JP4162343B2 - 電子線装置 - Google Patents

電子線装置 Download PDF

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Publication number
JP4162343B2
JP4162343B2 JP36744199A JP36744199A JP4162343B2 JP 4162343 B2 JP4162343 B2 JP 4162343B2 JP 36744199 A JP36744199 A JP 36744199A JP 36744199 A JP36744199 A JP 36744199A JP 4162343 B2 JP4162343 B2 JP 4162343B2
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JP
Japan
Prior art keywords
sample
magnetic pole
electron beam
irradiation position
beam irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP36744199A
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English (en)
Japanese (ja)
Other versions
JP2001185066A5 (enExample
JP2001185066A (ja
Inventor
彬 米澤
成司 森田
光義 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Science Corp
Original Assignee
SII NanoTechnology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SII NanoTechnology Inc filed Critical SII NanoTechnology Inc
Priority to JP36744199A priority Critical patent/JP4162343B2/ja
Priority to US09/740,662 priority patent/US6504164B2/en
Publication of JP2001185066A publication Critical patent/JP2001185066A/ja
Publication of JP2001185066A5 publication Critical patent/JP2001185066A5/ja
Application granted granted Critical
Publication of JP4162343B2 publication Critical patent/JP4162343B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP36744199A 1999-12-24 1999-12-24 電子線装置 Expired - Lifetime JP4162343B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP36744199A JP4162343B2 (ja) 1999-12-24 1999-12-24 電子線装置
US09/740,662 US6504164B2 (en) 1999-12-24 2000-12-19 Electron beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36744199A JP4162343B2 (ja) 1999-12-24 1999-12-24 電子線装置

Publications (3)

Publication Number Publication Date
JP2001185066A JP2001185066A (ja) 2001-07-06
JP2001185066A5 JP2001185066A5 (enExample) 2005-10-27
JP4162343B2 true JP4162343B2 (ja) 2008-10-08

Family

ID=18489322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36744199A Expired - Lifetime JP4162343B2 (ja) 1999-12-24 1999-12-24 電子線装置

Country Status (2)

Country Link
US (1) US6504164B2 (enExample)
JP (1) JP4162343B2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002134051A (ja) * 2000-10-20 2002-05-10 Seiko Instruments Inc 電磁界重畳型レンズ及びこれを用いた電子線装置
JP4005411B2 (ja) * 2002-05-15 2007-11-07 エスアイアイ・ナノテクノロジー株式会社 電子線装置
DE10233002B4 (de) * 2002-07-19 2006-05-04 Leo Elektronenmikroskopie Gmbh Objektivlinse für ein Elektronenmikroskopiesystem und Elektronenmikroskopiesystem
US7034297B2 (en) * 2003-03-05 2006-04-25 Applied Materials, Israel, Ltd. Method and system for use in the monitoring of samples with a charged particle beam
JP2005149733A (ja) * 2003-11-11 2005-06-09 Jeol Ltd 走査電子顕微鏡
EP1557867B1 (en) * 2004-01-21 2008-02-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Focussing lens for charged particle beams
EP1648018B1 (en) * 2004-10-14 2017-02-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Focussing lens and charged particle beam device for non zero landing angle operation
KR101010338B1 (ko) * 2005-08-18 2011-01-25 전자빔기술센터 주식회사 전자칼럼의 전자빔 에너지 변환 방법
JP4790393B2 (ja) * 2005-11-30 2011-10-12 日本電子株式会社 電子検出器及びそれを備えたビーム装置
JP4906409B2 (ja) * 2006-06-22 2012-03-28 株式会社アドバンテスト 電子ビーム寸法測定装置及び電子ビーム寸法測定方法
DE102006059162B4 (de) * 2006-12-14 2009-07-09 Carl Zeiss Nts Gmbh Teilchenoptische Anordnung
JP5227643B2 (ja) 2008-04-14 2013-07-03 株式会社日立ハイテクノロジーズ 高分解能でかつ高コントラストな観察が可能な電子線応用装置
US20110266436A1 (en) * 2010-04-29 2011-11-03 Battelle Energy Alliance, Llc Apparatuses and methods for forming electromagnetic fields
US8502159B2 (en) 2010-04-29 2013-08-06 Battelle Energy Alliance, Llc Apparatuses and methods for generating electric fields
JP5530811B2 (ja) * 2010-06-02 2014-06-25 株式会社日立ハイテクノロジーズ 走査電子顕微鏡装置
JP2014160678A (ja) * 2014-05-12 2014-09-04 Hitachi High-Technologies Corp 荷電粒子線装置
JP6177817B2 (ja) * 2015-01-30 2017-08-09 松定プレシジョン株式会社 荷電粒子線装置及び走査電子顕微鏡
CZ307259B6 (cs) 2016-09-26 2018-05-02 Tescan Brno, S.R.O. Objektivová čočka pro zařízení využívající nejméně jednoho svazku nabitých částic
WO2018173242A1 (ja) 2017-03-24 2018-09-27 株式会社 日立ハイテクノロジーズ 荷電粒子線装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5894124A (en) * 1995-03-17 1999-04-13 Hitachi, Ltd. Scanning electron microscope and its analogous device

Also Published As

Publication number Publication date
JP2001185066A (ja) 2001-07-06
US20010011702A1 (en) 2001-08-09
US6504164B2 (en) 2003-01-07

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