JP4030784B2 - 層間接続方法と装置及び多層基板 - Google Patents
層間接続方法と装置及び多層基板 Download PDFInfo
- Publication number
- JP4030784B2 JP4030784B2 JP2002088265A JP2002088265A JP4030784B2 JP 4030784 B2 JP4030784 B2 JP 4030784B2 JP 2002088265 A JP2002088265 A JP 2002088265A JP 2002088265 A JP2002088265 A JP 2002088265A JP 4030784 B2 JP4030784 B2 JP 4030784B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- hole
- intermediate electrode
- inner chamber
- conductor portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002088265A JP4030784B2 (ja) | 2002-03-27 | 2002-03-27 | 層間接続方法と装置及び多層基板 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002088265A JP4030784B2 (ja) | 2002-03-27 | 2002-03-27 | 層間接続方法と装置及び多層基板 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003283124A JP2003283124A (ja) | 2003-10-03 |
| JP2003283124A5 JP2003283124A5 (cg-RX-API-DMAC7.html) | 2005-09-15 |
| JP4030784B2 true JP4030784B2 (ja) | 2008-01-09 |
Family
ID=29234178
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002088265A Expired - Fee Related JP4030784B2 (ja) | 2002-03-27 | 2002-03-27 | 層間接続方法と装置及び多層基板 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4030784B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT201700083957A1 (it) * | 2017-07-24 | 2019-01-24 | Wise S R L | Metodo e apparato per il trattamento di pannelli |
-
2002
- 2002-03-27 JP JP2002088265A patent/JP4030784B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003283124A (ja) | 2003-10-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5004376B2 (ja) | 多層電極を有する薄板状セラミック及び製造方法 | |
| CN106952843B (zh) | 加热构件、静电卡盘及陶瓷加热器 | |
| TW202121619A (zh) | 用於基板支撐件的整合電極和接地平面 | |
| KR20180068330A (ko) | 정전척 | |
| JP4850992B2 (ja) | ウェーハを支持する装置及びウェーハを支持する装置を製作する方法 | |
| CN101276693B (zh) | 电子元件的制备方法 | |
| JP4354545B2 (ja) | セラミック体のための導電性フィードスルー及びその製造方法 | |
| US10535545B2 (en) | Substrate fixing device | |
| JP2016100473A (ja) | 静電チャック | |
| US20220415846A1 (en) | Interconnect structure for semiconductor with ultra-fine pitch and forming method thereof | |
| JPH07258828A (ja) | 膜形成方法 | |
| JP4048811B2 (ja) | 立体回路板及びその製造方法 | |
| JP4030784B2 (ja) | 層間接続方法と装置及び多層基板 | |
| JP2018157186A (ja) | セラミックスヒータ及び静電チャック並びにセラミックスヒータの製造方法 | |
| JP4184829B2 (ja) | 静電チャックの製造方法 | |
| US12431379B2 (en) | Ceramic substrate, method of manufacturing the ceramic substrate, electrostatic chuck, substrate fixing device, and package for semiconductor device | |
| JP2013127992A (ja) | コンデンサ内蔵基板の製造方法、及び該製造方法に使用可能な素子シートの製造方法 | |
| JP2002111176A (ja) | 導電路の形成方法および基板 | |
| JPS6070170A (ja) | 金属層付着方法 | |
| JP7258437B2 (ja) | ウェーハの製造方法 | |
| JP2018067597A (ja) | 回路モジュールの製造方法および成膜装置 | |
| JP3443420B1 (ja) | フレキシブルプリント配線板の製造装置及び製造方法 | |
| JP2018056393A (ja) | 電子部品の製造方法および成膜装置 | |
| JP2008153701A (ja) | 静電チャック | |
| JP2022078929A (ja) | 基板固定装置、静電チャック及び静電チャックの製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050328 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050330 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20070830 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070918 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20071017 |
|
| R150 | Certificate of patent (=grant) or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101026 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111026 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121026 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131026 Year of fee payment: 6 |
|
| LAPS | Cancellation because of no payment of annual fees |