JP4148940B2 - ペリクル容積のアクティブパージのためのシステム - Google Patents

ペリクル容積のアクティブパージのためのシステム Download PDF

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Publication number
JP4148940B2
JP4148940B2 JP2004295412A JP2004295412A JP4148940B2 JP 4148940 B2 JP4148940 B2 JP 4148940B2 JP 2004295412 A JP2004295412 A JP 2004295412A JP 2004295412 A JP2004295412 A JP 2004295412A JP 4148940 B2 JP4148940 B2 JP 4148940B2
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JP
Japan
Prior art keywords
pellicle
purge
region
gas
flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004295412A
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English (en)
Japanese (ja)
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JP2005115389A5 (enExample
JP2005115389A (ja
Inventor
フローレンス ルオ チー
フォーゲル ハーマン
ヒラリー ハロルド ジョージ
テン カテ ニコラース
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
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Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of JP2005115389A publication Critical patent/JP2005115389A/ja
Publication of JP2005115389A5 publication Critical patent/JP2005115389A5/ja
Application granted granted Critical
Publication of JP4148940B2 publication Critical patent/JP4148940B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2004295412A 2003-10-07 2004-10-07 ペリクル容積のアクティブパージのためのシステム Expired - Fee Related JP4148940B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/679,324 US7619718B2 (en) 2003-10-07 2003-10-07 Method and system for active purging of pellicle volumes

Publications (3)

Publication Number Publication Date
JP2005115389A JP2005115389A (ja) 2005-04-28
JP2005115389A5 JP2005115389A5 (enExample) 2005-08-25
JP4148940B2 true JP4148940B2 (ja) 2008-09-10

Family

ID=34394148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004295412A Expired - Fee Related JP4148940B2 (ja) 2003-10-07 2004-10-07 ペリクル容積のアクティブパージのためのシステム

Country Status (2)

Country Link
US (1) US7619718B2 (enExample)
JP (1) JP4148940B2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200729292A (en) * 2005-12-22 2007-08-01 Qimonda Ag Apparatus for preserving and using at least one photolithograph projection photo mask and the method using the same in the exposure apparatus
NL2008345A (en) * 2011-03-28 2012-10-01 Asml Holding Nv Lithographic apparatus and device manufacturing method.
WO2014005780A1 (en) 2012-07-06 2014-01-09 Asml Netherlands B.V. A lithographic apparatus
US9841360B1 (en) * 2012-10-15 2017-12-12 Michael C. Solazzi Sample cup assembly, system and method for purging
NL2012291A (en) * 2013-02-20 2014-08-21 Asml Netherlands Bv Gas flow optimization in reticle stage environment.
KR101853576B1 (ko) * 2014-05-02 2018-04-30 미쯔이가가꾸가부시끼가이샤 펠리클 프레임, 펠리클 및 그 제조 방법, 노광 원판 및 그 제조 방법, 노광 장치, 그리고 반도체 장치의 제조 방법
US10036951B2 (en) * 2015-05-29 2018-07-31 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle assembly and fabrication methods thereof
KR102172722B1 (ko) * 2018-12-26 2020-11-02 주식회사 에프에스티 초극자외선 리소그라피용 펠리클의 검사에 사용되는 캡슐
US11163791B2 (en) 2019-01-23 2021-11-02 Servicenow, Inc. Transformation configuration in instance data replication with bi-directional replication support

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6436586B1 (en) * 1999-04-21 2002-08-20 Shin-Etsu Chemical Co., Ltd. Pellicle with a filter and method for production thereof
JP2001133960A (ja) * 1999-11-08 2001-05-18 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル及びペリクルの使用方法
US6791661B2 (en) * 1999-12-09 2004-09-14 Nikon Corporation Gas replacement method and apparatus, and exposure method and apparatus
JP2001345264A (ja) 2000-03-30 2001-12-14 Nikon Corp 露光装置及び露光方法並びにデバイスの製造方法
US6614504B2 (en) * 2000-03-30 2003-09-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2002158153A (ja) * 2000-11-16 2002-05-31 Canon Inc 露光装置およびペリクル空間内ガス置換方法
JP2003043670A (ja) * 2001-07-30 2003-02-13 Asahi Glass Co Ltd ペリクル
JPWO2003034475A1 (ja) 2001-10-10 2005-02-03 株式会社ニコン ガス置換方法及び装置、マスク保護装置、マスク、露光方法及び装置
JP4027085B2 (ja) 2001-12-04 2007-12-26 キヤノン株式会社 デバイス製造関連装置およびデバイス製造方法
JP3958049B2 (ja) 2002-01-15 2007-08-15 キヤノン株式会社 ペルクル付きレチクル、デバイス製造関連装置、露光装置及びデバイス製造方法
JP4006235B2 (ja) 2002-02-05 2007-11-14 キヤノン株式会社 不活性ガス置換方法及び装置、レチクル保管庫、レチクル検査装置、レチクル搬送ボックス、デバイスの製造方法
US7068347B2 (en) * 2002-12-20 2006-06-27 Intel Corporation Apparatus for reducing pellicle darkening

Also Published As

Publication number Publication date
US20050074352A1 (en) 2005-04-07
JP2005115389A (ja) 2005-04-28
US7619718B2 (en) 2009-11-17

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