JP4036831B2 - 光電子センサ - Google Patents
光電子センサ Download PDFInfo
- Publication number
- JP4036831B2 JP4036831B2 JP2003535258A JP2003535258A JP4036831B2 JP 4036831 B2 JP4036831 B2 JP 4036831B2 JP 2003535258 A JP2003535258 A JP 2003535258A JP 2003535258 A JP2003535258 A JP 2003535258A JP 4036831 B2 JP4036831 B2 JP 4036831B2
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- Prior art keywords
- node
- photodetector according
- transistor
- voltage
- capacitance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000001514 detection method Methods 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 4
- 230000003071 parasitic effect Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 5
- 108091027981 Response element Proteins 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/04—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
- H03F3/08—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only controlled by light
- H03F3/087—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only controlled by light with IC amplifier blocks
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1443—Devices controlled by radiation with at least one potential jump or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/50—Control of the SSIS exposure
- H04N25/57—Control of the dynamic range
- H04N25/571—Control of the dynamic range involving a non-linear response
- H04N25/575—Control of the dynamic range involving a non-linear response with a response composed of multiple slopes
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Nonlinear Science (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Description
4 アース電圧線
6 フォトダイオードキャパシタ
8 ストレージキャパシタ
9 ストレージスイッチ
10 ストレージノード
11 非線形応答要素
12 MOSトランジスタ
13 ゲート
14 ドレイン
15 ダイオード
16 ソース
Claims (16)
- 光によって生成される電荷を集積するために適するように不純物添加されるとともにグランドノード(4)と検出ノード(16)との間に接続された半導体材料の領域(2)を備え、
その入口部ノードとグランドノードとの間に接続されたキャパシタンス(8)を備えている電圧検出回路を備え、
前記検出ノード(16)は前記電圧検出回路の入口部ノードに接続され、
前記電圧検出回路のキャパシタンス(8)上の電圧信号を一時的にサンプリングおよび保留するために検出ノード(16)を電圧検出回路から切断する切り替え手段(9)を備え、
前記キャパシタンス(8)は電圧検出回路の飽和を後段露光効果により防止するために適した非線形相互コンダクタンス要素に接続される、
ことからなる光検出器。 - 電圧検出回路のキャパシタンス(8)が寄生キャパシタンスであることを特徴とする請求項1記載の光検出器。
- グランドノード(4)と検出ノード(16)との間において半導体材料の領域に並列にキャパシタンス(6)が結合されることを特徴とする請求項1記載の光検出器。
- 光生成された電荷を集積するように適宜に不純物添加された半導体材料の前記領域がフォトダイオード(2)であるとともに、このフォトダイオード(2)の検出ノード(16)の接続または切断のスイッチ手段は、トランジスタ(M1)によって作動することを特徴とする請求項1ないし3のいずれかに記載の光検出器。
- 非線形相互コンダクタンス要素(11)はトランジスタ(12,M2)によって構成され、そのゲート(13)が適宜な電位に接続されることを特徴とする請求項1ないし4のいずれかに記載の光検出器。
- トランジスタ(12,M2)のゲート(13)はそのソース(16)に接続されることを特徴とする請求項5記載の光検出器。
- トランジスタ(12,M2)のゲート(13)がそのドレイン(14)に接続されることを特徴とする請求項5記載の光検出器。
- トランジスタ(12,M2)のゲート(13)は外部制御された信号に接続されることを特徴とする請求項5記載の光検出器。
- トランジスタ(12,M2)のゲート(13)は外部制御された時間変化する信号に接続されることを特徴とする請求項5記載の光検出器。
- 非線形相互コンダクタンス要素(11)はダイオード(15)によって構成され、このダイオードの他方の端子が固定された電位に接続されることを特徴とする請求項1記載の光検出器。
- 非線形相互コンダクタンス要素(11)はダイオード(15)によって構成され、このダイオードの他方の端子が時間変化する電位に接続されることを特徴とする請求項1記載の光検出器。
- 第二非線形相互コンダクタンス要素(M3)が、光生成された電荷を集積するように適宜に不純物添加された半導体材料の領域(2)に接続されることにより、突光の強度に対して非線形の応答を示すことを特徴とする請求項1記載の光検出器。
- 前記第二非線形相互コンダクタンス要素(M3)がトランジスタであることを特徴とする請求項12記載の光検出器。
- 非線形相互コンダクタンス要素(11)がストレージノード(10)をリセットするかあるいはストレージノードおよびダイオード(15)をリセットするために使用されることを特徴とする請求項1ないし13のいずれかに記載の光検出器。
- 少なくとも部分的に請求項1ないし14に記載の光検出器によって構成された、一次元あるいは二次元アレー。
- 前記アレーはラインセンサまたは画像センサを形成することを特徴とす る請求項14記載の一次元あるいは二次元アレー。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2001/011673 WO2003032394A1 (en) | 2001-10-09 | 2001-10-09 | Optoelectronic sensor |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005505769A JP2005505769A (ja) | 2005-02-24 |
JP2005505769A5 JP2005505769A5 (ja) | 2005-12-22 |
JP4036831B2 true JP4036831B2 (ja) | 2008-01-23 |
Family
ID=8164617
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003535258A Expired - Fee Related JP4036831B2 (ja) | 2001-10-09 | 2001-10-09 | 光電子センサ |
Country Status (6)
Country | Link |
---|---|
US (1) | US20060049337A1 (ja) |
EP (1) | EP1440474A1 (ja) |
JP (1) | JP4036831B2 (ja) |
KR (1) | KR20040047901A (ja) |
CN (1) | CN1559089A (ja) |
WO (1) | WO2003032394A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7958769B2 (en) * | 2005-02-14 | 2011-06-14 | Olympus Ndt | Detection of channel saturation in phase-array ultrasonic non-destructive testing |
GB2426575A (en) | 2005-05-27 | 2006-11-29 | Sensl Technologies Ltd | Photon detector using controlled sequences of reset and discharge of a capacitor to sense photons |
EP1763220A1 (en) | 2005-09-07 | 2007-03-14 | CSEM Centre Suisse d'Electronique et de Microtechnique SA | Solid-state charge sensor with high sensitivity and improved dynamic range |
DE102006016877B4 (de) * | 2006-04-04 | 2010-10-07 | Institut Für Mikroelektronik Stuttgart | Schaltungsanordnung zum Erzeugen eines lichtabhängigen elektrischen Signals |
US8232512B2 (en) * | 2006-04-10 | 2012-07-31 | Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. | Method and apparatus for integrating a quantity of light |
US8149605B2 (en) * | 2007-11-28 | 2012-04-03 | Nxp B.V. | Compact and accurate analog memory for CMOS imaging pixel detectors |
EP2559967A1 (en) * | 2011-08-16 | 2013-02-20 | Leica Geosystems AG | Light detection circuit |
CN106935667A (zh) * | 2017-05-05 | 2017-07-07 | 京东方科技集团股份有限公司 | 光电传感器、显示面板及显示装置 |
US11412169B2 (en) * | 2020-06-03 | 2022-08-09 | Pixart Imaging Inc. | Pixel circuit outputting over exposure information and method of calculating real intensity thereof, pixel array having the same |
CN113763870B (zh) * | 2020-06-03 | 2024-06-04 | 原相科技股份有限公司 | 像素电路及像素阵列 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3576715B2 (ja) * | 1996-09-10 | 2004-10-13 | 本田技研工業株式会社 | 光センサ回路 |
US6133563A (en) * | 1997-09-29 | 2000-10-17 | Intel Corporation | Sensor cell having a soft saturation circuit |
KR100266657B1 (ko) * | 1998-01-20 | 2000-10-02 | 김영환 | 이중 리셋 구조를 갖는 모스형 증폭 촬상소자 |
US6933488B2 (en) * | 2000-06-08 | 2005-08-23 | California Institute Of Technology | Variable electronic shutter in CMOS imager with improved anti smearing techniques |
-
2001
- 2001-10-09 KR KR10-2004-7005287A patent/KR20040047901A/ko active IP Right Grant
- 2001-10-09 CN CNA018237312A patent/CN1559089A/zh active Pending
- 2001-10-09 WO PCT/EP2001/011673 patent/WO2003032394A1/en not_active Application Discontinuation
- 2001-10-09 US US10/491,999 patent/US20060049337A1/en not_active Abandoned
- 2001-10-09 EP EP01274530A patent/EP1440474A1/en not_active Withdrawn
- 2001-10-09 JP JP2003535258A patent/JP4036831B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2003032394A1 (en) | 2003-04-17 |
KR20040047901A (ko) | 2004-06-05 |
JP2005505769A (ja) | 2005-02-24 |
US20060049337A1 (en) | 2006-03-09 |
EP1440474A1 (en) | 2004-07-28 |
CN1559089A (zh) | 2004-12-29 |
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