JP3849876B2 - 半導体レーザ素子及びその製造方法 - Google Patents

半導体レーザ素子及びその製造方法 Download PDF

Info

Publication number
JP3849876B2
JP3849876B2 JP2004303592A JP2004303592A JP3849876B2 JP 3849876 B2 JP3849876 B2 JP 3849876B2 JP 2004303592 A JP2004303592 A JP 2004303592A JP 2004303592 A JP2004303592 A JP 2004303592A JP 3849876 B2 JP3849876 B2 JP 3849876B2
Authority
JP
Japan
Prior art keywords
layer
waveguide region
waveguide
ridge
stripe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2004303592A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005020037A (ja
JP2005020037A5 (enrdf_load_stackoverflow
Inventor
拓明 松村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichia Corp
Original Assignee
Nichia Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichia Corp filed Critical Nichia Corp
Priority to JP2004303592A priority Critical patent/JP3849876B2/ja
Publication of JP2005020037A publication Critical patent/JP2005020037A/ja
Publication of JP2005020037A5 publication Critical patent/JP2005020037A5/ja
Application granted granted Critical
Publication of JP3849876B2 publication Critical patent/JP3849876B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Semiconductor Lasers (AREA)
JP2004303592A 2000-06-08 2004-10-18 半導体レーザ素子及びその製造方法 Expired - Lifetime JP3849876B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004303592A JP3849876B2 (ja) 2000-06-08 2004-10-18 半導体レーザ素子及びその製造方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000172797 2000-06-08
JP2001116197 2001-04-13
JP2004303592A JP3849876B2 (ja) 2000-06-08 2004-10-18 半導体レーザ素子及びその製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001125215A Division JP3716974B2 (ja) 2000-06-08 2001-04-24 半導体レーザ素子及びその製造方法

Publications (3)

Publication Number Publication Date
JP2005020037A JP2005020037A (ja) 2005-01-20
JP2005020037A5 JP2005020037A5 (enrdf_load_stackoverflow) 2005-07-21
JP3849876B2 true JP3849876B2 (ja) 2006-11-22

Family

ID=34198642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004303592A Expired - Lifetime JP3849876B2 (ja) 2000-06-08 2004-10-18 半導体レーザ素子及びその製造方法

Country Status (1)

Country Link
JP (1) JP3849876B2 (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4952376B2 (ja) 2006-08-10 2012-06-13 三菱電機株式会社 光導波路と半導体光集積素子の製造方法
JP7573837B2 (ja) 2020-01-08 2024-10-28 旭化成株式会社 光学装置の製造方法及び光学装置

Also Published As

Publication number Publication date
JP2005020037A (ja) 2005-01-20

Similar Documents

Publication Publication Date Title
KR100763829B1 (ko) 반도체 레이저 소자 및 그 제조방법
JP3945479B2 (ja) 半導体レーザ素子及びその製造方法
JP4370911B2 (ja) 半導体レーザ素子
US20040041156A1 (en) Nitride semiconductor light emitting element and production thereof
JP5076656B2 (ja) 窒化物半導体レーザ素子
JP3716974B2 (ja) 半導体レーザ素子及びその製造方法
JP4291960B2 (ja) 窒化物半導体素子
JP4991025B2 (ja) 窒化物半導体レーザ素子
JP4333362B2 (ja) GaN系半導体レーザ装置
US7804882B2 (en) Nitride semiconductor laser element
JP5023567B2 (ja) 窒化物半導体レーザ素子
JP4955195B2 (ja) 窒化物半導体素子
JP4146881B2 (ja) 窒化物半導体発光素子およびエピウエハとその製造方法
JP3849876B2 (ja) 半導体レーザ素子及びその製造方法
JP4045792B2 (ja) 窒化物半導体レーザ素子
JP2005101536A (ja) 窒化物半導体レーザ素子
JP5010096B2 (ja) 窒化物半導体レーザ素子及びそれを用いたld装置
JP5532082B2 (ja) 窒化物半導体レーザ素子
JP3968959B2 (ja) 窒化物半導体素子の製造方法
JP5074863B2 (ja) 窒化物半導体発光素子およびエピウエハとその製造方法
CN100375349C (zh) 半导体激光元件及其制造方法
JP2002111133A (ja) 窒化物半導体発光素子

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050204

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050204

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060810

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060823

R150 Certificate of patent or registration of utility model

Ref document number: 3849876

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090908

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090908

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100908

Year of fee payment: 4

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100908

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110908

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110908

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120908

Year of fee payment: 6

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120908

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120908

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130908

Year of fee payment: 7

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term