JP4163938B2 - サンプルの表面分析を行う方法及びこれを実施する装置 - Google Patents

サンプルの表面分析を行う方法及びこれを実施する装置 Download PDF

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Publication number
JP4163938B2
JP4163938B2 JP2002355558A JP2002355558A JP4163938B2 JP 4163938 B2 JP4163938 B2 JP 4163938B2 JP 2002355558 A JP2002355558 A JP 2002355558A JP 2002355558 A JP2002355558 A JP 2002355558A JP 4163938 B2 JP4163938 B2 JP 4163938B2
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JP
Japan
Prior art keywords
sample
particle beam
gas mixture
low dynamic
energy particle
Prior art date
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Expired - Fee Related
Application number
JP2002355558A
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English (en)
Japanese (ja)
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JP2003194748A (ja
JP2003194748A5 (OSRAM
Inventor
ウィルフリート・ファンデルフォルスト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Interuniversitair Microelektronica Centrum vzw IMEC
Original Assignee
Interuniversitair Microelektronica Centrum vzw IMEC
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Application filed by Interuniversitair Microelektronica Centrum vzw IMEC filed Critical Interuniversitair Microelektronica Centrum vzw IMEC
Publication of JP2003194748A publication Critical patent/JP2003194748A/ja
Publication of JP2003194748A5 publication Critical patent/JP2003194748A5/ja
Application granted granted Critical
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Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0459—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for solid samples
    • H01J49/0463—Desorption by laser or particle beam, followed by ionisation as a separate step
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
    • G01N27/626—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using heat to ionise a gas
    • G01N27/628—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using heat to ionise a gas and a beam of energy, e.g. laser enhanced ionisation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N19/00—Investigating materials by mechanical methods
    • G01N19/06—Investigating by removing material, e.g. spark-testing

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
JP2002355558A 2001-12-06 2002-12-06 サンプルの表面分析を行う方法及びこれを実施する装置 Expired - Fee Related JP4163938B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01870272A EP1318394B1 (en) 2001-12-06 2001-12-06 Method and apparatus for local surface analysis
EP01870272-0 2001-12-06

Publications (3)

Publication Number Publication Date
JP2003194748A JP2003194748A (ja) 2003-07-09
JP2003194748A5 JP2003194748A5 (OSRAM) 2006-02-02
JP4163938B2 true JP4163938B2 (ja) 2008-10-08

Family

ID=8185065

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002355558A Expired - Fee Related JP4163938B2 (ja) 2001-12-06 2002-12-06 サンプルの表面分析を行う方法及びこれを実施する装置

Country Status (5)

Country Link
US (1) US6809317B2 (OSRAM)
EP (1) EP1318394B1 (OSRAM)
JP (1) JP4163938B2 (OSRAM)
AT (1) ATE386264T1 (OSRAM)
DE (1) DE60132788T2 (OSRAM)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4777006B2 (ja) * 2004-08-10 2011-09-21 富士通株式会社 ３次元微細領域元素分析方法
JP2006260807A (ja) * 2005-03-15 2006-09-28 Fujitsu Ltd 元素測定装置及び方法
JP4777088B2 (ja) * 2006-02-24 2011-09-21 富士通株式会社 ３次元微細領域元素分析方法
US20070278180A1 (en) * 2006-06-01 2007-12-06 Williamson Mark J Electron induced chemical etching for materials characterization
US7791055B2 (en) 2006-07-10 2010-09-07 Micron Technology, Inc. Electron induced chemical etching/deposition for enhanced detection of surface defects
US7807062B2 (en) * 2006-07-10 2010-10-05 Micron Technology, Inc. Electron induced chemical etching and deposition for local circuit repair
US7892978B2 (en) 2006-07-10 2011-02-22 Micron Technology, Inc. Electron induced chemical etching for device level diagnosis
US7833427B2 (en) 2006-08-14 2010-11-16 Micron Technology, Inc. Electron beam etching device and method
US7718080B2 (en) 2006-08-14 2010-05-18 Micron Technology, Inc. Electronic beam processing device and method using carbon nanotube emitter
US7791071B2 (en) 2006-08-14 2010-09-07 Micron Technology, Inc. Profiling solid state samples
WO2013028663A1 (en) * 2011-08-22 2013-02-28 Exogenesis Corporation Methods and apparatus for employing an accelerated neutral beam for improved surface analysis
CN108426758B (zh) * 2017-02-14 2020-10-30 无锡华瑛微电子技术有限公司 晶圆局部处理方法
WO2020257258A1 (en) 2019-06-18 2020-12-24 Fluidigm Corporation Improved mass cytometry

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3567927A (en) * 1969-04-11 1971-03-02 Nasa Ion microprobe mass spectrometer for analyzing fluid materials
US4393311A (en) * 1980-06-13 1983-07-12 Bell Telephone Laboratories, Incorporated Method and apparatus for surface characterization and process control utilizing radiation from desorbed particles
US4496449A (en) * 1983-12-16 1985-01-29 Colromm, Inc. Electron beam etching of integrated circuit structures
US4733073A (en) * 1983-12-23 1988-03-22 Sri International Method and apparatus for surface diagnostics
US5272338A (en) * 1992-05-21 1993-12-21 The Pennsylvania Research Corporation Molecular imaging system
US6204189B1 (en) * 1999-01-29 2001-03-20 The Regents Of The University Of California Fabrication of precision high quality facets on molecular beam epitaxy material

Also Published As

Publication number Publication date
DE60132788D1 (de) 2008-03-27
JP2003194748A (ja) 2003-07-09
EP1318394B1 (en) 2008-02-13
DE60132788T2 (de) 2009-02-05
EP1318394A1 (en) 2003-06-11
ATE386264T1 (de) 2008-03-15
US6809317B2 (en) 2004-10-26
US20030127591A1 (en) 2003-07-10

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