JP4051383B2 - 平面モータの初期化方法、平面モータ、リソグラフィ装置、およびデバイス製造方法 - Google Patents

平面モータの初期化方法、平面モータ、リソグラフィ装置、およびデバイス製造方法 Download PDF

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Publication number
JP4051383B2
JP4051383B2 JP2005183282A JP2005183282A JP4051383B2 JP 4051383 B2 JP4051383 B2 JP 4051383B2 JP 2005183282 A JP2005183282 A JP 2005183282A JP 2005183282 A JP2005183282 A JP 2005183282A JP 4051383 B2 JP4051383 B2 JP 4051383B2
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JP
Japan
Prior art keywords
commutation
coil assembly
angle
magnetic plate
planar motor
Prior art date
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Expired - Lifetime
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JP2005183282A
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English (en)
Japanese (ja)
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JP2006014592A (ja
JP2006014592A5 (enExample
Inventor
フランシスクス ヨハネス サイモンズ ウィルヘルムス
ヘルマン マリー コックス ヘンリクス
アントワーン ヨハン ホル スフェン
Original Assignee
エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2006014592A5 publication Critical patent/JP2006014592A5/ja
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P25/00—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details
    • H02P25/02—Arrangements or methods for the control of AC motors characterised by the kind of AC motor or by structural details characterised by the kind of motor
    • H02P25/06—Linear motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Linear Motors (AREA)
  • Linear Motors (AREA)
JP2005183282A 2004-06-24 2005-06-23 平面モータの初期化方法、平面モータ、リソグラフィ装置、およびデバイス製造方法 Expired - Lifetime JP4051383B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/874,691 US7205741B2 (en) 2004-06-24 2004-06-24 Planar motor initialization method, planar motor, lithographic apparatus and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2006014592A JP2006014592A (ja) 2006-01-12
JP2006014592A5 JP2006014592A5 (enExample) 2007-08-02
JP4051383B2 true JP4051383B2 (ja) 2008-02-20

Family

ID=35504961

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005183282A Expired - Lifetime JP4051383B2 (ja) 2004-06-24 2005-06-23 平面モータの初期化方法、平面モータ、リソグラフィ装置、およびデバイス製造方法

Country Status (2)

Country Link
US (1) US7205741B2 (enExample)
JP (1) JP4051383B2 (enExample)

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US7283140B2 (en) * 2005-06-21 2007-10-16 Microsoft Corporation Texture montage
JP2007068256A (ja) * 2005-08-29 2007-03-15 Canon Inc ステージ装置の制御方法
US8659205B2 (en) 2007-06-27 2014-02-25 Brooks Automation, Inc. Motor stator with lift capability and reduced cogging characteristics
KR101660894B1 (ko) 2007-06-27 2016-10-10 브룩스 오토메이션 인코퍼레이티드 다차원 위치 센서
US8823294B2 (en) 2007-06-27 2014-09-02 Brooks Automation, Inc. Commutation of an electromagnetic propulsion and guidance system
US8283813B2 (en) 2007-06-27 2012-10-09 Brooks Automation, Inc. Robot drive with magnetic spindle bearings
JP5416104B2 (ja) * 2007-06-27 2014-02-12 ブルックス オートメーション インコーポレイテッド セルフベアリングモータ用位置フィードバック
US9752615B2 (en) * 2007-06-27 2017-09-05 Brooks Automation, Inc. Reduced-complexity self-bearing brushless DC motor
US7830495B2 (en) * 2007-07-10 2010-11-09 Asml Netherlands B.V. Lithographic apparatus and position sensor
CN101801817B (zh) 2007-07-17 2015-07-22 布鲁克斯自动化公司 具备集成到室壁上的电动机的基片加工装置
US9465305B2 (en) 2010-05-18 2016-10-11 Nikon Corporation Method for determining a commutation offset and for determining a compensation map for a stage
CN101834437B (zh) * 2010-05-21 2012-07-04 浙江大学 一种高压直流换流器换相重叠角的确定方法
CN102607388B (zh) * 2012-02-17 2014-09-24 清华大学 平面电机动子位移测量装置及方法
CN102607391B (zh) * 2012-03-01 2014-06-18 清华大学 一种平面电机动子位移的测量方法
JP6394967B2 (ja) * 2012-10-02 2018-09-26 株式会社ニコン 移動体装置、露光装置、及びデバイス製造方法
CN103973172B (zh) 2013-01-25 2016-09-28 上海微电子装备有限公司 一种动线圈式磁浮平面电机磁对准系统及其对准方法
US9250514B2 (en) 2013-03-11 2016-02-02 Applied Materials, Inc. Apparatus and methods for fabricating a photomask substrate for EUV applications
CN104104198B (zh) * 2013-04-15 2017-02-08 上海微电子装备有限公司 一种动线圈型磁浮电机及其磁角度检测方法
CN104143936A (zh) * 2013-05-08 2014-11-12 上海微电子装备有限公司 动线圈型磁浮电机的磁对准方法及系统
CN104143945B (zh) * 2013-05-08 2017-08-29 上海微电子装备（集团）股份有限公司 动线圈型磁浮电机的磁对准方法及系统
WO2021233615A1 (en) * 2020-05-20 2021-11-25 Asml Netherlands B.V. Magnet assembly, coil assembly, planar motor, positioning device and lithographic apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6246204B1 (en) * 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
JP4362975B2 (ja) * 1998-04-10 2009-11-11 株式会社ニコン リニアモーターコイル、コイル、リニアモーター、電気モーター、リニアモーターの製造方法、電気モーターの製造方法、ステージ装置、露光装置
TW591342B (en) * 2000-11-30 2004-06-11 Asml Netherlands Bv Lithographic projection apparatus and integrated circuit manufacturing method using a lithographic projection apparatus
US6580260B2 (en) * 2001-04-19 2003-06-17 Nikon Corporation PWM feedback control by using dynamic pulse-to-pulse error compensation

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Publication number Publication date
JP2006014592A (ja) 2006-01-12
US20050285550A1 (en) 2005-12-29
US7205741B2 (en) 2007-04-17

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