JP3934259B2 - ポジ型感光性樹脂組成物 - Google Patents

ポジ型感光性樹脂組成物 Download PDF

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Publication number
JP3934259B2
JP3934259B2 JP22979198A JP22979198A JP3934259B2 JP 3934259 B2 JP3934259 B2 JP 3934259B2 JP 22979198 A JP22979198 A JP 22979198A JP 22979198 A JP22979198 A JP 22979198A JP 3934259 B2 JP3934259 B2 JP 3934259B2
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Japan
Prior art keywords
group
acid
photosensitive resin
resin composition
compound
Prior art date
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Expired - Fee Related
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JP22979198A
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English (en)
Japanese (ja)
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JP2000066396A5 (hr
JP2000066396A (ja
Inventor
保雅 河辺
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Fujifilm Corp
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Fujifilm Corp
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Priority to JP22979198A priority Critical patent/JP3934259B2/ja
Publication of JP2000066396A publication Critical patent/JP2000066396A/ja
Publication of JP2000066396A5 publication Critical patent/JP2000066396A5/ja
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Publication of JP3934259B2 publication Critical patent/JP3934259B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
JP22979198A 1998-08-14 1998-08-14 ポジ型感光性樹脂組成物 Expired - Fee Related JP3934259B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22979198A JP3934259B2 (ja) 1998-08-14 1998-08-14 ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22979198A JP3934259B2 (ja) 1998-08-14 1998-08-14 ポジ型感光性樹脂組成物

Publications (3)

Publication Number Publication Date
JP2000066396A JP2000066396A (ja) 2000-03-03
JP2000066396A5 JP2000066396A5 (hr) 2005-02-24
JP3934259B2 true JP3934259B2 (ja) 2007-06-20

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ID=16897738

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22979198A Expired - Fee Related JP3934259B2 (ja) 1998-08-14 1998-08-14 ポジ型感光性樹脂組成物

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JP (1) JP3934259B2 (hr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002006483A (ja) * 2000-06-20 2002-01-09 Sumitomo Chem Co Ltd フォトレジスト組成物
JP2002049157A (ja) * 2000-08-03 2002-02-15 Nec Corp ポジ型化学増幅レジスト及びそのパターン形成方法
JP2002343860A (ja) * 2001-05-17 2002-11-29 Tokyo Ohka Kogyo Co Ltd 保護膜形成用材料
JP4574067B2 (ja) * 2001-06-08 2010-11-04 ルネサスエレクトロニクス株式会社 レジスト組成物
US6569778B2 (en) * 2001-06-28 2003-05-27 Hynix Semiconductor Inc. Method for forming fine pattern in semiconductor device
JP4617950B2 (ja) * 2004-03-23 2011-01-26 住友化学株式会社 化学増幅型ポジ型レジスト組成物
US7132218B2 (en) * 2004-03-23 2006-11-07 Sumitomo Chemical Company, Limited Chemically amplified positive resist composition

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Publication number Publication date
JP2000066396A (ja) 2000-03-03

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