JP4043077B2 - マグネトロンスパッタ装置およびそれに使用するマグネットユニット - Google Patents

マグネトロンスパッタ装置およびそれに使用するマグネットユニット Download PDF

Info

Publication number
JP4043077B2
JP4043077B2 JP20510797A JP20510797A JP4043077B2 JP 4043077 B2 JP4043077 B2 JP 4043077B2 JP 20510797 A JP20510797 A JP 20510797A JP 20510797 A JP20510797 A JP 20510797A JP 4043077 B2 JP4043077 B2 JP 4043077B2
Authority
JP
Japan
Prior art keywords
magnet
hole
holder
magnet unit
piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP20510797A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1150249A (ja
JPH1150249A5 (enExample
Inventor
喜之 中野
敏行 末光
政秀 横山
賢治 丸山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP20510797A priority Critical patent/JP4043077B2/ja
Publication of JPH1150249A publication Critical patent/JPH1150249A/ja
Publication of JPH1150249A5 publication Critical patent/JPH1150249A5/ja
Application granted granted Critical
Publication of JP4043077B2 publication Critical patent/JP4043077B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Physical Vapour Deposition (AREA)
JP20510797A 1997-07-31 1997-07-31 マグネトロンスパッタ装置およびそれに使用するマグネットユニット Expired - Lifetime JP4043077B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20510797A JP4043077B2 (ja) 1997-07-31 1997-07-31 マグネトロンスパッタ装置およびそれに使用するマグネットユニット

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20510797A JP4043077B2 (ja) 1997-07-31 1997-07-31 マグネトロンスパッタ装置およびそれに使用するマグネットユニット

Publications (3)

Publication Number Publication Date
JPH1150249A JPH1150249A (ja) 1999-02-23
JPH1150249A5 JPH1150249A5 (enExample) 2005-05-26
JP4043077B2 true JP4043077B2 (ja) 2008-02-06

Family

ID=16501544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20510797A Expired - Lifetime JP4043077B2 (ja) 1997-07-31 1997-07-31 マグネトロンスパッタ装置およびそれに使用するマグネットユニット

Country Status (1)

Country Link
JP (1) JP4043077B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4614578B2 (ja) * 2001-06-01 2011-01-19 キヤノンアネルバ株式会社 スパッタ成膜応用のためのプラズマ処理装置
CN105632855B (zh) * 2014-10-28 2018-05-25 北京北方华创微电子装备有限公司 一种磁控管及半导体加工设备
JP6672595B2 (ja) * 2015-03-17 2020-03-25 凸版印刷株式会社 成膜装置
US11322338B2 (en) * 2017-08-31 2022-05-03 Taiwan Semiconductor Manufacturing Co., Ltd. Sputter target magnet

Also Published As

Publication number Publication date
JPH1150249A (ja) 1999-02-23

Similar Documents

Publication Publication Date Title
JP5012571B2 (ja) マグネトロンスパッタ装置用磁石ユニット
CN103103489B (zh) 磁控溅射装置
JP2001515966A (ja) 真空スパッタ装置
TW200402105A (en) Magnetic field generator for magnetron plasma
JPH08176817A (ja) マグネトロンスパッタリング装置
JP4043077B2 (ja) マグネトロンスパッタ装置およびそれに使用するマグネットユニット
JP6106690B2 (ja) 交換可能な磁石パック
JPS6272121A (ja) 半導体処理装置
JP4470429B2 (ja) マグネトロンスパッタリング装置
JP3834111B2 (ja) マグネトロンスパッタ方法、マグネトロンスパッタ装置及びそれに使用するマグネットユニット
CN100549220C (zh) 磁控溅射装置
JP3646968B2 (ja) マグネトロンプラズマ用磁場発生装置
EP0579114A1 (en) Sputtering apparatus
KR100456287B1 (ko) 스퍼터링 증착장치의 스퍼터 건
TW201042070A (en) Magnetron sputtering apparatus
JP2879302B2 (ja) マグネトロンプラズマエッチング用磁場発生装置
JP3343819B2 (ja) イオンエッチング方法および装置
JPH11302840A (ja) スパッタ装置
JP2756912B2 (ja) マグネトロンプラズマ用磁場発生装置
JPH02163372A (ja) マグネトロンスパッタ装置
EP0899773A3 (en) Apparatus for driving the arc in a cathodic arc coater
JP2005068468A (ja) マグネトロンスパッタリング用ターゲット及びマグネトロンスパッタリング装置
JP2006083458A (ja) スパッタリング装置
JP2756910B2 (ja) マグネトロンプラズマ用磁場発生装置
JPS5928034Y2 (ja) マグネトロンスパッタ装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20040730

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040730

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20070209

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070828

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070914

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20071016

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20071113

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101122

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111122

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121122

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121122

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131122

Year of fee payment: 6

EXPY Cancellation because of completion of term