JP4090657B2 - プローブ装置 - Google Patents

プローブ装置 Download PDF

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Publication number
JP4090657B2
JP4090657B2 JP2000028894A JP2000028894A JP4090657B2 JP 4090657 B2 JP4090657 B2 JP 4090657B2 JP 2000028894 A JP2000028894 A JP 2000028894A JP 2000028894 A JP2000028894 A JP 2000028894A JP 4090657 B2 JP4090657 B2 JP 4090657B2
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Japan
Prior art keywords
probe
sample
stage
charged particle
particle beam
Prior art date
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Expired - Lifetime
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JP2000028894A
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English (en)
Japanese (ja)
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JP2001217290A (ja
JP2001217290A5 (https=
Inventor
馨 梅村
聡 富松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
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Hitachi Ltd
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Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2000028894A priority Critical patent/JP4090657B2/ja
Publication of JP2001217290A publication Critical patent/JP2001217290A/ja
Publication of JP2001217290A5 publication Critical patent/JP2001217290A5/ja
Application granted granted Critical
Publication of JP4090657B2 publication Critical patent/JP4090657B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Analysing Materials By The Use Of Radiation (AREA)
  • Measuring Leads Or Probes (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2000028894A 2000-02-01 2000-02-01 プローブ装置 Expired - Lifetime JP4090657B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000028894A JP4090657B2 (ja) 2000-02-01 2000-02-01 プローブ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000028894A JP4090657B2 (ja) 2000-02-01 2000-02-01 プローブ装置

Publications (3)

Publication Number Publication Date
JP2001217290A JP2001217290A (ja) 2001-08-10
JP2001217290A5 JP2001217290A5 (https=) 2006-03-02
JP4090657B2 true JP4090657B2 (ja) 2008-05-28

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ID=18554229

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000028894A Expired - Lifetime JP4090657B2 (ja) 2000-02-01 2000-02-01 プローブ装置

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JP (1) JP4090657B2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4596968B2 (ja) 2005-05-11 2010-12-15 株式会社リコー 半導体装置の不良箇所観察のためのシリコン基板加工方法及び不良箇所特定方法
JP2007114040A (ja) * 2005-10-20 2007-05-10 Renesas Technology Corp プロービング装置
JP2008004569A (ja) * 2007-09-26 2008-01-10 Hitachi Ltd 帯電中和制御方法、及びそれを用いた荷電粒子線装置
JP5042282B2 (ja) * 2009-07-27 2012-10-03 株式会社日立製作所 イオンビーム装置
US9941096B2 (en) 2011-09-12 2018-04-10 Fei Company Glancing angle mill
JP7113613B2 (ja) * 2016-12-21 2022-08-05 エフ イー アイ カンパニ 欠陥分析
CN108254666B (zh) * 2017-12-25 2020-06-05 建荣半导体（深圳）有限公司 一种针对蓝牙系统级的晶圆测试装置及方法
CN108761309B (zh) * 2018-05-23 2024-05-17 昆山龙雨智能科技有限公司 一种测试装置
CN110557877B (zh) * 2019-09-11 2021-03-12 北京航空航天大学 朗缪尔探针、朗缪尔探针检测系统及检测方法
CN110718439B (zh) * 2019-09-30 2020-12-18 中国科学院长春光学精密机械与物理研究所 离子束加工设备
CN115236483B (zh) * 2022-06-17 2025-11-14 长鑫存储技术有限公司 一种测试设备、失效分析方法和测试系统
KR102762911B1 (ko) * 2023-03-09 2025-02-07 한국표준과학연구원 오페란도 트랜지스터 분석 장치

Also Published As

Publication number Publication date
JP2001217290A (ja) 2001-08-10

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