JP4008080B2 - 差動排気型クライオポンプ - Google Patents
差動排気型クライオポンプ Download PDFInfo
- Publication number
- JP4008080B2 JP4008080B2 JP33189797A JP33189797A JP4008080B2 JP 4008080 B2 JP4008080 B2 JP 4008080B2 JP 33189797 A JP33189797 A JP 33189797A JP 33189797 A JP33189797 A JP 33189797A JP 4008080 B2 JP4008080 B2 JP 4008080B2
- Authority
- JP
- Japan
- Prior art keywords
- shield
- baffle
- case
- pump
- cryopump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004020 conductor Substances 0.000 claims description 7
- 239000007789 gas Substances 0.000 description 12
- 150000002500 ions Chemical class 0.000 description 6
- 238000009792 diffusion process Methods 0.000 description 4
- 238000005468 ion implantation Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33189797A JP4008080B2 (ja) | 1997-12-02 | 1997-12-02 | 差動排気型クライオポンプ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33189797A JP4008080B2 (ja) | 1997-12-02 | 1997-12-02 | 差動排気型クライオポンプ |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007180371A Division JP4854614B2 (ja) | 2007-07-09 | 2007-07-09 | イオン注入方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11166476A JPH11166476A (ja) | 1999-06-22 |
| JPH11166476A5 JPH11166476A5 (enExample) | 2005-05-19 |
| JP4008080B2 true JP4008080B2 (ja) | 2007-11-14 |
Family
ID=18248860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33189797A Expired - Lifetime JP4008080B2 (ja) | 1997-12-02 | 1997-12-02 | 差動排気型クライオポンプ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4008080B2 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7482598B2 (en) * | 2005-12-07 | 2009-01-27 | Varian Semiconductor Equipment Associates, Inc. | Techniques for preventing parasitic beamlets from affecting ion implantation |
| JP4854614B2 (ja) * | 2007-07-09 | 2012-01-18 | アルバック・クライオ株式会社 | イオン注入方法 |
-
1997
- 1997-12-02 JP JP33189797A patent/JP4008080B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11166476A (ja) | 1999-06-22 |
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