JP4025075B2 - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物 Download PDF

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Publication number
JP4025075B2
JP4025075B2 JP2002003899A JP2002003899A JP4025075B2 JP 4025075 B2 JP4025075 B2 JP 4025075B2 JP 2002003899 A JP2002003899 A JP 2002003899A JP 2002003899 A JP2002003899 A JP 2002003899A JP 4025075 B2 JP4025075 B2 JP 4025075B2
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JP
Japan
Prior art keywords
group
substituted
acid
carbon atoms
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002003899A
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English (en)
Japanese (ja)
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JP2003207885A (ja
JP2003207885A5 (enrdf_load_stackoverflow
Inventor
元 中尾
保雅 河邉
亨 藤森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
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Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002003899A priority Critical patent/JP4025075B2/ja
Priority to US10/338,737 priority patent/US7214465B2/en
Publication of JP2003207885A publication Critical patent/JP2003207885A/ja
Publication of JP2003207885A5 publication Critical patent/JP2003207885A5/ja
Application granted granted Critical
Publication of JP4025075B2 publication Critical patent/JP4025075B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2002003899A 2002-01-10 2002-01-10 ポジ型感光性組成物 Expired - Fee Related JP4025075B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002003899A JP4025075B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物
US10/338,737 US7214465B2 (en) 2002-01-10 2003-01-09 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002003899A JP4025075B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物

Publications (3)

Publication Number Publication Date
JP2003207885A JP2003207885A (ja) 2003-07-25
JP2003207885A5 JP2003207885A5 (enrdf_load_stackoverflow) 2005-04-07
JP4025075B2 true JP4025075B2 (ja) 2007-12-19

Family

ID=27643367

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002003899A Expired - Fee Related JP4025075B2 (ja) 2002-01-10 2002-01-10 ポジ型感光性組成物

Country Status (1)

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JP (1) JP4025075B2 (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI527792B (zh) * 2012-06-26 2016-04-01 羅門哈斯電子材料有限公司 光酸產生劑、含該光酸產生劑之光阻劑及含該光阻劑之經塗覆物件
JP6442965B2 (ja) * 2014-10-07 2018-12-26 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法
WO2016181722A1 (ja) * 2015-05-14 2016-11-17 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、感活性光線性又は感放射線性樹脂組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3340864B2 (ja) * 1994-10-26 2002-11-05 富士写真フイルム株式会社 ポジ型化学増幅レジスト組成物
JP4007570B2 (ja) * 1998-10-16 2007-11-14 富士フイルム株式会社 ポジ型レジスト組成物
JP4604367B2 (ja) * 2000-03-27 2011-01-05 住友化学株式会社 化学増幅型ポジ型レジスト組成物
JP4025074B2 (ja) * 2001-09-19 2007-12-19 富士フイルム株式会社 ポジ型レジスト組成物

Also Published As

Publication number Publication date
JP2003207885A (ja) 2003-07-25

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