JP4050155B2 - 近視野光プローブの作製方法 - Google Patents
近視野光プローブの作製方法 Download PDFInfo
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- JP4050155B2 JP4050155B2 JP2003005722A JP2003005722A JP4050155B2 JP 4050155 B2 JP4050155 B2 JP 4050155B2 JP 2003005722 A JP2003005722 A JP 2003005722A JP 2003005722 A JP2003005722 A JP 2003005722A JP 4050155 B2 JP4050155 B2 JP 4050155B2
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- 230000003287 optical effect Effects 0.000 title claims description 102
- 239000000523 sample Substances 0.000 title claims description 96
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 239000000758 substrate Substances 0.000 claims description 22
- 238000005530 etching Methods 0.000 claims description 17
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 28
- 238000000034 method Methods 0.000 description 17
- 239000011521 glass Substances 0.000 description 14
- 238000010586 diagram Methods 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 238000013500 data storage Methods 0.000 description 5
- 238000013459 approach Methods 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 230000003993 interaction Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 230000002238 attenuated effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003005722A JP4050155B2 (ja) | 2003-01-14 | 2003-01-14 | 近視野光プローブの作製方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003005722A JP4050155B2 (ja) | 2003-01-14 | 2003-01-14 | 近視野光プローブの作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004219201A JP2004219201A (ja) | 2004-08-05 |
| JP2004219201A5 JP2004219201A5 (enExample) | 2006-02-09 |
| JP4050155B2 true JP4050155B2 (ja) | 2008-02-20 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003005722A Expired - Fee Related JP4050155B2 (ja) | 2003-01-14 | 2003-01-14 | 近視野光プローブの作製方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4050155B2 (enExample) |
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2003
- 2003-01-14 JP JP2003005722A patent/JP4050155B2/ja not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| JP2004219201A (ja) | 2004-08-05 |
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