JP2000025931A - Buffer device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To increase storage capacity by integrally-forming the whole rack part so that a plurality of stages formed out of a plurality of rolls and serving as a conveyor may be overlapped and mounted on the rack, moving it while controlling a vertical position, and using the lowest stages of the respective rack stages as the conveyor for conveyance in receiving and delivering a processed substrate. SOLUTION: A processed substrate for receiving is placed on a roller 151. If a device 100 is not performing delivering or receiving operation, it is checked whether or not any stage of a rack stage 110A is vacant. If vacant, it is checked whether or not the lowest stage for conveyance of the rack stage 110B is vacant and placed at the height of a receiving position. If the lowest stage of the rack stage 110B is not placed at the height of a receiving position, the lowest stage is moved at the height of the receiving position by vertical movement of the rack stage 110B by a vertical moving part 130. The receiving stage of the processed substrate of the rack stage 110A is selected and moved at the height of the receiving position. After the processed substrate is conveyed in the prescribed position on the selected stage by rotation driving of a roller 151, the lowest stage roller 113 of the rack stage 110B, and the roller of selected stages of the rack stage 110A, driving of the respective rollers is stopped.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a puffer device for storing a processing substrate for a predetermined time in a processing line for processing, and more specifically, to a substrate for a plasma display. As the exposure,
The present invention relates to an apparatus used as a buffer section provided between an exposure section and a development section in an apparatus for performing a development process consistently, and for completing a reaction of radicals excited by light of a negative photosensitive resist.

[0002]

2. Description of the Related Art In recent years, plasma display panels (hereinafter, also referred to as PDPs) have been used in various display devices because of their small depth, light weight, clear display, and wide viewing angle compared to liquid crystal panels. It is being used.
Generally, a plasma display panel (PDP) has two
A pair of regularly arranged electrodes are provided on a pair of opposed glass substrates, and a gas mainly containing neon, xenon, or the like is sealed between the pair of electrodes. Then, a voltage is applied between these electrodes, and a discharge is generated in minute cells around the electrodes, so that each cell emits light and display is performed. In particular, in order to display information, regularly arranged cells are selectively discharged to emit light.

Here, the configuration of the PDP is shown in FIG.
An example of the type PDP will be described. FIG. 7 is a perspective view of the PDP structure, but shows the front plate (glass substrate 710) and the rear plate (glass substrate 720) apart from the actual case for easy understanding. As shown in FIG. 7, two glass substrates 710 and 720 are disposed in parallel and opposed to each other, and both are provided on a glass substrate 720 serving as a back plate in parallel with each other (cell barrier). 730)
Are held at regular intervals. On the back side of the glass substrate 710 serving as a front plate, composite electrodes composed of a transparent electrode 740 serving as a discharge sustaining electrode and a metal electrode 750 serving as a bus electrode are formed in parallel with each other.
A dielectric layer 760 is formed, and a protective layer (MgO layer) 770 is further formed thereon. In addition, on the front side of a glass substrate 720 serving as a back plate, an address electrode 780 is positioned between barriers 730 so as to be orthogonal to the composite electrode.
Are formed in parallel with each other, and a phosphor 790 is provided so as to cover the wall surface of the barrier 730 and the cell bottom surface. The barrier 730 is for defining a discharge space, and each partitioned discharge space is called a cell or a unit light emitting region.
This AC type PDP is of a surface discharge type, and has a structure in which an AC voltage is applied between composite electrodes on the front panel to cause discharge.
In this case, since the alternating current is applied, the direction of the electric field changes according to the frequency. Then, the phosphor 790 is caused to emit light by the ultraviolet light generated by the discharge, and the light transmitted through the front plate can be visually recognized by an observer. In addition, DC type PD
In the case of P, the electrode is different from the AC type in that the electrode has a structure not coated with the dielectric layer, but the discharge effect is the same. 7 has a structure in which a base layer 767 is provided on one surface of a glass substrate 720 and a dielectric layer 765 is provided thereon, but the base layer 767 and the dielectric layer
5 is not necessarily required.

[0004] Conventionally, as a method of forming a barrier of a back plate used in the above-mentioned PDP, a barrier forming material is repeatedly printed on a glass substrate in a barrier pattern shape by screen printing a plurality of times, and a required pattern is formed. The first method of stacking and drying at a height (called a screen printing method), or applying a barrier-forming material over the entire surface of a glass substrate and then patterning a resist having sandblast resistance on the applied surface into a predetermined shape A second method (called a sandblast method) of forming a barrier-forming material into a predetermined shape by sandblasting using the resist as a mask has been employed. However, in forming the barrier of the back plate used in the PDP by the first method, it is necessary to screen-print the paste several times to several tens times to obtain a predetermined thickness as the barrier, which is troublesome. In addition, it is necessary to control the printing accuracy, and it is difficult to obtain satisfactory printing quality. At present, the second method is mainly used.

Here, the second method (sand blast method)
FIG. 6 shows an example of the barrier formation by the sand blast method, and the barrier formation method by the sand blast method will be further described. FIG.
As shown in (a), after an electrode wiring 630 is formed on one surface of a glass substrate 610 via an undercoat layer 620, the electrode wiring 630 is formed so as to cover the glass substrate 610 surface.
Further, a dielectric layer 650 is formed. Next, the dielectric layer 6
After applying a processing material 660 made of a low-melting glass paste for barrier formation to the entire surface on the upper surface 50 (FIG. 6B), a photosensitive resist 640 resistant to sandblasting is applied on the processing material 660. Then, only a predetermined region of the resist 640 is exposed to a predetermined ionizing radiation using a photomask having a pattern of a predetermined shape corresponding to the shape of the barrier to be formed, and is then exposed. Develop and pattern into a predetermined shape. (FIG. 6D) Then, the resist 640 is used as a mask when the processing material 660 is sandblasted, and sandblasting is performed, and only the processing material 660 exposed from the mask is cut into a predetermined shape. I do. (FIG. 6E) Thereafter, the resist 640 is removed and a baking process is performed to form a barrier 660A on the dielectric layer 650. (FIG. 6
(F))

As described above, in forming a barrier on a glass substrate serving as a back plate used in a PDP according to the second method, a barrier-forming material coated on the glass substrate is coated with a photosensitive material having a resistance to sandblasting. The resist 640 was covered with a mask having a predetermined shape, and abrasive sand such as glass beads was blown from a plurality of nozzles with high-pressure air, and a portion exposed from the mask was selectively cut to form a barrier. . Similarly, when forming the electrode wiring 630, a photosensitive resist is used, and only a predetermined region of the resist 640 is exposed to a predetermined ionizing radiation using a photomask having a picture of a predetermined shape. Developing this to form a pattern into a predetermined shape has been adopted.

As described above, in the production of a substrate for a PDP, there are various steps of exposing and developing a photosensitive resist, and the photosensitive resist used is a negative resist such as a dry film resist. Photosensitive resists have been commonly used. In recent years, there has been a strong demand for mass production of PDPs.
There is a need for a production line that can perform processing as reliably and consistently as possible. Under these circumstances, PD
Exposure, even in an apparatus that performs the development process consistently, using the substrate for P as a processing substrate, after exposing the negative photosensitive resist, a predetermined time is required to complete the reaction of the radicals excited by light, A buffer that does not lengthen the entire production line and can ensure a predetermined time to complete the reaction of photoexcited radicals after exposing a negative photosensitive resist to a processed substrate after exposure. It was difficult to provide a part, which was a problem.

[0008]

As described above, the PDP
In an apparatus that performs exposure and development processing consistently in the production of a substrate for use, after exposing a negative photosensitive resist,
In order to complete the reaction of the photoexcited radical, it is provided between the exposure part and the development processing part, taking up as little space as possible,
There has been a demand for a buffer device capable of storing a processed substrate after exposure and reliably sending the processed substrate to a development processing unit after a predetermined time has elapsed. The present invention responds to this problem by exposing a substrate for PDP to light exposure,
It is an apparatus that performs development processing consistently, and is provided between the exposure part and the development processing part to complete the reaction of photoexcited radicals after exposing the negative photosensitive resist, and it takes as little space as possible It is an object of the present invention to provide a buffer device that can store a processed substrate after exposure, and can reliably send the processed substrate to a development processing unit after a predetermined time has elapsed.

[0009]

A buffer device according to the present invention is a puffer device for storing a processing substrate for a predetermined time in the middle of a processing step line for processing, wherein the processing substrate is kept substantially horizontal. Can be transported, and can be placed stationary on it, and can be stored, a plurality of stages also serving as a conveyor consisting of a plurality of rolls, a plurality of shelves provided in a shelf shape, and the entire shelves are integrated, A vertical moving unit that moves while managing its position in the vertical direction, a sensor unit that detects the reception of processed substrates, management of the presence or absence of processed substrates in each stage of the shelf unit, and conveyor transport of stored processed substrates And a control unit that performs time management in the operation of each stage, and time management in the vertical operation of the shelf, and controls the operation of each unit in association with each other.
The position of the predetermined empty step where the processing substrate is not placed is adjusted to the height of the processing substrate to be received, and the processing substrate is received inside.When sending out the processing substrate,
The processing substrate is sent out to the outside in accordance with the position of the step where the processing substrate stored for a predetermined time is placed, and the sending position. In the above, two or more shelves are arranged so as to be adjacent to each other from the processing substrate receiving side to the processing substrate sending side, and the processing substrates are transported between the adjacent shelf stages by the conveyor of each stage. It is characterized by being carried out by transport. The above-mentioned buffer device is used as a buffer unit provided between an exposure unit and a development unit in an apparatus that performs exposure and development processes consistently, using a substrate for a plasma display as a processing substrate, It is characterized in that it is for completing the reaction of photoexcited radicals in the resist.

[0010]

The buffer device of the present invention has such a structure, and is a device for performing the exposure and development processes in the manufacture of a PDP substrate in an integrated manner. In order to complete the reaction of the radicals, it is provided between the exposure unit and the development processing unit, takes up as little space as possible, can store the processing substrate after exposure, and after a predetermined time elapses, moves the processing substrate to the development processing unit side. This makes it possible to provide a reliable buffer device. More specifically, a plurality of conveyor-use steps composed of a plurality of rolls, which can transport a processing substrate in a substantially horizontal state and can be placed and stored on the processing station, are provided in a shelve-like manner. And the entire shelf
A vertical moving unit that moves while managing its position in the vertical direction, a sensor unit that detects the reception of processed substrates, management of the presence or absence of processed substrates in each stage of the shelf unit, and conveyor transport of stored processed substrates Time management in the operation of each stage,
A control unit for performing time management in the up and down operation of the shelf and controlling the operation of each unit in association with each other, and when receiving a processing substrate, a predetermined empty stage where no processing substrate is placed. The processing substrate is received inside according to the height of the processing substrate to be received.When the processing substrate is sent out, the position of the step where the processing substrate stored for a predetermined time is placed This is achieved by sending the processing substrate to the outside according to the sending position. That is, place the processing substrate stationary on it,
By providing a shelf that also serves as a conveyor made up of a plurality of rolls that can be stored, it takes up less space, and a sensor unit that detects the reception of a processing substrate, and each stage of the shelf unit Management of presence / absence of processing substrates, time management in the operation of each stage to convey the stored processing substrates on the conveyor, time management in the vertical operation of the shelf,
Further, by providing a control unit for controlling the operation of each unit in association with each other, it is possible to manage the storage time for each processing substrate.

In particular, a substrate for a plasma display (PDP) is used as a processing substrate, and is used as a buffer section provided between an exposure section and a development section in an apparatus that performs exposure and development processes consistently. It is effective when applied to complete the reaction of photoexcited radicals of a reactive resist. When used as a buffer for a PDP, the shelf is about 10 steps in order to increase the size of the PDP (60 inch class, size 1000 mm × 1500 mm, thickness about 5 mm). is there. When the number of shelves is about 10 steps, two shelves are arranged so as to be adjacent to each other from the processing substrate receiving side to the processing substrate sending side.
The processing substrates can be stored using two shelves, and as a result, each processing substrate can be reliably sent to the development processing section after a predetermined time has elapsed after exposure, which is practical. The transfer of the processing substrate between the adjacent shelf stages can be performed by the conveyor transport of each stage.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of a buffer device according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic sectional view of an example of an embodiment of a buffer device according to the present invention.
FIG. 3A is a diagram viewed from A1-A2 in FIG.
Is a diagram of a sensor unit for detecting the position of the vertical movement.
FIG. 5 is a diagram for explaining the operation of the buffer device of the present example. FIG. 3A is a view of the vicinity of the blade viewed from the B1-B2 direction in FIG. 2, and FIG. 3B is a view of C1 in FIG. 3A.
It is a partial sectional view in -C2. 1 to 3, 10
0 is a buffer device, 110 is a shelf, 111 is a stage, 113
Is a roller, 113A is a shaft, 115 is a holding unit, 120 is a control unit, 130 is a vertical moving unit, 131 is a ball screw, 13
2 is a motor, 141, 142, 143 are sensors, 14
5 is a position sensor, 145A is a light emitting unit, 145B is a light receiving unit, 148 is a blade, 148S is a surface, 151 and 152 are rollers, 161 is a receiving unit, 162 is a sending unit, 17
0 is a booth and 180 is a processing substrate. The buffer device 100 of the present example shown in FIG. 1 is used when manufacturing a substrate for a PDP, and is provided between an exposure device and a developing device. This is an apparatus for exposing only, exposing only a predetermined period of time, and sending it out to a development processing unit. Then, as shown in FIG. 1, the processing substrate 180 can be transported in a substantially horizontal state,
And it can be placed on it and stored.
Conveyor combined stage 111 composed of a plurality of rolls 113
And two shelves 110 (110
A, and 110B) and the vertical moving unit 1 that moves the shelf 110 as a whole while managing its position in the vertical direction.
30 and the receiving portion 161 of the processing substrate 180,
A sensor 141 for detecting the reception of the processing substrate 180 and the size of the processing substrate 180;
1 to manage the presence / absence of the processing substrate, perform time management in the operation of each stage 111 that conveys the stored processing substrate on the conveyor, and manage time in the vertical operation of the shelf 110, and associate the operation of each unit. And a control unit 120 for controlling. When the processing substrate 180 is received, the processing substrate 180 of the shelf 110B is not placed.
The position of the predetermined empty step 111 is adjusted to the height of the processing substrate to be received, and the processing substrate 180 is received inside. When the processing substrate 180 is sent out, the position of the step 111 on which the processing substrate 180 is placed is set. The processing substrate 180 is sent to the outside in accordance with the position to be sent. still,
If necessary, a stage with a processing substrate on the shelf 110B is adjusted to the height of an empty stage on the shelf 110A, and the processing substrate is fed to the empty stage by rotating the rollers of each stage.

Each stage 111 of the shelf 110 comprises a plurality of rollers 113 which can be driven to rotate substantially horizontally, and can convey the processing substrate 180 on a conveyor in a substantially horizontal state. It can be stored, and the control of conveyor conveyance and stationary of each stage is performed by the control unit 1
20. The driving of the rotation of each roller 113 is as follows.
Although not shown in FIG. 1, for example, there is a method in which a predetermined coupling portion is provided on the shaft at both ends of the roller, and a rotating portion fitted to this is appropriately fitted and rotated. However, it is not limited to.

The vertical moving unit 130 rotates the ball screw 131 with a motor 132 so that the holding unit 11 can rotate.
5 is moved up and down, and as a result, the entire shelf 110 fixed to the vertically moving holding unit 115 is moved up and down. Note that a screw portion that fits into the ball screw 131 is provided inside the holding portion.

The sensor 145 is fixed at a predetermined position, and detects the vertical movement position of the shelf 110, so that the position of the shelf can be grasped and the receiving and sending out of the processing substrate can be performed normally. It is a sensor for controlling the vertical position so that the processing substrate can be conveyed between the shelf stages. As the sensor, a photosensor is described in this example, but the sensor is not limited to this, but may be a mechanical sensor.

The sensor 141 receives the processing substrate 18
0, the size of the processing substrate 180 is grasped, and based on this information,
Is set so that it is located approximately at the center of the shelf. The size of the processing substrate can be calculated from the transport speed of the rollers 151 and 113. The sensor 142 confirms the delivery of the processed substrate stored for a predetermined time, but this is not always necessary. The sensor 143 detects the movement of the processing substrate from the shelf 110B to the shelf 110A.

The control unit 120 grasps the state of the apparatus 100 according to a predetermined operation flow shown in FIGS. 4 and 5 described later based on information from each sensor and the like, and instructs each unit to operate. Is what you do. Specifically, the control unit 12
0 is the management of the presence / absence of the processing substrate 180 in each stage 111 of each shelf unit 110, the time management in the operation of each stage 111 that conveys the stored processing substrate 180 on the conveyor, the shelf stage 11
Time management is performed in the vertical movement of 0, and the operation of each unit is controlled in association with each other. There are various control methods, and there is no particular limitation. When there are a plurality of sizes of the processing substrates, the control unit also grasps the sizes of the processing substrates in each stage and controls the roller rotation driving of the stages.

Next, FIG.
This will be described based on FIG. The sensor 145 is for grasping the vertical movement position of the shelf 110, for example, as shown in FIG.
(A) As shown in FIG.
A large number of 48 are provided at predetermined distance intervals to sense light reflected from one surface of the blade. That is, as shown in FIG. 3B, the sensor 145 is a photosensor having a light projecting unit 145A and a light receiving unit 145B fixed at a predetermined position. By detecting the surface 148S of the 148,
A signal (data) corresponding to the position can be obtained. In addition, it is also possible to provide a rotary encoder on the rotation axis of the ball screw and control the position by the output.

FIG. 4 shows an example of an operation flow of receiving a processing substrate from the apparatus of this embodiment, and FIG. 5 shows an example of an operation flow of taking out a processing substrate from the apparatus of this embodiment. Each operation will be described. The operation shown in FIG. 4 and FIG. 5 is basically such that the substrate for storage is sent to the shelf 110A as shown in FIG.
Once stored in a column, allow a predetermined time to elapse in that stage,
The processing substrate is sent out from the stage to the outside. However, the lowermost stage of each shelf stage is left empty, and is used as a conveyor for transfer during processing substrate receiving operation and processing substrate sending operation. Here, the steps 110A, 1
The lowermost stage of 10B is described below as stage A0 and stage B0, respectively. The operation flow shown in FIGS. 4 and 5 is an example, and it goes without saying that the apparatus of this embodiment may be operated using another operation flow. In addition, the description of the operation of the control unit 120, the operation of the shelf 110, and the like will be omitted.

First, the operation of receiving the processing substrate into the apparatus of the present embodiment shown in FIG. 3 will be described based on FIG. 4 with reference to FIGS. First, a processing substrate for receiving is set on the roller 151. (S410) Before the receiving unit 161, the processing substrate 180 waits for a receiving operation in a stationary state. When the apparatus 100 is performing an operation such as a sending operation or a receiving operation, the processing substrate is kept stationary, and the receiving is stopped. When the apparatus 100 is not operating, the receiving operation is started. (S4
11) If the apparatus 100 is not performing an operation such as a sending operation or a receiving operation, first, it is checked whether or not there is an empty stage in the shelf stage 110A. (S412) Then, if there is a space in the shelf 110A, the shelf 11
It is confirmed that the transfer stage B0 of the OB is empty (S41).
3) Check that step B0 is at the height of the receiving position. (S414) If the stage B0 is not at the height position of the receiving position, the shelf 110B is moved up and down, and the stage B0 is moved to the height position of the receiving position. At the height position where the stage B0 is the receiving position, the stage that receives the processing substrate is selected from the empty stages of the shelf stage 110A. (S415) The selected step is moved to the same height position as the receiving position. (S416) Next, the roller 151, the roller 113 of the stage B0, and the roller of the selected stage of the shelf 110A are rotationally driven (S416).
417), the processing substrate is transported to a predetermined position on the selected stage, and first, the rollers on the selected stage are stopped (S41).
8) Then, the driving of each roller is appropriately stopped. (S
419) In this way, the processing substrate is stored at a predetermined position of the selected shelf, and the control unit 120 determines the reception time of the accepted processing substrate, the corresponding shelf , The storage stage, etc., are correspondingly grasped, and if necessary, this data is sent to the sending operation flow side or the like. And the acceptance is completed.

If there is no empty stage other than the stage A0 in the shelf stage 110A, it is checked whether there is an empty stage in the shelf stage 110B in addition to the stage B0. (S421) When there is an empty stage, the stage to be received is selected.
(S422) Next, the selected step is moved to the same height position as the receiving position. (S423) Next, the roller 151 and the roller 113 of the selected stage of the shelf 110B are rotationally driven to receive the processing substrate.
(S424) In a state where the processing substrate is in a predetermined position of the selected stage,
Stop the roller 113 of the selected stage (S425),
Next, the roller 151 also stops. (S426) Similarly, the processing substrate is stored in a predetermined position of the selected shelf, and the control unit 120 determines the receiving time, the corresponding shelf, The storage stage and the like are correspondingly grasped, and if necessary, this data is sent to the sending operation flow side or the like. And the acceptance is completed.

Next, an operation of sending a processing substrate to the apparatus of the present embodiment shown in FIG. 5 will be described based on FIG. 5 and with reference to FIGS. For each of the shelves, it is sequentially checked whether or not there is a storage time that has reached a predetermined time, and if there is a corresponding stage, the processing substrate of that stage is sent out. Then, first, a stage whose storage time has reached a predetermined time is selected (specified). (S510) Next, when the apparatus 100 is performing an operation such as a sending operation or an accepting operation, the processing substrate is kept stationary at the specified stage, the sending is stopped, and when the apparatus 100 is not operating, Start the sending operation. (S51
1) When the apparatus 100 is not performing an operation such as a sending operation or a receiving operation, the specified stage is first the shelf stage 110A.
Check if there is. (S512) When the specified level is on the shelf level 110A, the specified level is moved to the same height as the sending position. (S513) After the movement, the roller 152 and the roller 113 of the specified stage of the shelf 110A are rotationally driven to send out the processing substrate. (S514) Thereafter, the rotation of each roller is appropriately stopped. The specified stage of the shelf is empty, but the control unit 120 grasps this information and sends it to the receiving operation flow side or the like as necessary. Thus, the sending operation is completed.

If the specified shelf is 110B, it is temporarily confirmed that the stage A0 of the shelf 110A is empty (S520), and the stage A0 is at the same height as the sending position. Check if it is not at that position, move it to that position. (S521) With the stage A0 at the same height as the sending position,
The specified stage of the shelf stage 110B is moved to a position at the same height as the sending position. (S522) After the movement, the roller 152 and the roller 113 of the specified stage of the stage A0 and the shelf 110B are rotationally driven to send out the processing substrate. (S523) Thereafter, the rotation of each roller is appropriately stopped. The specified stage of the shelf is empty, but the control unit 120 grasps this information and sends it to the receiving operation flow side or the like as necessary. Thus, the sending operation is completed.

[0024]

According to the present invention, as described above, the processing substrate is
A puffer device for storing for a predetermined time in the middle of a processing step line to be processed.It can save a large number of processing substrates in a space-saving manner, and can send out processing substrates after a predetermined time has passed. It is possible to provide a reliable device. In particular, it is applied to an apparatus that performs exposure and development processes consistently in the manufacture of PDP substrates. After exposing a negative-type photosensitive resist, it completes the reaction of photoexcited radicals. When provided between the units, the processing substrate after exposure can be stored without taking up space, and the processing substrate can be reliably sent out to the development processing unit side after a predetermined time has elapsed. The effect is great both in terms of work and work.

[Brief description of the drawings]

FIG. 1 is a schematic diagram of an example of a buffer device according to an embodiment;

FIG. 2 is a cross-sectional view of one example of a buffer device according to the embodiment;

FIG. 3 is a diagram illustrating a sensor unit that detects a position of a vertical movement.

FIG. 4 is a flowchart of a processing board receiving operation.

FIG. 5 is a flowchart of a processing substrate unloading operation.

FIG. 6 is a diagram for explaining formation of a barrier by sandblasting.

FIG. 7 is a diagram illustrating a PDP substrate.

[Explanation of symbols]

 Reference Signs List 100 device 110, 110A, 110B shelf 111 step 113 roller 113A shaft 115 holding unit 120 control unit 130 vertical movement unit 131 ball screw 132 motor 141, 142, 143 sensor 145 position sensor 145A light emitting unit 145B light receiving unit 148 blade 148S surface , 152 roller 161 receiving unit 162 sending-out unit 170 booth 180 processing substrate

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H097 BA06 DB01 DB07 LA10 3F022 AA08 CC02 FF26 HH13 JJ16 MM01 MM13 MM22 MM27 NN05 NN42 NN50 NN51 QQ12 5C012 AA05

Claims (3)

[Claims] 1. A puffer device for storing a processing substrate in a processing process line for processing for a predetermined time, wherein the processing substrate can be transported in a substantially horizontal state,
And it can be placed on it and stored.
A shelf section in which a plurality of rolls serving also as a conveyor are stacked and provided in a shelf shape; an up-down moving section which moves the whole shelf section integrally while managing its position in the up-down direction; And a sensor unit for detecting the presence or absence of the processing substrate in each stage of the shelf unit, time management in the operation of each stage to convey the stored processing substrate on the conveyor, time management in the vertical operation of the shelf stage, And a control unit that controls the operation of each unit in association with each other, and when the processing substrate is received, the position of the predetermined empty step on which the processing substrate is not placed, the height of the processing substrate that receives the processing substrate. When processing substrates are sent out, the position of the stage where the processing substrates stored for a predetermined time are placed is adjusted to the position to be sent out, and the processing substrates are transferred. What to send out Buffer apparatus characterized by some. 2. The method according to claim 1, wherein two or more shelves are arranged adjacent to each other from the processing substrate receiving side to the processing substrate sending side, and the transfer of the processing substrates between the adjacent shelf stages is performed. Characterized in that it is carried out by conveyor transport at each stage. 3. A substrate for a plasma display, which is used as a buffer substrate provided between an exposure unit and a development unit in an apparatus that performs exposure and development processes consistently, using a substrate for processing as a processing substrate. 3. The buffer device according to claim 1, wherein the buffer device completes the reaction of the photoexcited radical.