JP2002151566A - Substrate transfer equipment - Google Patents

Abstract

PROBLEM TO BE SOLVED: To miniaturize substrate transfer equipment as a whole, reduce the area of installation, and realize cost reduction. SOLUTION: A first robot 3 for substrate transfer is operated, and one substrate 8 only is carried out in a horizontal state from a cassette 7. The substrate 8 is subjected to attitude conversion to a vertical state and transferred to a prescribed position.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer apparatus, and more particularly, to a substrate transfer apparatus for vertically aligning substrates housed in a cassette in a horizontal state and aligning the substrates in a vertical state. About.

[0002]

2. Description of the Related Art Conventionally, substrate transfer apparatuses have been widely used in various fields (for example, semiconductor wafer cleaning fields).
In the following, description will be made based on the semiconductor wafer cleaning field, but the same applies to other fields.

In a semiconductor wafer cleaning apparatus, a plurality of semiconductor wafers housed in a cassette in a horizontal state (surface is horizontal) are all set in a vertical state (surface is vertical) and stored in a cleaning tank. In this state, a configuration is generally employed in which the cleaning liquid is supplied to increase the cleaning efficiency of the semiconductor wafer.

[0004] Here, since a cassette specified by the SEMI standard is used, n (n is a positive integer) semiconductor wafers are accommodated in a single cassette in a horizontal state at a predetermined pitch.

Therefore, in order to increase the number of semiconductor wafers that can be cleaned at one time, all the 2n semiconductor wafers housed in the two cassettes are set in a vertical state, and the front surface and the back surface are set to face each other. Increasing the number of semiconductor wafers that can be simultaneously cleaned by accommodating them in a cleaning tank is becoming common.

In such a semiconductor wafer cleaning apparatus, a robot which takes out a horizontal wafer from a cassette and makes it vertical, and converts the interval between wafers from a predetermined pitch to a half pitch (so-called half pitch). Interval conversion device (for example, JP-A-5-175179,
Japanese Patent Application Laid-Open No. 9-69503) and an arrangement state setting device for setting the arrangement of wafers such that front and rear surfaces are opposed to each other (for example, see Japanese Patent Application Laid-Open Nos. 6-163501 and 7-307319). ), A plurality of wafers are taken out from the two carriers to form a first wafer group and a second wafer group, and the wafers of the second wafer group are replaced with the respective wafers of the first wafer group. To generate a third group of wafers, and the third group of wafers can be collectively cleaned. By making the front surface and the back surface face each other, the quality of cleaning can be improved.

[0007]

However, when the semiconductor wafer cleaning apparatus having the above structure is employed, a robot, an interval conversion device, and an arrangement state are required to transfer the wafer between the cassette and the cleaning tank. Not only a setting device is required, but also a temporary storage space for transferring wafers between them is required for a plurality of batches, which not only increases the size of the wafer transfer device as a whole, but also increases the installation area. There is an inconvenience of causing a significant increase in cost.

[0008]

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and provides a substrate transfer apparatus which can be reduced in size as a whole, can be reduced in installation area, and can achieve cost reduction. First to offer
It is a second object of the present invention to provide a substrate transfer apparatus capable of further reducing the required time.

[0009]

According to a first aspect of the present invention, there is provided a substrate transfer apparatus for loading and unloading a plurality of substrates one by one into and out of a cassette, and a substrate held by the loading and unloading means. The attitude control means for controlling the attitude of the loading / unloading means so as to perform the attitude conversion between the horizontal state and the vertical state, and the attitude for loading and unloading the substrate in the vertical state to and from the predetermined alignment unit. Moving means for moving the controlled carry-in / out means.

According to a second aspect of the present invention, the substrate transfer apparatus receives and supports the substrate in the vertical state moved by the moving means in a vertical state, and receives the next substrate in a direction perpendicular to the surface of the substrate for receiving the next substrate. Further includes alignment support means for moving a predetermined distance.

According to a third aspect of the present invention, as the attitude control means, when the substrate held by the loading / unloading means is brought into a vertical state, the direction of the surface of the substrate is changed by one for each sheet.
What is inverted by 80 ° is adopted.

5. The substrate transfer device according to claim 4, wherein said alignment support means comprises: a fixed holder for aligning and supporting a plurality of substrates at predetermined intervals in a vertical state; and a movable holder for supporting the substrates in the same direction as said fixed holder. And a positioning mechanism for moving the movable holder to face the predetermined position of the fixed holder, and an elevating mechanism for raising and lowering the movable holder to transfer the substrate between the positioned movable holder and the fixed holder. It is something that adopts.

According to a fifth aspect of the present invention, there is provided a substrate transfer apparatus for loading and unloading a plurality of substrates in a horizontal state with respect to a cassette by a plurality of substrates at a time, and horizontally transferring the substrates held by the loading and unloading units. Attitude control means for controlling the attitude of the loading / unloading means so as to perform the attitude conversion between the state and the vertical state, and the attitude is controlled so that the substrate in the vertical state is loaded into and unloaded from the predetermined alignment unit. Moving means for moving the loaded carry-in / out means.

According to a sixth aspect of the present invention, in the substrate transfer apparatus, when the substrate held by the loading / unloading unit is brought into a vertical state, the orientation of the surface of the substrate is changed by one each time.
What is inverted by 80 ° is adopted.

According to a seventh aspect of the present invention, the posture of the moving means is such that the vertical substrate is loaded and unloaded in accordance with a substrate gap formed by a smaller number of the plurality of vertical substrates. An operation of moving the controlled loading / unloading means, and an operation of moving the loading / unloading means whose attitude is controlled to load and unload the vertical substrates to a predetermined position following a plurality of the vertical substrates. And the one that selects

According to another aspect of the present invention, there is provided a substrate transfer apparatus for carrying in and out a plurality of substrates in a horizontal state with respect to a cassette, each of the plurality of substrates being less than one by one, and holding the substrates by a carry-in / out device. Attitude control means for controlling the attitude of the loading / unloading means so as to change the attitude of the substrate between a horizontal state and a vertical state, and an attitude for loading and unloading the substrate in the vertical state to and from a predetermined alignment unit. And moving means for moving the controlled carry-in / out means.

According to a ninth aspect of the present invention, as the posture control means, when the substrate held by the loading / unloading means is brought into a vertical state, the direction of the surface of the substrate is changed by one each time.
What is inverted by 80 ° is adopted.

According to a tenth aspect of the present invention, as the moving means, the distance between the front surfaces of the substrates is set to be smaller than the distance between the rear surfaces thereof so as to correspond to a substrate gap formed by a smaller number of the plurality of vertical substrates. The operation of moving the loading / unloading means, the attitude of which is controlled so as to load and unload the substrate in the vertical state, is also adopted so as to reduce the size.

In a preferred embodiment of the present invention, the alignment unit includes a first alignment unit for supporting a substrate in a vertical state in which a distance between front surfaces and a distance between back surfaces are different from each other. And a second alignment portion for supporting the substrate in a vertical state with the same distance between the first alignment portion and the second alignment portion in units of two substrates whose surfaces are opposed to each other.
The apparatus further includes an interval adjusting means for moving the substrate between the aligning unit.

[0020]

According to the substrate transfer apparatus of the present invention, a plurality of substrates housed in a cassette in a horizontal state are taken out one by one by a carry-in / out means, and the substrates taken out by the carry-in / out means are taken out. The attitude of the loading / unloading means is controlled by the attitude control means to bring the substrate into the vertical state, and the loading / unloading means whose attitude is controlled to align the substrates in the vertical state is moved to the alignment unit by the moving means. Then, by performing the reverse operation, the substrate can be transported from the alignment unit to the cassette.

Therefore, since the loading / unloading means, the attitude control means and the moving means can be realized by one robot, the overall size can be reduced, the installation area can be reduced, and the cost can be reduced. be able to.

According to the second aspect of the present invention, the substrate in the vertical state moved by the moving means is received and supported in the vertical state, and the substrate is moved vertically to the surface of the substrate for receiving the next substrate. Since it further includes the alignment support means that moves a predetermined distance in any direction, the distance between the substrates can be controlled by controlling the movement distance of the alignment support means in addition to the function of the first aspect.

According to a third aspect of the present invention, in the substrate transfer apparatus, as the attitude control means, when the substrates held by the loading / unloading means are brought into a vertical state, the direction of the surface of the substrates is inverted by 180 ° for each one. Since this is adopted, in addition to the effect of claim 1 or claim 2, the substrates can be aligned with the front surface and the back surface facing each other.

According to a fourth aspect of the present invention, as the alignment support means, a fixed holder for aligning and supporting a plurality of substrates at predetermined intervals in a vertical state, and supporting the substrates in the same direction as the fixed holder. A movable holder, a positioning mechanism for moving the movable holder to face the predetermined position of the fixed holder, and an elevating mechanism for elevating and lowering the movable holder so as to transfer a substrate between the positioned movable holder and the fixed holder. Therefore, in addition to the effects of claim 2 or claim 3, the substrates can be aligned at predetermined intervals by the movable holder and the fixed holder that can move and run.

According to the fifth aspect of the present invention, a plurality of substrates accommodated in the cassette in a horizontal state are taken out by the carry-in / out means in a smaller number of sheets at a time, and taken out by the carry-in / out means. The attitude of the loading / unloading means is controlled by the attitude control means to bring the substrate into a vertical state,
The carrying-in / out means whose posture is controlled to align the substrates in the vertical state is moved to the aligning unit by the moving means. Then, by performing the reverse operation, the substrate can be transported from the alignment unit to the cassette.

Therefore, the loading / unloading means, the attitude control means and the moving means can be realized by one robot, so that the overall size can be reduced, the installation area can be reduced, and the cost can be reduced. be able to. Further, as compared with the substrate transfer apparatus of the first aspect, the transfer speed converted per one substrate can be increased.

According to a sixth aspect of the present invention, the attitude control means reverses the direction of the surface of the substrate by 180 ° each time the substrate held by the loading / unloading means is brought into a vertical state. Because we adopt
In addition to the function of the fifth aspect, the substrates can be aligned with the front surface and the back surface facing each other.

In the substrate transfer apparatus according to the present invention, as the moving means, a vertical substrate is loaded and unloaded in accordance with a substrate gap formed by a smaller number of vertical substrates. The operation of moving the loading / unloading means having a controlled posture, and the movement of the loading / unloading means having a controlled posture to carry out loading / unloading of a vertical substrate to a predetermined position following a plurality of vertical substrates. Since an operation for selecting the operation to be performed is adopted, in addition to the effect of claim 5 or claim 6, the substrates are aligned in a state in which the front surface and the rear surface face each other in units of a smaller number of substrates. be able to.

According to the substrate transfer apparatus of the present invention, a plurality of substrates accommodated in the cassette in a horizontal state are taken out by the carry-in / out means in a horizontal state with a smaller number of every other one by one. Then, the attitude of the loading / unloading means is controlled by the attitude control means so as to bring the substrate taken out by the vertical direction, and the loading / unloading means whose attitude is controlled to align the substrates in the vertical state is moved to the alignment unit by the moving means. Then, by performing the reverse operation, the substrate can be transported from the alignment unit to the cassette.

Therefore, since the loading / unloading means, the attitude control means and the moving means can be realized by one robot, the overall size can be reduced, the installation area can be reduced, and the cost can be reduced. be able to. Further, as compared with the substrate transfer apparatus of the first aspect, the transfer speed converted per substrate can be increased, and the gap between the substrates transferred at one time can be increased.

According to a ninth aspect of the present invention, as the attitude control means, when the substrate held by the loading / unloading means is brought into a vertical state, the direction of the surface of the substrate is inverted by 180 ° each time. Because we adopt
In addition to the function of the eighth aspect, the substrates can be aligned with the front surface and the back surface facing each other.

According to a tenth aspect of the present invention, the moving means corresponds to a substrate gap formed by a smaller number of the plurality of vertical substrates, and the distance between the front surfaces of the substrates is equal to the distance between the rear surfaces. In order to carry out loading and unloading of the substrate in the vertical state so as to be smaller than the interval, an operation of moving the loading / unloading means whose attitude is controlled is adopted. Substrates can be aligned in units of a smaller number of substrates with the front surface and the rear surface facing each other.

[0033] In the substrate transfer apparatus according to the eleventh aspect, as the alignment unit, the first alignment unit that supports the substrate in a vertical state in which the distance between the front surfaces and the distance between the back surfaces are different, and the distance between the front surface and the first alignment unit. The first alignment section and the second alignment section each include a second alignment section that supports a substrate in a vertical state in a state in which the distances between the back sides are equal to each other, and employs two substrates whose front surfaces face each other as a unit. In addition to the function of claim 10, the distance between the front surfaces and the distance between the back surfaces are different from each other, and the distance between the front surfaces and the distance between the back surfaces are different from each other. The change of the arrangement state of the substrate between the same state and the same state can be easily achieved.

[0034]

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of a substrate transfer apparatus according to an embodiment of the present invention.

FIG. 1 is a schematic plan view showing a substrate cleaning apparatus in which the substrate transfer apparatus of the present invention is incorporated, and FIG. 2 is a perspective view showing the same.

In this substrate cleaning apparatus, a cassette mounting table 2 is provided at a predetermined position outside the outer housing 1. And
A first robot 3 for transferring a substrate inside the outer housing 1;
A substrate aligning and supporting device 4, a cleaning tank 5, and a second robot 6 for transporting substrates are provided. Further, an opening / closing door member (not shown) is provided at a predetermined position of the outer housing 1 corresponding to the cassette mounting table.

The substrate transfer first robot 3 carries the substrate 8 in and out of the cassette 7 through the opening / closing door member in a horizontal state (a state in which the surface of the substrate is horizontal), and moves the substrate 8 vertically and horizontally. State (state where the surface of the substrate is vertical)
It has a shaft configuration capable of performing a posture changing operation for converting between the two and a loading / unloading operation of the substrate 8 in the vertical state with respect to the substrate alignment support device 4. In the posture changing operation, it is preferable that, when the substrate is changed from the horizontal state to the vertical state, the direction of the surface of the substrate is inverted by 180 ° for each sheet. Also,
For example, as shown in FIGS. 3A and 3B, the robot hand 31 holding the substrate 8 has a movable engagement portion 31b at a base portion of a U-shaped arm 31a and a pair of fixed portions at a distal end portion. Each of them has an engaging portion 31c and holds only the outer peripheral portion of the substrate 8 at three points. Here, the movable engagement portion 31b and the fixed engagement portion 31c have tapered surfaces at ends facing each other, and a central portion following the tapered surface has an engagement surface orthogonal to the arm 31a, The substrate 8 can be gripped while being separated from the arm 31a.
See middle (b).

The substrate alignment support device 4 is, for example, as shown in FIG.
As shown in FIG.
And a movable holder 42 for transferring one substrate 8 between the first robot 3 for transferring the substrate and a positioning drive mechanism for reciprocating the movable holder 42 to face a predetermined position of the fixed holder 41. 43, and an elevating mechanism 44 for elevating the movable holder 42 so as to transfer the substrate 8 between the positioned movable holder 42 and the fixed holder 41.

The second substrate transport robot 6 transports a plurality of substrates 8 at a time between the substrate aligning and supporting device 4 and the conventionally known cleaning tank 5. And a shaft configuration capable of performing a vertical movement at an arbitrary position of a reciprocating operation.

The operation of the substrate cleaning apparatus having the above configuration will be described with reference to FIGS.

The first substrate transfer robot 3 is operated to unload only one substrate 8 from the cassette 7 in a horizontal state.
As shown in FIG. 5A, the posture of the substrate 8 is changed to a vertical state, and the substrate 8 is moved to the vicinity of the movable holder 42.
Refer to the middle (b). The movable holder 4 is moved by the lifting mechanism 44.
2 to supply the substrate 8 to the movable holder 42 (see FIG. 6A). Next, the positioning drive mechanism 43
The substrate 8 is moved in the horizontal direction together with the movable holder 42, and the movable holder 42 is moved down by the elevating mechanism 44, thereby transferring the substrate 8 to the pair of fixed holders 41 (see FIG. 6B).

Thereafter, the lowered movable holder 42 is moved in the horizontal direction to the original position by the positioning drive mechanism 43 (see FIG. 7A), and the movable holder 42 is raised by the elevating mechanism 44 so that the next substrate is moved. Prepare for receipt.

Next, the first robot 3 for transferring the substrate is operated to unload only one substrate 8 from the cassette 7 in a horizontal state (see FIG. 8A), and the posture of the substrate 8 is changed to a vertical state. {The vertical position in this case is different from the position in FIG. 5B by 180 °} and is moved to the movable holder 42 (see FIG. 8B) to supply the substrate 8 {FIG. See (a) in 9｝. Next, the substrate 8 is moved in the horizontal direction together with the movable holder 42 by the positioning drive mechanism 43, and the movable holder 4 is moved by the elevating mechanism 44.
The substrate 8 is moved to a pair of fixed holders 41 by lowering the substrate 2 (see FIG. 9B). Therefore,
The preceding substrate 8 and the current substrate 8 are in a state where their surfaces face each other.

Thereafter, by repeating the operation of the movable holder 42 and the operation of the first substrate transfer robot 3, all the substrates contained in the cassette 7 can be transferred to the substrate alignment support device 4.

After all the substrates contained in the cassette 7 have been transported to the substrate aligning and supporting device 4, all the substrates 8 are supplied to the cleaning tank 5 at once by the second substrate transport robot 6. Can be washed.

After the cleaning of the substrate 8 is completed, the cleaning liquid is discharged and the substrate 8 is dried, and then all the substrates 8 are taken out of the cleaning tank 5 by the second substrate transport robot 6 at once. It is transported to the alignment support device 4. After that,
By operating the first substrate transporting robot 3 and the substrate aligning and supporting device 4 in the reverse manner, the substrates 8 can be returned from the substrate aligning and supporting device 4 to the cassette 7 one by one.

As can be seen from the above description, the cassette 7
It is only necessary to employ the substrate transfer first robot 3 and the substrate alignment support device 4 as a device for changing the posture while transferring the substrate 8 and aligning the same, so that the overall size can be reduced. Thus, the installation area can be reduced and the cost can be reduced. Further, the fixed holder 4 in the substrate alignment support device 4
Since the substrate support interval can be set smaller than the thickness of the robot hand, the substrate alignment and support device 4 can be reduced in size, and the cleaning tank 5 can also be reduced in size. Furthermore, since the space for temporarily placing the substrate 8 is only required for one substrate, space saving can be achieved from this aspect as well.

FIG. 10 is a schematic view of a main part showing another example of the structure of the substrate alignment and support device.

This substrate aligning and supporting device differs from the substrate aligning and supporting device of FIG. 4 only in that a substrate sensor 9 for detecting the presence or absence of the substrate 8 at a predetermined position of the movable holder 42 is provided.

The substrate sensor 9 may be a transmission type optical sensor or a reflection type optical sensor. The mounting position of the substrate sensor 9 is set so that the lower part of the substrate 8 supported by the movable holder 42 and the lower part of the substrate 8 supported by the fixed holder 41 can be detected.

Therefore, when the substrate aligning and supporting device having this configuration is employed, it is possible to detect whether or not the movable holder 42 supports the substrate 8, so that it is determined whether or not the transfer of the substrate 8 has been performed. Can be reliably detected.

Further, as shown in FIG.
By moving the movable holder 42 on which the
It is possible to detect at which position the substrate 8 is supported.

The case where all the substrates 8 in the two cassettes 7 are transported to the substrate aligning and supporting apparatus 4 has been described above. This is suitable for low-volume mass production.

However, in recent years, there has been an increasing demand for high-mix low-volume production. In such a situation,
It is conceivable that the substrates 8 are intermittently accommodated in the cassette. In such a case, the substrates 8 can be taken out of the cassette 7 one by one and aligned at predetermined intervals. The back surfaces can be made to face each other, and the quality such as cleaning can be maintained.
Of course, of the substrates 8 housed in the cassette 7,
It is possible to easily cope with a single-wafer processing in which only an arbitrary substrate 8 is selected and a cleaning processing or the like is performed. In these cases,
Since the substrate 8 is present only locally, it can be present only at the center or only at the end of the substrate alignment and support device 4.

Further, by adopting the fixed holder 41 in which the substrate support interval is arbitrarily set, the support interval of the substrate 8 can be arbitrarily set, so that the substrate interval in which an optimum cleaning effect can be achieved is realized. Can be. Specifically, the support interval of the substrate is set to be large or small, the front surface and the back surface are opposed to each other, the front surface and the back surface are opposed, and the space between the front surfaces and the space between the back surfaces are different from each other. Can be.

In the above embodiment, the substrate is transported with the posture change using the first substrate transporting robot 3 and the substrate alignment support device 4. However, depending on the application, the substrate alignment support device may be used. Can be omitted.

FIG. 12 is a schematic view showing a main part (first substrate transfer robot) of a substrate cleaning apparatus in which still another embodiment of the substrate transfer apparatus of the present invention is incorporated.

This first substrate transfer robot 3 is different from the first substrate transfer robot of FIG. 3 in that a plurality of (four in this embodiment) U-shaped arms 31a are arranged at predetermined intervals (for example, 2 of the pitch of the substrate 8 accommodated in the cassette 7
At a double pitch), and each arm 31a has a movable engagement portion 3
1b and only the point provided with the fixed engagement portion 31c.

FIG. 13 is a schematic view showing another essential portion (substrate alignment support device) of a substrate cleaning apparatus in which still another embodiment of the substrate transfer apparatus of the present invention is incorporated.

This substrate alignment support device 4 is different from the substrate alignment support device of FIG. 4 in that the length of a pair of fixed holders 41 parallel to each other is increased so that the distance between the front surfaces and the distance between the back surfaces is increased. A movable holder in which a first alignment portion 41a for supporting a substrate in a vertical state in a different state and a second alignment portion 41b for supporting a substrate in a vertical state with a space between front surfaces and a space between back surfaces being equal are formed; 42, the two substrates 8 whose surfaces are opposed to each other are simultaneously
Interval adjusting section 4 for transporting between 1a and second alignment section 41b
It is only that 2 'was adopted. In addition, the interval adjusting unit 42 ′
To an arbitrary predetermined position of the first alignment section 41a,
(b) a positioning drive mechanism (43) for reciprocating operation so as to directly face an arbitrary predetermined position (b),
2 ′ between the first alignment portion 41a and the second alignment portion 41b.
And an elevating mechanism 44 for elevating and lowering the interval adjuster 42 'to transfer the substrates 8.

The operation of the substrate cleaning apparatus having the above configuration is shown in FIG.
19 will be described with reference to FIG.

First, the first substrate transfer robot 3 is operated to carry out the four odd-numbered substrates 8 from the cassette 7 in a horizontal state (see FIG. 14), and the postures of these substrates 8 are changed to a vertical state. At the same time, the four substrates 8 are supplied to the first alignment portion 41a by moving the substrate to a position immediately above the first alignment portion 41a of the substrate alignment support device 4 and then lowering the substrate (see FIG. 15).

Then, the first robot 3 for transferring substrates is operated to carry out the even-numbered four substrates 8 from the cassette 7 in a horizontal state (see FIG. 16), and the postures of these substrates 8 are changed to a vertical state. At the same time, the four substrates 8 are moved to just above the first alignment part 41a of the substrate alignment support device 4 and then lowered, so that the four substrates 8 are alternately arranged with the already supplied substrates 8, and It is supplied to the first alignment unit 41a such that the front surface and the back surface face each other (see FIG. 17).

Therefore, in this state, the substrate 8
Are smaller than the distance between the back surfaces (for example, if the distance between the substrates in the cassette 7 is 10 mm and the distance between the front surfaces is 5 mm, the distance between the back surfaces is 15 mm) ). In other words, since the space between the back surfaces of the substrates 8 is set to be large, the robot hand 31 can enter without contacting the other substrates 8.

Thereafter, the second distance is adjusted by the interval adjuster 42 '.
The two substrates 8 closest to the alignment unit 41b are placed in the first alignment unit 41
Lifting from a {see FIG. 18 (A)}, interval adjusting unit 4
2 ′, the two lifted substrates 8 are moved toward the second alignment portion 41b {see FIG. 18 (B)}.
The two substrates 8 are lowered by the interval adjusting part 42 'and supported by the second alignment part 41b (see (C) in FIG. 18).

Next, the next two substrates 8 are supported by the second alignment portion 41b by operating the interval adjusting portion 42 'in the same manner as described above. {(A), (B), (C) in FIG. reference}.

Similarly, the remaining two substrates 8 can be supported by the second alignment portion 41b.

Thereafter, all the substrates 8 in the cassette 7 can be supported by the second alignment portion 41b by repeating the above series of processing.

In the transfer of the substrate 8 by the interval adjusting section 42 ', unlike the transfer using the robot hand, the interval between the substrates 8 can be made sufficiently small. In other words, the distance between the back surfaces of the substrates 8 can be reduced to the distance between the front surfaces.

Thereafter, the substrate can be cleaned in the same manner as in the substrate cleaning apparatus shown in FIGS.

Of course, by performing the operation reverse to the above, the cleaned substrate 8 can be returned to the cassette 7.

If this embodiment is adopted, the first alignment section 4
Since it is necessary to support a larger number of substrates 8 than in the above-described embodiment as 1a, the size of the substrate aligning and supporting device 4 is slightly increased, but the substrate 8 between the cassette 7 and the first aligning portion 41a is slightly larger. The transport is performed in units of a plurality of substrates, and the transport of the substrate 8 between the first alignment unit 41a and the second alignment unit 41b is performed in units of two substrates. The required time can be reduced.

In the embodiment shown in FIGS. 12 and 13, when the distance between the substrates 8 is set to 5 mm, the robot hand 3
This is suitable when the contact between the substrate 1 and the substrate 8 cannot be avoided (when the thickness of the robot hand 31 is large). In transporting the substrate 8 by the robot hand 31, the substrate 8 in a state supported by the first alignment unit 41a is suitable. The distance between the back surfaces of the robot hands can be reduced to 15 mm, and the robot hand 3
The interference between 1 and the substrate 8 can be reliably avoided.

However, when the thickness of the robot hand 31 is sufficiently small, the interference between the robot hand 31 and the substrate 8 can be avoided even if the distance between the substrates 8 is set to 5 mm.

Therefore, in such a case, the plurality of U-shaped arms 31a of the robot hand 31 are arranged at the same pitch as the pitch of the substrates 8 accommodated in the cassette 7, and The plurality of substrates 8 are loaded or unloaded in a horizontal state, and the posture of the substrate held by the robot hand 31 is changed between the horizontal state and the vertical state. '
The transfer of the substrate 8 can be achieved by directly supplying and taking out the second aligning portion 41b without intervening. Of course, the substrate 8 in the vertical state can be set in a state where the front surface and the back surface face each other.

As a result, it is possible to achieve both high-speed substrate transfer and simplification and downsizing of the configuration.

[0077]

According to the first aspect of the present invention, since the loading / unloading means, the attitude control means, and the moving means can be realized by one robot, the overall size can be reduced and the installation area can be reduced. In addition, there is an effect that the cost can be reduced.

The invention according to claim 2 has a unique effect that the distance between the substrates can be easily changed by controlling the moving distance of the alignment support means, in addition to the effect of claim 1.

The third aspect of the invention has a unique effect that the substrates can be aligned with the front surface and the back surface facing each other, in addition to the effect of the first or second aspect.

According to a fourth aspect of the present invention, in addition to the advantages of the second or third aspect, a unique effect that the substrate can be aligned at a predetermined interval by the movable holder and the movable holder that can move and run. To play.

According to the fifth aspect of the present invention, since the loading / unloading means, the attitude control means, and the moving means can be realized by one robot, the overall size can be reduced and the installation area can be reduced.
It is possible to achieve a unique effect that the cost can be reduced and the transport speed converted per substrate can be increased as compared with the first aspect of the present invention.

According to the invention of claim 6, in addition to the effect of claim 5, there is a special effect that the substrates can be aligned with the front surface and the back surface facing each other.

According to the seventh aspect of the present invention, in addition to the effects of the fifth or sixth aspect, the substrates can be aligned in a state in which the front surface and the rear surface face each other in a unit of a smaller number of substrates. Has a unique effect.

According to the eighth aspect of the present invention, since the loading / unloading means, the attitude control means and the moving means can be realized by one robot, the overall size can be reduced and the installation area can be reduced.
It is possible to reduce the cost, increase the transfer speed per substrate as compared with the invention of claim 1, and increase the gap between the substrates transferred at one time. It has the unique effect of being able to.

According to the ninth aspect of the present invention, in addition to the effect of the eighth aspect, a unique effect that the substrates can be aligned with the front surface and the rear surface facing each other is exerted.

The tenth aspect of the present invention has the unique effect that, in addition to the effect of the ninth aspect, the substrates can be aligned in a state in which the front surface and the back surface are opposed to each other in a smaller number of substrates. Play.

According to the eleventh aspect of the present invention, in addition to the effect of the tenth aspect, in addition to the state in which the distance between the front surfaces and the distance between the rear surfaces are different and the state where the distance between the front surfaces is equal to the distance between the rear surfaces, There is a unique effect that the arrangement state of the substrates can be easily changed.

[Brief description of the drawings]

FIG. 1 is a schematic plan view showing a substrate cleaning apparatus in which a substrate transfer device of the present invention is incorporated.

FIG. 2 is a transparent perspective view of the same.

FIG. 3 is a schematic view showing a robot hand of a first robot for transferring substrates.

FIG. 4 is a perspective view showing a configuration of a substrate alignment support device.

FIG. 5 is a schematic view illustrating the transfer of a substrate by a first substrate transfer robot.

FIG. 6 is a schematic diagram illustrating the transfer of a substrate from a movable holder to a fixed holder.

FIG. 7 is a schematic diagram illustrating a return operation of the movable holder.

FIG. 8 is a schematic diagram illustrating the transfer of a substrate by a first substrate transfer robot.

FIG. 9 is a schematic diagram illustrating the transfer of a substrate from a movable holder to a fixed holder.

FIG. 10 is a main part schematic diagram showing another configuration example of the substrate alignment support device.

FIG. 11 is a schematic diagram for explaining another function of the substrate alignment support device.

FIG. 12 is a main part of a substrate cleaning apparatus in which still another embodiment of the substrate transport apparatus of the present invention is incorporated (first substrate transport apparatus).
FIG.

FIG. 13 is a schematic view showing another main part (substrate alignment support device) of a substrate cleaning apparatus into which still another embodiment of the substrate transfer apparatus of the present invention is incorporated.

FIG. 14 is a schematic diagram illustrating a process of removing an odd-numbered substrate from a cassette.

FIG. 15 is a schematic diagram illustrating a process of supplying a substrate taken out of a cassette to a first alignment unit.

FIG. 16 is a schematic diagram illustrating a process of removing an even-numbered substrate from a cassette.

FIG. 17 is a schematic diagram illustrating a process of supplying a substrate taken out of a cassette to a first alignment unit.

FIG. 18 is a schematic diagram illustrating a process of transporting the first two substrates from the first alignment unit to the second alignment unit.

FIG. 19 is a schematic diagram illustrating a process of transporting the next two substrates from the first alignment unit to the second alignment unit.

[Explanation of symbols]

 Reference Signs List 3 first robot for substrate transfer 4 substrate alignment support device 7 cassette 8 substrate 41a first alignment unit 41b second alignment unit 42 'interval adjustment unit

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Takao Matsumoto 1304 Kanaokacho, Sakai City, Osaka Daikin Industries, Ltd. Inside the Kanaoka Plant (72) Eiji Taguchi 3-12 Chikushinmachi, Sakai City, Osaka Daikin Industries, Ltd. F-term in Rinkai factory (reference) 5F031 CA02 FA01 FA07 FA11 FA12 FA14 FA18 FA20 FA21 GA03 GA06 GA43 GA47 GA50 HA72 JA05 JA06 JA22 KA15 MA23

Claims (11)

[Claims] 1. A loading / unloading means (3) for loading and unloading a plurality of substrates (8) one by one with respect to a cassette (7) in a horizontal state, and held by a loading / unloading means (3). Attitude control means (3) for controlling the attitude of the loading / unloading means (3) so as to change the attitude of the substrate (8) between a horizontal state and a vertical state, and a predetermined alignment of the substrate (8) in the vertical state. A moving means (3) for moving a carrying-in / out means (3) whose attitude is controlled so as to carry in / out the unit. 2. The vertical substrate (8) moved by the moving means (3) is received and supported in a vertical state, and the substrate (8) is received for the next substrate (8). 2. The substrate transfer apparatus according to claim 1, further comprising an alignment support means (4) which moves a predetermined distance in a direction perpendicular to the plane. 3. The attitude control means (3) adjusts the direction of the surface of the substrate (8) one by one in order to bring the substrate (8) held by the carry-in / out means (3) into a vertical state.
3. The substrate transfer device according to claim 1, wherein the substrate transfer device is turned over. 4. The alignment support means (4) includes: a fixed holder (41) for aligning and supporting a plurality of substrates (8) at predetermined intervals in a vertical state; and a substrate in the same direction as the fixed holder (41). A movable holder (42) for supporting (8), a positioning mechanism (43) for moving the movable holder (42) to face a predetermined position of the fixed holder (41),
3. An elevating mechanism (44) for raising and lowering the movable holder (42) so as to transfer the substrate (8) between the positioned movable holder (42) and the fixed holder (41). 4. The substrate transfer device according to 3. 5. A loading / unloading means (3) for loading and unloading a plurality of substrates (8) in a horizontal state with respect to a cassette (7) in a smaller number of sheets, and holding by a loading / unloading means (3). A posture control means (3) for controlling the posture of the loading / unloading means (3) so as to convert the posture of the substrate (8) between the horizontal state and the vertical state, and a predetermined state of the substrate (8) in the vertical state. Moving means (3) for moving the carrying-in / out means (3) whose posture is controlled so that carrying-in / out is carried out with respect to the aligning section (4)
And a substrate transfer device. 6. When the substrate (8) held by the carry-in / out means (3) is brought into a vertical state, the attitude control means (3) changes the surface direction of the substrate (8) by 180 each time.
6. The substrate transfer device according to claim 5, wherein the substrate is inverted. 7. The moving means (3) for loading and unloading the substrate (8) in a vertical state corresponding to a substrate gap formed by a smaller number of substrates (8) in a vertical state. An operation for moving the loading / unloading means (3) whose attitude is controlled, and an attitude for loading and unloading the vertical substrate (8) to a predetermined position following a smaller number of the plurality of vertical substrates (8). 7. The substrate transfer apparatus according to claim 6, wherein the control means selects the operation of moving the controlled loading / unloading means (3). 8. A loading / unloading means (3) for loading and unloading a plurality of substrates (8) in a horizontal state with respect to a cassette (7) every other one by a plurality of sheets, and a loading / unloading means (3). )
A posture control means (3) for controlling the posture of the loading / unloading means (3) so as to convert the posture of the substrate (8) held by the robot between the horizontal state and the vertical state, and the substrate (8) in the vertical state
And a moving means (3) for moving a carrying-in / out means (3) whose posture is controlled so as to carry in / out a predetermined aligning section (4). 9. When the posture control means (3) sets the substrate (8) held by the carrying-in / out means (3) to a vertical state, the orientation of the surface of the substrate (8) is adjusted by 180 each time.
9. The substrate transfer device according to claim 8, wherein the substrate is inverted. 10. The moving means (3) corresponds to a substrate gap formed by a smaller number of the plurality of vertical substrates (8), and the distance between the front surfaces of the substrates (8) is smaller than that of the rear surfaces. 10. The substrate according to claim 9, wherein an operation of moving the loading / unloading means (3) whose attitude is controlled so as to load and unload the substrate in a vertical state so as to be smaller than the interval is performed. Transport device. 11. The first alignment portion (41a) for supporting the substrate (8) in a vertical state in a state where the distance between the front surfaces and the distance between the back surfaces are different from each other. A second alignment portion (42b) for supporting a substrate (8) in a vertical state with an equal distance between the back surfaces; and a first alignment portion for each of the two substrates (8) whose front surfaces are opposed to each other. The substrate transfer apparatus according to claim 10, further comprising an interval adjusting means (42 ') for moving the substrate (8) between the substrate and the second alignment unit.