JP3934291B2 - 遠紫外線露光用ポジ型レジスト組成物 - Google Patents

遠紫外線露光用ポジ型レジスト組成物 Download PDF

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Publication number
JP3934291B2
JP3934291B2 JP29714599A JP29714599A JP3934291B2 JP 3934291 B2 JP3934291 B2 JP 3934291B2 JP 29714599 A JP29714599 A JP 29714599A JP 29714599 A JP29714599 A JP 29714599A JP 3934291 B2 JP3934291 B2 JP 3934291B2
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Japan
Prior art keywords
group
acid
alkyl group
resin
hydrogen atom
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Expired - Lifetime
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JP29714599A
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Japanese (ja)
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JP2001117232A5 (enExample
JP2001117232A (ja
Inventor
健一郎 佐藤
邦彦 児玉
利明 青合
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP29714599A priority Critical patent/JP3934291B2/ja
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Publication of JP2001117232A5 publication Critical patent/JP2001117232A5/ja
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Publication of JP3934291B2 publication Critical patent/JP3934291B2/ja
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Expired - Lifetime legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP29714599A 1999-10-19 1999-10-19 遠紫外線露光用ポジ型レジスト組成物 Expired - Lifetime JP3934291B2 (ja)

Priority Applications (1)

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JP29714599A JP3934291B2 (ja) 1999-10-19 1999-10-19 遠紫外線露光用ポジ型レジスト組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29714599A JP3934291B2 (ja) 1999-10-19 1999-10-19 遠紫外線露光用ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2001117232A JP2001117232A (ja) 2001-04-27
JP2001117232A5 JP2001117232A5 (enExample) 2005-07-14
JP3934291B2 true JP3934291B2 (ja) 2007-06-20

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Family Applications (1)

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JP29714599A Expired - Lifetime JP3934291B2 (ja) 1999-10-19 1999-10-19 遠紫外線露光用ポジ型レジスト組成物

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JP (1) JP3934291B2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003342306A (ja) * 2002-03-18 2003-12-03 Toray Ind Inc レジスト用ポリマーの製造方法、およびポジ型感放射線性組成物
JP4512340B2 (ja) * 2003-10-20 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP4693149B2 (ja) * 2004-04-12 2011-06-01 三菱レイヨン株式会社 レジスト用重合体
WO2006028071A1 (ja) 2004-09-10 2006-03-16 Mitsubishi Rayon Co., Ltd. レジスト用重合体、レジスト用重合体の製造方法、レジスト組成物、およびパターンが形成された基板の製造方法
JP4645153B2 (ja) * 2004-10-27 2011-03-09 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4513501B2 (ja) * 2004-10-27 2010-07-28 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4796811B2 (ja) * 2005-09-22 2011-10-19 富士フイルム株式会社 ポジ型レジスト組成物およびそれを用いたパターン形成方法
US8735044B2 (en) 2009-05-28 2014-05-27 Sumitomo Chemical Company, Limited Salt and photoresist composition containing the same

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Publication number Publication date
JP2001117232A (ja) 2001-04-27

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