JP3884996B2 - 投影光学系における保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法 - Google Patents

投影光学系における保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法 Download PDF

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Publication number
JP3884996B2
JP3884996B2 JP2002174904A JP2002174904A JP3884996B2 JP 3884996 B2 JP3884996 B2 JP 3884996B2 JP 2002174904 A JP2002174904 A JP 2002174904A JP 2002174904 A JP2002174904 A JP 2002174904A JP 3884996 B2 JP3884996 B2 JP 3884996B2
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JP
Japan
Prior art keywords
holding member
optical system
respect
holding
holding device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002174904A
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English (en)
Japanese (ja)
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JP2004020868A (ja
JP2004020868A5 (enExample
Inventor
正彦 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2002174904A priority Critical patent/JP3884996B2/ja
Priority to US10/461,843 priority patent/US7016126B2/en
Publication of JP2004020868A publication Critical patent/JP2004020868A/ja
Publication of JP2004020868A5 publication Critical patent/JP2004020868A5/ja
Application granted granted Critical
Publication of JP3884996B2 publication Critical patent/JP3884996B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Lens Barrels (AREA)
JP2002174904A 2002-06-14 2002-06-14 投影光学系における保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法 Expired - Fee Related JP3884996B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002174904A JP3884996B2 (ja) 2002-06-14 2002-06-14 投影光学系における保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法
US10/461,843 US7016126B2 (en) 2002-06-14 2003-06-13 Optical element holding system in projection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002174904A JP3884996B2 (ja) 2002-06-14 2002-06-14 投影光学系における保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法

Publications (3)

Publication Number Publication Date
JP2004020868A JP2004020868A (ja) 2004-01-22
JP2004020868A5 JP2004020868A5 (enExample) 2005-06-16
JP3884996B2 true JP3884996B2 (ja) 2007-02-21

Family

ID=31173751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002174904A Expired - Fee Related JP3884996B2 (ja) 2002-06-14 2002-06-14 投影光学系における保持装置、該保持装置による光学調整方法、該保持装置を有する露光装置、露光方法、デバイス製造方法

Country Status (2)

Country Link
US (1) US7016126B2 (enExample)
JP (1) JP3884996B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7726811B2 (en) * 2006-02-14 2010-06-01 Lai Shui T Subjective wavefront refraction using continuously adjustable wave plates of Zernike function
SG185313A1 (en) * 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
CN106094155B (zh) * 2016-07-20 2018-10-30 瑞声科技(新加坡)有限公司 成像镜头

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1027743A (ja) * 1996-07-11 1998-01-27 Canon Inc 投影露光装置、デバイス製造方法及び収差補正光学系
JPH1054932A (ja) * 1996-08-08 1998-02-24 Nikon Corp 投影光学装置及びそれを装着した投影露光装置
US6179208B1 (en) * 1997-01-31 2001-01-30 Metanetics Corporation Portable data collection device with variable focusing module for optic assembly
JPH11121322A (ja) * 1997-10-09 1999-04-30 Nikon Corp 投影露光装置及び方法
US6924937B2 (en) * 1998-11-16 2005-08-02 Canon Kabushiki Kaisha Aberration correcting optical system

Also Published As

Publication number Publication date
US7016126B2 (en) 2006-03-21
US20040257680A1 (en) 2004-12-23
JP2004020868A (ja) 2004-01-22

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