JP4000492B2 - Wafer transfer device - Google Patents

Wafer transfer device Download PDF

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Publication number
JP4000492B2
JP4000492B2 JP8213297A JP8213297A JP4000492B2 JP 4000492 B2 JP4000492 B2 JP 4000492B2 JP 8213297 A JP8213297 A JP 8213297A JP 8213297 A JP8213297 A JP 8213297A JP 4000492 B2 JP4000492 B2 JP 4000492B2
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Japan
Prior art keywords
wafer
wafer transfer
transfer fork
fork
arm
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP8213297A
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Japanese (ja)
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JPH10256336A (en
Inventor
浩二 竹下
健生 鈴木
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Yaskawa Electric Corp
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Yaskawa Electric Corp
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Priority to JP8213297A priority Critical patent/JP4000492B2/en
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Description

【0001】
【発明の属する技術分野】
本発明は、搬送ロボットのウェハ搬送フォークにウェハを載置して搬送するウェハ搬送装置に関するものである。
【0002】
【従来の技術】
半導体デバイスの高速化、高集積化が進につれて、その製造プロセスが高度化し、半導体製造装置は半導体ウェハをバッチ処理する方式から1枚ごとに連続処理する枚葉式のマルチチャンバ方式に移行している。
前記マルチチャンバ方式の半導体製造装置は、図5に示すように、搬送ロボット10を収納する搬送室11を有するとともに、この搬送室11の一方側に処理室12、13を有し、他方側にウェハカセット14を収納するカセット室15を有している。
前記搬送ロボット10のアーム16には、ウェハ搬送フォーク17が取付けられている。前記ウェハ搬送フォーク17には、図6に示すように、前記搬送ロボット10のアーム16に固定する取付け穴18を有し、先端を二股にしたウェハ支持部19が設けられている。前記ウェハ支持部19には支持ピン20が取付けてある。21はウェハである。
つぎに、ウェハ搬送装置の動作について説明をする。
搬送室11内の搬送ロボット10を駆動すると、搬送ロボット10のアーム16が伸張してカセット室15のウェハカセット14内にウェハ搬送フォーク17を挿入する。前記ウェハカセット14内のウェハ21は、等間隔に設けられた支持棚上に多段に収納されている。前記ウェハカセット14内に挿入されたウェハ搬送フォーク17のウェハ支持部19がウェハ21の下方位置に達すると、ウェハ搬送フォーク17の移動が停止する。つぎに、前記ウェハ搬送フォーク17を上方に移動し、ウェハ搬送フォーク17のウェハ支持部19の支持ピン20上にウェハ21を載置する。ウェハ21を載置したウェハ搬送フォーク17をウェハカセット14から搬出して搬送ロボット10のアーム16を回動させて処理室12にウェハ21を搬入する。
このように、等間隔に設けられた支持棚上のウェハ21を載置して搬出入するウェハ搬送フォーク17は、ウェハ搬送フォーク17上の支持ピン20の突出高さ、ウェハ搬送フォーク17とウェハ21との間隙等の制限を受けてウェハ搬送フォークの厚みは薄く構成してある。
【0003】
【発明が解決しようとする課題】
ところが、従来のウェハ搬送装置における搬送ロボット10のアーム16は、微小振動しながら伸縮、旋回する。このアーム16が振動すると、アーム16に取付けたウェハ搬送フォーク17がアーム16と共振して、ウェハ搬送フォーク17が大きく振動する。このため、ウェハ搬送フォーク17上のウェハ21が振動によりウェハ搬送フォーク17上を滑って、ウェハ搬送フォーク17に対するウェハ21の位置が大きくずれる。したがって、処理室12にウェハ21を搬入するとき、ウェハ21が処理室12の枠に接触してウェハ21に傷がつき、あるいはウェハ搬送フォーク17上からウェハ21が落下する欠点があった。
そこで、本発明は、ウェハ搬送フォーク17の振動を小さくして、ウェハ搬送フォーク17上のウェハ21が位置ずれすることなく、ウェハ21を搬送できるようにすることを目的とする。
【0004】
【課題を解決するための手段】
上記問題点を解決するために、本発明は、搬送ロボットのアームにウェハ搬送フォークを取付け、このウェハ搬送フォークにウェハを載置して搬送するウェハ搬送装置において、前記アームに取付ける基部に取付け穴を設け、前記基部に連設し先端を二股にしたウェハ支持部を有するウェハ搬送フォークと、前記ウェハ搬送フォークの基部にウェハ搬送フォークの幅方向に設けた、固有振動数低下のための溝を設けている。
【0005】
【発明の実施の形態】
以下、本発明の実施例を、図を用いて説明する。
図1はウハ搬送フォークの平面図、図2は図1のA−A線に沿う断面図、図3は本発明におけるウェハ搬送フォークと従来のウェハ搬送フォークとの振動の比較例を示す図である。図5と同一のものには同一の符号を付して詳細な説明を省略する。
図において、1はウェハ搬送フォークで、このウェハ搬送フォーク1を搬送ロボット10のアーム16に取付ける取付け穴3を有する基部2と、先端を二股に形成しウェハ21を載置するウェハ支持部4が設けてある。5は前記ウェハ搬送フォーク1のウェハ支持部4に設けた支持ピン、6は前記ウェハ搬送フォーク1の基部2に設けた溝である。この溝6は、ウェハ搬送フォークの幅方向に複数本設けてある。
本発明におけるウェハ搬送フォークと従来のウェハ搬送フォークについて振動の比較をすると図3に示すようになる。つまり、横軸に搬送ロボット10のアーム16を駆動するモータ回転速度をとり、縦軸に搬送ロボット10のアーム16の伸縮時の垂直方向の最大振幅をとると、本発明におけるウェハ搬送フォークの最大振幅値が、従来のウェハ搬送フォークの最大振幅値よりも小さくなっているのがわかる。
このように、本発明におけるウェハ搬送フォークは、ウェハ搬送フォーク1に溝6を設けているので、ウェハ搬送フォーク1の固有振動数が低下し、搬送ロボット10のアーム16の振動と共振現象が発生しないため振動が低下する。したがって、ウェハ搬送フォーク17の振動が小さくなり、ウェハ搬送フォーク17上のウェハ21の位置ずれが生じない。
図4は本発明の第2の実施例を示すウェハ搬送フォークの平面図で、ウェハ搬送フォーク1の溝6に、エポキシ系等の樹脂材料7を充填したものである。樹脂材料7は振動の減衰性に優れているので、前記溝6に前記樹脂材料7を充填すると、ウェハ搬送フォーク1に発生した振動を短い時間で減衰することができる。
【0006】
【発明の効果】
以上述べたように、本発明によれば、次のような効果がある。
請求項1に記載の発明によると、ウェハ搬送フォークの基部に、ウェハ搬送フォークの幅方向に設けた、固有振動数低下のための溝を備えているので、ウェハ搬送フォークの固有振動数が低下し、搬送ロボットのアームの振動と共振現象が発生せず、振動が低下する。したがって、ウェハ搬送フォークの振動を小さくすることができ、ウェハ搬送フォーク上のウェハの位置ずれを防止して、ウェハを搬送することができる。
請求項2に記載の発明によると、前記ウェハ搬送フォークの溝に、振動の減衰性を有する樹脂材料を充填しているので、前記ウェハ搬送フォークに発生した振動を短い時間で減衰することができる。
【図面の簡単な説明】
【図1】 本発明の実施例を示すウェハ搬送フォークの平面図である。
【図2】 図1のA−A線に沿う断面図である。
【図3】 本発明におけるウェハ搬送フォークと従来のウェハ搬送フォークとの振動の比較例を示す図である。
【図4】 本発明の第2の実施例を示すウェハ搬送フォークの平面図である。
【図5】 従来の半導体製造装置の構成例を示す平面図である。
【図6】 従来のウェハ搬送フォークの平面図である。
【符号の説明】
1 ウェハ搬送フォーク、 2 基部、 3 取付け穴、
4 ウェハ支持部、 5 支持ピン、 6 溝、 7 樹脂材料
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a wafer transfer device that transfers a wafer placed on a wafer transfer fork of a transfer robot.
[0002]
[Prior art]
As the speed and integration of semiconductor devices has increased, the manufacturing process has become more advanced, and semiconductor manufacturing equipment has shifted from a batch processing method for semiconductor wafers to a single wafer multi-chamber method for continuous processing. Yes.
As shown in FIG. 5, the multi-chamber semiconductor manufacturing apparatus has a transfer chamber 11 in which the transfer robot 10 is accommodated, and has processing chambers 12 and 13 on one side of the transfer chamber 11, and the other side. A cassette chamber 15 for storing the wafer cassette 14 is provided.
A wafer transfer fork 17 is attached to the arm 16 of the transfer robot 10. As shown in FIG. 6, the wafer transfer fork 17 is provided with a wafer support 19 having a mounting hole 18 for fixing to the arm 16 of the transfer robot 10 and having a bifurcated tip. Support pins 20 are attached to the wafer support portion 19. 21 is a wafer.
Next, the operation of the wafer transfer device will be described.
When the transfer robot 10 in the transfer chamber 11 is driven, the arm 16 of the transfer robot 10 extends to insert the wafer transfer fork 17 into the wafer cassette 14 in the cassette chamber 15. The wafers 21 in the wafer cassette 14 are stored in multiple stages on support shelves provided at equal intervals. When the wafer support portion 19 of the wafer transfer fork 17 inserted into the wafer cassette 14 reaches a position below the wafer 21, the movement of the wafer transfer fork 17 stops. Next, the wafer transfer fork 17 is moved upward, and the wafer 21 is placed on the support pins 20 of the wafer support portion 19 of the wafer transfer fork 17. The wafer transfer fork 17 on which the wafer 21 is placed is unloaded from the wafer cassette 14 and the arm 16 of the transfer robot 10 is rotated to load the wafer 21 into the processing chamber 12.
As described above, the wafer transfer fork 17 on which the wafers 21 on the support shelves provided at equal intervals are placed and carried in / out is the protruding height of the support pins 20 on the wafer transfer fork 17, the wafer transfer fork 17 and the wafer. The thickness of the wafer transfer fork is made thin due to the limitation of the gap between the wafer 21 and the like.
[0003]
[Problems to be solved by the invention]
However, the arm 16 of the transfer robot 10 in the conventional wafer transfer apparatus expands and contracts and turns with minute vibration. When the arm 16 vibrates, the wafer transfer fork 17 attached to the arm 16 resonates with the arm 16 and the wafer transfer fork 17 vibrates greatly. For this reason, the wafer 21 on the wafer transfer fork 17 slides on the wafer transfer fork 17 due to vibration, and the position of the wafer 21 with respect to the wafer transfer fork 17 is greatly shifted. Therefore, when the wafer 21 is carried into the processing chamber 12, the wafer 21 comes into contact with the frame of the processing chamber 12 and the wafer 21 is damaged, or the wafer 21 falls from the wafer transfer fork 17.
Accordingly, an object of the present invention is to reduce the vibration of the wafer transfer fork 17 so that the wafer 21 on the wafer transfer fork 17 can be transferred without being displaced.
[0004]
[Means for Solving the Problems]
In order to solve the above-described problems, the present invention provides a wafer transfer device in which a wafer transfer fork is attached to an arm of a transfer robot, and a wafer is mounted on the wafer transfer fork and transferred. A wafer transfer fork having a wafer support portion that is connected to the base and has a bifurcated tip, and a groove for lowering the natural frequency provided in the width direction of the wafer transfer fork at the base of the wafer transfer fork. Is provided.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
1 c E c conveying fork plan view of FIG. 2 shows a comparison example of a vibration of a cross-sectional view taken along the line A-A of FIG. 1, a wafer transfer fork and conventional wafer transfer fork in Figure 3 the invention FIG. The same components as those in FIG. 5 are denoted by the same reference numerals and detailed description thereof is omitted.
In the figure, reference numeral 1 denotes a wafer transfer fork, which includes a base 2 having a mounting hole 3 for attaching the wafer transfer fork 1 to an arm 16 of a transfer robot 10 and a wafer support 4 for forming a wafer 21 on which a tip is bifurcated. It is provided. Reference numeral 5 denotes a support pin provided on the wafer support 4 of the wafer transfer fork 1, and reference numeral 6 denotes a groove provided on the base 2 of the wafer transfer fork 1. A plurality of the grooves 6 are provided in the width direction of the wafer transfer fork.
FIG. 3 shows a comparison of vibration between the wafer transfer fork according to the present invention and the conventional wafer transfer fork. That is, the horizontal axis indicates the motor rotation speed for driving the arm 16 of the transfer robot 10 and the vertical axis indicates the maximum vertical amplitude when the arm 16 of the transfer robot 10 is expanded and contracted. It can be seen that the amplitude value is smaller than the maximum amplitude value of the conventional wafer transfer fork.
As described above, the wafer transfer fork according to the present invention is provided with the groove 6 in the wafer transfer fork 1, so that the natural frequency of the wafer transfer fork 1 is lowered, and the vibration and resonance phenomenon of the arm 16 of the transfer robot 10 occurs. Not to reduce vibration. Accordingly, the vibration of the wafer transfer fork 17 is reduced, and the wafer 21 on the wafer transfer fork 17 is not displaced.
FIG. 4 is a plan view of a wafer transfer fork according to a second embodiment of the present invention, in which the groove 6 of the wafer transfer fork 1 is filled with a resin material 7 such as an epoxy system. Since the resin material 7 is excellent in vibration damping, when the groove 6 is filled with the resin material 7, the vibration generated in the wafer transfer fork 1 can be attenuated in a short time.
[0006]
【The invention's effect】
As described above, the present invention has the following effects.
According to the invention described in claim 1, since the groove for reducing the natural frequency is provided in the width direction of the wafer transfer fork at the base of the wafer transfer fork, the natural frequency of the wafer transfer fork is reduced. However, the vibration and resonance phenomenon of the arm of the transfer robot does not occur and the vibration is reduced. Therefore, the vibration of the wafer transfer fork can be reduced, and the wafer can be transferred while preventing the positional deviation of the wafer on the wafer transfer fork.
According to the second aspect of the present invention, since the groove of the wafer transfer fork is filled with the resin material having vibration damping property, the vibration generated in the wafer transfer fork can be attenuated in a short time. .
[Brief description of the drawings]
FIG. 1 is a plan view of a wafer transfer fork showing an embodiment of the present invention.
FIG. 2 is a cross-sectional view taken along the line AA in FIG.
FIG. 3 is a diagram showing a comparative example of vibration between the wafer transfer fork according to the present invention and a conventional wafer transfer fork.
FIG. 4 is a plan view of a wafer transfer fork showing a second embodiment of the present invention.
FIG. 5 is a plan view showing a configuration example of a conventional semiconductor manufacturing apparatus.
FIG. 6 is a plan view of a conventional wafer transfer fork.
[Explanation of symbols]
1 wafer transfer fork, 2 base, 3 mounting holes,
4 Wafer support, 5 Support pins, 6 Grooves, 7 Resin material

Claims (2)

搬送ロボット(10)のアーム(16)にウェハ搬送フォーク(1)を取付け、このウェハ搬送フォーク(1)にウェハ(21)を載置して搬送するウェハ搬送装置において、
前記アーム(16)に取付ける基部(2)に取付け穴(3)を設け、前記基部(2)に連設し先端を二股にしたウェハ支持部(4)を有するウェハ搬送フォーク(1)と、
前記ウェハ搬送フォーク(1)の基部(2)に、ウェハ搬送フォーク(1)の幅方向に設けた、固有振動数低下のための溝(6)と、
を設けたことを特徴とするウェハ搬送装置。
In the wafer transfer apparatus for attaching the wafer transfer fork (1) to the arm (16) of the transfer robot (10) and placing and transferring the wafer (21) on the wafer transfer fork (1),
A wafer transfer fork (1) having a wafer support part (4) provided with a mounting hole (3) in a base part (2) to be attached to the arm (16), and being connected to the base part (2) and having a bifurcated tip.
A groove (6) for lowering the natural frequency provided in the width direction of the wafer transfer fork (1) in the base (2) of the wafer transfer fork (1);
A wafer transfer apparatus characterized by comprising:
前記ウェハ搬送フォーク(1)の溝(6)に、振動の減衰性を有する樹脂材料(7)を充填したことを特徴とする請求項1記載のウェハ搬送装置。2. The wafer transfer device according to claim 1, wherein the groove (6) of the wafer transfer fork (1) is filled with a resin material (7) having vibration damping properties.
JP8213297A 1997-03-14 1997-03-14 Wafer transfer device Expired - Fee Related JP4000492B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8213297A JP4000492B2 (en) 1997-03-14 1997-03-14 Wafer transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8213297A JP4000492B2 (en) 1997-03-14 1997-03-14 Wafer transfer device

Publications (2)

Publication Number Publication Date
JPH10256336A JPH10256336A (en) 1998-09-25
JP4000492B2 true JP4000492B2 (en) 2007-10-31

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017112355A1 (en) * 2015-12-22 2017-06-29 Varian Semiconductor Equipment Associates, Inc. Self-damping end effector

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017112355A1 (en) * 2015-12-22 2017-06-29 Varian Semiconductor Equipment Associates, Inc. Self-damping end effector
US9862101B2 (en) 2015-12-22 2018-01-09 Varian Semiconductor Equipment Associats, Inc. Self-damping end effector

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