14160799A JP4235778B2 (ja) 1998-05-21 1999-05-21 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法

Publications (3)

Publication Number Publication Date
JP2000039557A JP2000039557A (ja) 2000-02-08
JP2000039557A5 JP2000039557A5 (OSRAM) 2008-01-24
JP4235778B2 true JP4235778B2 (ja) 2009-03-11

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JP14160799A Expired - Fee Related JP4235778B2 (ja) 1998-05-21 1999-05-21 投影光学系、投影光学装置、走査型露光装置、光加工方法および露光方法

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JP (1) JP4235778B2 (OSRAM)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5205683B2 (ja) 2000-04-19 2013-06-05 株式会社ニコン 光学装置、露光装置、および露光方法
JP2002023055A (ja) * 2000-07-10 2002-01-23 Nikon Corp 結像光学系および該結像光学系を備えた露光装置
JP2004006783A (ja) * 2002-04-18 2004-01-08 Nikon Corp 投影光学系、露光装置、露光方法及びマイクロデバイスの製造方法
JP2004354909A (ja) * 2003-05-30 2004-12-16 Orc Mfg Co Ltd 投影露光装置および投影露光方法
JP4618531B2 (ja) * 2004-03-15 2011-01-26 株式会社ニコン レーザ加工用光学系及びこれを用いたレーザ加工装置
CN100388056C (zh) * 2006-06-02 2008-05-14 上海微电子装备有限公司 一种投影物镜光学系统
US7760425B2 (en) * 2007-09-05 2010-07-20 Carl Zeiss Smt Ag Chromatically corrected catadioptric objective and projection exposure apparatus including the same
CN114859515B (zh) * 2022-05-23 2024-01-12 张家港中贺自动化科技有限公司 一种用于投影光刻的折反式物镜光学系统及投影光刻系统
CN115452828B (zh) * 2022-09-22 2024-08-23 苏州灵猴机器人有限公司 一种物料的光学检测系统

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
JPH0756090A (ja) * 1993-08-17 1995-03-03 Topcon Corp 走査型投影光学系
JPH08179217A (ja) * 1994-08-19 1996-07-12 Tamarack Scient Co Inc ダイソンレンズ系
US5557469A (en) * 1994-10-28 1996-09-17 Ultratech Stepper, Inc. Beamsplitter in single fold optical system and optical variable magnification method and system
JPH08211294A (ja) * 1995-02-02 1996-08-20 Nikon Corp 投影露光装置
US5585972A (en) * 1995-02-15 1996-12-17 Ultratech Stepper, Inc. Arbitrarily wide lens array with an image field to span the width of a substrate

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Publication number Publication date
JP2000039557A (ja) 2000-02-08

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