JP4137555B2 - 半導体装置の作製方法 - Google Patents

半導体装置の作製方法 Download PDF

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Publication number
JP4137555B2
JP4137555B2 JP2002244801A JP2002244801A JP4137555B2 JP 4137555 B2 JP4137555 B2 JP 4137555B2 JP 2002244801 A JP2002244801 A JP 2002244801A JP 2002244801 A JP2002244801 A JP 2002244801A JP 4137555 B2 JP4137555 B2 JP 4137555B2
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Japan
Prior art keywords
region
film
silicon film
concentration
channel tft
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Expired - Fee Related
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JP2002244801A
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English (en)
Japanese (ja)
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JP2003151992A (ja
JP2003151992A5 (enExample
Inventor
健司 笠原
直樹 牧田
拓哉 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Sharp Corp
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Semiconductor Energy Laboratory Co Ltd
Sharp Corp
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Priority to JP2002244801A priority Critical patent/JP4137555B2/ja
Publication of JP2003151992A publication Critical patent/JP2003151992A/ja
Publication of JP2003151992A5 publication Critical patent/JP2003151992A5/ja
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Publication of JP4137555B2 publication Critical patent/JP4137555B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Thin Film Transistor (AREA)
  • Recrystallisation Techniques (AREA)
JP2002244801A 2001-08-27 2002-08-26 半導体装置の作製方法 Expired - Fee Related JP4137555B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002244801A JP4137555B2 (ja) 2001-08-27 2002-08-26 半導体装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001255893 2001-08-27
JP2001-255893 2001-08-27
JP2002244801A JP4137555B2 (ja) 2001-08-27 2002-08-26 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2003151992A JP2003151992A (ja) 2003-05-23
JP2003151992A5 JP2003151992A5 (enExample) 2005-10-27
JP4137555B2 true JP4137555B2 (ja) 2008-08-20

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JP2002244801A Expired - Fee Related JP4137555B2 (ja) 2001-08-27 2002-08-26 半導体装置の作製方法

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JP (1) JP4137555B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0512819A (ja) * 1991-07-05 1993-01-22 Teac Corp 信号記録装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4624047B2 (ja) * 2004-09-21 2011-02-02 シャープ株式会社 ファラデーカップ装置およびイオンドーピング装置ならびに半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0512819A (ja) * 1991-07-05 1993-01-22 Teac Corp 信号記録装置

Also Published As

Publication number Publication date
JP2003151992A (ja) 2003-05-23

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