JP4226669B2 - 耐熱部材 - Google Patents

耐熱部材 Download PDF

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Publication number
JP4226669B2
JP4226669B2 JP02266997A JP2266997A JP4226669B2 JP 4226669 B2 JP4226669 B2 JP 4226669B2 JP 02266997 A JP02266997 A JP 02266997A JP 2266997 A JP2266997 A JP 2266997A JP 4226669 B2 JP4226669 B2 JP 4226669B2
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JP
Japan
Prior art keywords
layer
ceramic
ceramic layer
heat
elastic modulus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP02266997A
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English (en)
Japanese (ja)
Other versions
JPH09272987A5 (enExample
JPH09272987A (ja
Inventor
一浩 安田
誠一 末永
国彦 和田
昌子 中橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
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Toshiba Corp
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Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP02266997A priority Critical patent/JP4226669B2/ja
Publication of JPH09272987A publication Critical patent/JPH09272987A/ja
Publication of JPH09272987A5 publication Critical patent/JPH09272987A5/ja
Application granted granted Critical
Publication of JP4226669B2 publication Critical patent/JP4226669B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP02266997A 1996-02-05 1997-02-05 耐熱部材 Expired - Fee Related JP4226669B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP02266997A JP4226669B2 (ja) 1996-02-05 1997-02-05 耐熱部材

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP1856596 1996-02-05
JP8-18565 1996-02-05
JP02266997A JP4226669B2 (ja) 1996-02-05 1997-02-05 耐熱部材

Publications (3)

Publication Number Publication Date
JPH09272987A JPH09272987A (ja) 1997-10-21
JPH09272987A5 JPH09272987A5 (enExample) 2004-10-21
JP4226669B2 true JP4226669B2 (ja) 2009-02-18

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ID=26355261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP02266997A Expired - Fee Related JP4226669B2 (ja) 1996-02-05 1997-02-05 耐熱部材

Country Status (1)

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JP (1) JP4226669B2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3510993B2 (ja) 1999-12-10 2004-03-29 トーカロ株式会社 プラズマ処理容器内部材およびその製造方法
US7204912B2 (en) 2002-09-30 2007-04-17 Tokyo Electron Limited Method and apparatus for an improved bellows shield in a plasma processing system
US7166166B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved baffle plate in a plasma processing system
US7137353B2 (en) 2002-09-30 2006-11-21 Tokyo Electron Limited Method and apparatus for an improved deposition shield in a plasma processing system
US7166200B2 (en) 2002-09-30 2007-01-23 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate in a plasma processing system
US6837966B2 (en) 2002-09-30 2005-01-04 Tokyo Electron Limeted Method and apparatus for an improved baffle plate in a plasma processing system
US7147749B2 (en) 2002-09-30 2006-12-12 Tokyo Electron Limited Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system
US6798519B2 (en) 2002-09-30 2004-09-28 Tokyo Electron Limited Method and apparatus for an improved optical window deposition shield in a plasma processing system
KR100772740B1 (ko) 2002-11-28 2007-11-01 동경 엘렉트론 주식회사 플라즈마 처리 용기 내부재
JP4532479B2 (ja) 2003-03-31 2010-08-25 東京エレクトロン株式会社 処理部材のためのバリア層およびそれと同じものを形成する方法。
CN100495413C (zh) 2003-03-31 2009-06-03 东京毅力科创株式会社 用于邻接在处理元件上的相邻覆层的方法
US7552521B2 (en) 2004-12-08 2009-06-30 Tokyo Electron Limited Method and apparatus for improved baffle plate
US7601242B2 (en) 2005-01-11 2009-10-13 Tokyo Electron Limited Plasma processing system and baffle assembly for use in plasma processing system
EP1780298A4 (en) 2005-07-29 2009-01-07 Tocalo Co Ltd Part Coated with Y203 Thermally Sprayed Film and Method of Making the Same
JP4571561B2 (ja) 2005-09-08 2010-10-27 トーカロ株式会社 耐プラズマエロージョン性に優れる溶射皮膜被覆部材およびその製造方法
US7854966B2 (en) 2006-02-06 2010-12-21 Hamilton Sundstrand Corporation Coating process for fatigue critical components
US7850864B2 (en) 2006-03-20 2010-12-14 Tokyo Electron Limited Plasma treating apparatus and plasma treating method
US7648782B2 (en) 2006-03-20 2010-01-19 Tokyo Electron Limited Ceramic coating member for semiconductor processing apparatus
JP5081418B2 (ja) * 2006-08-28 2012-11-28 パナソニック株式会社 Ｌｅｄパッケージ
US9341118B2 (en) * 2009-12-29 2016-05-17 Rolls-Royce Corporation Various layered gas turbine engine component constructions
EP2631324A4 (en) * 2010-10-19 2014-04-16 Nat Inst For Materials Science NICKEL-BASED SUPER-LUBRICATING ELEMENT COMPRISING A HAZARD-RESISTANT LAYER COATING THEREIN
JPWO2014083630A1 (ja) * 2012-11-28 2017-01-05 株式会社日立製作所 遮熱コーティング部材
EP2884048A1 (de) * 2013-12-13 2015-06-17 Siemens Aktiengesellschaft Wärmedämmbeschichtung einer Turbinenschaufel

Also Published As

Publication number Publication date
JPH09272987A (ja) 1997-10-21

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