JP4111342B2 - 周辺露光方法及びその装置 - Google Patents

周辺露光方法及びその装置 Download PDF

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Publication number
JP4111342B2
JP4111342B2 JP2004196813A JP2004196813A JP4111342B2 JP 4111342 B2 JP4111342 B2 JP 4111342B2 JP 2004196813 A JP2004196813 A JP 2004196813A JP 2004196813 A JP2004196813 A JP 2004196813A JP 4111342 B2 JP4111342 B2 JP 4111342B2
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Japan
Prior art keywords
processed
peripheral exposure
wafer
peripheral
beam interference
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Expired - Fee Related
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JP2004196813A
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Japanese (ja)
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JP2006019568A (ja
JP2006019568A5 (enExample
Inventor
英民 八重樫
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2004196813A priority Critical patent/JP4111342B2/ja
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Publication of JP2006019568A5 publication Critical patent/JP2006019568A5/ja
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Publication of JP4111342B2 publication Critical patent/JP4111342B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004196813A 2004-07-02 2004-07-02 周辺露光方法及びその装置 Expired - Fee Related JP4111342B2 (ja)

Priority Applications (1)

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JP2004196813A JP4111342B2 (ja) 2004-07-02 2004-07-02 周辺露光方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004196813A JP4111342B2 (ja) 2004-07-02 2004-07-02 周辺露光方法及びその装置

Publications (3)

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JP2006019568A JP2006019568A (ja) 2006-01-19
JP2006019568A5 JP2006019568A5 (enExample) 2006-07-13
JP4111342B2 true JP4111342B2 (ja) 2008-07-02

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JP2004196813A Expired - Fee Related JP4111342B2 (ja) 2004-07-02 2004-07-02 周辺露光方法及びその装置

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013145863A (ja) 2011-11-29 2013-07-25 Gigaphoton Inc ２光束干渉装置および２光束干渉露光システム
JP7175119B2 (ja) * 2018-07-25 2022-11-18 東京エレクトロン株式会社 基板処理装置、および基板処理方法

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JP2006019568A (ja) 2006-01-19

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