JP3916188B2 - ポジ型フォトレジスト組成物 - Google Patents

ポジ型フォトレジスト組成物 Download PDF

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Publication number
JP3916188B2
JP3916188B2 JP10282298A JP10282298A JP3916188B2 JP 3916188 B2 JP3916188 B2 JP 3916188B2 JP 10282298 A JP10282298 A JP 10282298A JP 10282298 A JP10282298 A JP 10282298A JP 3916188 B2 JP3916188 B2 JP 3916188B2
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JP
Japan
Prior art keywords
group
acid
resin
embedded image
groups
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10282298A
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English (en)
Japanese (ja)
Other versions
JPH11295893A (ja
JPH11295893A5 (enExample
Inventor
亨 藤森
史郎 丹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP10282298A priority Critical patent/JP3916188B2/ja
Priority to KR10-1999-0012958A priority patent/KR100533402B1/ko
Priority to US09/292,052 priority patent/US6207343B1/en
Publication of JPH11295893A publication Critical patent/JPH11295893A/ja
Publication of JPH11295893A5 publication Critical patent/JPH11295893A5/ja
Application granted granted Critical
Publication of JP3916188B2 publication Critical patent/JP3916188B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Materials For Photolithography (AREA)
JP10282298A 1998-04-14 1998-04-14 ポジ型フォトレジスト組成物 Expired - Fee Related JP3916188B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP10282298A JP3916188B2 (ja) 1998-04-14 1998-04-14 ポジ型フォトレジスト組成物
KR10-1999-0012958A KR100533402B1 (ko) 1998-04-14 1999-04-13 포지티브 감광성 조성물
US09/292,052 US6207343B1 (en) 1998-04-14 1999-04-14 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10282298A JP3916188B2 (ja) 1998-04-14 1998-04-14 ポジ型フォトレジスト組成物

Publications (3)

Publication Number Publication Date
JPH11295893A JPH11295893A (ja) 1999-10-29
JPH11295893A5 JPH11295893A5 (enExample) 2005-05-26
JP3916188B2 true JP3916188B2 (ja) 2007-05-16

Family

ID=14337726

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10282298A Expired - Fee Related JP3916188B2 (ja) 1998-04-14 1998-04-14 ポジ型フォトレジスト組成物

Country Status (1)

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JP (1) JP3916188B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4121396B2 (ja) 2003-03-05 2008-07-23 富士フイルム株式会社 ポジ型レジスト組成物
JP5039410B2 (ja) * 2007-03-29 2012-10-03 富士フイルム株式会社 ポジ型レジスト組成物およびこれを用いたパターン形成方法

Also Published As

Publication number Publication date
JPH11295893A (ja) 1999-10-29

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