JP3852196B2 - 投影光学系、投影露光装置及び走査投影露光方法 - Google Patents

投影光学系、投影露光装置及び走査投影露光方法 Download PDF

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Publication number
JP3852196B2
JP3852196B2 JP36274197A JP36274197A JP3852196B2 JP 3852196 B2 JP3852196 B2 JP 3852196B2 JP 36274197 A JP36274197 A JP 36274197A JP 36274197 A JP36274197 A JP 36274197A JP 3852196 B2 JP3852196 B2 JP 3852196B2
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Japan
Prior art keywords
optical system
projection
imaging
imaging optical
optical path
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Expired - Lifetime
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JP36274197A
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English (en)
Japanese (ja)
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JPH11176741A5 (enExample
JPH11176741A (ja
Inventor
泰弘 大村
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Nikon Corp
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Nikon Corp
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Priority to JP36274197A priority Critical patent/JP3852196B2/ja
Publication of JPH11176741A publication Critical patent/JPH11176741A/ja
Publication of JPH11176741A5 publication Critical patent/JPH11176741A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP36274197A 1997-12-12 1997-12-12 投影光学系、投影露光装置及び走査投影露光方法 Expired - Lifetime JP3852196B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP36274197A JP3852196B2 (ja) 1997-12-12 1997-12-12 投影光学系、投影露光装置及び走査投影露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36274197A JP3852196B2 (ja) 1997-12-12 1997-12-12 投影光学系、投影露光装置及び走査投影露光方法

Publications (3)

Publication Number Publication Date
JPH11176741A JPH11176741A (ja) 1999-07-02
JPH11176741A5 JPH11176741A5 (enExample) 2005-09-02
JP3852196B2 true JP3852196B2 (ja) 2006-11-29

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JP36274197A Expired - Lifetime JP3852196B2 (ja) 1997-12-12 1997-12-12 投影光学系、投影露光装置及び走査投影露光方法

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JP (1) JP3852196B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006173305A (ja) * 2004-12-15 2006-06-29 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
JP6936002B2 (ja) * 2016-12-08 2021-09-15 リコーインダストリアルソリューションズ株式会社 投射光学系および投射装置および撮像装置

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Publication number Publication date
JPH11176741A (ja) 1999-07-02

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