JP4196320B2 - Mounting circuit resin board with thin film - Google Patents

Mounting circuit resin board with thin film Download PDF

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Publication number
JP4196320B2
JP4196320B2 JP2002181024A JP2002181024A JP4196320B2 JP 4196320 B2 JP4196320 B2 JP 4196320B2 JP 2002181024 A JP2002181024 A JP 2002181024A JP 2002181024 A JP2002181024 A JP 2002181024A JP 4196320 B2 JP4196320 B2 JP 4196320B2
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Prior art keywords
pattern
wiring
thin film
mounting circuit
resin substrate
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JP2002181024A
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JP2004031391A (en
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尚美 福永
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Fujitsu Ltd
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Fujitsu Ltd
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Description

【0001】
【発明の属する技術分野】
本発明は薄膜付実装回路樹脂基板に関するものであり、特に、層間絶縁膜としてドライフィルムを用いた薄膜付実装回路樹脂基板における絶縁材料のダレを防止するための構成に特徴のある薄膜付実装回路樹脂基板に関するものである。
【0002】
【従来の技術】
近年、実装回路基板として層間絶縁膜にドライフィルムを用いた薄膜付樹脂基板が用いられるようになったが、この薄膜付樹脂基板においては、配線層の上面にドライフィルムを熱圧着することにより層間絶縁層を形成しているので、ここで、図5を参照して、従来の薄膜付実装回路樹脂基板を説明する。
【0003】
図5(a)参照
図5(a)は、従来の薄膜付実装回路樹脂基板60の概略的平面図であり、基板の内部側に配線形成領域64が設けられている。
また、基板の外周部61と、配線形成領域64内に設けられる貫通孔形成領域63及び製品番号表示領域62とには配線が設けられない構成となっている。
【0004】
図5(b)参照
図5(b)は、図5(a)におけるA−A′を結ぶ一点鎖線に沿った概略的断面図であり、樹脂コア材71上に、無電解メッキ法でCu膜を堆積させたのち、エッチングすることによって、配線形成領域64においては、第1Cu配線層72を形成するとともに、外周部においてはCu膜を除去する。
【0005】
次いで、ドライフィルムを熱圧着させて第1層間絶縁膜73を形成したのち、無電解Cuメッキ法によりメッキシード層を形成し、レジストからなるメッキフレームをマスクとして電解メッキ法によりCuメッキ層を選択的に形成し、メッキフレームを除去したのち、露出するメッキシード層を除去することによって第2Cu配線層74を形成する。
【0006】
この工程を必要とする回数だけ繰り返して多層配線層構造を形成し、最後に表面をソルダーレジストからなる表面絶縁膜79で被覆することによって、薄膜付実装回路樹脂基板の基本構成が得られる。
なお、図においては、第4Cu配線層78乃至第1Cu配線層72を、第3層間絶縁膜77乃至第1層間絶縁膜73で分離した4層配線構造として示しており、また、図示は省略したが、第3層間絶縁膜77乃至第1層間絶縁膜73には、必要個所において上下の配線層を電気的に接続するためのスルービアが設けられている。
【0007】
【発明が解決しようとする課題】
しかし、薄膜付実装回路樹脂基板の配線層には面内分布があり、配線層の粗密バランスが悪い領域、例えば、薄膜付実装回路樹脂基板の端部近傍においては、製造プロセス上、配線密度の高いエリアから低いエリア方向へ絶縁材がダレるため、配線層上部の絶縁材の膜厚が薄くなりやすく、膜厚が薄くなると、絶縁低下や層間剥離等の不具合が発生し易くなり信頼性上問題となる。
【0008】
この傾向は、図5において概念的図示したように、ドライフィルムからなる層間絶縁膜及びソルダーレジストからなる表面絶縁層の両者に共通である。
【0009】
したがって、本発明は、配線層の粗密に起因する絶縁材のダレを防止することを目的とする。
【0010】
【課題を解決するための手段】
図1は本発明の原理的構成図であり、この図1を参照して本発明における課題を解決するための手段を説明する。
なお、図における符号1は薄膜付実装回路基板の基部を構成するコア層である。
図1参照
上記目的を達成するため、本発明は、下層配線層と上層配線層との間に設ける層間絶縁膜4をドライフィルムによって構成した薄膜付実装回路樹脂基板において、実配線層2を形成する配線形成領域と、前記配線形成領域を挟んで配置され、前記配線形成領域よりもパターンの密度が大きいベタパターン形成領域と、前記実配線層2の密度が相対的に粗な領域に隣接し、且つ、前記基板の外周部に設けたダレ防止用パターン3とから構成され、前記ベタパターン形成領域に隣接する前記基板の外周部には、前記ダレ防止用パターン3を形成しないことを特徴とする。
【0011】
この様に、少なくとも実配線層2の密度が相対的に粗な領域に隣接し、且つ、基板の外周部にダレ防止用パターン3を設けることによって、実配線層2上に設ける層間絶縁膜4或いは表面絶縁膜5等の絶縁膜の膜厚の低下を防止することができる。
特に、ベタパターン形成領域に隣接する基板の外周部には、ダレ防止用パターン3を形成しないので、ダレ防止パターン3を形成するためのスペースが不要になり、配線形成領域を拡大することができる。
なお、実配線層2とは、実際の回路を構成するための配線層で、ダミーパターンに対するものである。
【0013】
また、ダレ防止用パターン3は、薄膜付実装回路樹脂基板の内部側に設ける貫通孔の周囲に、貫通孔の周囲を縁取るように設けることが望ましく、貫通孔の周囲における絶縁不良の発生を防止することができる。
【0014】
また、ダレ防止パターン3は、薄膜付実装回路樹脂基板の内部側に設ける配線非形成領域の周囲、即ち、製品番号表示部或いはロゴマーク記入部等の配線非形成領域の周囲、特に、内周囲に、周囲を縁取るように設けることが望ましく、それによって、配線非形成領域近傍における絶縁不良の発生を防止することができる。
【0015】
また、この様なダレ防止用パターン3は、どの様な部材で構成しても良いが、製造工程を増やさないためには、同層の配線層と同じ材料で同時に形成することが望ましく、また、各層の配線層に対して夫々ダレ防止用パターン3を設けることが望ましい。
【0016】
また、ダレ防止用パターン3は、ドライフィルムに予め形成した膜厚部によって構成しても良いものであり、この場合には、ダレ防止用パターン3自体に起因する短絡を防止することができる。
【0017】
【発明の実施の形態】
ここで、図2を参照して、本発明の前提となる参考例1の薄膜付実装回路樹脂基板を説明する。
図2(a)参照
図2(a)は、本発明の前提となる参考例1の薄膜付実装回路樹脂基板10の概略的平面図であり、基板の内部側に設けられた実配線パターンを形成した配線形成領域14を囲むように外周部11に外周部11を縁取るようにダレ防止パターン21を設ける。
【0018】
また、配線形成領域14内に設けられる貫通孔形成領域13及び製品番号表示部12にも、貫通孔形成領域13の外周部及び製品番号表示部12の内周部を縁取るようにダレ防止パターン22,23を設ける。
【0019】
これらのダレ防止パターン22〜23は、以下に説明するように、配線層と同じ材料により同時に形成するものであり、また、このダレ防止パターン22〜23は、配線形成領域14の外周端部或いは内周端部から0.1mm〜1mm離れた位置に設ける。
【0020】
この場合、配線形成領域14に設ける実配線パターンに電磁ノイズ等の電気的に影響を与えないためには、0.1mm以上離れていれば良く、一方、絶縁膜のダレを効果的に抑制するためには、1mm以下であることが望ましく、ここでは、製造プロセスと電気的な影響を考えて0.1mmとする。
【0021】
図2(b)参照
図2(b)は、図2(a)におけるA−A′を結ぶ一点鎖線に沿った概略的断面図であり、樹脂コア材31上に、無電解メッキ法でCu膜を堆積させたのち、エッチングすることによって、配線形成領域14に第1Cu配線層32及びダレ防止パターン33を形成するとともに、外周部11においてはCu膜を除去する。
【0022】
次いで、ドライフィルムを熱圧着させて第1層間絶縁膜34を形成したのち、無電解Cuメッキ法によりメッキシード層を形成し、レジストからなるメッキフレームをマスクとして電解メッキ法によりCuメッキ層を選択的に形成し、メッキフレームを除去したのち、露出するメッキシード層を硫酸系エッチング液によって除去することによって、配線形成領域14に第2Cu配線層35を形成するとともに、外周部11にダレ防止パターン36を形成する。
なお、製造番号表示部12の内周部及び貫通孔形成部13の外周部にもダレ防止パターンが同時に形成される。
【0023】
この工程を必要とする回数だけ繰り返して多層配線層構造を形成し、最後に表面をソルダーレジストからなる表面絶縁膜43で被覆することによって、薄膜付実装回路樹脂基板の基本構成が得られる。
また、貫通孔は、貫通孔形成部13の外周部に設けたダレ防止パターン23の内側に形成される。
【0024】
なお、図においては、第4Cu配線層41乃至第1Cu配線層32を、第3層間絶縁膜40乃至第1層間絶縁膜34で分離した4層配線構造として示しており、また、図示は省略したが、第3層間絶縁膜40乃至第1層間絶縁膜34には、必要個所において上下の配線層を電気的に接続するためのスルービアが設けられている。
【0025】
この場合、第4Cu配線層41乃至第1Cu配線層32と同時に形成されたダレ防止パターン42〜33によって、外周部11に設けるダレ防止パターン21が形成される。
また、貫通孔形成領域13の外周部を縁取るように設けるダレ防止パターン23も外周部11に設けるダレ防止パターン21と同じ構成となる。
【0026】
この様に、参考例1においては、配線層が粗な領域に隣接してダレ防止パターン21〜23を設けているので、配線形成領域14にベタパターンを形成することなく、配線層上部の絶縁膜、即ち、表面絶縁膜43、及び、第3層間絶縁膜40乃至第1層間絶縁膜34の膜厚を均一化することができる。
【0027】
また、絶縁膜の膜厚を均一化することができるので、配線層が粗な領域における絶縁膜の膜厚が薄くなることがなく、絶縁低下や層間剥離等の不具合の発生を抑制することができ、信頼性が向上する。
【0028】
次に、図3を参照して、本発明の前提となる参考例2の薄膜付実装回路樹脂基板を説明する。
図3(a)参照
図3(a)は、本発明の前提となる参考例2の薄膜付実装回路樹脂基板の概略的平面図であり、基板の内部側には、配線形成領域14と、ベタパターン形成領域15,16に区分けされている。
【0029】
図3(b)参照
図3(b)は、配線形成領域14における配線パターンの説明するための平面図であり、実際に電子回路における電気信号や電源を伝送する実配線パターン17とその外周から約1μm分離された位置にベタパターン18が設けられている。
【0030】
再び、図3(a)参照
この場合、配線形成領域14内に設けられる製品番号表示部12及びベタパターン形成領域16内に設けられる貫通孔形成領域13には、上記の第1の実施の形態と同様に貫通孔形成領域13の外周部及び製品番号表示部12の内周部を縁取るようにダレ防止パターン22,23を設ける。
また、外周部11にも、外周部11を縁取るようにダレ防止パターン21を設ける。
【0031】
この様に、参考例2においては、配線形成領域14を挟むようにベタパターン形成領域15,16を設けるとともに、配線形成領域14にも実配線パターン17を囲むようにベタパターン18を設けているが、外周部11にも、外周部11を縁取るようにダレ防止パターン21を設けることによって、外周部11の近傍の実配線パターン17が粗な領域においても、実配線パターン17上における絶縁膜の膜厚が薄膜化をより確実に抑制することができる。
【0032】
次に、図4を参照して、本発明の第の実施の形態の薄膜付実装回路樹脂基板を説明する。
図4参照
図4は、本発明の第の実施の形態の薄膜付実装回路樹脂基板の概略的平面図であり、基板の基本的構成は上記の参考例2と同様であり、内部側には、配線形成領域14と、ベタパターン形成領域15,16に区分けされている。
【0033】
この第の実施の形態においても、配線形成領域14内に設けられる製品番号表示部12及びベタパターン形成領域16内に設けられる貫通孔形成領域13には、上記の第1の実施の形態と同様に貫通孔形成領域13の外周部及び製品番号表示部12の内周部を縁取るようにダレ防止パターン22,23を設ける。
【0034】
但し、外周部11には、外周部11の配線形成領域14に隣接する領域にのみダレ防止パターン24,25を設けたものである。
【0035】
この場合、ベタパターン形成領域15,16には実配線パターンが存在せず、且つ、ベタパターン形成領域15,16自体が密パターンとなるので、隣接する外周部11にはダレ防止パターンは設ける必要はない。
【0036】
しかし、配線形成領域14の周辺部においては、実配線パターンの密度が低下する傾向にあるので、外周部11の配線形成領域14に隣接する領域にのみダレ防止パターン24,25を設けることによって、配線層上の絶縁膜の膜厚を均一にすることができる。
【0037】
また、ベタパターン形成領域15,16に隣接する外周部11には、ダレ防止パターンを形成していないので、ダレ防止パターンを形成するためのスペースが不要になり、配線形成領域14を拡大することができる。
【0038】
以上、本発明の実施の形態を説明したが、本発明は実施の形態に記載した構成及び条件に限られるものではなく、各種の変更が可能である。
例えば、上記の実施の形態においては言及していないが、ダレ防止パターンは、上下のどちらかの電源層に接続しても良く、それによって、実配線パターンとの間の短絡を検出することができる。
【0039】
また、上記の実施の形態においては、配線層及びダレ防止パターンをCuメッキ層によって形成しているが、必ずしもCuメッキ層である必要はなく、スパッタ層でも良いものであり、また、パターン形成方法としてもエッチング法を用いても良いものである。
【0040】
また、配線層及びダレ防止パターンの構成材料は、Cuに限られるものではなく、AuやW等の他の導電材料を単層で或いは積層構造で用いても良いものである。
【0041】
また、上記の実施の形態においては、内部に設ける配線非形成領域を製品番号表示部として説明しているが、この様な内部に設ける配線非形成領域は製品番号表示部に限られるものではなく、ロゴマークや、電気的特性を表示する他の表示部にしても良いものである。
【0042】
また、上記の実施の形態においては、ダレ防止パターンを配線層と同じ材料によって同時に形成しているが、必ずしも同じ材料である必要はなく、絶縁物で形成しても良いものである。
例えば、層間絶縁膜となるドライフィルムの外周部の薄膜付実装回路樹脂基板の外周部の対応する位置に膜厚部を形成してダレ防止パターンとしても良いものである。
【0043】
(付記1) 下層配線層と上層配線層との間に設ける層間絶縁膜4をドライフィルムによって構成した薄膜付実装回路樹脂基板において、実配線層2を形成する配線形成領域と、前記配線形成領域を挟んで配置され、前記配線形成領域よりもパターンの密度が大きいベタパターン形成領域と、前記実配線層2の密度が相対的に粗な領域に隣接し、且つ、前記基板の外周部に設けたダレ防止用パターン3とから構成され、前記ベタパターン形成領域に隣接する前記基板の外周部には、前記ダレ防止用パターン3を形成しないことを特徴とする薄膜付実装回路樹脂基板。
(付記2) 上記薄膜付実装回路樹脂基板の内部側に設ける貫通孔の周囲に、前記貫通孔の周囲を縁取るように、ダレ防止用パターン3を設けたことを特徴とする付記1記載の薄膜付実装回路樹脂基板。
(付記3) 上記薄膜付実装回路樹脂基板の内部側に設ける配線非形成領域の周囲に、前記配線非形成領域の周囲を縁取るように、ダレ防止用パターン3を設けたことを特徴とする付記1または付記2に記載の薄膜付実装回路樹脂基板。
(付記4) 上記ダレ防止用パターン3を、同層の配線層と同じ材料で形成したことを特徴とする付記1乃至3のいずれか1に記載の薄膜付実装回路樹脂基板。
(付記5) 上記ダレ防止用パターン3を、各配線層に対して同層に設けたことを特徴とする付記4記載の薄膜付実装回路樹脂基板。
(付記6) 上記ダレ防止用パターン3が、ドライフィルムに予め形成した膜厚部であることを特徴とする付記1乃至3のいずれか1に記載の薄膜付実装回路樹脂基板。
【0044】
【発明の効果】
本発明によれば、配線形成領域、貫通孔形成領域、或いは、基板内部の配線非形成領域の周囲を縁取りするように、ダレ防止パターンを形成しているので、実配線層上の絶縁膜の膜厚を均一にすることができ、それによって、絶縁低下や層間剥離を抑制することができるので、薄膜付実装回路樹脂基板の信頼性の向上に寄与するところが大きい。
【図面の簡単な説明】
【図1】本発明の原理的構成の説明図である。
【図2】 本発明の前提となる参考例1の薄膜付実装回路樹脂基板の構成説明図である。
【図3】 本発明の前提となる参考例2の薄膜付実装回路樹脂基板の構成説明図である。
【図4】 本発明の第の実施の形態の薄膜付実装回路樹脂基板の構成説明図である。
【図5】従来の薄膜付実装回路樹脂基板の構成説明図である。
【符号の説明】
1 コア層
2 実配線層
3 ダレ防止用パターン
4 層間絶縁膜
5 表面絶縁膜
10 薄膜付実装回路樹脂基板
11 外周部
12 製品番号表示部
13 貫通孔形成領域
14 配線形成領域
15 ベタパターン形成領域
16 ベタパターン形成領域
17 実配線パターン
18 ベタパターン
21 ダレ防止パターン
22 ダレ防止パターン
23 ダレ防止パターン
24 ダレ防止パターン
25 ダレ防止パターン
31 樹脂コア層
32 第1Cu配線層
33 ダレ防止パターン
34 第1層間絶縁膜
35 第2Cu配線層
36 ダレ防止パターン
37 第2層間絶縁膜
38 第3Cu配線層
39 ダレ防止パターン
40 第3層間絶縁膜
41 第4Cu配線層
42 ダレ防止パターン
43 表面絶縁膜
60 薄膜付実装回路樹脂基板
61 外周部
62 製品番号表示部
63 貫通孔形成領域
64 配線形成領域
71 樹脂コア層
72 第1Cu配線層
73 第1層間絶縁膜
74 第2Cu配線層
75 第2層間絶縁膜
76 第3Cu配線層
77 第3層間絶縁膜
78 第4Cu配線層
79 表面絶縁膜
[0001]
BACKGROUND OF THE INVENTION
TECHNICAL FIELD The present invention relates to a mounting circuit resin substrate with a thin film, and in particular, a mounting circuit with a thin film characterized by a configuration for preventing sagging of an insulating material in a mounting circuit resin substrate with a thin film using a dry film as an interlayer insulating film. The present invention relates to a resin substrate.
[0002]
[Prior art]
In recent years, a resin substrate with a thin film using a dry film as an interlayer insulating film has been used as a mounting circuit board. In this resin substrate with a thin film, a dry film is thermocompression bonded to the upper surface of a wiring layer. Since an insulating layer is formed, a conventional mounting circuit resin substrate with a thin film will be described with reference to FIG.
[0003]
FIG. 5A is a schematic plan view of a conventional mounting circuit resin substrate 60 with a thin film, and a wiring formation region 64 is provided on the inner side of the substrate.
In addition, no wiring is provided in the outer peripheral portion 61 of the substrate, the through-hole forming area 63 provided in the wiring forming area 64, and the product number display area 62.
[0004]
FIG. 5B is a schematic cross-sectional view taken along the alternate long and short dash line connecting AA ′ in FIG. 5A, and Cu is formed on the resin core material 71 by electroless plating. After the film is deposited, the first Cu wiring layer 72 is formed in the wiring forming region 64 and the Cu film is removed from the outer peripheral portion by etching.
[0005]
Next, the first interlayer insulating film 73 is formed by thermocompression bonding of the dry film, and then a plating seed layer is formed by an electroless Cu plating method, and a Cu plating layer is selected by an electrolytic plating method using a resist plating frame as a mask. Then, after the plating frame is removed, the exposed plating seed layer is removed to form the second Cu wiring layer 74.
[0006]
This process is repeated as many times as necessary to form a multilayer wiring layer structure, and finally the surface is covered with a surface insulating film 79 made of a solder resist, thereby obtaining the basic structure of the mounting circuit resin substrate with a thin film.
In the drawing, the fourth Cu wiring layer 78 to the first Cu wiring layer 72 are shown as a four-layer wiring structure separated by the third interlayer insulating film 77 to the first interlayer insulating film 73, and the illustration is omitted. However, the third interlayer insulating film 77 to the first interlayer insulating film 73 are provided with through vias for electrically connecting the upper and lower wiring layers at necessary places.
[0007]
[Problems to be solved by the invention]
However, the wiring layer of the mounting circuit resin substrate with a thin film has an in-plane distribution, and in the area where the density balance of the wiring layer is poor, for example, in the vicinity of the end of the mounting circuit resin substrate with a thin film, the wiring density is reduced due to the manufacturing process. Since the insulating material sag from the high area to the low area, the film thickness of the insulating material on the upper part of the wiring layer tends to be thin, and if the film thickness is thin, defects such as insulation degradation and delamination are likely to occur. It becomes a problem.
[0008]
This tendency is common to both the interlayer insulating film made of a dry film and the surface insulating layer made of a solder resist, as conceptually shown in FIG.
[0009]
Accordingly, an object of the present invention is to prevent sagging of an insulating material due to the density of a wiring layer.
[0010]
[Means for Solving the Problems]
FIG. 1 is a block diagram showing the principle of the present invention. Means for solving the problems in the present invention will be described with reference to FIG.
In addition, the code | symbol 1 in a figure is a core layer which comprises the base of a mounting circuit board with a thin film.
Refer to FIG. 1. In order to achieve the above object, the present invention forms an actual wiring layer 2 in a mounting circuit resin substrate with a thin film in which an interlayer insulating film 4 provided between a lower wiring layer and an upper wiring layer is formed of a dry film. A wiring pattern forming region, a solid pattern forming region having a pattern density higher than that of the wiring forming region, and a region where the density of the actual wiring layer 2 is relatively coarse. And the anti-sagging pattern 3 provided on the outer peripheral portion of the substrate , and the anti-sagging pattern 3 is not formed on the outer peripheral portion of the substrate adjacent to the solid pattern forming region. And
[0011]
As described above, the interlayer insulating film 4 provided on the actual wiring layer 2 is provided by providing the anti-sagging pattern 3 on the outer peripheral portion of the substrate adjacent to the region where the density of the actual wiring layer 2 is relatively coarse. Or the fall of the film thickness of insulating films, such as the surface insulating film 5, can be prevented.
In particular, since the sagging prevention pattern 3 is not formed on the outer peripheral portion of the substrate adjacent to the solid pattern forming region, a space for forming the sagging preventing pattern 3 becomes unnecessary, and the wiring forming region can be enlarged. .
The actual wiring layer 2 is a wiring layer for constituting an actual circuit and is for the dummy pattern.
[0013]
Further, it is desirable that the sagging prevention pattern 3 is provided around the through hole provided on the inner side of the mounting circuit resin substrate with a thin film so as to border the periphery of the through hole. Can be prevented .
[0014]
Further, the sagging prevention pattern 3 is provided around the non-wiring area provided on the inner side of the mounting circuit resin substrate with a thin film, that is, around the non-wiring area such as the product number display part or the logo mark writing part, particularly the inner circumference. In addition, it is desirable to border the periphery, thereby preventing the occurrence of insulation failure in the vicinity of the wiring non-forming region .
[0015]
Further, the sagging prevention pattern 3 may be formed of any member, but it is desirable to form it simultaneously with the same material as the wiring layer of the same layer in order not to increase the manufacturing process. It is desirable to provide a sagging prevention pattern 3 for each wiring layer.
[0016]
Further, the sagging prevention pattern 3 may be constituted by a film thickness portion previously formed on the dry film. In this case, a short circuit caused by the sagging prevention pattern 3 itself can be prevented.
[0017]
DETAILED DESCRIPTION OF THE INVENTION
Here, with reference to FIG. 2, the mounting circuit resin board with a thin film of the reference example 1 used as the premise of this invention is demonstrated.
FIG. 2A is a schematic plan view of the thin-film mounted circuit resin substrate 10 of Reference Example 1 , which is a premise of the present invention, and shows an actual wiring pattern provided on the inner side of the substrate. An anti-sag pattern 21 is provided on the outer peripheral portion 11 so as to border the outer peripheral portion 11 so as to surround the formed wiring formation region 14.
[0018]
Further, the anti-sag pattern is also formed in the through-hole forming region 13 and the product number display unit 12 provided in the wiring forming region 14 so as to border the outer peripheral part of the through-hole forming region 13 and the inner peripheral part of the product number display unit 12. 22 and 23 are provided.
[0019]
These sag prevention patterns 22 to 23 are simultaneously formed of the same material as that of the wiring layer, as will be described below, and these sag prevention patterns 22 to 23 are formed at the outer peripheral edge of the wiring formation region 14 or Provided at a position 0.1 mm to 1 mm away from the inner peripheral edge.
[0020]
In this case, in order not to electrically affect the actual wiring pattern provided in the wiring forming region 14 such as electromagnetic noise, it is only necessary that the distance is 0.1 mm or more. On the other hand, sagging of the insulating film is effectively suppressed. For this purpose, the thickness is preferably 1 mm or less. Here, the thickness is set to 0.1 mm in consideration of the manufacturing process and electrical influence.
[0021]
FIG. 2B is a schematic cross-sectional view taken along the alternate long and short dash line connecting A-A ′ in FIG. 2A, and Cu is formed on the resin core material 31 by electroless plating. After the film is deposited, the first Cu wiring layer 32 and the sagging prevention pattern 33 are formed in the wiring forming region 14 by etching, and the Cu film is removed from the outer peripheral portion 11.
[0022]
Next, after the dry film is thermocompression bonded to form the first interlayer insulating film 34, a plating seed layer is formed by an electroless Cu plating method, and a Cu plating layer is selected by an electrolytic plating method using a plating frame made of resist as a mask. After removing the plating frame, the exposed plating seed layer is removed with a sulfuric acid-based etchant, thereby forming the second Cu wiring layer 35 in the wiring forming region 14 and the anti-sag pattern on the outer peripheral portion 11. 36 is formed.
A sagging prevention pattern is simultaneously formed on the inner peripheral portion of the production number display portion 12 and the outer peripheral portion of the through hole forming portion 13.
[0023]
By repeating this process as many times as necessary, a multilayer wiring layer structure is formed, and finally the surface is covered with a surface insulating film 43 made of a solder resist, thereby obtaining a basic structure of a mounting circuit resin substrate with a thin film.
Further, the through hole is formed inside an anti-sag pattern 23 provided on the outer periphery of the through hole forming portion 13.
[0024]
In the figure, the fourth Cu wiring layer 41 to the first Cu wiring layer 32 are shown as a four-layer wiring structure separated by the third interlayer insulating film 40 to the first interlayer insulating film 34, and the illustration is omitted. However, the third interlayer insulating film 40 to the first interlayer insulating film 34 are provided with through vias for electrically connecting the upper and lower wiring layers at necessary places.
[0025]
In this case, the anti-sagging pattern 21 provided on the outer peripheral portion 11 is formed by the anti-sagging patterns 42 to 33 formed simultaneously with the fourth Cu wiring layer 41 to the first Cu wiring layer 32.
The anti-sagging pattern 23 provided so as to border the outer peripheral portion of the through-hole forming region 13 has the same configuration as the anti-sagging pattern 21 provided on the outer peripheral portion 11.
[0026]
As described above, in Reference Example 1 , since the sagging prevention patterns 21 to 23 are provided adjacent to the region where the wiring layer is rough, the insulation on the upper portion of the wiring layer is not formed in the wiring forming region 14. The thickness of the film, that is, the surface insulating film 43 and the third interlayer insulating film 40 to the first interlayer insulating film 34 can be made uniform.
[0027]
In addition, since the film thickness of the insulating film can be made uniform, the film thickness of the insulating film in the region where the wiring layer is rough is not reduced, and it is possible to suppress the occurrence of defects such as a decrease in insulation and delamination. And reliability is improved.
[0028]
Next, with reference to FIG. 3, the mounting circuit resin board with a thin film of the reference example 2 used as the premise of this invention is demonstrated.
FIG. 3A is a schematic plan view of a mounting circuit resin substrate with a thin film according to Reference Example 2 which is a premise of the present invention. It is divided into solid pattern forming regions 15 and 16.
[0029]
FIG. 3B is a plan view for explaining a wiring pattern in the wiring formation region 14, and shows an actual wiring pattern 17 that actually transmits an electric signal and a power source in an electronic circuit and its outer periphery. A solid pattern 18 is provided at a position separated by about 1 μm.
[0030]
3A again, in this case, the product number display unit 12 provided in the wiring formation region 14 and the through-hole formation region 13 provided in the solid pattern formation region 16 have the above-described first embodiment. Similarly, the anti-sagging patterns 22 and 23 are provided so as to border the outer peripheral part of the through-hole forming region 13 and the inner peripheral part of the product number display part 12.
Further, an anti-sag pattern 21 is also provided on the outer peripheral portion 11 so as to border the outer peripheral portion 11.
[0031]
As described above, in the reference example 2 , the solid pattern forming regions 15 and 16 are provided so as to sandwich the wiring forming region 14, and the solid pattern 18 is also provided in the wiring forming region 14 so as to surround the actual wiring pattern 17. However, by providing the outer peripheral portion 11 with the anti-sagging pattern 21 so as to border the outer peripheral portion 11, the insulating film on the actual wiring pattern 17 can be obtained even in a region where the actual wiring pattern 17 near the outer peripheral portion 11 is rough. The film thickness of the film can more reliably suppress the thinning.
[0032]
Next, with reference to FIG. 4, the mounting circuit resin board with a thin film of the 1st Embodiment of this invention is demonstrated.
FIG. 4 is a schematic plan view of the mounting circuit resin substrate with a thin film according to the first embodiment of the present invention. The basic configuration of the substrate is the same as that of Reference Example 2 described above, and Are divided into a wiring formation region 14 and solid pattern formation regions 15 and 16.
[0033]
Also in the first embodiment, the product number display section 12 provided in the wiring formation region 14 and the through hole formation region 13 provided in the solid pattern formation region 16 are the same as those in the first embodiment. Similarly, sagging prevention patterns 22 and 23 are provided so as to border the outer peripheral portion of the through-hole forming region 13 and the inner peripheral portion of the product number display portion 12.
[0034]
However, the outer peripheral portion 11 is provided with the sagging prevention patterns 24 and 25 only in the region adjacent to the wiring forming region 14 of the outer peripheral portion 11.
[0035]
In this case, there is no actual wiring pattern in the solid pattern forming regions 15 and 16 and the solid pattern forming regions 15 and 16 themselves are dense patterns. Therefore, it is necessary to provide a sagging prevention pattern in the adjacent outer peripheral portion 11. There is no.
[0036]
However, since the density of the actual wiring pattern tends to decrease in the peripheral portion of the wiring formation region 14, by providing the anti-sagging patterns 24 and 25 only in the region adjacent to the wiring formation region 14 of the outer peripheral portion 11, The film thickness of the insulating film on the wiring layer can be made uniform.
[0037]
In addition, since the anti-sag pattern is not formed on the outer peripheral portion 11 adjacent to the solid pattern forming regions 15 and 16, a space for forming the anti-sag pattern is not required, and the wiring forming region 14 is enlarged. Can do.
[0038]
Having described the implementation of the embodiment of the present invention, the present invention is not limited to the configuration and conditions described in the form of implementation, it can be variously modified in the.
For example, it in the form of implementation described above does not mention, sagging prevention pattern may be connected to either the power supply layer of the upper and lower, thereby detecting a short circuit between the wiring line patterns Can do.
[0039]
Further, in the implementation of the above, although the wiring layer and sagging prevention pattern is formed by Cu plating layer is intended not necessarily need to be a Cu-plated layer may be a sputtered layer, patterning An etching method may be used as a method.
[0040]
Further, the constituent material of the wiring layer and the sag prevention pattern is not limited to Cu, and other conductive materials such as Au and W may be used in a single layer or a laminated structure.
[0041]
Further, in the implementation of the above, it is assumed that the wiring non-formation regions provided within a product number display unit, wiring non-formation regions provided within such limited to product number display portion Alternatively, it may be a logo mark or other display unit for displaying electrical characteristics.
[0042]
Further, in the implementation described above, but are formed at the same time the sagging prevention pattern of the same material as the wiring layer is not necessarily the same material, but may be formed of an insulating material.
For example, a sagging prevention pattern may be formed by forming a film thickness portion at a position corresponding to the outer peripheral portion of the mounted circuit resin substrate with a thin film on the outer peripheral portion of the dry film serving as the interlayer insulating film.
[0043]
(Supplementary Note 1) In a thin film with mounting circuit resin substrate an interlayer insulating film 4 is constituted by a dry film provided between the lower wiring layer and an upper wiring layer, and a wiring formation region that form the actual wiring layer 2, the wiring formation A solid pattern forming region having a pattern density higher than that of the wiring forming region and an area where the density of the actual wiring layer 2 is relatively coarse, and arranged on the outer periphery of the substrate. An anti-sagging pattern 3 is provided, and the anti-sagging pattern 3 is not formed on the outer periphery of the substrate adjacent to the solid pattern forming region.
(Additional remark 2) The sagging prevention pattern 3 was provided around the through-hole provided in the inner side of the said mounting circuit resin substrate with a thin film so that the circumference | surroundings of the said through-hole might be bordered. Mounting circuit resin board with thin film.
(Additional remark 3) The anti-sagging pattern 3 is provided around the non-wiring region provided on the inner side of the above-mentioned mounting circuit resin substrate with thin film so as to border the non-wiring region. The mounting circuit resin substrate with a thin film according to appendix 1 or appendix 2.
(Additional remark 4) The mounting circuit resin substrate with a thin film of any one of Additional remarks 1 thru | or 3 which formed the said pattern 3 for dripping prevention with the same material as the wiring layer of the same layer.
(Additional remark 5) The mounting circuit resin board with a thin film of Additional remark 4 characterized by providing the said anti-sagging pattern 3 in the same layer with respect to each wiring layer.
(Appendix 6) The mounting circuit resin substrate with a thin film according to any one of appendices 1 to 3, wherein the sagging prevention pattern 3 is a film thickness portion previously formed on a dry film.
[0044]
【The invention's effect】
According to the present invention, since the sagging prevention pattern is formed so as to border the periphery of the wiring forming region, the through hole forming region, or the wiring non-forming region inside the substrate, the insulating film on the actual wiring layer is formed. Since the film thickness can be made uniform, thereby suppressing insulation degradation and delamination, it greatly contributes to improving the reliability of the mounted circuit resin substrate with a thin film.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram of a basic configuration of the present invention.
FIG. 2 is an explanatory diagram of a structure of a mounting circuit resin substrate with a thin film according to Reference Example 1 , which is a premise of the present invention.
FIG. 3 is a configuration explanatory view of a thin-film mounted circuit resin substrate of Reference Example 2 , which is a premise of the present invention.
FIG. 4 is a configuration explanatory view of a mounting circuit resin substrate with a thin film according to the first embodiment of the present invention.
FIG. 5 is a configuration explanatory view of a conventional mounting circuit resin substrate with a thin film.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Core layer 2 Actual wiring layer 3 Anti-sagging pattern 4 Interlayer insulating film 5 Surface insulating film 10 Mounting circuit resin substrate with thin film 11 Outer peripheral part 12 Product number display part 13 Through-hole formation area 14 Wiring formation area 15 Solid pattern formation area 16 Solid pattern formation region 17 Actual wiring pattern 18 Solid pattern 21 Anti-sagging pattern 22 Anti-sagging pattern 23 Anti-sagging pattern 24 Anti-sagging pattern 25 Anti-sagging pattern 31 Resin core layer 32 First Cu wiring layer 33 Anti-sagging pattern 34 First interlayer insulating film 35 Second Cu Wiring Layer 36 Anti-sagging Pattern 37 Second Interlayer Insulating Film 38 Third Cu Wiring Layer 39 Anti-sagging Pattern 40 Third Interlayer Insulating Film 41 Fourth Cu Wiring Layer 42 Anti-sagging Pattern 43 Surface Insulating Film 60 Mounting Circuit Resin Substrate with Thin Film 61 Outer peripheral part 62 Product number display part 63 Through-hole formation area 64 Wiring forming region 71 Resin core layer 72 First Cu wiring layer 73 First interlayer insulating film 74 Second Cu wiring layer 75 Second interlayer insulating film 76 Third Cu wiring layer 77 Third interlayer insulating film 78 Fourth Cu wiring layer 79 Surface insulating film

Claims (4)

下層配線層と上層配線層との間に設ける層間絶縁膜をドライフィルムによって構成した薄膜付実装回路樹脂基板において、実配線層を形成する配線形成領域と、前記配線形成領域を挟んで配置され、前記配線形成領域よりもパターンの密度が大きいベタパターン形成領域と、前記実配線層の密度が相対的に粗な領域に隣接し、且つ、前記基板の外周部に設けたダレ防止用パターンとから構成され、前記ベタパターン形成領域に隣接する前記基板の外周部には、前記ダレ防止用パターンを形成しないことを特徴とする薄膜付実装回路樹脂基板。In the thin film with mounting circuit resin substrate constituted by a dry film an interlayer insulating film provided between the lower wiring layer and an upper wiring layer, and a wiring formation region that form the actual wiring layer is disposed to sandwich the wiring forming region A solid pattern forming region having a pattern density larger than that of the wiring forming region; and an anti-sagging pattern provided adjacent to a region where the density of the actual wiring layer is relatively coarse and provided on an outer peripheral portion of the substrate. The mounting circuit resin substrate with a thin film is characterized in that the sagging prevention pattern is not formed on the outer peripheral portion of the substrate adjacent to the solid pattern forming region. 上記薄膜付実装回路樹脂基板の内部側に設ける貫通孔の周囲に、前記貫通孔の周囲を縁取るように、ダレ防止用パターンを設けたことを特徴とする請求項1記載の薄膜付実装回路樹脂基板。2. The mounting circuit with a thin film according to claim 1 , wherein an anti-sagging pattern is provided around the through hole provided on the inner side of the mounting circuit resin substrate with the thin film so as to border the periphery of the through hole. Resin substrate. 上記薄膜付実装回路樹脂基板の内部側に設ける配線非形成領域の周囲に、前記配線非形成領域の周囲を縁取るように、ダレ防止用パターンを設けたことを特徴とする請求項1または2に記載の薄膜付実装回路樹脂基板。Around the wiring non-formation region provided on the inner side of the mounting circuit resin substrate with the thin film, the wiring such borders the periphery of the non-forming region, claim, characterized in that a sag preventing pattern 1 or 2 A mounting circuit resin substrate with a thin film as described in 1 . 上記ダレ防止用パターンを、同層の配線層と同じ材料で形成したことを特徴とする請求項1乃至3のいずれか1項に記載の薄膜付実装回路樹脂基板。  The mounting circuit resin substrate with a thin film according to any one of claims 1 to 3, wherein the sagging prevention pattern is formed of the same material as the wiring layer of the same layer.
JP2002181024A 2002-06-21 2002-06-21 Mounting circuit resin board with thin film Expired - Fee Related JP4196320B2 (en)

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