JP2004039908A - Circuit board and its manufacturing method - Google Patents

Circuit board and its manufacturing method Download PDF

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Publication number
JP2004039908A
JP2004039908A JP2002195838A JP2002195838A JP2004039908A JP 2004039908 A JP2004039908 A JP 2004039908A JP 2002195838 A JP2002195838 A JP 2002195838A JP 2002195838 A JP2002195838 A JP 2002195838A JP 2004039908 A JP2004039908 A JP 2004039908A
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Japan
Prior art keywords
conductive layer
circuit board
layer
hole
base material
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JP2002195838A
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Japanese (ja)
Inventor
Fumihiko Matsuda
松田 文彦
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Nippon Mektron KK
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Nippon Mektron KK
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Priority to JP2002195838A priority Critical patent/JP2004039908A/en
Publication of JP2004039908A publication Critical patent/JP2004039908A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a circuit board and its manufacturing method capable of reducing the number of circuit parts and a mounting cost by containing a capacitor in the circuit board, and improving mounting density by miniaturizing and flattening the contained capacitor. <P>SOLUTION: A capacitor structural section 1 comprises a first electrode 2 formed by plating copper and the like, a second electrode 3 formed by processing a second conductive layer located on the second surface of a double-side copper-clad sheet, and a dielectric layer 4 composed of a part of an insulating base 5 interposed between both electrodes 2, 3. The circuit board includes a conductive layer 6 on which required wiring is formed including the lower surface of the first electrode 2. Further, a via hole 7 can be also formed, and instead of a means to form the dielectric layer 4 composed of a part of the insulating base 5, the circuit board can be constituted of a dielectric layer 8 composed of separate electrolytic deposition resin. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は回路基板及びその製造法に関し、特には、コンデンサー構造を内蔵する回路基板及びその製造法に関する。
【0002】
【従来の技術とその問題点】
近年、携帯電話等の小型電子機器に向け、電子機器に搭載される電子部品の小型化の要求が高まっている。例えば、小型化が進んでいる携帯電話向けの電子部品の一つとしてコンデンサーが挙げられる。このような携帯電話向けの代表的な小型コンデンサーには通称0603(0.6×0.3×0.3mm)、1005(1.0×0.5×0.5mm)等がある。
【0003】
しかし、上記以下の大きさへの小型化が困難なこと、及び携帯電話1台につきコンデンサーが約250個搭載されていることから部品コストおよび実装コストがかかることが挙げられる。
【0004】
また、多層回路基板においてはペースト状の誘電体を印刷することによりコンデンサーを有する回路基板を製造する手法が一部に採用されているが、ペーストと導体層の界面が熱衝撃に弱く、信頼性の高いコンデンサーを有する回路基板を安価にかつ安定的に製造することは困難であった。
【0005】
【課題を解決するための手段】
本発明は、上記問題を好適に解決するため本発明では、絶縁性基材の所定の箇所に設けられた凹部と、該凹部の底面および壁面に設けられた第一の電極と、前記凹部の底面に位置する絶縁性基材を介し、前記第一の電極と対向して設けられた第二の電極からなるコンデンサー構造を内蔵する回路基板が提供される。
【0006】
また、絶縁性基材の所定の箇所に設けられた孔と、該孔の底面に露出する様に設けられた第二の電極と、前記孔の底部に露出する面に設けられた、絶縁性基材とは別体の誘電体層を介し、前記第二の電極と対向するように、前記孔の壁面および前記誘電体層上に設けられた第一の電極からなるコンデンサー構造を内蔵する回路基板も採用される。
【0007】
そして、上記回路基板の製造法としては、絶縁性基材の第一の面には第一の導電層を有し、第二の面には第二の導電層を有する両面銅張り板、又は、第一の導電層が最表層の導電層であると共に第二の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記第一の導電層の所要位置に開口を形成してマスク層とする工程、前記開口により露出する絶縁性基材をレーザー加工、プラズマエッチング加工又はウエットエッチング加工を施し前記絶縁性基材の第二の面側に該絶縁性基材の厚みの一部を残した凹部を形成する工程、該凹部の底面および壁面に対しメッキ処理を施し上記第一の電極を形成する工程を採用できる。
【0008】
また、絶縁性基材の第一の面には第一の導電層を有し、第二の面には第二の導電層を有する両面銅張り板、又は、第一の導電層が最表層の導電層であると共に第二の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記第一の導電層の所要位置に開口を形成してマスク層とする工程、この開口によって露出される絶縁性基材をレーザー加工、プラズマエッチング加工又はウエットエッチング加工を施し、底部に第二の導電層が露出する様に孔を形成する工程、前記第二の導電層における孔の底面に露出する面に誘電体層を形成する工程、該誘電体上面、及び孔の壁面に対しメッキ処理を施し、第一の電極を形成する工程を有する回路基板の製造法も採用できる。
更に、絶縁性基材の一方の面に導電層を有する片面銅張り板、又は、一方の面の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記絶縁性基材の所要位置にレーザー加工を施し、前記絶縁性基材の導電層側に該絶縁性基材の厚みの一部を残した凹部を形成する工程、該凹部の底面および壁面に対しメッキ処理を施して第一の電極を形成する工程を有する回路基板の製造法も採用される。
【0009】
そして、絶縁性基材の一方の面に導電層を有する片面銅張り板、又は、一方の面の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記絶縁性基材の所要位置にレーザー加工を施し、底部に前記導電層が露出する様に孔又は溝を形成する工程、前記導電層における孔又は溝の底面に露出する面に誘電体層を形成する工程、該誘電体上面及び前記孔又は溝の壁面に対しメッキ処理を施して第一の電極を形成する工程を有する回路基板の製造法も採用できる。
【0010】
ここで、前記誘電体層を形成する為には、電着樹脂の電着により被着形成する方法も採用される。
【0011】
【発明の実施の形態】
以下、図示の実施例を参照しながら本発明をさらに説明する。図1は、本発明のコンデンサー構造を内蔵する回路基板の構造を示す概念的断面構成図である。
【0012】
この実施例はポリイミド等の可撓性絶縁基材における第一の面と第二の面に、銅箔などの導体層を有する両面銅張り板を用いて製作されたコンデンサー構造を内蔵する両面可撓性回路基板を示している。
【0013】
図1において、1はコンデンサー構造部であって、銅等のメッキ処理で形成された第一の電極2と、両面銅張り板の第二の面に位置する第二の導体層を加工して形成された第二の電極3と、これら両電極間に介在するポリイミド等の可撓性絶縁基材5の一部からなる誘電体層4とから構成されている。
【0014】
ここで、6は、配線形成加工が施された第一の導体層を示し、また、7は層間接続用のビアホールを示しており、上記のコンデンサー構造部1と同時に作製が可能である。
【0015】
図2は、本発明の他の実施例に従ったコンデンサー構造を内蔵する回路基板の構造を示す概念的断面構成図である。
【0016】
図2において、1はコンデンサー構造部であって、銅等のメッキで形成された第一の電極2と、可撓性絶縁性基材5を有する両面銅張り板の第二の導体層を加工して形成された第二の電極3と、これら両電極間に電着ポリイミド等の電着樹脂からなる誘電体層8とから構成されている。
【0017】
ここで、6は、配線形成加工が施された第一の導体層を示し、また、7は図1と同様に層間接続用のビアホールを示しており、上記のコンデンサー構造部1と同時に作製が可能である。
【0018】
図3は、本発明の一実施例によるコンデンサーを内蔵する両面可撓性回路基板の製造工程図である。
【0019】
先ず同図(1)に示すように、ポリイミドフィルム等の絶縁性基材5における第一の面には第一の導電層を有し、第二の面には第二の導電層10を有する両面銅張り板を用意し、前記第一の導電層の所要位置に開口11を形成してマスク層12とする。
【0020】
ここで、上記両面銅張板の銅箔裏面の凹凸がコンデンサー部の容量を精度よく形成する際の阻害要因となる事、誘電体を薄く形成した際の短絡発生原因になる事等を好適に防止する為にはスパッタや無電解めっき等の手法で平滑なポリイミドフィルム上に銅箔を形成したものを用いることも出来る。
【0021】
次に同図(2)に示す様に、上記開口11により露出された絶縁性基材5のビアホール形成部に位置する部分に対し、レーザー加工、プラズマエッチング加工、又はウエットエッチング加工を施し、絶縁性基材5の厚みの一部9を除去する。
【0022】
次に、同図(3)に示す様に、マスク層12を用いてビアホール形成部とコンデンサー形成部に対し、レーザー加工、プラズマエッチング加工又はウエットエッチング加工を施し、絶縁性基材5の第二の面側に該絶縁性基材5の厚みの一部を残した凹部13を形成する。このとき、予めレーザー加工を施したビアホール形成部に位置する絶縁性基材5はその厚みの全てが除去されて貫通し、ビアホールを形成するための孔14となり、レーザー加工を施していないコンデンサー構造部に位置する絶縁性基材5は底部に3μm程度が残り、これを絶縁性基材5からなる誘電体層4とする。
【0023】
そこで、同図(4)に示す様に、ビアホール7を形成する孔14の底面と壁面、コンデンサー形成部1を形成する凹部13の底面と壁面、更には、マスク層12の上面に対し導電化処理とメッキ処理を施し、メッキ皮膜15を形成する。
【0024】
次に、同図(5)に示すようにメッキ皮膜15及びマスク層12と、第二の導体層10に対し、エッチング手法により配線形成加工を行い、コンデンサー構造部1を内蔵する両面可撓性回路基板を得る。
【0025】
上記実施例のコンデンサーの設計例として、厚さ3μmで直径0.2mmのポリイミド膜を第二の導体層上に残した場合の静電容量はおよそ0.3pFとなる。
【0026】
そして、コンデンサーの数、ポリイミドの厚さ、面積を変更することにより、基板上の静電容量の値を任意に制御可能である。例えば携帯電話等に用いられる高周波用小容量コンデンサーの静電容量は0.1 ̄1pF程度であるから、実施例のように0603(0.6×0.3×0.3mm)以下の大きさに製造することが可能である。
【0027】
また、ポリイミドの絶縁破壊電圧は、例えば宇部興産(株)製のユーピレックスの場合で200kV/mmであるので、厚さ3μmに加工した場合に600V/3μmなり、様々な電子機器への使用が可能である。
【0028】
図4は、本発明の他の実施例によるコンデンサーを内蔵する両面可撓性回路基板の製造工程図である。
【0029】
先ず同図(1)に示すように、ポリイミドフィルム等の絶縁性基材5における第一の面には第一の導電層を有し、第二の面には第二の導電層10を有する両面銅張り板を用意し、前記第一の導電層の所要位置に開口11を形成してマスク層12とする。
【0030】
次に、同図(2)に示す様に、上記開口11により露出された絶縁性基材5に対し、レーザー加工、プラズマエッチング加工またはウエットエッチング加工を施し、コンデンサーを形成するための孔16と、ビアホールを形成するための孔14を形成する。この際、これらの孔の底部を必要に応じてソフトエッチング手法により裏面処理の除去および底面の平坦化を行うと良い。
【0031】
次に、同図(3)に示す様に、ビアホールを形成するための孔14の底面に電着ポリイミドが電着しないようにマスクテープによる保護層を形成するなどして、コンデンサーを形成するための孔16の穴底のみに選択的に電着樹脂8を電着する。この電着樹脂8として電着ポリイミドが好適である。この実施例における電着ポリイミドの厚みは3μm程度である。
【0032】
そこで、同図(4)に示すように、ビアホール7の孔14の底面と壁面、コンデンサー構造部1を形成する孔16の底面と壁面、更には、マスク層12の上面に対し導電化処理とメッキ処理を施し、メッキ皮膜15を形成する。
【0033】
更に、同図(5)に示すように、メッキ皮膜15及びマスク層12と、第二の導体層10に対し、エッチング手法により第二の電極3を含む配線形成加工を行い、コンデンサー構造部1を内蔵する両面可撓性回路基板を得る。
【0034】
図示しないが、上記実施例により得られたコンデンサーを内蔵する回路基板を積層して多層基板に適用することによりコンデンサーを内蔵する多層回路基板を得ることも可能である。
【0035】
図5は、本発明の更に他の実施例によるコンデンサーを内蔵する多層回路基板の製造工程図である。
【0036】
先ず、同図(1)に示すように、ポリイミドフィルム等の絶縁性基材5における一方の面に第一の導電層を有する片面型銅張り板を用意し、前記第一の導電層の所要位置に開口を形成してマスク層12とする。
【0037】
そして、上記開口により露出された絶縁性基材5に対し、レーザー加工、プラズマエッチング加工又はウエットエッチング加工を施し、コンデンサーを形成するための穴17及び凹部18を形成する。
【0038】
次に、同図(2)に示すように、多層回路基板の為の内層回路基板として、絶縁性基材5の両面であって上記凹部18に対応する位置にも配線及び電極3を有し、且つ上記穴17と一致する他の穴17を形成する。
【0039】
次いで、同図(3)に示すように、ポリイミドフィルム等の絶縁性基材5における一方の面に第二の導電層10を有する片面型銅張り板を用意し、上記穴17と一致する所要の位置に対し、レーザー加工を施し、絶縁性基材5の第二の面側に該絶縁性基材5の厚みの一部を残したコンデンサーを形成するための凹部19を形成する。
【0040】
次に、同図(4)に示すように、同図(1)〜(3)に示した内層および外層回路基板をプレスで圧着し、コンデンサー構造部1を形成する凹部18及び19の底面と壁面、更には、穴17の壁面及びマスク層12の上面に対し導電化処理とメッキ処理を施し、メッキ皮膜15を形成する。
【0041】
そして、同図(5)に示すようにメッキ皮膜15及びマスク層12と、第二の導体層10に対し、エッチング手法により配線及び電極2、3の形成加工を行い、これにより、1、2層間でのコンデンサー構造部1および1、3層間でのコンデンサー構造部1を内蔵する多層回路基板を得ることができる。
【0042】
【発明の効果】
本発明による回路基板は、可撓性回路基板等にもコンデンサーを内蔵できるので、従来の回路基板に対して部品及びその実装コストを低減させ、コンデンサーの小型化・平坦化により実装密度を向上させることが可能である。
【0043】
また、ペースト状の誘電体を用いた回路基板のコンデンサーでは達成することが困難であった誘電体と導体界面の高い信頼性も確保できるので、従来の製造法では困難であった信頼性の高いコンデンサーを内蔵する可撓性回路基板等を安価かつ安定的に提供することができる。
【図面の簡単な説明】
【図1】本発明の一実施例に従ったコンデンサー構造を内蔵する回路基板の構造を示す概念的断面構成図。
【図2】本発明の他の実施例によるコンデンサー構造を内蔵する回路基板の構造を示す概念的断面構成図。
【図3】本発明の一実施例によるコンデンサーを内蔵する両面可撓性回路基板の製造工程図。
【図4】本発明の他の実施例によるコンデンサーを内蔵する両面可撓性回路基板の製造工程図。
【図5】本発明の更に他の実施例によるコンデンサーを内蔵する多層回路基板の製造工程図。
【符号の説明】
1 コンデンサー構造部
2 第一の電極
3 第二の電極
4 絶縁性基材からなる誘電体層
5 絶縁性基材
6 配線加工された第一の導体層
7 ビアホール
8 電着ポリイミドからなる誘電体層
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a circuit board and a method of manufacturing the same, and more particularly, to a circuit board having a built-in capacitor structure and a method of manufacturing the same.
[0002]
[Conventional technology and its problems]
2. Description of the Related Art In recent years, there has been an increasing demand for downsizing electronic components mounted on electronic devices for small electronic devices such as mobile phones. For example, capacitors are one of the electronic components for mobile phones that are becoming smaller in size. Typical small capacitors for such a mobile phone include 0603 (0.6 × 0.3 × 0.3 mm) and 1005 (1.0 × 0.5 × 0.5 mm).
[0003]
However, it is difficult to reduce the size to the size described below, and the parts cost and the mounting cost are increased because about 250 capacitors are mounted on one mobile phone.
[0004]
In the case of multilayer circuit boards, the method of manufacturing a circuit board having a capacitor by printing a paste-like dielectric is partially adopted, but the interface between the paste and the conductive layer is weak to thermal shock, and the reliability is low. It has been difficult to stably manufacture a circuit board having a capacitor with high cost at low cost.
[0005]
[Means for Solving the Problems]
The present invention, in order to suitably solve the above problems, in the present invention, a concave portion provided at a predetermined location of the insulating substrate, a first electrode provided on the bottom surface and the wall surface of the concave portion, A circuit board having a built-in capacitor structure including a second electrode provided opposite to the first electrode via an insulating base material located on a bottom surface is provided.
[0006]
Further, a hole provided at a predetermined position of the insulating base material, a second electrode provided so as to be exposed at the bottom of the hole, and an insulating material provided at a surface exposed at the bottom of the hole. A circuit incorporating a capacitor structure including a wall surface of the hole and a first electrode provided on the dielectric layer so as to face the second electrode via a dielectric layer separate from the base material. Substrates are also employed.
[0007]
And as a method of manufacturing the circuit board, a double-sided copper-clad board having a first conductive layer on a first surface of an insulating base material and a second conductive layer on a second surface, or Preparing a multilayer circuit board in which the first conductive layer is the outermost conductive layer and the second conductive layer is the inner circuit layer of the multilayer circuit board, and forms an opening at a required position of the first conductive layer. Step of forming a mask layer, the insulating substrate exposed by the opening is subjected to laser processing, plasma etching processing or wet etching processing on the second surface side of the insulating substrate, the thickness of the insulating substrate A step of forming a recess with a part left behind, and a step of plating the bottom and wall surfaces of the recess to form the first electrode can be employed.
[0008]
In addition, the first surface of the insulating substrate has a first conductive layer, the second surface has a second conductive layer on the double-sided copper-clad plate, or the first conductive layer is the outermost layer Preparing a multilayer circuit board that is both a conductive layer and a second conductive layer is an inner circuit layer of the multilayer circuit board, forming an opening at a required position of the first conductive layer to form a mask layer, Laser processing, plasma etching processing or wet etching processing on the insulating base material exposed by the opening, and forming a hole such that the second conductive layer is exposed at the bottom, and forming a hole in the second conductive layer. It is also possible to adopt a method of manufacturing a circuit board including a step of forming a dielectric layer on a surface exposed to the bottom, a step of plating the upper surface of the dielectric, and a wall surface of the hole to form a first electrode.
Further, a single-sided copper-clad board having a conductive layer on one surface of an insulating substrate, or a multilayer circuit board in which the conductive layer on one surface is an inner layer circuit layer of the multilayer circuit board is prepared, Performing laser processing at a required position to form a concave portion on the conductive layer side of the insulating base material while leaving a part of the thickness of the insulating base material, performing plating on the bottom surface and wall surfaces of the concave portion In addition, a method for manufacturing a circuit board having a step of forming a first electrode is also adopted.
[0009]
Then, a single-sided copper-clad board having a conductive layer on one surface of the insulating base material, or a multilayer circuit board in which the conductive layer on one surface is an inner layer circuit layer of the multilayer circuit board is prepared. Performing a laser processing at a required position, forming a hole or a groove so that the conductive layer is exposed at the bottom, forming a dielectric layer on a surface of the conductive layer exposed at the bottom of the hole or the groove, A method of manufacturing a circuit board including a step of forming a first electrode by plating the dielectric upper surface and the wall surface of the hole or groove can also be adopted.
[0010]
Here, in order to form the dielectric layer, a method in which the dielectric layer is formed by electrodeposition of an electrodeposition resin is also adopted.
[0011]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, the present invention will be further described with reference to the illustrated embodiments. FIG. 1 is a conceptual cross-sectional configuration diagram showing a structure of a circuit board having a built-in capacitor structure of the present invention.
[0012]
This embodiment employs a double-sided flexible board having a built-in capacitor structure manufactured by using a double-sided copper-clad board having a conductive layer such as a copper foil on the first and second surfaces of a flexible insulating base material such as polyimide. 3 shows a flexible circuit board.
[0013]
In FIG. 1, reference numeral 1 denotes a capacitor structure, which is formed by processing a first electrode 2 formed by a plating process of copper or the like and a second conductor layer located on a second surface of a double-sided copper clad plate. It is composed of the formed second electrode 3 and a dielectric layer 4 made of a part of a flexible insulating base material 5 such as polyimide interposed between the two electrodes.
[0014]
Here, reference numeral 6 denotes a first conductor layer subjected to wiring formation processing, and reference numeral 7 denotes a via hole for interlayer connection, which can be manufactured at the same time as the capacitor structure 1 described above.
[0015]
FIG. 2 is a conceptual cross-sectional configuration diagram showing a structure of a circuit board having a built-in capacitor structure according to another embodiment of the present invention.
[0016]
In FIG. 2, reference numeral 1 denotes a capacitor structure which processes a first electrode 2 formed by plating of copper or the like and a second conductor layer of a double-sided copper-clad board having a flexible insulating base material 5. And a dielectric layer 8 made of an electrodeposited resin such as an electrodeposited polyimide between the two electrodes.
[0017]
Here, reference numeral 6 denotes a first conductor layer subjected to wiring formation processing, and reference numeral 7 denotes a via hole for interlayer connection as in FIG. It is possible.
[0018]
FIG. 3 is a manufacturing process diagram of a double-sided flexible circuit board having a built-in capacitor according to an embodiment of the present invention.
[0019]
First, as shown in FIG. 1A, a first surface of an insulating substrate 5 such as a polyimide film has a first conductive layer, and a second surface has a second conductive layer 10. A double-sided copper-clad plate is prepared, and an opening 11 is formed at a required position of the first conductive layer to form a mask layer 12.
[0020]
Here, the unevenness of the copper foil back surface of the double-sided copper-clad board becomes a hindrance factor when accurately forming the capacitance of the capacitor portion, and preferably causes a short circuit when the dielectric is formed thin. In order to prevent this, a copper foil formed on a smooth polyimide film by a technique such as sputtering or electroless plating can be used.
[0021]
Next, as shown in FIG. 2B, laser processing, plasma etching processing, or wet etching processing is performed on a portion of the insulating base material 5 exposed through the opening 11 and located at the via hole forming portion. A part 9 of the thickness of the conductive base material 5 is removed.
[0022]
Next, as shown in FIG. 3C, laser processing, plasma etching processing, or wet etching processing is performed on the via hole forming portion and the capacitor forming portion using the mask layer 12, and the second insulating material 5 is formed. Is formed on the surface side of the insulating substrate 5 while leaving a part of the thickness of the insulating base material 5. At this time, the insulating substrate 5 located in the via-hole forming portion which has been laser-processed in advance has its thickness removed entirely and penetrates to form a hole 14 for forming a via-hole. The insulating substrate 5 located at the portion has about 3 μm remaining at the bottom, which is used as the dielectric layer 4 made of the insulating substrate 5.
[0023]
Therefore, as shown in FIG. 4D, the bottom surface and the wall surface of the hole 14 forming the via hole 7, the bottom surface and the wall surface of the concave portion 13 forming the capacitor forming part 1, and the upper surface of the mask layer 12 are made conductive. Processing and plating are performed to form a plating film 15.
[0024]
Next, as shown in FIG. 5 (5), the plating film 15, the mask layer 12, and the second conductor layer 10 are subjected to wiring forming processing by an etching method, and the double-sided flexible board in which the capacitor structure 1 is built. Obtain a circuit board.
[0025]
As a design example of the capacitor of the above embodiment, when a polyimide film having a thickness of 3 μm and a diameter of 0.2 mm is left on the second conductor layer, the capacitance is about 0.3 pF.
[0026]
By changing the number of capacitors, the thickness of polyimide, and the area, the value of the capacitance on the substrate can be arbitrarily controlled. For example, since the capacitance of a high-frequency small-capacity capacitor used for a mobile phone or the like is about 0.1 ̄1 pF, the size is 0603 (0.6 × 0.3 × 0.3 mm) or less as in the embodiment. It is possible to manufacture.
[0027]
In addition, since the dielectric breakdown voltage of polyimide is 200 kV / mm in the case of UPILEX manufactured by Ube Industries, Ltd., for example, it becomes 600 V / 3 μm when processed to a thickness of 3 μm, and can be used for various electronic devices. It is.
[0028]
FIG. 4 is a manufacturing process diagram of a double-sided flexible circuit board having a built-in capacitor according to another embodiment of the present invention.
[0029]
First, as shown in FIG. 1A, a first surface of an insulating substrate 5 such as a polyimide film has a first conductive layer, and a second surface has a second conductive layer 10. A double-sided copper-clad plate is prepared, and an opening 11 is formed at a required position of the first conductive layer to form a mask layer 12.
[0030]
Next, as shown in FIG. 2B, the insulating base material 5 exposed through the opening 11 is subjected to laser processing, plasma etching processing or wet etching processing to form a hole 16 for forming a capacitor. Then, a hole 14 for forming a via hole is formed. At this time, the bottoms of these holes may be subjected to removal of the back surface treatment and flattening of the bottom surface by a soft etching method as necessary.
[0031]
Next, as shown in FIG. 3C, a capacitor tape is formed on the bottom surface of the hole 14 for forming a via hole by forming a protective layer using a mask tape so as to prevent electrodeposited polyimide from being electrodeposited. The electrodeposition resin 8 is selectively electrodeposited only on the bottom of the hole 16. Electrodeposited polyimide is suitable as the electrodeposited resin 8. The thickness of the electrodeposited polyimide in this embodiment is about 3 μm.
[0032]
Therefore, as shown in FIG. 4D, the bottom surface and the wall surface of the hole 14 of the via hole 7, the bottom surface and the wall surface of the hole 16 forming the capacitor structure 1, and the upper surface of the mask layer 12 are subjected to a conductive treatment. A plating process is performed to form a plating film 15.
[0033]
Further, as shown in FIG. 5E, the plating film 15 and the mask layer 12 and the second conductor layer 10 are subjected to wiring forming processing including the second electrode 3 by an etching technique, and the capacitor structure 1 is formed. To obtain a double-sided flexible circuit board.
[0034]
Although not shown, it is also possible to obtain a multilayer circuit board having a built-in capacitor by laminating the circuit boards having the built-in capacitors obtained in the above embodiments and applying the laminated circuit board to a multilayer board.
[0035]
FIG. 5 is a manufacturing process diagram of a multilayer circuit board having a built-in capacitor according to still another embodiment of the present invention.
[0036]
First, as shown in FIG. 1A, a single-sided copper-clad board having a first conductive layer on one surface of an insulating base material 5 such as a polyimide film is prepared, and the required thickness of the first conductive layer is determined. An opening is formed at the position to form the mask layer 12.
[0037]
Then, the insulating substrate 5 exposed by the opening is subjected to laser processing, plasma etching processing or wet etching processing to form holes 17 and concave portions 18 for forming capacitors.
[0038]
Next, as shown in FIG. 2B, wiring and electrodes 3 are provided on both surfaces of the insulating substrate 5 at positions corresponding to the concave portions 18 as inner layer circuit boards for the multilayer circuit board. In addition, another hole 17 corresponding to the hole 17 is formed.
[0039]
Next, as shown in FIG. 3C, a single-sided copper-clad plate having a second conductive layer 10 on one surface of an insulating base material 5 such as a polyimide film is prepared, Is formed on the second surface side of the insulating substrate 5 to form a concave portion 19 for forming a capacitor with a part of the thickness of the insulating substrate 5 left.
[0040]
Next, as shown in FIG. 4D, the inner and outer circuit boards shown in FIGS. 1A to 3C are press-bonded by a press, and the bottom surfaces of the concave portions 18 and 19 forming the capacitor structure 1 are formed. Conductivity treatment and plating treatment are performed on the wall surface, and further on the wall surface of the hole 17 and the upper surface of the mask layer 12 to form a plating film 15.
[0041]
Then, as shown in FIG. 5 (5), the plating film 15 and the mask layer 12, and the second conductor layer 10 are subjected to an etching process to form wirings and electrodes 2, 3, thereby obtaining 1, 2 It is possible to obtain a multilayer circuit board incorporating the capacitor structure 1 between the layers and the capacitor structure 1 between the first and third layers.
[0042]
【The invention's effect】
Since the circuit board according to the present invention can incorporate a capacitor in a flexible circuit board or the like, the components and the mounting cost thereof can be reduced with respect to a conventional circuit board, and the mounting density can be improved by miniaturizing and flattening the capacitor. It is possible.
[0043]
In addition, since high reliability of the interface between the dielectric and the conductor, which was difficult to achieve with a circuit board capacitor using a paste-like dielectric, can be ensured, high reliability has been difficult with the conventional manufacturing method. A flexible circuit board or the like having a built-in capacitor can be provided stably at low cost.
[Brief description of the drawings]
FIG. 1 is a conceptual cross-sectional view showing the structure of a circuit board having a built-in capacitor structure according to an embodiment of the present invention.
FIG. 2 is a conceptual cross-sectional view showing the structure of a circuit board having a capacitor structure according to another embodiment of the present invention.
FIG. 3 is a manufacturing process diagram of a double-sided flexible circuit board having a built-in capacitor according to an embodiment of the present invention.
FIG. 4 is a manufacturing process diagram of a double-sided flexible circuit board having a built-in capacitor according to another embodiment of the present invention.
FIG. 5 is a manufacturing process diagram of a multilayer circuit board having a built-in capacitor according to still another embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Capacitor structure part 2 First electrode 3 Second electrode 4 Dielectric layer 5 made of insulating base material 5 Insulating base material 6 First conductor layer 7 processed by wiring 7 Via hole 8 Dielectric layer made of electrodeposited polyimide

Claims (7)

絶縁性基材の所定の箇所に設けられた凹部と、該凹部の底面および壁面に設けられた第一の電極と、前記凹部の底面に位置する絶縁性基材を介し、前記第一の電極と対向して設けられた第二の電極からなるコンデンサー構造を内蔵する回路基板。A concave portion provided at a predetermined portion of the insulating base material, a first electrode provided on the bottom surface and the wall surface of the concave portion, and the first electrode via an insulating base material located on the bottom surface of the concave portion. A circuit board having a built-in capacitor structure comprising a second electrode provided opposite to the first electrode. 絶縁性基材の所定の箇所に設けられた孔又は溝と、該孔又は溝の底面に露出する様に設けられた第二の電極と、前記孔又は溝の底部に露出する面に設けられた、前記絶縁性基材とは別体の誘電体層を介し、前記第二の電極と対向するように、前記孔又は溝の壁面および前記誘電体層上に設けられた第一の電極からなるコンデンサー構造を内蔵する回路基板。A hole or a groove provided at a predetermined position of the insulating base material, a second electrode provided to be exposed at the bottom of the hole or the groove, and a second electrode provided at a surface exposed at the bottom of the hole or the groove. In addition, through the dielectric layer separate from the insulating base material, from the first electrode provided on the wall surface of the hole or groove and the dielectric layer so as to face the second electrode. Circuit board with built-in capacitor structure. 絶縁性基材の第一の面には第一の導電層を有し、第二の面には第二の導電層を有する両面銅張り板、又は、第一の導電層が最表層の導電層であると共に第二の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記第一の導電層の所要位置に開口を形成してマスク層とする工程、前記開口により露出される絶縁性基材をレーザー加工、プラズマエッチング加工又はウエットエッチング加工を施し前記絶縁性基材の第二の面側に該絶縁性基材の厚みの一部を残した凹部を形成する工程、該凹部の底面および壁面に対しメッキ処理を施し第一の電極を形成する工程を有するコンデンサー構造を内蔵する回路基板の製造法。The first surface of the insulating base material has a first conductive layer, the second surface is a double-sided copper-clad plate having a second conductive layer, or the first conductive layer is the outermost conductive layer Preparing a multilayer circuit board in which the second conductive layer is a layer and an inner circuit layer of the multilayer circuit board, forming an opening in a required position of the first conductive layer to form a mask layer, A step of subjecting the exposed insulating base material to laser processing, plasma etching processing or wet etching processing to form a concave portion on the second surface side of the insulating base material while leaving a part of the thickness of the insulating base material A method of manufacturing a circuit board having a built-in capacitor structure, comprising a step of plating a bottom surface and a wall surface of the concave portion to form a first electrode. 絶縁性基材の第一の面には第一の導電層を有し、第二の面には第二の導電層を有する両面銅張り板、又は、第一の導電層が最表層の導電層であると共に第二の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記第一の導電層の所要位置に開口を形成してマスク層とする工程、この開口によって露出される絶縁性基材をレーザー加工、プラズマエッチング加工又はウエットエッチング加工を施し、底部に第二の導電層が露出する様に孔又は溝を形成する工程、前記第二の導電層における孔又は溝の底面に露出する面に誘電体層を形成する工程、該誘電体層の上面及び前記孔又は溝の壁面に対しメッキ処理を施し第一の電極を形成する工程を有するコンデンサー構造を内蔵する回路基板の製造法。The first surface of the insulating base material has a first conductive layer, the second surface is a double-sided copper-clad plate having a second conductive layer, or the first conductive layer is the outermost conductive layer A step of preparing a multilayer circuit board in which the second conductive layer is a layer and an inner circuit layer of the multilayer circuit board, forming an opening in a required position of the first conductive layer to form a mask layer, A step of forming a hole or a groove so that the exposed insulating substrate is subjected to laser processing, plasma etching processing or wet etching processing, and the second conductive layer is exposed at the bottom, or a hole or hole in the second conductive layer. A capacitor structure including a step of forming a dielectric layer on a surface exposed at the bottom of the groove, and a step of plating the upper surface of the dielectric layer and the wall surface of the hole or groove to form a first electrode is incorporated. Manufacturing method of circuit board. 絶縁性基材の一方の面に導電層を有する片面銅張り板、又は、一方の面の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記絶縁性基材の所要位置にレーザー加工を施し、前記絶縁性基材の導電層側に該絶縁性基材の厚みの一部を残した凹部を形成する工程、該凹部の底面および壁面に対しメッキ処理を施し第一の電極を形成する工程を有するコンデンサー構造を内蔵する回路基板の製造法。Prepare a single-sided copper-clad board having a conductive layer on one surface of an insulating substrate, or a multilayer circuit board in which the conductive layer on one surface is an inner layer circuit layer of the multilayer circuit board, and Performing laser processing on the position, forming a concave portion on the conductive layer side of the insulating base material while leaving a part of the thickness of the insulating base material, plating the bottom surface and the wall surface of the concave portion with a first treatment. A method of manufacturing a circuit board having a built-in capacitor structure having a step of forming electrodes. 絶縁性基材の一方の面に導電層を有する片面銅張り板、又は、一方の面の導電層が多層回路基板の内層回路層である多層回路基板を用意し、前記絶縁性基材の所要位置にレーザー加工を施し、底部に前記導電層が露出する様に孔又は溝を形成する工程、前記導電層における孔又は溝の底面に露出する面に誘電体層を形成する工程、該誘電体層の上面及び前記孔又は溝の壁面に対しメッキ処理を施し第一の電極を形成する工程を有するコンデンサー構造を内蔵する回路基板の製造法。Prepare a single-sided copper-clad board having a conductive layer on one surface of an insulating substrate, or a multilayer circuit board in which the conductive layer on one surface is an inner layer circuit layer of the multilayer circuit board, and Forming a hole or a groove so that the conductive layer is exposed at the bottom, forming a dielectric layer on a surface of the conductive layer exposed at the bottom of the hole or the groove, A method for manufacturing a circuit board having a built-in capacitor structure, comprising a step of plating a top surface of a layer and a wall surface of the hole or groove to form a first electrode. 前記誘電体層を形成する工程は、電着樹脂の電着によって被着形成する請求項4及び6に記載の回路基板の製造法。7. The method for manufacturing a circuit board according to claim 4, wherein the step of forming the dielectric layer is performed by electrodeposition of an electrodeposition resin.
JP2002195838A 2002-07-04 2002-07-04 Circuit board and its manufacturing method Pending JP2004039908A (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006093261A (en) * 2004-09-22 2006-04-06 Toray Ind Inc Mounting substrate with built-in capacitor and its manufacturing method
JP2007096003A (en) * 2005-09-29 2007-04-12 Sanyo Electric Co Ltd Circuit device
JP2007305825A (en) * 2006-05-12 2007-11-22 Nippon Mektron Ltd Method for manufacturing circuit board
CN105655321A (en) * 2014-12-01 2016-06-08 通用电气公司 Electronic packages and methods of making and using same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006093261A (en) * 2004-09-22 2006-04-06 Toray Ind Inc Mounting substrate with built-in capacitor and its manufacturing method
JP2007096003A (en) * 2005-09-29 2007-04-12 Sanyo Electric Co Ltd Circuit device
JP2007305825A (en) * 2006-05-12 2007-11-22 Nippon Mektron Ltd Method for manufacturing circuit board
CN105655321A (en) * 2014-12-01 2016-06-08 通用电气公司 Electronic packages and methods of making and using same

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