JP4220333B2 - 外観検査装置 - Google Patents
外観検査装置 Download PDFInfo
- Publication number
- JP4220333B2 JP4220333B2 JP2003299898A JP2003299898A JP4220333B2 JP 4220333 B2 JP4220333 B2 JP 4220333B2 JP 2003299898 A JP2003299898 A JP 2003299898A JP 2003299898 A JP2003299898 A JP 2003299898A JP 4220333 B2 JP4220333 B2 JP 4220333B2
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- inspection
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- defective
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- 238000007689 inspection Methods 0.000 title claims description 247
- 230000002950 deficient Effects 0.000 claims description 75
- 238000003384 imaging method Methods 0.000 claims 1
- 238000012545 processing Methods 0.000 description 93
- 230000008439 repair process Effects 0.000 description 40
- 238000000034 method Methods 0.000 description 34
- 230000008569 process Effects 0.000 description 26
- 239000000758 substrate Substances 0.000 description 23
- 238000012360 testing method Methods 0.000 description 20
- 238000005286 illumination Methods 0.000 description 14
- 238000004458 analytical method Methods 0.000 description 13
- 230000007547 defect Effects 0.000 description 12
- 229910000679 solder Inorganic materials 0.000 description 11
- 238000005476 soldering Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 3
- 238000011179 visual inspection Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
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- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Image Processing (AREA)
- Image Analysis (AREA)
Description
Claims (1)
- 被検査対象から得られる被検査画像を用いる外観検査装置において、
前記被検査画像をラインセンサにより走査して撮影する単一の撮影手段と、
撮影された前記被検査画像自体から抽出されるパラメータを良品基準として定められた境界値と比較することにより前記被検査対象の良否を複数のロジック検査項目のそれぞれについて個別に判定する複数の判定手段と、
前記複数の判定手段による判定が順次行われる際、いずれかの判定手段において前記被検査対象が不良であると判定されたとき、前記被検査画像と所定の良品画像を画素の差分をもとに比較することにより、前記被検査対象の良否を再判定する手段と、
を含み、
前記複数の判定手段と前記再判定する手段はともに、前記ラインセンサの走査方向に垂直な方向への前記単一の撮影手段の一次元運動により撮影された前記被検査画像を用い、
前記再判定する手段による再判定の救済候補を、前記判定する手段の判定結果に応じて制限することを特徴とする外観検査装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003299898A JP4220333B2 (ja) | 2003-08-25 | 2003-08-25 | 外観検査装置 |
Applications Claiming Priority (1)
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JP2003299898A JP4220333B2 (ja) | 2003-08-25 | 2003-08-25 | 外観検査装置 |
Publications (2)
Publication Number | Publication Date |
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JP2005069863A JP2005069863A (ja) | 2005-03-17 |
JP4220333B2 true JP4220333B2 (ja) | 2009-02-04 |
Family
ID=34404989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2003299898A Expired - Lifetime JP4220333B2 (ja) | 2003-08-25 | 2003-08-25 | 外観検査装置 |
Country Status (1)
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JP (1) | JP4220333B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008286692A (ja) * | 2007-05-18 | 2008-11-27 | Mega Trade:Kk | 外観検査システム |
JP5865707B2 (ja) * | 2012-01-06 | 2016-02-17 | 株式会社キーエンス | 外観検査装置、外観検査方法及びコンピュータプログラム |
JP5934516B2 (ja) * | 2012-02-23 | 2016-06-15 | 株式会社キーエンス | 検査領域表示装置及び検査領域表示方法 |
-
2003
- 2003-08-25 JP JP2003299898A patent/JP4220333B2/ja not_active Expired - Lifetime
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JP2005069863A (ja) | 2005-03-17 |
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