JP4031323B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4031323B2
JP4031323B2 JP2002247337A JP2002247337A JP4031323B2 JP 4031323 B2 JP4031323 B2 JP 4031323B2 JP 2002247337 A JP2002247337 A JP 2002247337A JP 2002247337 A JP2002247337 A JP 2002247337A JP 4031323 B2 JP4031323 B2 JP 4031323B2
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JP
Japan
Prior art keywords
group
carbon atoms
alicyclic hydrocarbon
alkyl group
general formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2002247337A
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English (en)
Japanese (ja)
Other versions
JP2004085931A5 (enExample
JP2004085931A (ja
Inventor
亨 藤森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002247337A priority Critical patent/JP4031323B2/ja
Publication of JP2004085931A publication Critical patent/JP2004085931A/ja
Publication of JP2004085931A5 publication Critical patent/JP2004085931A5/ja
Application granted granted Critical
Publication of JP4031323B2 publication Critical patent/JP4031323B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002247337A 2002-08-27 2002-08-27 ポジ型レジスト組成物 Expired - Lifetime JP4031323B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002247337A JP4031323B2 (ja) 2002-08-27 2002-08-27 ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002247337A JP4031323B2 (ja) 2002-08-27 2002-08-27 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2004085931A JP2004085931A (ja) 2004-03-18
JP2004085931A5 JP2004085931A5 (enExample) 2005-09-22
JP4031323B2 true JP4031323B2 (ja) 2008-01-09

Family

ID=32055014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002247337A Expired - Lifetime JP4031323B2 (ja) 2002-08-27 2002-08-27 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4031323B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010237313A (ja) * 2009-03-30 2010-10-21 Jsr Corp 感放射線性樹脂組成物
US10377692B2 (en) 2009-09-09 2019-08-13 Sumitomo Chemical Company, Limited Photoresist composition
JP5747456B2 (ja) * 2009-09-09 2015-07-15 住友化学株式会社 レジスト組成物
US9229321B2 (en) * 2013-12-13 2016-01-05 Sumitomo Chemical Company, Limited Salt and photoresist composition comprising the same

Also Published As

Publication number Publication date
JP2004085931A (ja) 2004-03-18

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