JP4184486B2 - Buffer device - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a puffer device for storing a processing substrate for a predetermined time in the middle of a processing process line for processing. More specifically, the present invention relates to exposure and development processing using a plasma display substrate as a processing substrate. The present invention relates to an apparatus for completing a reaction of photoexcited radicals of a negative photosensitive resist, which is used as a buffer section provided between an exposure section and a development section in a consistent apparatus.
[0002]
[Prior art]
In recent years, plasma display panels (hereinafter also referred to as PDPs) are being used in various display devices because of their thin depth, light weight, and clear display and wider viewing angle than liquid crystal panels.
In general, a plasma display panel (PDP) has a structure in which a pair of regularly arranged electrodes are provided on two opposing glass substrates, and a gas mainly composed of neon, xenon, or the like is enclosed therebetween. Then, a voltage is applied between these electrodes, and discharge is generated in minute cells around the electrodes, thereby causing each cell to emit light for display. In particular, in order to display information, the regularly arranged cells are selectively discharged to emit light.
[0003]
Here, the configuration of the PDP will be described with reference to an example of the AC type PDP shown in FIG.
FIG. 7 is a perspective view of the PDP structure, but the front plate (glass substrate 710) and the back plate (glass substrate 720) are shown separated from each other for the sake of clarity.
As shown in FIG. 7, two glass substrates 710 and 720 are arranged in parallel and facing each other, and both of them are barriers (cell barriers) provided in parallel to each other on a glass substrate 720 as a back plate. (Also referred to as 730).
On the back side of the glass substrate 710 serving as the front plate, a composite electrode composed of a transparent electrode 740 serving as a discharge sustaining electrode and a metal electrode 750 serving as a bus electrode is formed in parallel with each other. A layer 760 is formed, and a protective layer (MgO layer) 770 is further formed thereon.
In addition, address electrodes 780 are formed between the barriers 730 so as to be orthogonal to the composite electrode on the front side of the glass substrate 720 serving as a back plate, and are formed in parallel with each other. A phosphor 790 is provided so as to cover.
The barrier 730 is for partitioning the discharge space, and each partitioned discharge space is called a cell or a unit light emitting region.
This AC type PDP is a surface discharge type, and has a structure in which an AC voltage is applied between the composite electrodes on the front plate to cause discharge. In this case, since alternating current is applied, the direction of the electric field changes corresponding to the frequency. Then, the phosphor 790 is caused to emit light by ultraviolet rays generated by this discharge, and the observer can visually recognize the light transmitted through the front plate.
The DC type PDP is different from the AC type in that the electrode has a structure not covered with a dielectric layer, but the discharge effect is the same.
7 has a structure in which a base layer 767 is provided on one surface of a glass substrate 720 and a dielectric layer 765 is provided thereon, but the base layer 767 and the dielectric layer 765 are not necessarily required. .
[0004]
Conventionally, as a method for forming a barrier for a back plate used in the above PDP, a barrier forming material is formed on a glass substrate in a barrier pattern shape and repeatedly printed a plurality of times by screen printing to a required height. A first method of stacking and drying (referred to as a screen printing method), or after applying a barrier forming material on the entire surface of a glass substrate, a resist having resistance to sandblasting is patterned and formed in a predetermined shape on the coated surface, A second method (referred to as a sandblasting method) in which a barrier forming material is formed into a predetermined shape by sandblasting using the resist as a mask has been adopted. However, in the barrier formation of the back plate used for the PDP according to the first method, it is necessary to perform screen printing of paste several times to several times in order to obtain a predetermined thickness as a barrier. In addition, it is necessary to manage the printing accuracy, and it is difficult to obtain a satisfactory product in terms of quality. At present, the second method is mainstream.
[0005]
Here, one example of the formation of the barrier by the second method (sand blasting method) will be described with reference to FIG. 6 to further explain the barrier forming method by the sand blasting method.
As shown in FIG. 6A, after the electrode wiring 630 is formed on one surface of the glass substrate 610 through the undercoat layer 620, the surface of the glass substrate 610 is further covered on the electrode wiring 630. A dielectric layer 650 is formed.
Next, a processing material 660 made of a low-melting glass paste for barrier formation is applied to the entire surface of the dielectric layer 650 (FIG. 6B), and then a photosensitive material that is resistant to sandblasting on the processing material 660. Next, only a predetermined region of the resist 640 is irradiated with a predetermined ionizing radiation using a photomask having a pattern with a predetermined shape corresponding to the shape of the barrier to be formed. It is exposed, developed, and patterned into a predetermined shape. (Fig. 6 (d))
Then, the resist 640 is used as a mask when the processing material 660 is sandblasted, and sandblasting is performed, and only the processing material 660 exposed from the mask is cut into a predetermined shape. (Fig. 6 (e))
Thereafter, the resist 640 is removed, and a baking process is performed to form a barrier 660A on the dielectric layer 650. (Fig. 6 (f))
[0006]
As described above, in the barrier formation on the glass substrate that is the back plate used in the PDP by the second method, the barrier forming material coated on the glass substrate is a photosensitive resist 640 that is resistant to sandblasting. Was covered with a mask having a predetermined shape, and polishing sand such as glass beads was blown from a plurality of nozzles with high-pressure air, and a portion exposed from the mask was selectively cut to form a barrier.
Similarly, when forming the electrode wiring 630, a photosensitive resist is used, and this is used to expose only a predetermined region of the resist 640 with a predetermined ionizing radiation using a photomask having a pattern with a predetermined shape. The process of developing this and patterning it into a predetermined shape has been adopted.
[0007]
As described above, in the production of a substrate for PDP, there are various processes for exposing and developing a photosensitive resist. As the photosensitive resist used, a negative photosensitive resist such as a dry film resist is used. , Commonly used.
In recent years, there is a strong demand for mass production of PDPs, and there is a demand for production lines that can perform processing as reliably and consistently as possible in the production of substrates for these PDPs.
Under such circumstances, even in an apparatus that performs exposure and development processing consistently using a PDP substrate as a processing substrate, after exposing the negative photosensitive resist, a predetermined reaction that completes the reaction of the photoexcited radicals is performed. However, after the negative photosensitive resist is exposed to the treated substrate after the exposure, the photo-excited radical reaction is surely completed. It was difficult to provide a buffer unit capable of securing time, which was a problem.
[0008]
[Problems to be solved by the invention]
As described above, in an apparatus that consistently performs exposure and development processing in the production of a substrate for PDP, in order to complete the reaction of photoexcited radicals after exposing the negative photosensitive resist, There is a need for a buffer device that is provided between development processing units, can take up as little space as possible, can store a processed substrate after exposure, and can reliably send the processed substrate to the development processing unit after a predetermined time has elapsed. It was.
The present invention is a device that consistently performs exposure and development processing in the production of a substrate for PDP, and completes the reaction of photoexcited radicals after exposing a negative photosensitive resist. Therefore, it is provided between the exposure unit and the development processing unit, takes up as little space as possible, can store the processed substrate after exposure, and reliably sends out the processing substrate to the development processing unit side after a predetermined time has elapsed. It is an object of the present invention to provide a buffer device that can be used.
[0009]
[Means for Solving the Problems]
Buffer device of the present invention, the substrate in the course of processing to process line, a buffer device for storing a predetermined time, can transport the substrate in a substantially horizontal state and, on the The shelf unit, which is a stack of multiple rolls and can be stored and stored in a shelf, and the shelf unit as a whole, is integrated with the entire shelf unit, and its position is managed in the vertical direction. Up and down moving part, sensor part detecting acceptance of processing substrate, management of presence / absence of processing substrate of each stage of shelf part, time management in operation of each stage conveying conveyor stored processing substrate A control unit that performs time management in the vertical movement of the shelf and controls the operation of each unit in association with each other, and when the processing substrate is received, the processing substrate is not placed, a predetermined empty The position of the step The processing substrate is received inside according to the height of the processing substrate to be received. When the processing substrate is sent out, the position of the stage where the processing substrate stored for a predetermined time is placed is the sending position. together the state, and are not delivering the processed substrate to the outside, and, the ledge 2 or more, in order from the substrate receiving side, toward the processing substrate feeding side, arranged so that adjacent, between adjacent trays The processing substrate is conveyed by conveyor conveyance at each stage .
The above-described buffer device is used as a buffer unit provided between an exposure unit and a development unit in a device that performs exposure and development processing consistently using a plasma display substrate as a processing substrate. It is for completing the reaction of the photoexcited radical of the type photosensitive resist.
[0010]
[Action]
The buffer device of the present invention is a device that consistently performs exposure and development processing in the production of a substrate for a PDP by adopting such a configuration, and after exposing a negative photosensitive resist, In order to complete the reaction, it is provided between the exposure unit and the development processing unit, takes up as little space as possible, can store the processed substrate after exposure, and sends the processed substrate to the development processing unit side after a predetermined time has elapsed. However, it is possible to provide a buffer device that can be surely provided.
Specifically, a plurality of conveyor-use stages made up of a plurality of rolls, which can be transported in a substantially horizontal state and can be placed and stored in a stationary manner, are stacked in a shelf shape. The shelf part, the whole shelf part as a whole, a vertically moving part that moves while managing its position in the up and down direction, a sensor part that detects the acceptance of the processing board, and the presence or absence of processing boards at each stage of the shelf part A control unit that performs management, time management in the operation of each stage that conveys the stored processing substrate and conveys the time, and time management in the up and down operation of the shelf, and controls the operation of each part in association with each other. When the substrate is received, the processing substrate is received inside by aligning the position of a predetermined empty step where the processing substrate is not placed with the height of the processing substrate to be received. In the case of a predetermined time The position of the stage is placed with the stored processed substrate, in accordance with the feeding position, by those for feeding the processed substrate to the outside, have achieved this.
In other words, the processing substrate can be placed on the shelf and stored in a shelf-like manner that can be stored and used as a conveyor, so that it does not take up space and accepts the processing substrate. Sensor unit to detect the presence or absence of processing substrates at each stage of the shelf, time management in the operation of each stage that conveys the stored processing substrate, and time management in the vertical movement of the shelf, Further, by including a control unit that controls the operation of each unit in association with each other, the storage time can be managed for each processing substrate.
[0011]
In particular, it is used as a buffer unit provided between an exposure unit and a development unit in an apparatus that performs exposure and development processing consistently using a substrate for a plasma display (PDP) as a processing substrate. It is effective when applied to complete the reaction of photoexcited radicals.
When used as a buffer for PDP, the shelf has about 10 tiers due to its large size (60 inch class, size 1000 mm × 1500 mm, thickness 5 mm). is there.
And when the shelf part is about 10 stages, two shelf parts are used by arranging the shelf parts adjacent to each other from the process substrate receiving side to the process substrate delivery side, The processed substrates can be stored, and as a result, each processed substrate can be surely sent out to the development processing section after a predetermined time has passed after exposure, which is practical.
In addition, conveyance of the processing board | substrate between adjacent shelf stages can be performed by the conveyor conveyance of each each stage.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
An embodiment of the buffer device of the present invention will be given and described with reference to the drawings.
FIG. 1 is a schematic sectional view of an example of an embodiment of the buffer device according to the present invention. FIG. 2A is a view as viewed from A1-A2 in FIG. 1, and FIG. 3 is a sensor for detecting the position of vertical movement. 4 and 5 are diagrams for explaining the operation of the buffer device of this example.
FIG. 3A is a view of the vicinity of the blade viewed from the B1-B2 direction in FIG. 2, and FIG. 3B is a partial cross-sectional view taken along C1-C2 in FIG.
1-3, 100 is a buffer device, 110 is a shelf part, 111 is a step, 113 is a roller, 113A is a shaft, 115 is a holding part, 120 is a control part, 130 is a vertical movement part, 131 is a ball screw, 132 Is a motor, 141, 142, and 143 are sensors, 145 is a position sensor, 145A is a light emitting unit, 145B is a light receiving unit, 148 is a blade, 148S is a surface, 151 and 152 are rollers, 161 is a receiving unit, and 162 is a sending unit. , 170 is a booth, and 180 is a processing substrate.
A buffer device 100 of this example shown in FIG. 1 is used when a substrate for PDP is manufactured, and is used by being provided between an exposure device and a developing device. A predetermined portion of a negative photosensitive resist is used. This is an apparatus for storing only after exposure and storing it for a predetermined time and sending it to the development processing section.
And, as shown in FIG. 1, a conveyor combined stage 111 composed of a plurality of rolls 113 that can convey the processing substrate 180 in a substantially horizontal state, and can rest and store the processed substrate 180 thereon. Two shelves 110 (110A and 110B) provided in a plurality of overlapping shelves, the entire shelves 110 as a single unit, a vertical moving unit 130 that moves while managing the position in the vertical direction, and a processing substrate 180. In the receiving unit 161, the sensor 141 that detects the reception of the processing substrate 180 and the size of the processing substrate 180, the management of the presence / absence of the processing substrate in each stage 111 of the shelf 110, and the stored processing substrate as a conveyor And a control unit 120 that performs time management in the operation of each transporting stage 111 and time management in the up-and-down operation of the shelf 110 and controls the operation of each part in association with each other. To have.
Then, when the processing substrate 180 is received, the processing substrate 180 is placed in accordance with the height of the processing substrate to be received, with the position of the predetermined empty stage 111 where the processing substrate 180 of the shelf 110B is not placed. When the processing substrate 180 is received inside and sent out, the processing substrate 180 is sent out to the outside in accordance with the position of the stage 111 on which the processing substrate 180 is placed.
If necessary, the level of the processing substrate on the shelf 110B is adjusted to the height of the empty level on the shelf 110A, and the processing substrate is fed to the empty level side by rotating the rollers on each level.
[0013]
Each stage 111 of the shelf 110 is composed of a plurality of rollers 113 that can be driven to rotate substantially horizontally, and the processing substrate 180 can be conveyed by the conveyor in a substantially horizontal state, and placed and stored stationary on the substrate. The control of the conveyor conveyance and stationary of each stage is performed by the control unit 120.
The rotation driving of each roller 113 is not shown in FIG. 1, but for example, a predetermined coupling portion is provided on the shafts at both ends of the roller, and a rotation portion fitted to this is appropriately fitted and rotated. However, the method is not particularly limited to this.
[0014]
The up-and-down moving unit 130 moves the holding unit 115 up and down by rotating the ball screw 131 with a motor 132, and as a result, moves up and down the entire shelf 110 fixed to the holding unit 115 that moves up and down.
Note that a screw portion that fits into the ball screw 131 is provided inside the holding portion.
[0015]
The sensor 145 is fixed at a predetermined position and detects the position of the vertical movement of the shelf 110. The sensor 145 can grasp the position of the shelf, and can receive and send out the processing substrate normally. It is a sensor for controlling the vertical position so that the processed substrate can be conveyed by the conveyor.
As the sensor, a photo sensor is described in this example, but a mechanical sensor may be used without being limited thereto.
[0016]
The sensor 141 confirms the processing substrate 180 to be received, grasps the size of the processing substrate 180, controls the driving of the roller 113 of the receiving shelf based on this information, and is set so as to be positioned substantially at the center of the shelf. To do.
The size of the processing substrate can be calculated from the conveyance speed by the rollers 151 and 113.
The sensor 142 confirms delivery of the processed substrate stored for a predetermined time, but this is not always necessary.
The sensor 143 grasps the movement of the processing substrate from the shelf 110B to 110A.
[0017]
The control unit 120 grasps the state of the apparatus 100 according to a predetermined operation flow shown in FIGS. 4 and 5 to be described later based on information from each sensor, etc., and gives an operation instruction to each unit. It is.
Specifically, the control unit 120 manages the presence / absence of the processing substrate 180 in each stage 111 of each shelf unit 110, the time management, the shelf level in the operation of each stage 111 that conveys the stored processing substrate 180 by conveyor. The time management in the vertical movement of 110 is performed, and the operations of the respective units are controlled in association with each other.
When there are a plurality of processing substrate sizes, the control unit also grasps the size of the processing substrate at each stage and controls the roller rotation driving of the stage.
[0018]
Next, each sensor unit will be described with reference to FIG.
The sensor 145 is for grasping the vertical movement position of the shelf 110. For example, as shown in FIG. 3A, a large number of blades 148 integrally fixed to the shelf are arranged at predetermined distance intervals. It is provided to sense reflected light from one surface of the blade.
That is, as shown in FIG. 3B, the sensor 145 is a photosensor having a light projecting unit 145A and a light receiving unit 145B fixed at predetermined positions. By detecting the surface 148S of 148, a signal (data) corresponding to the position can be obtained.
In addition, it is also possible to provide a rotary encoder on the rotating shaft of the ball screw and manage the position by the output.
[0019]
FIG. 4 shows an example of an operation flow of receiving a processing substrate into the apparatus of this example, FIG. 5 shows an example of an operation flow of feeding the processing substrate from the apparatus of this example, and each operation based on the figure is shown. explain.
The operation shown in FIGS. 4 and 5 basically sends the storage substrate to the stage of the shelf 110A shown in FIG. 1 with priority over the shelf 110B, and the processed substrate is stored once in the stage. Then, after a predetermined time has passed at that stage, the processing substrate is sent out from that stage.
However, the lowermost level of each shelf is left empty and is used as a conveyor for transporting in the processing substrate receiving operation and sending out operation.
Here, the description will be given below assuming that the lowermost stage of the step parts 110A and 110B is the stage A0 and the stage B0, respectively.
Note that the operation flow shown in FIGS. 4 and 5 is an example, and it goes without saying that the apparatus of this example may be operated using another operation flow.
Moreover, it replaces with description of operation | movement of the control part 120, operation | movement of the shelf 110, etc. by this.
[0020]
First, the process substrate receiving operation to the apparatus of this example shown in FIG. 3 will be described based on FIG. 4 with reference to FIG. 1 and FIG.
First, a receiving processing substrate is set on the roller 151. (S410) Before the receiving unit 161, the processing substrate 180 stands still and waits for the receiving operation.
When the apparatus 100 is in operation such as sending out or receiving operation, the processing substrate is kept still, and the receiving is stopped. When the apparatus 100 is not operating, the receiving operation is started. (S411)
When the apparatus 100 is not in operation such as sending out or receiving, it is first checked whether or not there is an empty stage on the shelf 110A. (S412)
If there is a vacancy in the shelf 110A, it is confirmed that the transporting stage B0 of the shelf 110B is empty (S413), and it is confirmed that the stage B0 is at the height of the receiving position. (S414)
When the stage B0 is not at the height position of the receiving position, the shelf stage 110B is moved up and down, and the stage B0 is moved to the height position of the receiving position.
When the stage B0 is at the height of the receiving position, the stage that receives the processing substrate is selected from the empty stages of the shelf 110A. (S415)
Move the selected step to the same height as the receiving position. (S416)
Subsequently, the roller 151, the roller 113 of the stage B0, and the roller of the selected stage of the shelf stage 110A are rotationally driven (S417), and the processing substrate is transported to a predetermined position of the selected stage, and first of the selected stage. The rollers are stopped (S418), and then the driving of each roller is stopped as appropriate. (S419)
In this way, the processing substrate is stored at a predetermined position of the selected stage of the shelf, and the control unit 120 receives the processing time, the corresponding shelf, and storage of the received processing substrate. Correspondingly, the data is sent to the operation flow side or the like.
And acceptance is completed.
[0021]
When there is no empty stage other than the stage A0 in the shelf stage 110A, it is confirmed whether or not there is an empty stage other than the stage B0 in the shelf stage 110B. (S421)
If there is an empty stage, select the stage to accept. (S422)
Next, the selected step is moved to the same height position as the receiving position. (S423)
Next, the roller 151 and the roller 113 at the selected stage of the shelf 110B are rotationally driven to receive the processing substrate. (S424)
In a state where the processing substrate has entered the predetermined position of the selected stage, the roller 113 of the selected stage is stopped (S425), and then the roller 151 is also stopped. (S426)
Similarly, the processing substrate is stored at a predetermined position of the selected stage of the shelf, but the control unit 120 receives the processing time, the corresponding shelf, the storage stage, etc. of the received processing substrate. And send this data to the sending operation flow side as necessary.
And acceptance is completed.
[0022]
Next, the processing substrate delivery operation to the apparatus of this example shown in FIG. 5 will be described based on FIG. 5 with reference to FIG. 1 and FIG.
For each level of each shelf, it is sequentially checked whether there is a storage time that has reached a predetermined time. If there is a corresponding level, the processing substrate is sent out at that level.
First, a stage whose storage time has reached a predetermined time is selected (specified). (S510)
Next, when the apparatus 100 is in an operation such as a delivery operation or an acceptance operation, the processing substrate is kept still at the specified stage, the delivery is stopped, and when the apparatus 100 is not in operation, the delivery operation is performed. Start. (S511)
In addition, when the apparatus 100 is not in the operation of sending out or receiving, it is confirmed whether or not the specified stage is on the shelf stage 110A. (S512)
When the specified step is on the shelf step 110A, the specified step is moved to the same height as the delivery position. (S513)
After the movement, the roller 152 and the roller 113 of the specified stage of the shelf 110A are rotationally driven to send out the processing substrate. (S514)
Thereafter, the rotation of each roller is appropriately stopped.
Although the specified level of the shelf is empty, the control unit 120 grasps this information and sends it to the receiving operation flow side or the like as necessary.
In this way, the delivery operation is completed.
[0023]
If the specified shelf is 110B, it is temporarily confirmed that the level A0 of the level 110A is empty (S520), and it is confirmed whether the level A0 is at the same height as the delivery position. If not, move it to that position. (S521) With the stage A0 at the same height as the delivery position, the specified stage of the shelf 110B is moved to the same height as the delivery position. (S522)
After the movement, the roller 152 and the roller 113 at the specified stage of the stage A0 and the shelf 110B are rotationally driven to send out the processing substrate. (S523)
Thereafter, the rotation of each roller is appropriately stopped.
Although the specified level of the shelf is empty, the control unit 120 grasps this information and sends it to the receiving operation flow side or the like as necessary.
In this way, the delivery operation is completed.
[0024]
【The invention's effect】
As described above, the present invention is a puffer device for storing a processing substrate for a predetermined time in the middle of a processing process line for processing, and can store a large number of processing substrates in a space-saving manner. Thus, it has become possible to provide an apparatus capable of reliably delivering the processed substrate to the outside after the elapse of the time.
In particular, it is applied to an apparatus that consistently performs exposure and development processing in the production of a substrate for a PDP. After exposing a negative photosensitive resist, the exposure section and the development processing are completed in order to complete the reaction of photoexcited radicals. When it is provided between the parts, it is possible to store the processed substrate after exposure without taking up space, and to reliably send the processed substrate to the development processing part side after a predetermined time has passed, resulting in quality The effect is also great in terms of work.
[Brief description of the drawings]
FIG. 1 is a schematic view of an example buffer device according to an embodiment. FIG. 2 is a cross-sectional view of an example buffer device according to an embodiment. FIG. 3 is a diagram for explaining a sensor unit that detects the position of vertical movement. FIG. 4 is a flow chart of receiving operation of a processed substrate. FIG. 5 is a flow chart of operating flow of the processed substrate. FIG. 6 is a diagram for explaining formation of a barrier by sandblasting. Figure [Explanation of symbols]
100 apparatus 110, 110A, 110B shelf 111 step 113 roller 113A shaft 115 holding unit 120 control unit 130 vertical movement unit 131 ball screw 132 motor 141, 142, 143 sensor 145 position sensor 145A light projecting unit 145B light receiving unit 148 blade 148S surface 151 , 152 Roller 161 Receiving unit 162 Sending unit 170 Booth 180 Processing substrate

Claims (2)

The substrate, in the course of processing to process line, a buffer device for storing a predetermined time, can transport the substrate in a substantially horizontal state, and placed at rest on it, storage A plurality of rolls that can be used as conveyors, and a plurality of shelves provided in a shelf shape, and a vertical movement unit that moves the whole shelf part as a whole while managing the position in the vertical direction , Sensor unit for detecting acceptance of processing substrate, management of presence / absence of processing substrate at each stage of shelf part, time management in operation of each stage to convey conveyor stored processing substrate, up / down movement of shelf stage A control unit that performs time management and controls the operation of each unit in association with each other, and accepts the position of a predetermined empty stage where the processing substrate is not placed when receiving the processing substrate. Treated substrate In response to this, the processing substrate is received inside, and when the processing substrate is sent out, the position of the stage where the processing substrate stored for a predetermined time is placed in accordance with the sending position. der those for feeding the outside is, and, the ledge 2 or more, in order from the substrate receiving side, toward the processing substrate feeding side, it arranged so that adjacent, transport of the substrate between the adjacent trays is A buffer device, which is performed by conveyor conveyance at each stage . It is used as a buffer unit provided between the exposure unit and the development unit in an apparatus that consistently performs exposure and development processing using a substrate for plasma display as a processing substrate. buffer device according to claim 1 you, wherein the reaction is intended to complete the.

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