JP4159823B2 - 超純水製造方法 - Google Patents

超純水製造方法 Download PDF

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Publication number
JP4159823B2
JP4159823B2 JP2002235052A JP2002235052A JP4159823B2 JP 4159823 B2 JP4159823 B2 JP 4159823B2 JP 2002235052 A JP2002235052 A JP 2002235052A JP 2002235052 A JP2002235052 A JP 2002235052A JP 4159823 B2 JP4159823 B2 JP 4159823B2
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Japan
Prior art keywords
water
treated
exchange resin
acid
organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002235052A
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English (en)
Japanese (ja)
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JP2003236535A5 (enExample
JP2003236535A (ja
Inventor
徹 天谷
俊和 阿部
泉里 小島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nomura Micro Science Co Ltd
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Nomura Micro Science Co Ltd
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Priority to JP2002235052A priority Critical patent/JP4159823B2/ja
Publication of JP2003236535A publication Critical patent/JP2003236535A/ja
Publication of JP2003236535A5 publication Critical patent/JP2003236535A5/ja
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Publication of JP4159823B2 publication Critical patent/JP4159823B2/ja
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  • Physical Water Treatments (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
JP2002235052A 2001-12-11 2002-08-12 超純水製造方法 Expired - Fee Related JP4159823B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002235052A JP4159823B2 (ja) 2001-12-11 2002-08-12 超純水製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001376689 2001-12-11
JP2001-376689 2001-12-11
JP2002235052A JP4159823B2 (ja) 2001-12-11 2002-08-12 超純水製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2008163182A Division JP4519930B2 (ja) 2001-12-11 2008-06-23 超純水製造方法及び超純水製造装置

Publications (3)

Publication Number Publication Date
JP2003236535A JP2003236535A (ja) 2003-08-26
JP2003236535A5 JP2003236535A5 (enExample) 2005-11-04
JP4159823B2 true JP4159823B2 (ja) 2008-10-01

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ID=27790676

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JP2002235052A Expired - Fee Related JP4159823B2 (ja) 2001-12-11 2002-08-12 超純水製造方法

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JP (1) JP4159823B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2024148280A (ja) * 2023-04-05 2024-10-18 栗田工業株式会社 純水製造装置及び純水製造装置の運転方法
WO2025238792A1 (ja) * 2024-05-16 2025-11-20 栗田工業株式会社 純水製造装置及び純水製造装置の運転方法

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JP2003236535A (ja) 2003-08-26

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